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   Plasma Physics (including Thermonuclear Fusion).
      Plasma applications.
         Plasma technology.
Silicon nitride films fabricated by a plasma-enhanced chemical vapor deposition method for coatings of the laser interferometer gravitational wave detector
Huang-Wei Pan, Ling-Chi Kuo, Shu-Yu Huang, Meng-Yun Wu, Yu-Hang Juang, Chia-Wei Lee, Hsin-Chieh Chen, Ting Ting Wen, and Shiuh Chao
Phys. Rev. D: Part. Fields , Vol: 97, No: 2 , published: 24 January 2018
Low temperature plasma-based processes for innovation in textiles
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Pascale Chevallier, Ranna Tolouei, Stephane Turgeon, Lucie Levesque, Diego Mantovani
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Plasma processing of biologically active membranes at atmospheric and low pressure
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Farzaneh Arefi-Khonsari
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Effect of pH on the Stability of MWCNTs Coated with Functional Plasma Polymer Films
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Larissa Jorge, Pierre-Luc Girard-Lauriault, Sylvain Coulombe
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Adhesion and differentiation of inflammatory cells to oxygen- and nitrogen-rich plasma polymer films
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Sara Babaei, Natalie Fekete, Corinne A. Hoesli, Pierre-Luc Girard-Lauriault
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Triode sputter source used for the deposition of plain bearings
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Johann Laimer, Eva Ruppert, Herbert Stoeri
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Development of atmospheric pressure plasma sintering method
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Nobuhiro Nishino, Kazumasa Yamamoto, Naoya Ogawa
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Plasma Functionalization of Metal Oxide Nanoparticles and Impact on Dispersibility
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Stella Mathioudaki, Bastien Barthelemy, Stephane Lucas
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Surface plasma engineering for the controlled release of silver ions for antibacterial applications
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Linda Bonilla-Gameros, Maxime Cloutier, Vanessa Montano-Machado, Diego Mantovani
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Validity of the continuum approach in the modelling of very low pressure plasma spraying
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
D. Ivchenko, T. Zhang, G. Mariaux, A. Vardelle, S. Goutier, T. E. Itina
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Growth of thin films via atmospheric UVC-driven syngas PICVD
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Donya farhanian, Gregory De Crescenzo, Jason Tavares
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
In-situ investigation of early stages of Ag nanoparticle growth in a low temperature plasma
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Oleksandr Polonskyi, Jan Willem Abraham, Thomas Strunskus, Michael Bonitz, Franz Faupel
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Generation of Neutral and Positively-Charged Nanoparticles in Nonthermal Plasmas
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Meenakshi Mamunuru, Romain Le Picard, Yukinori Sakiyama, Steven Girshick
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Comparison of different quenching solutions for the synthesis of Cu nanoparticles by a RF thermal plasma
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Simone Bianconi, Marco Boselli, Matteo Gherardi, Vittorio Colombo
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Modelling of the Solid Propellant Ignition Process under Different Plasma Ignition Schemes
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Yuhua Hang, Xingwen Li, Weihong Yang, Yihong Wu, Shenli Jia
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Numerical investigation of joint impact of thermophoresis and radiative losses in induction plasma synthesis of copper nanoparticles
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Simone Bianconi, Marco Boselli, Matteo Gherardi, Vittorio Colombo
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Study of plasma component effect on cell membrane permeabilization for drug delivery applications
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Vinodini Vijayarangan, Anthony Delalande, Claire Douat, Sebastien Dozias, Jean-Michel Pouvesle, Chantal Pichon, Eric Robert
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Peroxynitric acid (HOONO2) is the active component in cryo-preserved plasma-treated water with the reduced-pH method for effective and safety disinfection
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Katsuhisa Kitano, Satoshi Ikawa, Yoichi Nakashima, Norihito Kawashita, Atsushi Tani
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
The safe lightening, non-thermal plasma against Atopic Dermatitis
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Jeong-Hae Choi, Hae-June Lee, Jin-Woo Hong, Gyoo-Cheon Kim
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Plasma-assisted decontamination of ex vivo human skin tissue
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Romolo Laurita, Anna Miserocchi, Martina Ghetti, Matteo Gherardi, Augusto Stancampiano, Valeria Purpura, Davide Melandri, Paola Minghetti, Elena Bondioli, Vittorio Colombo
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Effect of nanosecond-pulsed dielectric barrier discharge on human T-lymphoblastoid leukemia cells
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Romolo Laurita, Eleonora Turrini, Matteo Gherardi, Augusto Stancampiano, Elena Catanzaro, Vittorio Colombo, Carmela Fimognari
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Plasma activated water to enhance plant defenses
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Assunta Bertaccini, Enrico Biondi, Alessandro Canel, Vittorio Colombo, Nicoletta Contaldo, Matteo Gherardi, Romolo Laurita, Augusto Stancampiano, Yuri Zambon
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
The inactivation mechanism of planktonic bacteria in buffered and non-buffered solutions by an atmospheric pressure plasma jet
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
V. S. Santosh K. Kondeti, Chi Phan, Kristian Wende, Helena Jablonowski, Urvashi Gangal, Jennifer Granick, Ryan C. Hunter and Peter J. Bruggeman
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Analysis of components in CO2 plasma bubbled-up water
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Tomoko Miyake, Hiroaki Kawano, Jyumpei Hosoda, Mikio Shimada, Hidekazu Miyahara, Koichiro Takao, Yoshihisa Matsumoto, Akitoshi Okino
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Lifetime of bactericidal factor in CO2 plasma babbled-up water
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Hiroaki Kawano, Yuta Hayashi, Tomoko Miyake, Jumpei Hosoda, Toshihiro Takamatsu, Yuriko Matsumura, Hidekazu Miyahara, Atsuo Iwasawa, Takeshi Azuma,Akitoshi Okino
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
NTAPP Has Potential as an Efficient Inducer of Apoptosis in Liver Cancer Stem Cells Resistant to Conventional Anti-Caner Therapies
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Kiwon Song, Moon-ho Lee
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Anti-proliferative effect of cold plasma in vestibular schwannoma demonstrates its feasibility as an adjuvant treatment after surgery
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Kiwon Song, Yeo Jun Yoon, Michelle J. Suh, In Seok Moon, Eun Ha Choi, Haejun Lee
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
The strong H2O2 production by cancer cells during the direct cold atmospheric plasma treatment
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Dayun Yan, Jonathan Sherman, Michael Keidar
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Comparison of He and Ar atmospheric pressure plasma jets to enhance cutaneous delivery of epidermal growth factor by regulating cell junctions
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Hyun-Young Lee, Jeong-Hae Choi, Gyoo-Cheon Kim, Gwang-Hoon Kim, Byunghak Lee, Hae-June Lee
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Inactivation of the heat-resistant geobacillus stearothermophilus spore stored in a sterilization bag by H2O-O2 plasma
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Tatsuhiko Ihara, Kousei Satahira, Kaoru Nakasone
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Anti-cancer media from self-patterned plasma-liquid interaction: formation, composition and in vitro testing
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Zhitong Chen, Shiqiang Zhang, Igor Levchenko, Isak Beilis, Michael Keidar
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Comparison of plasma and electric pulse treatments on cell membrane permeabilization
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Claire Douat, Marie Breton, Sebastien Dozias, Joao Santos, Jean-Michel Pouvesle, Lluis M. Mir
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
PLA surface functionalisation: A first step toward targeted bioconjugation for medical applications
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Ivan Rodriguez Duran, Stephanie Vanslambrouck, Corinne Hoesli, Gaetan Laroche
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Disinfection/sterilization of thermosensitive materials by the late flowing-afterglow of a N2-O2 low-pressure discharge: assessment of DNA damage to bacterial spores
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Pierre Levif, Sylvie Larocque, Michel Moisan, Jean Barbeau
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Plasma activated water chemical properties and antibacterial action depend on the plasma source and its interaction with water
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Z. Machala, B. Tarabová, Z. Kovaľová, K. Kučerová, P. Terebun, M. Kwiatkowski, J. Pawłat, M. Janda, and K. Hensel
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Single and multiple pin(s)-to-liquid discharges: connecting self-organization patterns and ROS production in liquids for plasma agronomy applications
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
S. Zhang, A. Rousseau, T. Dufour
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Degradation characteristics of a capillary plasma pump for water purification
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Satoshi Uehara, Yasuhiro Miyaoka, Hideya Nishiyama
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
AC-driven pin-to-liquid discharge: characterization and application
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Michael Schmidt, Beke Altrock, Torsten Gerling, Ioana Cristina Gerber, Veronica Hahn, Klaus-Dieter Weltmann, Thomas von Woedtke
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Development of Micro-Nano-Plasma-Bubble generator utilizing a piezoelectric actuator assisted Low-temperature atmospheric-pressure Plasma
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada,
Gaku Watanabe, Takashi Kaito, Satoshi Kurumi, Ken-ichi Matsuda, Kaoru Suzuki
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Reactive species involved in higher seeds germination and shoots vigor through direct plasma exposure and plasma-activated liquids
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
T . Dufour, S. Zhang, S . Simon, A . Rousseau
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Synthesis of Carbon Blacks from HDPE plastic by 3-phase AC thermal plasma
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
F. Fabry and L. Fulcheri
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Oxidised sulphur-functionalized plasma polymer surfaces for heavy metals removal
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Behnam Akhavan, Karyn Jarvis, Peter Majewski
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
A novel approach to the non-thermal pasteurization of fresh apple juice by cold air plasma
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Barbora Tarabova, Andrea Zilkova, Francesco Tampieri, Ester Marotta, Cristina Paradisi, Marco Krewing, Julia Bandow, Zdenko Machala
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
The effects of plasma treatment on inactivation of microorganisms in salt water using a capillary discharge
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Eun Jeong Hong, Junghyun Lim, Yong-Seong Byeon, Suk Jae Yoo, Seungmin Ryu, Seong-Bong Kim
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Decentralized Grey Water Recovery System Using Cold Plasma for Rural India
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Punith Narayanappa, Arashdeep Singh, Lakshminarayana Rao, S. Dasappa
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Atomistic simulations of graphite etching at realistic time scales
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Damien Aussems, Kristof Bal, Thomas Morgan, Richard van de Sanden, Erik Neyts
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Microbial Inactivation of Raw Produce by Cold Atmospheric Pressure Plasma (CAP) sources: Correlation of Bacterial Disinfection to Etching and Surface Modifications
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
 Pingshan Luan, Luis Bastarrachea, Rohan Tikekar, Peter Bruggeman, Gottlieb Oehrlein
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Defect generation in graphene films by low-pressure inductively coupled argon plasmas treatments
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Pierre Vinchon, Xavier Glad, Germain Robert-Bigras, Simon Boivin, Luc Stafford
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Remote atmospheric pressure plasma for improving acid-base surface properties of PEEK polymer: relevance to coating adhesion
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
L. Brès, N. Gherardi, N. Naudé and B. Rives
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Improvement of Adhesiveness of Polytetrafluoroethylene by Heat Assisted Atmospheric Pressure Glow Plasma Treatment
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Kunihito Tanaka, Kiichi Furuse, Yasushi Sawada, Kazuo Takahashi, Masuhiro Kogoma
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Efficient and low-damage nitrogen incorporation in graphene films by nitrogen microwave late-afterglow plasma treatment
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Germain Robert Bigras, Xavier Glad, Luc Stafford
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Non-Thermal Plasma Processing of Plasmonic TiN Nanoparticles
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Alejandro Alvarez, Lorenzo Mangolini
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Plasma Treatment of Ramie Fibers to Improve their Adhesion to Polyproplene Matrix
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Ying Li, Sorin Manolache, Yiping Qiu, Majid Sarmadi
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
In search of the plasmaporation mechanism during plasma treatment of skin
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Jonas Van der Paal, Gregory Fridman, Alexander Fridman, Erik C. Neyts, Annemie Bogaerts
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Anisotropic plasmonic nanostructures from alternative materials through gas-phase deposition
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Yunxiang Qin, Uwe Kortshagen
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Plasma-deposited interlayers with controlled adhesion to glass fibres
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Erik Palesch, Tomas Plichta, Martin Branecky, Vladimir Cech
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Plasma initiated chemical vapor deposition (AP-PiCVD) - A new atmospheric-pressure vapor-phase route towards polymer coatings
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Francois Loyer, Gilles Frache, Patrick Choquet, Nicolas Boscher
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
On the Deposition of Bactericidal Copper/Plasma Polymer Composite Coatings by using Atmospheric Pressure Plasmas
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Katja Fricke, Monique Levien, Jana Kredl, Klaus-Dieter Weltmann, Martin Polak
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Cold atmospheric pressure plasma for the deposition of polymeric films and the codeposition of nanocomposite coatings
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Matteo Gherardi, Anna Liguori, Tommaso Gallingani, Federica Barletta, Maria Letizia Focarete, Cristiano Albonetti, Antonino Pollicino, Vittorio Colombo
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
N-rich Plasma Polymer Films for Regulation of Fibrinogen Adsorption
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Madhuwanthi Buddhadasa, Sophie Lerouge, Pierre-Luc Girard-Lauriault
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Boron-Doped Anatase TiO2 Thin-Film on Polymer Optical Fiber: Atmospheric Pressure-Plasma Enhanced Chemical Vapour Deposition as the Key for Functional Coatings on Temperature-Sensitive Substrates
Miguel Quesada-Gonzalez, Kamal Baba, Carlos Sotelo-Vazquez, Claire J. Carmalt, Ivan P. Parkin, Patrick Choquet, Nicolas D. Boscher
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Antibacterial nanocomposites based on Ag NPs and HMDSO deposited by atmospheric pressure plasma
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Maria D. Ionita, Eusebiu R. Ionita, Veronica Satulu, Mike De Vrieze, Andrea Zille, Martina Modic, Bogdana Mitu, Anton Nikiforov, Christophe Leys, Gheorghe Dinescu
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Diamond Film Deposition/Growth by Irradiation of Ar/CH4/H2 Modulated and Non-Modulated Induction Thermal Plasma
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Toshiki Betsuin, Takashi Arai, Yasunori Tanaka, Yoshihiko Uesugi, Tatsuo Ishijma
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Characterization of plasma-deposited polystyrene near atmospheric pressure: A novel approach
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Vanina Cristaudo, Delphine Merche, Claude Poleunis, Pierre Eloy, Francois Reniers, Arnaud Delcorte
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Plasma deposition of Vancomycin containing composite coatings
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Petr Jelinek, Fabio Palumbo, Chiara Lo Porto, Lenka Zajikova, Giussepe Camporeale, Pietro Favia
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Solution Precursor Vacuum Plasma Spray of Superhydrophobic Ceramic Coatings
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Pengyun Xu, Javad Mostaghimi, Thomas W. Coyle, Larry Pershin
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Polyaniline thin film growth modulation by controlling plasma deposition parameters
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Bogdan Butoi, Paul Dinca, Dumitru Staicu, Catalin Armeanu, Corneliu Porosnicu, Emil Barna, Valentin Barna
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Improvement of Interface between Stainless Steel 316L and Plasma Deposited Fluorocarbon Nano Coating by an Amorphous Oxide Layer
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Megan Mahrokh Dorri, Stephane Turgeon, Pascale Chevallier, Diego Mantovani
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Low pressure plasma enhanced chemical vapor deposition of zirconium and titanium oxide nanocoatings
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Ines Martinko, Olivier Antonin, Thomas Nelis, Mathias Rojo, Patrice Raynaud
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Deposition of thin PEG films on the inner wall of tube by transporting discharge in atmospheric pressure
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Azadeh Valinataj Omran, Alibi Baitukha, Shahid Shah, Farshad Sohbatzadeh, Farzaneh Arefi-Khonsari
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Towards the utilization of plasma deposited nanostructured TiO2 films as photoanodes in DSSCs
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Jonathan Dervaux, Pierre-Antoine Cormier, Fabrice Odobel, Rony Snyders
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Investigation of plasma processing of medical and biological waste
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
George Paskalov, Vladimir Messerle, Alexander Ustimenko, Alfred Mosse
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Sterilization Test of Wastewater for Pickled of Chinese cabbage Using an Underwater Capillary Discharge Device at Pilot-scale
23rd International Symposium on Plasma Chemistry (ISPC 23) , Montréal, Canada, July 30th – August 4th, 2017
Yong-Seong Byeon, Eun Jeong Hong, Junghyun Lim, Hyun-Gyu Lee, Jiyeong Park, Mi-Ai Lee, Seungmin Ryu, Suk Jae Yoo, Seong Bong Kim
Int. Symposium on Plasma Chemistry (ISPC), Vol: 2017, No: 23 , published: 01 August 2017
Effects of atmospheric pressure plasma jet with floating electrode on murine melanoma and fibroblast cells
G. Xu, J. Liu, C. Yao, S. Chen, F. Lin, P. Li, X. Shi, and Guan-Jun Zhang
Phys. Plasmas, Vol: 24, No: 8 , published: 01 August 2017
Characterization of electronic transport properties of semiconductor films during plasma processing
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Shota Nunomura, Isao Sakata and Koji Matsubar
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Pulsed electron beams for thin film deposition
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Magdalena Nistor
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Dynamic of HiPIMS Plasmas
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Achim von Keudell, Christian Maszl, Wolfgang Breilmann, Julian Held, Volker Schulz-Von der Gathen and Ante Hecimovic
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Application of plasma-bullet propagation to hydrophilic treatments of an interconnected porous scaffold
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Masato Oshiro, Tatsuru Shirafuji, Kumi Orita, Yoshihiro Hirakawa and Hiromitsu Toyoda
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
High Power Impulse Magnetron Sputtering: An overview on the benefits of ultra-short pulse operating mode
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Ioana-Laura Velicu, Vasile Tiron and Gheorghe Popa
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Surface-wave-sustained plasma for model biological systems treatment
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Evgenia Benova, Yana Topalova, Plamena Marinova, Yovana Todorova, Mariana Atanasova, Todor Bogdanov and Ivaylo Yotinov
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Water treatment using micro-bubble assisted three dimensionally integrated micro solution plasma
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Yodai Ishida and Hiroto Masunaga
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Calcium phosphate film formation on TiN surface created by atmospheric-pressure plasma
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Ryuji Sannomiya, Ryuta Ichiki, Katsuhiro Hanada, Syuichi Akamine and Seiji Kanazawa
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Tuning the wettability of metallic surfaces by microwave plasma generated low energy noble gas ion beams
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Sanghamitro Chatterjee and Sudeep Bhattacharjee
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Modeling of self-consistent mode formation in an electrostatic plasma lens
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Iryna Litovko, Alexey Goncharov, Andrey Dobrovolskiy, Alexey Bugaev, Vasiliy Gushenets and Efim Oks
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Growth of nano-tendril bundles on tungsten in impurity-rich helium plasmas
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Dogyun Hwangbo, Shin Kajita, Shota Kawaguchi, Hirohiko Tanaka and Noriyasu Ohno
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Deposition of diamond-like carbon film using high power impulse magnetron sputtering
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Takayuki Ohta, Atsushi Ishikawa, Akinori Oda and Hiroyuki Kohsaka
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Study of water treatment effects by a ball-lightning like discharge
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Yoshimitu Takatori, Hitoshi Suzuki, Kimio Tokaji, Yuuki Inada and Mitsuaki Maeyama
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Development of the LisbOn KInetics (LoKI) tool
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Antonio Tejero-Del-Caz, Duarte Nina, Samuel Jacob, Duarte Gonçalves, Mário Lino Da Silva, Luís Marques, Nuno R. Pinhão, Carlos Daniel Pintassilgo, Vasco Guerra and Luís L. Alves
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Atmospheric pressure plasma assisted preparation of ceramic submicron fibers
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
V. Medvecká, A. Zahoranová, D. Kováčik and M. Černák
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
The use of thermally stimulated luminescence for rapid assessment of plasma treated particulate materials
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Jozef Rahel, Tomas Moravek and Martina Ilcikova
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Dielectric Properties of Magnetron Sputtered PTFE Thin Films
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Veronica Satulu, Valentin Ion, Bogdana Mitu and Gheorghe Dinesc
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Plasma-Laser Assisted Synthesis of Nanoparticles for Antibacterial Coatings
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
A. Jurov, N. Krstulović, Martina Modic, N. Hojnik, Anton Nikiforov, A. Zille, C. Leys and U. Cvelba
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Effect of the magnetic field on formation of Cu nanoparticles during the magnetron sputtering in a gas aggregation source
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
M. Vaidulych, J. Hanus, S. Kadlec, A. Marek, I. Khalakhan, O. Kylián, A. Choukourov and H. Biederman
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Dependence of electrode materials and gaseous in serpentine plasma for nano particles preparation
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Shin-Ichi Aoqui, Fumiaki Mitsugi and Hiroharu Kawasaki
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Nitrogen-containing plasma polymer nanoparticles produced by means of a gas aggregation cluster source
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Artem Shelemin, Andrei Choukourov, Daniil Nikitin, Pavel Pleskunov, Danka Slavinska and Hynek Biederman
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Influence of the radial plasma non-uniformity on the etch process
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Violeta Georgieva, Stefan Tinck and Annemie Bogaerts
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Nanosecond pulsed discharges: generation, measurement and plasma processing
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Tom Huiskamp, Frank Beckers, Bert van Heesch, Wilfred Hoeben and A.J.M. Peme
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Challenges in the modelling of plasma-surface interactions
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Vasco Guerra and Daniil Marinov
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Quantitative Evaluation of High-Energy Oxygen Negative Ion Flux in DC Magnetron Sputtering of Indium-Tin-Oxide
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Hirotaka Toyoda, Hansin Bae, Taku Suyama, Kenta Setaka and Haruka Suzuki
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Simulation of Plasma Processing with FPS3D
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Paul Moroz and Daniel J. Moroz
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Measurements of nitrogen and oxygen atom density in N2 /Ar sputtering plasma for fabrication of high- mobility amorphous In2O3 :Sn films
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Masaharu Shiratani, Toshiyuki Takasaki, Han Wang, Koichi Matsushima, Hyunwoong Seo, Kazunori Koga, Keigo Takeda, Masaru Hori and Naho Itagaki
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Activity of catalase enzyme in P. tomentosa seeds after direct plasma treatments and treatments with plasma activated water
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Nevena Puac, Nikola Skoro, Kosta Spasic, Suzana Zivkovic, Milica Milutinovic, Vuk Sasic, Gordana Malovic and Zoran Petrović
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Human Stratum Corneum Epidermidis modification by means of atmospheric-pressure cold plasma treatment
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Dimitrios Athanasopoulos and Panagiotis Svarnas
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Development of a compact water-cooled surface wave plasma source for remote plasma processing
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Hyun Jong You and Wonil Choo
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Evidence of the paracetamol’s aromatic ring breaking thanks to a non-thermal plasma
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Yasmine Baloul, Cyril Colas, Olivier Aubry, Hervé Rabat, Benoit Maunit and Dunpin Hong
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Fabrication of transparent conductive films with Ag mesh patterns using a monolayer of polystyrene shperes
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Eun Chang Choi, Won Chang Lee and Byungyou Hong
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Study on high flow rate F-radical generation by a compact water-cooled surface wave plasma source for remote plasma cleaning process
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Wonil Choo and Hyun Jong You
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Pulsed Laser and Sputtering Deposition of Optical Materials
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Mohamed Chaker
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Characterization of carbon films by microwave-plasma assisted chemical vapour deposition in open-air system
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Hidetsugu Yagi, Shinji Yudate, Hideki Motomura and Masafumi Jinno
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Synthesis and Characterization of Photocatalytic Titanium Oxide Thin Film Deposited on Glass by Atmospheric Pressure Plasma CVD
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Seongchan Kang, Rodolphe Mauchauffé and Se Youn Moon
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Atmospheric pressure plasmas for surface and medical applications
Konstantin Kostov, Vadym Prisyaznhyi, Alonso Castro, Thalita Nishime, Cristiane Koga-Ito, Taiana Mui, Leide Lili Da Silva, Rogerio Mota, Aline Borges and Munemasa Machid
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Atmospheric pressure plasmas for agriculture, medicine and surface technology
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Joanna Pawlat
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Gas-liquid interfacial plasmas for novel gene transfer systems
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Toshiro Kaneko, Shota Sasaki, Keisuke Takashima, Takehiko Sato and Makoto Kanzaki
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Challenges in the kinetic modelling of electrons and ions in gaseous and liquid matter
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Ron White, Daniel Cocks, Greg Boyle, Madalyn Casey, Nathan Garland, Dmitry Konovalov, Jaime de Urquijo, Robert McEachran, Stephen Buckman, Michael Brunger, Zoran Petrovi[Pleaseinsertintopreamble] and Sasa Dujko
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Cell death Mechanism on human colorectal cancer after PAM (Plasma Activated Medium) treatment
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Julie Chauvin, Florian Judée, Patricia Vicendo, Nofel Merbahi, Marie-Pierre Rols, Laure Gibot, Muriel Golzio and Mohammed Yousfi
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Plasma activated water – stability and antimicrobial effect
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Iulia-Elena Vlad, Cristiana Martin, Akos Roland Toth, Judit Papp and Sorin Dan Anghel
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Investigation of compositions in plasma-irradiated buffer evoking TRP-channel mediated calcium response
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Shota Sasaki, Yuexing Zheng, Makoto Kanzaki and Toshiro Kaneko
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
PECVD of DLC & N-doped DLC Thin Films for Biomedical Applications
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Hyun-Jin Seo, Aiping Zeng, Sang-Hun Nam, Byungyou Hong and Jin-Hyo Boo
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Antibacterial and non-fouling Cu/C:F nanocomposites deposited onto poly(ether-ether-ketone) folis
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
A. Kuzminova, J. Kratochvíl, O. Kylian, V. Stranak, H. Biederman, H. Langhansová, J. Lieskovská and J. Štĕrba
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Effects of Air, N2 , and CO2 Plasma Irradiation to Seeds of Radish Sprouts, Potato and Soybean
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Masaharu Shiratani
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Effect of Plasma Activated Medium on human Head & Neck cancerous Tumor Spheroids
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Julie Chauvin, Nofel Merbahi, Florian Judée and Patricia Vicendo
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Role of intracellular RONS in plasma-based cancer treatment
Proc. of the XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), Estoril, Portugal, July 9-14, 2017
Emilio Martines, Paola Brun, Riccardo Artico, Paola Brun, Roberto Cavazzana, Luigi Cordaro, Gianluca De Masi, Daniele Fischetto, Andrea Zuin and Matteo Zuin
Int. Conf. on Phenomena in Ionized Gas (ICPIG) , Vol: 2017, No: , published: 09 July 2017
Mixed ion acceleration and control studies
8th PPLA Conference - Plasma Physics by Laser and Applications 2017 University of Messina, Italy, July 5-7, 2017
D. Neely
Conf. Plasma Phys. Laser and Application (PPLA), Vol: 2017, No: 8 , published: 05 July 2017
Study of ion energy distribution from laser-generated plasmas at two different intensities for accelerator applications
8th PPLA Conference - Plasma Physics by Laser and Applications 2017 University of Messina, Italy, July 5-7, 2017
G. Ceccio1, L. Torrisi, M. Okamura, T. Kanesue, S. Ikeda
Conf. Plasma Phys. Laser and Application (PPLA), Vol: 2017, No: 8 , published: 05 July 2017
Spectral gain investigation of large size OPCPA based on partially deuterated KDP
8th PPLA Conference - Plasma Physics by Laser and Applications 2017 University of Messina, Italy, July 5-7, 2017
M. Galimberti, A. Boyle, I. O. Musgrave, P. Oliveira, D. Pepler, W. Shaikh, T. B. Winstone, C. Hernandez–Gomez
Conf. Plasma Phys. Laser and Application (PPLA), Vol: 2017, No: 8 , published: 05 July 2017
The use of Femtosecond lasers in ophthalmology
8th PPLA Conference - Plasma Physics by Laser and Applications 2017 University of Messina, Italy, July 5-7, 2017
A. M. Roszkowska
Conf. Plasma Phys. Laser and Application (PPLA), Vol: 2017, No: 8 , published: 05 July 2017
Toward compact and ultra-intense laser-based soft X-ray lasers
8th PPLA Conference - Plasma Physics by Laser and Applications 2017 University of Messina, Italy, July 5-7, 2017
S. Sebban, A. Depresseux, E. Oliva, J. Gautier, F. Tissandier, J. Ne- jdl, M. Kozlova, G. Maynard, J. P. Goddet, A. Lifschitz, H. T. Kim, S. Jacquemot, V. Malka, K. Ta Phuoc1, C. Thaury, B. Vodungbo, G. Lam- bert, P. Zeitoun and A. Rousse
Conf. Plasma Phys. Laser and Application (PPLA), Vol: 2017, No: 8 , published: 05 July 2017
Effect of gas composition on morphological properties of graphene nanosheet
Neha Gupta, and Suresh C. Sharma
Phys. Plasmas, Vol: 24, No: 7 , published: 01 July 2017
Prospects of extreme ultraviolet radiation sources based on microwave discharge for high-resolution lithography
I. S. Abramov, E. D. Gospodchikov, and A. G. Shalashov
Phys. Plasmas, Vol: 24, No: 7 , published: 01 July 2017
Plasma deposition of antibacterial coatings
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
A. Nikiforov , Ch. Leys, I. Kuchakova, M. Vanneste, P. Heyse, M. De Vrieze, A. Zille, Gh. Dinescu, B. Mitu, M. Modic, U. Cvelbar
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Plasma non - equilibrium at work: key to success of energy technologies?
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
R. van de Sanden
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Tailoring the morphology and structural properties of tungsten nanoparticles produced by magnetron sputtering and gas aggregation
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
T. Acsente , E. Matei, C. Logofatu, L.C. Nistor, R.F. Negrea, R. Birjega, C. Grisolia, and G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
RF atmospheric pressure plasma jet: a method for synthesis of metallic particles
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
A. Lazea- Stoyanova , V. Marascu, C. Stancu, G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Dielectric properties of PTFE - like thin films obtained by magnetron sputtering
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
V. Satulu , V. Ion, B. Mitu, G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
HiPIMS and reactive magnetron sputtering techniques used for obtaining fusion related materials
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
C. Porosnicu , V. Tiron, P. Dinca, B. Butoi, I. Burducea, O.G. Pompilian, I. Jepu, C. P . Lungu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Polylactide - co - caprolactone based coatings deposited by Matrix Assisted Pulsed Laser Evaporation: an optimization study
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
S. Brajnicov , P. Neacsu, V. Dinca, V. Marascu, A. Bonciu, A. Cimpean, M. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Atmospheric pressure etching of silicon surface with fluorine - containing cold plasma jets 
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
M.D. Ionita , E.R. Ionita , G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Deposition of plasma - polymerized hexamethyldisilazane films onto polypropylene track- etched membranes
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
L.I. Kravets , S.N. Dmitriev, V. Satulu, B. Mitu, G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Mathematical modelling of plasma treatment parameters for the hydrophobization process of fabrics
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
I.R. Radulescu , L. Surdu, L. Dinca, E. Visileanu, V. Satulu, B. Mitu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Reactive magnetron sputtered SiCx thin films: a correlation between their optical properties and OES process characterization
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
I. Pana , C. Vitelaru, A. Kiss, M. Braic
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Cleaning of carbon layers from surfaces by low pressure radiofrequency plasma
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
C. Stancu , S.D. Stoica, V. Satulu, V. Ion, G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Cleaning of oleic acid contaminant from glass surface by low -pressure discharge plasma
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
F. Samoilă , L. Sirghi
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Plasma treatment of layered double hydroxides thin films deposited by laser techniques
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
A. Matei , R. Birjega, D.D. Baciu, A. Vlad, A. Marinescu, M. D. Ionita, R. Zavoianu, M. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Polymeric guiding system obtained by laser direct writing 
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
A. Matei , F. Jipa, B. Calin, M. Zamfirescu, M. Dinescu, B. Mitu, V. Marascu , J. Heitz, C. Plamadeala
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Stoichiometry of thin oxide films deposited by reactive high power impulse magnetron sputtering
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
L. Sirghi and V. Tiron
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Simulation of magnetron sputtering deposition of titanium nanopatterns on substrates w ith colloidal masks
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
C. Costin , A. Demeter, V. Tiron, L. Sirghi
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Influence of C2 H2 /H2 ratio on the plasma parameters and on the morphology of carbon films obtained by PECVD
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
S.D. Stoica , S. Vizireanu, B. Mitu, G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Reactive sputtering of carbon target under HiPIMS conditions for the deposition of DLC coatings
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
C. Vitelaru , M . Dinu, A.C. Parau, L. Constantin, A.E Kiss
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Sub - micrometric patterns deposited by localized atmospheric pressure plasma enhanced chemical vapor deposition
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
M. Haacké , A. Boileau, T. Gries, C. Noël and T. Belmonte
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Evaluation of 3D thin film profile in magnetron sputtering deposition
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
B. Mitu , R. Coca, G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Design, deposition and characterization of PVD optical coatings: a systematic experimental approach
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
I. Pana , C. Vitelaru, N.C. Zoita, A. Kiss, M. Braic
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Interface characteristics of W/Si multilayers prepared by TVA
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
A. Anghel , M. Badulescu, M. Vlaicu, C. Logofatu, C. Surdu- Bob
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Tailoring sp2/sp3 ratio in Diamond - Like Carbon films via deposition parameters in a high voltage anodic vacuum plasma
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
M. Badulescu , A. Anghel, C.C. Surdu- Bob, C. Logofatu, C. Luculescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Titanium 2D nanopatterns obtained by magnetron sputtering deposition with colloidal masks
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
A. Demeter , L. Sirghi
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
TiO2 thin films deposited by rf - magnetron sputtering for optoelectronic applications
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
D. Dogaru , C. Besleaga, A.C. Galca, M. Nistor, L. Ion
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Plasma biofilm decontamination: What happens to the underlying surface?
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
M. Modic, J. Kovač, J.R. Nicholls, U. Cvelbar, MI. Hasan and J.L. Walsh
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Laser evaporation of polymers for medical applications A. Palla Papavlu , M. Filipescu, M. Dinescu 46O - 14 Laser evaporation of polymers for medical applications
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
A. Palla Papavlu , M. Filipescu, M. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Self - modulation of the discharge current oscillations in the presence of a complex space charge configuration in low - temperature plasma
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
S.A. Irimiciuc , D.G. Dimitriu, M. Agop
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Stimulation of seed germination by non - thermal plasma
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
M. Magureanu , D. Dobrin, M. Gidea
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Plasma spraying on polymers: a study on bioactive and antibacterial coatings
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
L. Barillas , J.M. Cubero- Sesin, I. Vargas
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
The effect of a cold atmospheric filamentary plasma jet on stored products pest and wheat germination
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
L.G. Carpen , C. Chireceanu, M. Teodorescu, A. Chiriloaie, A. Teodoru, G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
TVA o btained Cu/Ag layers having antimicrobial properties used in smart ventilation systems
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
B. Butoi , C. Porosnicu, P. Dinca, I. Jepu, O.G. Pompilian, C. P. Lungu, M Diaconu, G. Soreanu, I. Cretescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Laser processing of hybrid biomimetic coatings 
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
M. Icriverzi , V. Dinca, L. Rusen, S. Brajnicov, V. Marascu, A. Bonciu, A. Cimpean, M. Dinescu, A. Ros eanu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Nanomaterials processing by plasma in liquids
Seventeen International Conference on Plasma Physics and Applications (17th CPPA) and Workshop on Plasma Coatings for Medical Applications, 15 – 20 June 2017, Bucharest, Romania
S. Vizireanu , M.D. Ionita, E. R. Ionita, S.D. Stoica, L. Carpen, M. Teodorescu, I. Ion, D. Panaitescu, G. Dinescu
Int. Conf. Plasma Phys. Applications (CPPA), Vol: 2017, No: , published: 15 June 2017
Plasma analysis of inductively coupled impulse sputtering of Cu, Ti and Ni
D A L Loch, Y Aranda Gonzalvo and A P Ehiasarian
Plasma Sources Sci. and Technol., Vol: 26, No: 6 , published: 01 June 2017
Calorimetric probe measurements for a high voltage pulsed substrate (PBII) in a HiPIMS process
Sven Gauter, Maik Fröhlich, Wagdi Garkas, Martin Polak and Holger Kersten
Plasma Sources Sci. and Technol., Vol: 26, No: 6 , published: 01 June 2017
Simple experiment on the sputtering rate of solids in gas discharges
Peter Hartmann, Jorge C. Reyes, Ihor Korolov, Lorin S. Matthews, and Truell W. Hyde
Phys. Plasmas, Vol: 24, No: 6 , published: 01 June 2017
Neutral-neutral and neutral-ion collision integrals for Y2O3-Ar plasma system
Gayatri D. Dhamale, Swastik Nath, Vikas L. Mathe, and Srikumar Ghorui
Phys. Plasmas, Vol: 24, No: 6 , published: 01 June 2017
Layer-by-layer etching of LaAlSiO x
Mitsuhiro Omura, Kazuhito Furumoto, Kazuhisa Matsuda, Toshiyuki Sasaki, Itsuko Sakai and Hisataka Hayashi
Plasma Sources Sci. and Technol., Vol: 26, No: 6 , published: 01 June 2017
In situ plasma sputtering and angular distribution measurements for structured molybdenum surfaces
Gary Z Li, Taylor S Matlock, Dan M Goebel, Christopher A Dodson, Christopher S R Matthes, Nasr M Ghoniem and Richard E Wirz
Plasma Sources Sci. and Technol., Vol: 26, No: 6 , published: 01 June 2017
Atmospheric Plasma Spraying Evolution Since the Sixties Through Modeling, Measurements and Sensors
P. Fauchais, M. Vardelle, S. Goutier
Plasma Chem. Plasma Process., Vol: 37, No: 3 , published: 01 May 2017
Main Issues for a Fully Predictive Plasma Spray Torch Model and Numerical Considerations
Christophe Chazelas, Juan Pablo Trelles, Isabelle Choquet, Armelle Vardelle
Plasma Chem. Plasma Process., Vol: 37, No: 3 , published: 01 May 2017
Plasma-based water purification: Challenges and prospects for the future
John E. Foster
Phys. Plasmas, Vol: 24, No: 5 , published: 01 May 2017
Cathode voltage and discharge current oscillations in HiPIMS
P Klein, J Hnilica, Z Hubička, M Čada, M Šlapanská, M Zemánek and P Vašina
Plasma Sources Sci. and Technol., Vol: 26, No: 5 , published: 01 May 2017
Steam Plasma Treatment of Organic Substances for Hydrogen and Syngas Production
M. Hrabovsky, M. Hlina, V. Kopecky, A. Maslani, O. Zivny, P. Krenek, A. Serov, O. Hurba
Plasma Chem. Plasma Process., Vol: 37, No: 3 , published: 01 May 2017
Plasma-Assisted Treatment of Municipal Solid Waste: A Scenario Analysis
I. J. van der Walt, A. A. Jansen, P. L. Crouse
Plasma Chem. Plasma Process., Vol: 37, No: 3 , published: 01 May 2017
Synthesis of Functional Oxide Nanoparticles Through RF Thermal Plasma Processing
Takamasa Ishigaki
Plasma Chem. Plasma Process., Vol: 37, No: 3 , published: 01 May 2017
Plasma Enhanced Pulsed Laser Deposition of CuO and Cu2O thin films
44th IOP Plasma Physics Conference, 3-6 April 2017, Oxford, UK
S. Rajendiran , D. Meehan and E. Wagenaars
IOP Plasma Physics Conference, Vol: 2017, No: , published: 03 April 2017
Modelling of plasma - liquid interactions
44th IOP Plasma Physics Conference, 3-6 April 2017, Oxford, UK
J. T. Holgate and M. Coppins
IOP Plasma Physics Conference, Vol: 2017, No: , published: 03 April 2017
On the growth mechanism of nanoparticles in plasma during pulsed laser ablation in liquids
F Taccogna, M Dell'Aglio, M Rutigliano, G Valenza and A De Giacomo
Plasma Sources Sci. and Technol., Vol: 26, No: 4 , published: 01 April 2017
Degradation of Textile Dye AB 52 in an Aqueous Solution by Applying a Plasma at Atmospheric Pressure
Josefina Vergara Sánchez ; César Torres Segundo ; Esteban Montiel Palacios ; Aarón Gómez Díaz ; Pedro Guillermo Reyes Romero ; Horacio Martinez Valencia
IEEE Trans. Plasma Sci., Vol: 45, No: 3 , published: 01 March 2017
Influence of PM Size Distribution and Ingredients on DPF Regeneration by Non-thermal Plasma Technology
Yunxi Shi, Yixi Cai, Jing Wang, Xiaoyu Pu, Gu Linbo
Plasma Chem. Plasma Process., Vol: 37, No: 2 , published: 01 March 2017
On the Etching Mechanisms of SiC Thin Films in CF4/CH2F2/N2/Ar Inductively Coupled Plasma
Jongchan Lee, Alexander Efremov, Kwangsoo Kim, Kwang-Ho Kwon
Plasma Chem. Plasma Process., Vol: 37, No: 2 , published: 01 March 2017
The characteristics of high etch rate ion beam etcher with magnetized inductively coupled plasma source
J W Kim, H W Cheong, Y T Hong and K W Whang
Plasma Sources Sci. and Technol., Vol: 26, No: 3 , published: 01 March 2017
Плазменная обработка микронных вольфрамовых проволок для исследования имплозии квазисферических лайнеров
XLIV конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 13 — 17 февраля 2017 г.
Джангобегов В.В., Олейник Г.М., Родионов Р.Н. (Троицкий Институт Инновационных и Термоядерных Исследований, Административный округ Троицк, Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2017, No: , published: 13 February 2017
Некоторые особенности модифицирования поверхности ПЭТФ-ткани в плазме пониженного давления в аргоне
XLIV конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 13 — 17 февраля 2017 г.
Василькин Д.П., Шикова Т.Г., 1Кузьмичева Л.А., 1Титов В.А. (Ивановский государственный химико-технологический университет, Иваново, Россия, 1Институт химии растворов РАН им. Г.А. Крестова, Иваново, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2017, No: , published: 13 February 2017
Износостойкие покрытия, полученные из плазмы дугового и ВЧ-магнетронного разрядов
XLIV конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 13 — 17 февраля 2017 г.
Смоланов Н.А., Медведев А.В., Крапивин Д.Ю. (Национальный исследовательский Мордовский государственный университет имени Н.П. Огарева, Саранск, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2017, No: , published: 13 February 2017
Влияние продуктов плазмы поверхностного разряда на динамику всхожести протравленных семян пшеницы
XLIV конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 13 — 17 февраля 2017 г.
Лазукин А.В., 1Сердюков Ю.А., 2Кривов С.А., 3,4Грабельных О.И., 3,4Корсукова А.В. (1Институт физиологии растений им. К.А. Тимирязева РАН, Москва, Россия, 2Московский энергетический институт (технический университет), Москва, Россия, 3Сибирский институт физиологии и биохимии растений СО РАН, г. Иркутск, Россия, 4Иркутский государственный университет, Иркутск, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2017, No: , published: 13 February 2017
Воздействие излучения слабоионизованной плазмы на аминокислоты и белки
XLIV конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 13 — 17 февраля 2017 г.
Пискарев И.М., 1Иванова И.П., 1Астафьева К.А. (НИИ Ядерной физики им. Д.В. Скобельцына, МГУ, Москва Россия, 1Нижегородская государственная медицинская академия, Нижний Новгород, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2017, No: , published: 13 February 2017
Структурные особенности углеродных пленок, осаждаемых при одновременном электронном облучении
XLIV конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 13 — 17 февраля 2017 г.
Белова Н.Е., Коршунов С.Н., Лебедев А.М., Мартыненко Ю.В., Свечников Н.Ю., Скорлупкин И.Д. (Национальный исследовательский центр "Курчатовский институт", Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2017, No: , published: 13 February 2017
Воздействие высокочастотной плазмы на ксеноперикард хирургических имплантатов
XLIV конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 13 — 17 февраля 2017 г.
Гребенщикова М.М., Миронов М.М. (Казанский национальный исследовательский технический университет им. А.Н. Туполева, Казань, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2017, No: , published: 13 February 2017
Плазменная установка для испытаний тугоплавких металлов и создания высокопористых материалов нового поколения
XLIV конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 13 — 17 февраля 2017 г.
Федорович С.Д., 1Дедов А.В., 1Елецкий А.В., 1Лукашевский М.В., 1Бочаров Г.С., 2Шестаков Е.А., 2Карпов А.В., 1Лазукин А.В., 1Губкин М.К., 1Хазиев И.А., 1Мухрыгин А.А. (1Московский энергетический институт (технический университет), Москва, Россия, 2Национальный исследовательский центр "Курчатовский институт", Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2017, No: , published: 13 February 2017
Influences of guide-tube and bluff-body on advanced atmospheric pressure plasma source for single-crystalline polymer nanoparticle synthesis at low temperature
Dong Ha Kim, Choon-Sang Park, Won Hyun Kim, Bhum Jae Shin, Jung Goo Hong, Tae Seon Park, Jeong Hyun Seo, and Heung-Sik Tae
Phys. Plasmas, Vol: 24, No: 2 , published: 01 February 2017
Production of Metal-Supported Solid Oxide Fuel Cell Using Thermal Plasma Spraying Technique
Sheng-Fu Yang ; Chang-Sing Hwang ; Chun-Huang Tsai ; Chun-Liang Chang ; Ming-Hsiu Wu
IEEE Trans. Plasma Sci., Vol: 45, No: 2 , published: 01 February 2017
Densities and Surface Reaction Probabilities of Oxygen and Nitrogen Atoms During Sputter Deposition of ZnInON on ZnO
Koichi Matsushima ; Tomoaki Ide ; Keigo Takeda ; Masaru Hori ; Daisuke Yamashita ; Hyunwoong Seo ; Kazunori Koga ; Masaharu Shiratani ; Naho Itagaki
IEEE Trans. Plasma Sci., Vol: 45, No: 2 , published: 01 February 2017
Mechanisms of plasma-assisted catalyzed growth of carbon nanofibres: a theoretical modeling
R Gupta, S C Sharma and R Sharma
Plasma Sources Sci. and Technol., Vol: 26, No: 2 , published: 01 February 2017
Determination of deposited flux and energy of sputtered tungsten atoms on every stages of transport in HiPIMS discharge
M Desecures, L de Poucques and J Bougdira
Plasma Sources Sci. and Technol., Vol: 26, No: 2 , published: 01 February 2017
Electrode-selective deposition/etching processes using an SiF4/H2/Ar plasma chemistry excited by sawtooth tailored voltage waveforms
J K Wang and E V Johnson
Plasma Sources Sci. and Technol., Vol: 26, No: 1 , published: 01 February 2017
Controlling VUV photon fluxes in pulsed inductively coupled Ar/Cl2 plasmas and potential applications in plasma etching
Peng Tian and Mark J Kushner
Plasma Sources Sci. and Technol., Vol: 26, No: 2 , published: 01 February 2017
Low Cost Compact Nanosecond Pulsed Plasma System for Environmental and Biomedical Applications
Muhammad Arif Malik, Karl H. Schoenbach, Tarek M. Abdel-Fattah, Richard Heller, Chunqi Jiang
Plasma Chem. Plasma Process., Vol: 37, No: 1 , published: 01 January 2017
A Portable Plasma Sterilizer
ChangMing Du, Chao Shang, Ting Wang, ZiMing Li, Xin Yang, HaiTian Chen, Ya Liu, Kui Wang
Plasma Chem. Plasma Process., Vol: 37, No: 1 , published: 01 January 2017
Polytetrafluoroethylene Sputtered PES Membranes for Membrane Distillation: Influence of RF Magnetron Sputtering Conditions
Sara Pedram, Hamid R. Mortaheb, Houssam Fakhouri, Farzaneh Arefi-Khonsari
Plasma Chem. Plasma Process., Vol: 37, No: 1 , published: 01 January 2017
Investigation of the Expansion of an Oxygen Microwave Remote Plasma for the Growth of Functional Oxide Thin Films
G. Al Makdessi, M. Tabbal
Plasma Chem. Plasma Process., Vol: 37, No: 1 , published: 01 January 2017
VUV absorption spectroscopy of bacterial spores and DNA components
43rd EPS Conference on Plasma Physics, Leuven, 4-8 July 2016
Marcel Fiebrandt, Jan-Wilm Lackmann, Marina Raguse, Ralf Moeller, Peter Awakowicz and Katharina Stapelmann
Plasma Phys. and Contr. Fusion, Vol: 59, No: 1 , published: 01 January 2017
Plasma medicine—current state of research and medical application
43rd EPS Conference on Plasma Physics, Leuven, 4-8 July 2016
K.-D. Weltmann and Th. von Woedtke
Plasma Phys. and Contr. Fusion, Vol: 59, No: 1 , published: 01 January 2017
Нанесение покрытий TaB2 методом магнетронного распыления с плазменным ассистированием
С. Яковин, А. Зыков, С. Дудин, В. Фареник, А. Гончаров, И. Шелест, В. Кузнецов
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2017, No: 1 , published: 01 January 2017
Получение карбида кремния химическим газофазным, плазмохимическим и сублимационным методами
А.Ю. Журавлёв, Н.А. Хованский, Д.А. Хижняк, Б.М. Широков, Н.А. Семёнов, А.В. Шиян, С.В. Стригуновский, А.И. Евсюков, А.Б. Шевцов, Е.А. Назаренко, Н.Н. Пилипенко
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2017, No: 1 , published: 01 January 2017
Эффект параметров смещения потенциала подложки на поверхностные свойства покрытий ta-C
В. Сафонов, К. Мирошниченко, А. Зыкова, В. Завалеев, Я. Валькович, Р. Роговская
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2017, No: 1 , published: 01 January 2017
Особенности осаждения покрытий при комбинированном стационарно-импульсном режиме работы магнетроной распылительной системы
А.Г. Чунадра, К.Н. Середа, И.К. Тарасов, А.А. Бизюков, А.И. Гирка
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2017, No: 1 , published: 01 January 2017
Поддерживаемые плазмой процессы "отходы - в энергию"
В.А. Жовтянский, Э.П. Колесникова, М.В. Якимович
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2017, No: 1 , published: 01 January 2017
Special Issue on Numerical Modelling of Low-Temperature Plasmas for Various Applications – Part I: Review and Tutorial Papers on Numerical Modelling Approaches
Luís L. Alves and Annemie Bogaerts
Plasma Processes and Polymers, Vol: 14, No: 1-2 , published: 01 January 2017
Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges
Jan Trieschmann, Frederik Schmidt and Thomas Mussenbrock
Plasma Processes and Polymers, Vol: 14, No: 1-2 , published: 01 January 2017
Seed Germination and Early Growth Responses to Seed Pre-treatment by Non-thermal Plasma in Hemp Cultivars (Cannabis sativa L.)
B. Sera, M. Sery, B. Gavril, I. Gajdova
Plasma Chem. Plasma Process., Vol: 37, No: 1 , published: 01 January 2017
3-D Numerical Simulation on Plasma Immersion Ion Implantation Batch Treating Process of Bearing Balls
Yonghao Yu ; Langping Wang ; Xiaofeng Wang ; Yang Lu
IEEE Trans. Plasma Sci., Vol: 45, No: 1 , published: 01 January 2017
Cathodic Plasma Electrolysis Processing for Metal Coating Deposition
Xu Yang, Xianfei Ding, Guojian Hao, Yongfeng Liang, Junping Lin
Plasma Chem. Plasma Process., Vol: 37, No: 1 , published: 01 January 2017
Внутренние напряжения в многокомпонентных нитридных покрытиях, получаемых методом плазменно-иммерсионной ионной имплантации
А.И. Калиниченко, С.С. Перепёлкин, В.Е. Стрельницкий
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2017, No: 1 , published: 01 January 2017
Некоторые аспекты осаждения проводящих, диэлектрических и защитных покрытий на изоляторы с использованием дугового разряда и ВЧ-смещения
В.С. Таран, Р.М. Муратов, Ю.Н. Незовибатько, А.В. Леонович, М.А. Сергиец
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2017, No: 1 , published: 01 January 2017
Characteristics of plasma in culture medium generated by positive pulse voltage and effects of organic compounds on its characteristics
Y Sato, T Sato and D Yoshino
Plasma Sources Sci. and Technol., Vol: 25, No: 6 , published: 01 December 2016
Municipal Solid Waste Plasma Processing: Thermodynamic Computation and Experiment
Vladimir E. Messerle ; Alfred L. Mosse ; Alexander B. Ustimenko
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 12 , published: 01 December 2016
Plasma-Assisted Treatment of Sewage Sludge
Igor B. Matveev ; Serhiy I. Serbin ; Nikolay V. Washchilenko
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 12 , published: 01 December 2016
Multipurpose Equipment for Radio Frequency Plasma Decontamination and Protective Coating of Paper Materials
Emil Ghiocel Ioanid ; Dorina E. Rusu ; Ana M. Vlad ; Simona Dunca ; Catalin Tănase ; Viorica Frunza ; Gabriela Savin ; Marta C. Ursescu
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 12 , published: 01 December 2016
Introduction to the Special Issue on The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28)
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Hiroshi Akatsuka ; Jong-Shinn Wu ; Kungen Teii ; Koichi Takaki
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Microfluidic Transport Through Microsized Holes Treated by Nonequilibrium Atmospheric-Pressure Plasma
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Takumi Ito ; Kenji Ishikawa ; Daisuke Onoshima ; Naoto Kihara ; Kentaro Tatsukoshi ; Hidefumi Odaka ; Hiroshi Hashizume ; Hiromasa Tanaka ; Hiroshi Yukawa ; Keigo Takeda ; Hiroki Kondo ; Makoto Sekine ; Yoshinobu Baba ; Masaru Hori
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Preparation of Er2O3 and TiO2 Multilayer Films as Optical Filter Using Magnetron Sputtering Deposition
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Hiroharu Kawasaki ; Yoshiaki Suda ; Tamiko Ohshima ; Yoshihito Yagyu ; Takeshi Ihara
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Preparation of Titanium-Doped Diamond-Like Carbon Films With Electrical Conductivity Using High Power Pulsed Magnetron Sputtering System With Bipolar Pulse Voltage Source for Substrate
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Takashi Kimura ; Hikaru Kamata ; Setsuo Nakao ; Kingo Azuma
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Infrared Spectroscopic Study of Hydrogenation Process of Si(100) Surface During Hydrogen Plasma Exposure
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Masanori Shinohara ; Naoki Maruno ; Yoshiki Takami ; Susumu Takabayashi ; Yoshinobu Matsuda
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Basic Study of the Peeling Off of Paint Using Irradiation by Atmospheric Pressure Plasma
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Tsubasa Nakamura ; Kenta Morito ; Tateki Hamasaki ; Toyohisa Asaji ; Muneo Furuse
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Ar/O2 Argon-Based Round Atmospheric-Pressure Plasma Jet on Sterilizing Bacteria and Endospores
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Z. -H. Lin ; C. -Y. Tobias Tschang ; K. -C. Liao ; C. -F. Su ; J. -S. Wu ; M. -T. Ho
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Positive-Bias Temperature Instability Improvement of Poly-Si Thin-Film Transistor With HfO2 Gate Dielectric by Ammonia Plasma Treatment
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
William Cheng-Yu Ma ; Zheng-Yi Lin ; Yao-Sheng Huang ; Bo-Siang Huang ; Zheng-Da Wu
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Preparation of Antibacterial Ceramic Coatings Containing Ag on Titanium Alloy by Use of Microarc Oxidation
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Jeou-Long Lee ; Kwan-Nin Kuo ; Ta-Lun Sung ; Yen-Tze Lai
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Effect of Ground and Floating Electrode on a Helium-Based Plasma Jet and Its Applications in Sterilization and Ceramic Surface Treatment
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Chih-Tung Liu ; Kuang-Yao Cheng ; Zhi-Hua Lin ; Ching-Jung Wu ; Jane-Yii Wu ; Jong-Shinn Wu
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Plasma Parameters of Titanium-Based Metallic Plasma Generated by a Compact-Type High-Power Pulsed Sputtering Penning Discharge
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Kingo Azuma ; Takashi Kimura
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Plasma-Induced Interfacial Layer Impacts on TFETs With Poly-Si Channel Film by Oxygen Plasma Surface Treatment
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
William Cheng-Yu Ma ; Kang Chang ; Yu-Cheng Lin ; Tai-Hsuan Wu
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Efficiency Enhancement of CW Magnetron by Ferrite Material Filling
Sandeep Kumar Vyas ; Shivendra Maurya ; Vindhyavasini Prasad Singh
IEEE Trans. Plasma Sci. Pt 3, Vol: 44, No: 12 , published: 01 December 2016
Легирование и модификация нержавеющей стали мощными потоками плазмы
В.А. Махлай, Н.Н. Аксёнов, O.В. Бырка, A.Г. Чунадра, С.С. Геращенко, С.В. Малыхин, И.Ф. Михайлов, К.Н. Середа, С.В. Суровицкий
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2016, No: 6 , published: 01 December 2016
Синтез и обработка наночастиц с помощью плазмы
Amir Mohammad Ahadi, Thomas Strunskus, Oleksandr Polonskyi, Thomas Trottenberg, Holger Kersten, Franz Faupel
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2016, No: 6 , published: 01 December 2016
Трибологические свойства вакуумно-дуговых покрытий Cr-O-N на макро- и микроуровнях
А.С. Куприн, T.A. Кузнецова, A. Гилевич, Г.Н. Толмачёва, В.Д. Овчаренко, С.О. Абетковская, Т.И. Зубар, A.Л. Худолей, С.А. Чижик, O. Лупицка, Б. Вархолинский
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2016, No: 6 , published: 01 December 2016
Особенности создания плазмы для магнитоплазменной переработки ОЯТ на стадии ионизации
В.В. Катречко, В.Б. Юферов, А.С. Свичкарь, Т.И. Ткачева, С.В. Шарый, В.О. Ильичёва
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2016, No: 6 , published: 01 December 2016
Структура и свойства покрытий (Cr, Al)N, осажденных PIII и D-методом
В.В. Васильев, А.А. Лучанинов, Е.Н. Решетняк, В.Е. Стрельницкий, B. Lorentz, S. Reichert, V. Zavaleyev, J. Walkowicz, M. Sawczak
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2016, No: 6 , published: 01 December 2016
Синтез тонких плёнок Ta2O5 методом реактивного магнетронного распыления
С. Яковин, А. Зыков, С. Дудин, Н. Ефименко
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2016, No: 6 , published: 01 December 2016
Испарение металлических макрочастиц в высокотемпературной технологической плазме
А.А. Бизюков, А.Д. Чибисов, Е.В. Ромащенко, Ю.Е. Коляда
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2016, No: 6 , published: 01 December 2016
Разработка комплексной технологии упрочнения тонкостенного режущего инструмента
T.C. Скобло, С.П. Романюк, А.И. Сидашенко, В.С. Таран, Ю.Н. Незовибатько, Н.Н. Пильгуй
Вопр. атом. науки и техн. Сер. Физика плазмы, Vol: 2016, No: 6 , published: 01 December 2016
Aerosol-Assisted Plasma Deposition of Biocomposite Coatings: Investigation of Processing Conditions on Coating Properties
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Chun-Ping Hsiao ; Cheng-Chen Wu ; Yung-Hsin Liu ; Yi-Wei Yang ; Yun-Chien Cheng ; Fabio Palumbo ; Giuseppe Camporeale ; Pietro Favia ; Jong-Shinn Wu
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Effects of Working Pressure on the Physical Properties of a-InGaZnOx Films Formed Using Inductively Coupled Plasma-Enhanced Reactive Sputtering Deposition
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
Kosuke Takenaka ; Keitaro Nakata ; Giichiro Uchida ; Yuichi Setsuhara ; Akinori Ebe
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Low-Energy Ion-Assisted Deposition of Boron Nitride Films in Surface-Wave Plasma
The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28), December 12-15, 2015, Nagasaki, Japan
M. Torigoe ; K. Teii ; S. Matsumoto
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 12 , published: 01 December 2016
Investigation of powder dynamics in silane-argon discharge using impedance analyser
Deepika Chaudhary, Mansi Sharma, S. Sudhakar, Sushil Kumar
Phys. Plasmas, Vol: 23, No: 12 , published: 01 December 2016
Rapid Disinfection Performance of a Touchable Pulsed SDBD Nonthermal Plasma
1st Sino-German Symposium on Atmospheric Pressure Gas Discharges and Plasma Applications. Beijing, October 11–17, 2015
Chao Zheng ; Yanqin Kou ; Zhen Liu ; Chibo Li ; Yifan Huang ; Keping Yan
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 11 , published: 01 November 2016
Effects of Atmospheric-Pressure Nonthermal Nitrogen and Air Plasma on Bacteria Inactivation
1st Sino-German Symposium on Atmospheric Pressure Gas Discharges and Plasma Applications. Beijing, October 11–17, 2015
Dezhi Xiao ; Cheng Cheng ; Yan Lan ; Guo Hua Ni ; Jie Shen ; Yue Dong Meng ; Paul K. Chu
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 11 , published: 01 November 2016
Measurements of Plasma-Generated Hydroxyl and Hydrogen Peroxide Concentrations for Plasma Medicine Applications
1st Sino-German Symposium on Atmospheric Pressure Gas Discharges and Plasma Applications. Beijing, October 11–17, 2015
Yuan Fu Yue ; Soheila Mohades ; Mounir Laroussi ; Xinpei Lu
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 11 , published: 01 November 2016
A High-Performance Drive Circuit for All Solid-State Marx Generator
1st Sino-German Symposium on Atmospheric Pressure Gas Discharges and Plasma Applications. Beijing, October 11–17, 2015
Ziwei Zhou ; Zi Li ; Junfeng Rao ; Song Jiang ; Takashi Sakugawa
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 11 , published: 01 November 2016
A Modular Multilevel-Based High-Voltage Pulse Generator for Water Disinfection Applications
Mohamed A. Elgenedy ; Ahmed Darwish ; Shehab Ahmed ; Barry W. Williams
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 11 , published: 01 November 2016
Surface Modification by Low Temperature Plasma: Sterilization of Biodegradable Materials
Magdalena Stepczyńska
Plasma Processes and Polymers, Vol: 13, No: 11 , published: 01 November 2016
Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl2 + Ar and HBr + Ar Inductively Coupled Plasmas
Junmyung Lee Alexander Efremov Byung Jun Lee Kwang-Ho Kwon
Plasma Chem. Plasma Process., Vol: 36, No: 6 , published: 01 November 2016
Plasma Treated Sepiolite: A New Adsorbent for Removal of Malachite Green from Contaminated Water
Mustafa Kaya Mehmet Fatih Dilekoğlu Ömer Şahin Cafer Saka
Plasma Chem. Plasma Process., Vol: 36, No: 6 , published: 01 November 2016
Introduction of Tensioned Inner Wire Electrode for NOx Treatment With Nanosecond Pulsed Power System
Mitsuru Morimoto ; Ryotaro Arai ; Koji Omatsu ; Kenji Teranishi ; Naoyuki Shimomura
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 11 , published: 01 November 2016
Cold Atmospheric Pressure Plasma VUV Interactions With Surfaces: Effect of Local Gas Environment and Source Design
Andrew J. Knoll, Pingshan Luan, Elliot A. J. Bartis, Vighneswara S. S. K. Kondeti, Peter J. Bruggeman and Gottlieb S. Oehrlein
Plasma Processes and Polymers, Vol: 13, No: 11 , published: 01 November 2016
Role of Carbon Bridge Length of Organosilicate Precursors on the Atmospheric Plasma Deposition of Transparent Bilayer Protective Coatings on Plastics
Siming Dong, Jiahao Han, Zhenlin Zhao and Reinhold H. Dauskardt
Plasma Processes and Polymers, Vol: 13, No: 11 , published: 01 November 2016
High Throughput Plasma Water Treatment
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
Selman Mujovic , John Foster
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
Towards Plasma-Based Water Purification: Challenges and Prospects for the Future
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
John Foster
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
Ion Concentration vs. Depth Modelling Code for Plasma Ion Implantation
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
Michael Bradley , Marcel Risch
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
A Computational Framework for Efficient Low Temperature Plasma Simulations
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
Abhishek Kumar Verma , Ayyaswamy Venkattraman
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
Detailed Kinetic Modeling of Processes Relevant To Fusion Energy
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
Marco Mehl, Michael Armstrong, Joseph Zaug, Jonathan Crowhurst, Harry Radousky, Elissaios Stavrou
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
Spectral control of laser accelerated ions via deuterium vapour deposition onto cryogenically cooled targets
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
Graeme Scott
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
Vortex Stabilized Plasma for Rapid Water Disinfection & Pharmaceutical Degradation
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
Ady Hershcovitch
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
Photoionization sensor CES for non-invasive medical diagnostics
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
Aleksandr Mustafaev, Iuliia Rastvorova, Kristina Khobnya, Sofia Podenko
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
Physical investigation of a quad confinement plasma source
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
Aaron Knoll , Andrea Lucca Fabris , Christopher Young , Mark Cappelli
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
Hardening of Metallic Materials Using Plasma Immersion Ion Implantation (PIII)
58th Annual Meeting of the APS Division of Plasma Physics, October 31–November 4, 2016, San Jose, US
Yufan Xu , Mike Clark , Ken Flanagan , Jason Milhone , Paul Nonn , Cary Forest
Bull. Am. Phys. Soc., Vol: 61, No: 18 , published: 31 October 2016
Synchronized metal-ion irradiation as a way to control growth of transition-metal nitride alloy films during hybrid HIPIMS/DCMS co-sputtering
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Grzegorz Greczynski
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
What can we learn about HiPIMS process from the multidimensional plasma modeling?
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Tiberiu Minea
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Localized traveling ionization zones and their importance for the high power impulse magnetron sputtering process
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Christian Maszl
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Synchronized metal-ion irradiation as a way to control growth of transition-metal nitride alloy films during hybrid HIPIMS/DCMS co-sputtering
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Grzegorz Greczynski
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
What can we learn about HiPIMS process from the multidimensional plasma modeling?
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Tiberiu Minea
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Localized traveling ionization zones and their importance for the high power impulse magnetron sputtering process
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Christian Maszl
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Electrical and Structural Properties of Copper Thin Films Deposited by Novel RF Magnetized Plasma Sputtering with Gyratory Square-Shaped Arrangement by Bar Permanent Magnets
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Amzad Hossain , Yasunori Ohtsu
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Lateral epitaxial overgrowth of silicon thick films during nanocluster assisted mesoplasma CVD
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Makoto Kambara , Tesuro Koyano , Yusuke Imamura , Toyonobu Yoshida
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Opportunities offered by the interaction of plasma and droplets to elaborate nanostructured oxide materials
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Mehrdad Nikravech , Abdelkader Rahmani
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Jon Tomas Gudmundsson, Daniel Lundin, Nils Brenning, Michel A. Raadu, Chunqing Huo, Tiberiu Minea
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
The self scattering regime of reactive high power impulse magnetron sputtering of chromium and nitrogen
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Wolfgang Breilmann, Christian Maszl, Ante Hecimovic, Jan Benedikt, Achim von Keudell
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Aluminum Surface Morphology Evolution under High-Flux Helium Ions Bombardment
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Oleksii Girka, Oleksandr Babych, Oleksander Bizyukov, Anatolii Chunadra, Oleksander Chibisov, Ivan Bizyukov
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Separated effects of ions, metastables and photons on the properties of barrier layers on polymers
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Beatrix Biskup, Marc Boeke, Jan Benedikt, Achim von Keudell
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Composite layers for barrier coatings on polymers
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Markus Brochhagen, Christoph Vorkoetter, Marc Boeke, Jan Benedikt
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Plasma Parameters Characterization of Large Diameter Inverted Cylindrical Magnetron Discharge
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Ramkrishna Rane, Subrato Mukherjee
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Time resolved ion energy distribution functions of non-reactive and reactive high power impulse magnetron sputtering of titanium
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Katharina Grosse, Wolfgang Breilmann, Christian Maszl, Jan Benedikt, Achim von Keudell
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Synthesis, transport, and retention of tin nanodroplets in a magnetron sputtering source combined with a capacitively-coupled plasma
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
K. Sasaki, K. Takanari
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Numerical studies from quantum to macroscopic scales of carbon nanoparticules in hydrogen plasma
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Guillaume Lombardi, Alain Ngandjong, Zsolt Mezei, Jonathan Mougenot, Armelle Michau, Khaled Hassouni, Mahamadou Seydou, François Maurel
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
A Study of Impedance Relationships in Dual Frequency PECVD Process Plasma
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Douglas Keil, Edward Augustyniak, Yukinori Sakiyama
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Consistent kinetic simulation of plasma and sputtering in low temperature plasmas
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Frederik Schmidt, Jan Trieschmann, Thomas Mussenbrock
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Screening in humid air plasmas
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Anatoly Filippov , Ivan Derbenev , Nikolay Dyatko , Sergey Kurkin
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Effects of Various RF Powers on CdTe Thin Film Growth Using RF Magnetron Sputtering
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Mohammad Alibakhshi, Zohreh Ghorannevis
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Recent results for electron scattering from biomolecules and molecules formed due to plasma treatment of biomass
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Michael Brunger
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Simulation of the electric potential and plasma generation coupling in magnetron sputtering discharges
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Jan Trieschmann, Dennis Krueger, Frederik Schmidt, Ralf Peter Brinkmann, Thomas Mussenbrock
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Global model for active control of capacitive radio frequency magnetron discharges
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Dennis Engel, Dennis Krueger, Christian Woelfel, Moritz Oberberg, Jan Lunze, Peter Awakowicz, Ralf Peter Brinkmann
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Electron dynamics in magnetized technological plasmas: A kinetic description
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Ralf Peter Brinkmann , Dennis Krueger
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Modeling of RF Magnetron Plasma in N2 with dielectric target
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Steven Arbeltier, Adrien Revel, Frédéric Sabary, Christophe Secouard, Tiberiu Minea
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Reactive high power impulse magnetron sputtering: combining simulation and experiment
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Tomas Kozak, Jaroslav Vlcek
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Generation and remote delivery of plasma activated species
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Paul Maguire, Charles Mahony, Colin Kelsey, David Rutherford, Davide Mariotti, Manuel Macias-Montero, Fatima Perez-Martin, Declan Diver
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Synthesis of boron-nitride nanocages and fullerenes in a BN plasma
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Predrag Krstic, Longtao Han
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Plasma-produced nanocrystals enable new insights in semiconductor physics
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Benjamin Greenberg , Zachary Robinson , Claudia Gorynski , Bryan Voigt , Lorraine Francis , Eray Aydil , Uwe Kortshagen
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Bactericidal active ingredient in cryopreserved plasma-treated water with the reduced-pH method for plasma disinfection
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Katsuhisa Kitano, Satoshi Ikawa, Yoichi Nakashima, Atsushi Tani, Takashi Yokoyama, Tomoko Ohshima
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Mechanisms of selective antitumor action of cold atmospheric plasma
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
David Graves, Georg Bauer
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Synthesis of Silicon Nanoparticles in Inductively Coupled Plasmas
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Aram H. Markosyan, Romain Le Picard, Steven L. Girshick, Mark J. Kushner
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Plasma Etching of superconducting radio frequency cavity by Ar/Cl2 capacitively coupled Plasma
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Janardan Upadhyay, Svetozar Popovic, Anne-Marie Valente-Feliciano, Larry Phillips, Lepsha Vuskovic
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Computer modelling of cryogenic etching in SF6/O2/SiF4 and CxFy inductively coupled plasmas
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Quan-Zhi Zhang, Annemie Bogaerts
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Temporal evolution of as-developed line and space photoresist profiles during etch
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Barton Lane, Peter Ventzek, Alok Ranjan, Vinayak Rastogi, Jun Yoshikawa
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Origin of plasma-induced surface roughening and ripple formation during plasma etching
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Kouichi Ono, Nobuya Nakazaki, Hirotaka Tsuda, Yoshinori Takao, Koji Eriguchi
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Plasma treatment of Seeds: effect on growth, spores and bacterial charge
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
P. F. Ambrico, M. Simek, M. Morano, M. Ambrico, A. Minafra, V. Prukner, R. M. De Miccolis Angelini, P. Trotti
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Biological decontamination of surfaces using guided ionization waves
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Julien Jarrige, Clement Zaepffel
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Investigating the cell death mechanisms in primary prostate cancer cells using low-temperature plasma treatment
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Deborah O'Connell, A M Hirst, J R Packer, M S Simms, V M Mann, F M Frame, N J Maitland
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Selective deposition for "chamber clean-free" processes using tailored voltage waveform plasmas
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Junkang Wang, Erik V. Johnson
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Thin film deposition using rarefied gas jet
69th Annual Gaseous Electronics Conference, Oct. 10–14, 2016, Bochum, Germany
Sahadev Pradhan
Bull. Am. Phys. Soc., Vol: 61, No: 9 , published: 10 October 2016
Design and Simulation Study of MITL for a Multistage FLTD in a Series
Pengfei Zhang ; Ai’ci Qiu ; Yongdong Li ; Hongguang Wang ; Jiang Sun ; Yang Hu ; Fengju Sun ; Peitian Cong
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 10 , published: 01 October 2016
The Sources of Pulse Current Based on Explosive Magnetic Generators for Mobile Testing Facility
A. V. Shurupov ; A. V. Koslov ; M. A. Shurupov ; V. E. Zavalova ; V. E. Fortov
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 10 , published: 01 October 2016
Bipolar Modulation of the Output of a 10-GW Pulsed Power Generator
Meng Wang ; Bucur M. Novac ; Laurent Pécastaing ; Ivor R. Smith
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 10 , published: 01 October 2016
TiO2-Coated Electrodes for Pulsed Electric Field Treatment of Microorganisms
Si Qin ; Igor V. Timoshkin ; Michelle Maclean ; Scott J. MacGregor ; Mark P. Wilson ; Martin J. Given ; Tao Wang ; John G. Anderson
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 10 , published: 01 October 2016
Oxidation and Biodecontamination Effects of Impulsive Discharges in Atmospheric Air
Sirui Li ; Igor V. Timoshkin ; Michelle Maclean ; Scott J. MacGregor ; Mark P. Wilson ; Martin J. Given ; Tao Wang ; John G. Anderson
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 10 , published: 01 October 2016
Surfactant Treatment Using Nanosecond Pulsed Powers and Action of Electric Discharges on Solution Liquid
Mitsuru Morimoto ; Kai Shimizu ; Kenji Teranishi ; Naoyuki Shimomura
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 10 , published: 01 October 2016
The Effect of Scale-Up of Pulsed Corona Discharge for Treatment of Pollution Water Sprayed in Discharge Gap
Taichi Sugai ; Phan Trong Nguyen ; Tomoyo Maruyama ; Akira Tokuchi ; Weihua Jiang
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 10 , published: 01 October 2016
High-Rate Deposition of Stoichiometric Compounds by Reactive Magnetron Sputtering at Oblique Angles
Rafael Alvarez, Aurelio Garcia-Valenzuela, Carmen Lopez-Santos, Francisco J. Ferrer, Victor Rico, Elena Guillen, Mercedes Alcon-Camas, Ramon Escobar-Galindo, Agustin R. Gonzalez-Elipe and Alberto Palmero
Plasma Processes and Polymers, Vol: 13, No: 10 , published: 01 October 2016
Plasma-Produced Vertical Carbonous Nanoflakes for Li-Ion Batteries
Jieyang Wu, Yuanjun Shao, Biben Wang, Kostya (Ken) Ostrikov, Jia Feng and Qijin Cheng
Plasma Processes and Polymers, Vol: 13, No: 10 , published: 01 October 2016
Determination of the optimum conditions for lung cancer cells treatment using cold atmospheric plasma
Morteza Akhlaghi, Hajar Rajaei, Amir Shahriar Mashayekh, Mojtaba Shafiae, Hamed Mahdikia, Mohammadreza Khani, Zuhair Mohammad Hassan, and Babak Shokri
Phys. Plasmas, Vol: 23, No: 10 , published: 01 October 2016
Numerical study of capacitive coupled HBr/Cl2 plasma discharge for dry etch applications
Banat Gul, Iftikhar Ahmad, Gulfam Zia and Aman-ur-Rehman
Phys. Plasmas, Vol: 23, No: 9 , published: 01 October 2016
Study of the VHF Plasma Etching of Micro/Nano Patterned PMMA Coated on Ultra-Thin Flexible Glass Substrates
Aparajita Mandal, Arindam Kole, Sean M. Garner and Partha Chaudhuri
Plasma Processes and Polymers, Vol: 13, No: 10 , published: 01 October 2016
Plasma Polymerization of 3-Aminopropyltrietoxysilane (APTES) by Open-Air Atmospheric Arc Plasma Jet for In-Line Treatments
Sarab Ben Said, Farzaneh Arefi-Khonsari and Jerome Pulpytel
Plasma Processes and Polymers, Vol: 13, No: 10 , published: 01 October 2016
Carbon Dioxide Destruction with Methane Reforming by a Novel Plasma-Catalytic Converter
Mun Sup Lim, Young Nam Chun
Plasma Chem. Plasma Process., Vol: 36, No: 5 , published: 01 September 2016
Easy Synthesis of Ageing-Resistant Coatings with Tunable Wettability by Atmospheric Pressure Plasma
Bernard Nisol, Jonathan Ghesquière, François Reniers
Plasma Chem. Plasma Process., Vol: 36, No: 5 , published: 01 September 2016
Synthesis of Nano-catalysts by Induction Suspension Plasma Technology (SPS) for Fischer–Tropsch Reaction
James Aluha, Kossi Bere, Nicolas Abatzoglou, François Gitzhofer
Plasma Chem. Plasma Process., Vol: 36, No: 5 , published: 01 September 2016
Nano-Architecture of Facetted NiFe2O4/(Ni,Fe)O Particles Produced by Induction Plasma
Samuel Bastien, Christian Ricolleau, Nadi Braidy
Plasma Chem. Plasma Process., Vol: 36, No: 5 , published: 01 September 2016
Efficiency Enhancement of PIC-MCC Modeling for Magnetron Sputtering Simulations Using GPU Parallelization
Ilyoup Sohn ; Jihun Kim ; Junkyeong Bae ; Jinpil Lee
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 9 , published: 01 September 2016
Analysis of Electrical Discharge Plasma in a Gas-Liquid Flow Reactor Using Optical Emission Spectroscopy and the Formation of Hydrogen Peroxide
Kevin C. Hsieh, Huihui Wang and Bruce R. Locke
Plasma Processes and Polymers, Vol: 13, No: 9 , published: 01 September 2016
Fluid Simulation of Capacitively Coupled HBr/Ar Plasma for Etching Applications
Banat Gul, Aman-ur Rehman
Plasma Chem. Plasma Process., Vol: 36, No: 5 , published: 01 September 2016
Designing Hydrophobicity of the PLA Polymer Blend Surfaces by ICP Etching
Domagoj Vrsaljko, Ivana Grčić, Cédric Guyon, Guillaume Schelcher and Michael Tatoulian
Plasma Processes and Polymers, Vol: 13, No: 9 , published: 01 September 2016
Deposition of Cu/a-C:H Nanocomposite Films
Jan Hanuš, Tereza Steinhartová, Ondřej Kylián, Jaroslav Kousal, Petr Malinský, Andrei Choukourov, Anna Macková and Hynek Biederman
Plasma Processes and Polymers, Vol: 13, No: 9 , published: 01 September 2016
Sulfur-Rich Organic Films Deposited by Plasma- and Vacuum-Ultraviolet (VUV) Photo-Polymerization
Evelyne Kasparek, Jason R. Tavares, Michael R. Wertheimer and Pierre-Luc Girard-Lauriault
Plasma Processes and Polymers, Vol: 13, No: 9 , published: 01 September 2016
Deposition of Copper Oxide Coatings With an Atmospheric Pressure Plasma Source: I − Characterization of the Plasma
Johannes Gruenwald, Katja Fricke, Maik Fröhlich and Martin Polak
Plasma Processes and Polymers, Vol: 13, No: 9 , published: 01 September 2016
Experimental Study on Microwave Power Combining Based on Injection-Locked 15-kW S -Band Continuous-Wave Magnetrons
Changjun Liu ; Heping Huang ; Zhengyu Liu ; Feixiang Huo ; Kama Huang
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 8 , published: 01 August 2016
Efficient Magnetron With a Virtual Cathode
Mikhail I. Fuks ; Sarita Prasad ; Edl Schamiloglu
IEEE Trans. Plasma Sci. Pt 1, Vol: 44, No: 8 , published: 01 August 2016
Pulse-Shortening in a Relativistic Magnetron: The Role of Anode Block Axial Endcaps
John G. Leopold ; Anatoli S. Shlapakovski ; Arkady F. Sayapin ; Yakov E. Krasik
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 8 , published: 01 August 2016
Experimental Study of Millimeter Magnetrons With Cold Cathodes
Shengen Li ; Tiechang Yan ; Fengling Li ; Jinsheng Yang ; Wei Shi
IEEE Trans. Plasma Sci. Pt 2, Vol: 44, No: 8 , published: 01 August 2016
The Effects of the Low Temperature Argon Plasma on Stem Cells Proliferation and Regeneration in Planarians
Artem Ermakov, Olga Ermakova, Alexander Skavulyak, Natalia Kreshchenko, Sergey Gudkov and Eugene Maevsky
Plasma Processes and Polymers, Vol: 13, No: 8 , published: 01 August 2016
Deposition of Copper Oxide Coatings with an Atmospheric Pressure Plasma Source: II – Characterization of the Films
Johannes Gruenwald, Katja Fricke, Maik Fröhlich, Jürgen F. Kolb and Martin Polak
Plasma Processes and Polymers, Vol: 13, No: 8 , published: 01 August 2016
Wide Range Control of the Chemical Composition and Optical Properties of Propanethiol Plasma Polymer Films by Regulating the Deposition Temperature
Francisco J. Aparicio, Damien Thiry, Priya Laha and Rony Snyders
Plasma Processes and Polymers, Vol: 13, No: 8 , published: 01 August 2016
Deposition of Poly(Ethylene Oxide)-Like Plasma Polymers on Inner Surfaces of Cavities by Means of Atmospheric-Pressure SDBD-Based Jet
Ivan Gordeev, Milan Šimek, Václav Prukner, Anna Artemenko, Jaroslav Kousal, Daniil Nikitin, Andrei Choukourov and Hynek Biederman
Plasma Processes and Polymers, Vol: 13, No: 8 , published: 01 August 2016
Liquid-Assisted Plasma-Enhanced Chemical Vapor Deposition of Catechol and Quinone-Functionalized Coatings: Insights into the Surface Chemistry and Morphology
Rodolphe Mauchauffé, Maryline Moreno-Couranjou, Nicolas D. Boscher, Anne-Sophie Duwez and Patrick Choquet
Plasma Processes and Polymers, Vol: 13, No: 8 , published: 01 August 2016
Synthesis of Silicon Nanoparticles in Nonthermal Capacitively-Coupled Flowing Plasmas: Processes and Transport
Romain Le Picard , Aram H. Markosyan , David H. Porter , Steven L. Girshick , Mark J. Kushner
Plasma Chem. Plasma Process., Vol: 36, No: 4 , published: 01 July 2016
Plasma Polymer and Biomolecule Modification of 3D Scaffolds for Tissue Engineering
David E. Robinson, Sameer A. Al-Bataineh, Brooke L. Farrugia, Andrew Michelmore, Allison J. Cowin, Tim R. Dargaville, Robert D. Short, Louise E. Smith and Jason D. Whittle
Plasma Processes and Polymers, Vol: 13, No: 7 , published: 01 July 2016
Atmospheric Pressure Plasma Polymer of Ethyl Lactate: In Vitro Degradation and Cell Viability Studies
Morgane Laurent, Julia Koehler, Gad Sabbatier, Corinne A. Hoesli, Nicolas Gherardi and Gaétan Laroche
Plasma Processes and Polymers, Vol: 13, No: 7 , published: 01 July 2016
Linewidth Control and the Improved Adhesion of Inkjet-Printed Ag on Polyimide Substrate, Textured Using Near-Atmospheric Pressure Plasmas
Mu Kyeom Mun, Jin Woo Park and Geun Young Yeom
Plasma Processes and Polymers, Vol: 13, No: 7 , published: 01 July 2016
A high-efficiency relativistic magnetron with the filled dielectric
Xiao-Yu Wang, Yu-Wei Fan, Di-fu Shi and Ting Shu
Phys. Plasmas, Vol: 23, No: 7 , published: 01 July 2016
Influence of impact conditions on plasma generation during hypervelocity impact by aluminum projectile
Weidong Song, Yangtao Lv, Jianqiao Li, Cheng Wang and Jianguo Ning
Phys. Plasmas, Vol: 23, No: 7 , published: 01 July 2016
“Virtual IED sensor” at an rf-biased electrode in low-pressure plasma
M. A. Bogdanova, D. V. Lopaev, S. M. Zyryanov and A. T. Rakhimov
Phys. Plasmas, Vol: 23, No: 7 , published: 01 July 2016
Fundamentals of planar-type inductively coupled thermal plasmas on a substrate for large-area material processing
Mai Kai Suan Tial, Hiromitsu Irie, Yuji Maruyama, Yasunori Tanaka, Yoshihiko Uesugi and Tatsuo Ishijima
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Absolute densities of Cu, Zn, Sn, and S atoms in magnetron sputtering plasmas employing a Cu2ZnSnS4 target
Nayan Nafarizal and Koichi Sasaki
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C2H2 and Ne/C2H2 mixture
Takashi Kimura and Hikaru Kamata
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Preparation of self-supporting Au thin films on perforated substrate by releasing from water-soluble sacrificial layer
Yu Miyamoto, Yuma Fujii, Masafumi Yamano, Toru Harigai, Yoshiyuki Suda, Hirofumi Takikawa, Takeshi Kawano, Mamiko Nishiuchi, Hironao Sakaki and Kiminori Kondo
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Disinfection of Streptococcus mutans biofilm by a non-thermal atmospheric plasma brush
Qing Hong, Xiaoqing Dong, Meng Chen, Yuanxi Xu, Hongmin Sun, Liang Hong, Yong Wang and Qingsong Yu
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Sterilization characteristics of dental instruments using oxygen plasma produced by narrow gap RF discharge
Yasuhiro Sakai, Zhen Liu, Masaaki Goto and Nobuya Hayashi
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Characteristics of surface sterilization using electron cyclotron resonance plasma
Akira Yonesu, Kazufumi Hara, Tatsuya Nishikawa and Nobuya Hayashi
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Improvement of efficiency and viability in plasma gene transfection by plasma minimization and optimization electrode configuration
Masafumi Jinno, Kunihide Tachibana, Hideki Motomura, Noboru Saeki and Susumu Satoh
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Growth enhancement and gene expression of Arabidopsis thaliana irradiated with active oxygen species
Satoshi Watanabe, Reoto Ono, Nobuya Hayashi, Masaharu Shiratani, Kosuke Tashiro, Satoru Kuhara, Asami Inoue, Kaori Yasuda and Hiroko Hagiwara
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Selective Plasma Etching of Polyphenolic Composite in O2/Ar Plasma for Improvement of Material Tracking Properties
Harinarayanan Puliyalil, Gregor Filipič and Uroš Cvelbar
Plasma Processes and Polymers, Vol: 13, No: 7 , published: 01 July 2016
Synthesis of Thermo-Sensitive Hydrogels from Free Radical Copolymerization of NIPAAm with MBA Initiated by Atmospheric Plasma Treatment
Petar Jovančić, Alberto Vílchez and Ricardo Molina
Plasma Processes and Polymers, Vol: 13, No: 7 , published: 01 July 2016
Effects of Radical Species on Structural and Electronic Properties of Amorphous Carbon Films Deposited by Radical-Injection Plasma-Enhanced Chemical Vapor Deposition
Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu and Masaru Hori
Plasma Processes and Polymers, Vol: 13, No: 7 , published: 01 July 2016
The Effect of Low Pressure Plasma Polymerization Modes on the Properties of the Deposited Plasma Polymers
Dani Zeniieh, Arpad Mihai Rostas, Erik Schleicher, Loic Ledernez, Stefan Weber and Gerald Urban
Plasma Processes and Polymers, Vol: 13, No: 7 , published: 01 July 2016
Development of open air silicon deposition technology by silane-free atmospheric pressure plasma enhanced chemical transport under local ambient gas control
Teruki Naito, Nobuaki Konno and Yukihisa Yoshida
Jpn. J. Appl. Phys., Part 3, Vol: 55, No: 7S2 , published: 01 July 2016
Enabling technology innovation through plasma modeling: Biotechnology as the next frontier
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Mark J. Kushner
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Development and pilot test of sterilization system using discharge reactor for hydroponics solution
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Takamasa Okumura ; Kohei Takano ; Yoshinori Saito ; Katsuyuki Takahashi ; Koichi Takaki ; Naoya Satta ; Takuya Fujio
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Influence of driving method on discharge mode of damage free remote plasma removal process for semiconductor manufacturing
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Tae S Cho ; Qing Han ; Soonam Park ; Dima Lubomirsky ; Shankar Venkataraman
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Thermal power plant boilers using microwave ignition of pulverized coal mixture
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Anton Danilenko ; Ibragim Ibragimoglu ; Chegdem Dindar ; Beycan Ibragimoglu ; Vuslat Ibragimoglu
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Development and testing of corona array and nanosecond pulsed power system for electroporation
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Matthew L. Burnette ; David A. Staack
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Fully coupled simulation of plasma-liquid systems: Dependence on interfacial properties
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Alex Lindsay ; David Graves ; Steven Shannon
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Plasma medical innovation using non-thermal atmospheric pressure plasma
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Masara Hori
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Main bactericidal factors of escherichia coli in solutions treated with neutral oxygen radicals
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Masafumi Ito ; Tsuyoshi Kobayashi ; Takayuki Ohta ; Hiroshi Hashizume ; Kenji Ishikawa ; Masaru Hori
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Plasma irradiation effects in the abdominal adhesion mouse model
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Keita Soda ; Takao Hamakubo ; Hiroharu Yamashita ; Kyungho Chang ; Nobuyuki Shimizu
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Atmospheric-pressure plasma-induced cellular responses in human colorectal adenocarcinoma Caco-2 cells: A study of comprehensive quantitative proteomics
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Masanori Tachikawa ; Daichi Sano ; Shota Sasaki ; Makoto Kanzaki ; Tetsuya Terasaki ; Toshiro Kaneko
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Treatment with low-temperature atmospheric pressure plasma enhances cutaneous delivery of epidermal growth factor by regulating E-cadherin-mediated cell junctions
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Jin-Woo Hong ; Hae-June Lee ; Jeong-Hae Choi ; Gyoo-Cheon Kim
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Effects of nanosecond pulsed electromagnetic field on mitochondrial membrane potential∗
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Wenjun Xu ; Xueling Yao ; Jingliang Chen
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Plasma based water treatment: Design guidelines for controlling interface dynamics
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Gunnar R. Stratton ; Selma Mededovic Thagard ; Fei Dai ; Thomas M. Holsen ; Christopher L. Bellona
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Effects of low temperature atmospheric pressure plasma on skin wound healing of mice in vivo
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Guimin Xu ; Jingfen Cai ; Sile Chen ; Congwei Yao ; Ping Li ; Xingmin Shi ; Guan-jun Zhang
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Plasma-activated medium and its medical and biological applications
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Hiromasa Tanaka ; Masaaki Mizuno ; Fumitaka Kikkawa ; Masara Hori
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Impact of synergism of nitrite and hydrogen peroxide on cell survivals in Plasma-Activated-Medium (PAM)
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Naoyuki Kurake ; Hiromasa Tanaka ; Kenji Ishikawa ; Kae Nakamura ; Hiroaki Kajiyama ; Fumiaki Kikkawa ; Takashi Kondo ; Masaaki Mizuno ; Keigo Takeda ; Hiroki Kondo ; Makoto Sekine ; Masaru Hori
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Effective decontamination of soft reline-based oral cancer obturators by means of cold atmospheric plasma
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Vittorio Colombo ; Matteo Gherardi ; Romolo Laurita ; Anna Liguori ; Augusto Stancampiano ; Barbara Azzimonti ; Andrea Cochis ; Marta Petri ; Rita Sorrentino ; Lia Rimondini
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Effects of low temperature atmospheric pressure plasma on cell viability and collagen synthesis of fibroblasts
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Xingmin Shi ; Hongbin Ren ; Jinren Liu ; Jingfen Cai ; Guimin Xu ; Sile Chen ; Guanjun Zhang
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Selective plasma activation of surfaces for biosensing application
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
S. S. Rezaie ; U. Rengarajan ; H. Hoi ; C. Montemagno ; M. Gupta
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Plasma-irradiated solution as drug permeation enhancer
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Toshiro Kaneko ; Kei Kikuchi ; Shota Sasaki ; Makoto Kanzaki
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Bactericidal and physicochemical properties of plasma activated water stored at different temperatures
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Ying Tian ; Kaile Wang ; Songjie Wu ; Ruonan Ma ; Qian Zhang ; Jue Zhang ; Jing Fang
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Cold plasma application in cancer therapy
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Michael Keidar
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Experimental study of ultra-fast electric field in an atmospheric pressure discharge in a pin-to-plate geometry
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Sylvain Iséni ; Sébastien Dozias ; Jean-Michel Pouvesle ; Éric Robert
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Study of plasma properties in pulsed plasma spraying of liquid feedstock
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
F. Mavier ; V. Rat ; M. Bienia ; M. Lejeune ; J. F. Coudert
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Mechanism of silver nanoparicles production at the plasma-liquid interface
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
V S. Santosh ; K. Kondeti ; Urvashi Gangal ; Peter J. Bruggeman
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Adsorption dynamics of plasma-generated N atoms on graphene films
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Germain Robert-Bigras ; Leron Vandsburger ; Luc Stafford
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Design oriented modelling for the synthesis of copper nanoparticles by a radio-frequency induction thermal plasma
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Simone Bianconi ; Marco Boselli ; Vittorio Colombo ; Matteo Gherardi
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Investigation of inductively coupled SF6 plasma etching of Si and SiO2 throught a global model coupled with langmuir adsorption kinetics
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
David A. Toneli ; Rodrigo S. Pessoa ; Marisa Roberto
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Realistic surface reaction modeling for 3D feature profile simulation of fluorocarbon-based plasma etch process
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Yeong-Geun Yook ; Hae Sung You ; Yeon Ho Im ; Won-Seok Chang
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Green plasma route for nitrogen functionalized vertical graphene synthesis using sustainable resources
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Woo Yan Lin ; Bo Ouyang ; Sabpreet Bhatti ; Rajdeep S. Rawat ; Zhang Zheng
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Optimizing remote plasma sources for selective etching
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Shuo Huang ; Mark J. Kushner ; Vladimir Volynets ; Sangheon Lee ; In-Cheol Song ; Siqing Lu ; James R. Hamilton ; Jonathan Tennyson
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Pre-electrospinning polymer solution treatment by atmospheric-pressure argon plasma jet
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Fatemeh Rezaei ; Nathalie De Geyter ; Rino Morent
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Laser surface melting of stainless steel anodes for reduced hydrogen outgassing
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
P. T. Murray ; S. B. Fairchild ; T. C. Back ; D. Gortat ; M. Sparkes ; G. J. Gruen ; N. P. Lockwood
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Capacitively coupled oxyzen plasma treatment of gallium zinc oxide
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Jewon Lee ; Eunji Lee ; Howon Jin ; Guan Sik Cho ; Keun Yong Shon ; Young Yoo ; Stephen J. Pearton
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Plasma treatment of tooth root canal for enhancement of bond strength of dental adhesive system
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Vittorio Colombo ; Diletta Forgione ; Matteo Gherardi ; Romolo Laurita ; Emanuele Simoncelli ; Augusto Stancampiano ; Riccardo Tonini
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Plasmatreatment induces blood clot formation; protein aggregation and hemolysis
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Yuzuru Ikehara ; Sanae Ikehara ; Hajime Sakakita ; Takashi Yamaguchi ; Jaeho Kim ; Masahiro Yamagishi ; Yoshihiro Akimoto ; Kenji Ishikawa ; Masaru Hori ; Hayao Nakanishi ; Nobuyuki Shimizu ; Yuzuru Ikehara
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Enhanced efficacy of a novel atmospheric non-thermal microplasma brush for surface sterilization
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Johanna Neuber ; Shutong Song ; Chunqi Jiang
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Increase in galectin expression in healing wounded skin treated with low-temperature plasma: Comparison with treatment by electronical coagulation
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Y. Akimoto ; S. Ikehara ; T. Yamaguchi ; J. Kim ; H. Kawakami ; N. Shimizu ; M. Hori ; H. Sakakita ; Y. Ikehara
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
RF test and thermal analysis on high power waterload for 30 kW microwave of 2450 MHz applications
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Haejin Kim ; Hyunho Wi ; Suyeon Park ; Sangwon Seon ; Yongchul Hong ; Jaenam Kim ; Seungwook Choi
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
High voltage, fast rise nanosecond pulsers
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Timothy M. Ziemba ; Kenneth E. Miller ; James R. Prager ; Ilia Slobodov ; Julian Picard
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Origins of aspect ratio dependent etching in plasma materials processing
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Chad M. Huard ; Mark J. Kushner ; Yiting Zhang ; Saravanapriyan Sriraman ; Jun R. Belen ; Alex Paterson
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
SiO2-like film deposition on copper surface by atmospheric pressure diffuse discharge
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Wenyao Li ; Chengyan Ren ; Cheng Zhang ; Ruixue Wang ; Jie Li ; Tao Shao
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Effect of HMDSO flow rate in nitrogen atmospheric plasma on the superhydrophobic characteristics of organosilicon-based coatings
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Siavash Asadollahi ; Reza Jafari ; Masoud Farzaneh
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Effect of plasma density enhancement during plasma ion implantation
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Michael P. Bradley
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Effct of target poisoning on the growth of interfacial layer during the initial stage of DC magnetron sputtering deposition
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Jin Young Lee ; Woo Seok Kang ; Min Hur ; Jae-Ok Lee ; Young-Hoon Song
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Microwave plasma-assisted deposition of boron doped single crystal diamond
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Timothy A. Grotjohn ; Ayan Bhattacharya ; Steven Zajac
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
Mei Shen ; Triratna P. Muneshwar ; Ken Cadien ; Ying Y. Tsui ; Doug Barlage ; Triratna P. Muneshwar ; Ken Cadien
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
Applications of laser plasma deposition
2016 IEEE International Conference on Plasma Science (ICOPS), Banff, Canada June 19–23, 2016
M. Gupta ; M. Shen ; Z. Tchir ; Y. Y. Tsui
IEEE Int. Conf. Plasma Sci. (ICOPS) , Vol: 2016, No: , published: 19 June 2016
2D fluid model analysis for the effect of 3D gas flow on a capacitively coupled plasma deposition reactor
Ho Jun Kim and Hae June Lee
Plasma Sources Sci. and Technol., Vol: 25, No: 3 , published: 01 June 2016
Hydrophilic Modification of Polysulfone Ultrafiltration Membranes by Low Temperature Water Vapor Plasma Treatment to Enhance Performance
Adoracion Pegalajar-Jurado, Michelle N. Mann, Matthew R. Maynard and Ellen R. Fisher
Plasma Processes and Polymers, Vol: 13, No: 6 , published: 01 June 2016
Fs Laser-Induced Plasmas from Energetic Polymers: Towards Micro-Laser Plasma Thruster Application
Alexandra Palla Papavlu, Lukas Urech, Thomas Lippert, Claude Phipps, Jörg Hermann and Alexander Wokaun
Plasma Processes and Polymers, Vol: 13, No: 6 , published: 01 June 2016
Co-Deposition of Plasma-Polymerized Polyacrylic Acid and Silver Nanoparticles for the Production of Nanocomposite Coatings Using a Non-Equilibrium Atmospheric Pressure Plasma Jet
Anna Liguori, Enrico Traldi, Elena Toccaceli, Romolo Laurita, Antonino Pollicino, Maria Letizia Focarete, Vittorio Colombo and Matteo Gherardi
Plasma Processes and Polymers, Vol: 13, No: 6 , published: 01 June 2016
Monte Carlo Poration Model of Cell Membranes for Application to Plasma Gene Transfection
Amel Zerrouki, Mohammed Yousfi, Ahmed Rhallabi, Hideki Motomura and Masafumi Jinno
Plasma Processes and Polymers, Vol: 13, No: 6 , published: 01 June 2016
Effects of Precursor and Deposition Conditions on Prevention of Bacterial Biofilm Growth on Chlorinated Plasma Polymers
Thomas D. Michl, Bryan R. Coad, Amanda Hüsler, Jules D. P. Valentin, Krasimir Vasilev and Hans J. Griesser
Plasma Processes and Polymers, Vol: 13, No: 6 , published: 01 June 2016
Escherichia Coli Inactivation in Water Using Pulsed Discharge
Yifan Huang ; Yanqin Kou ; Chao Zheng ; Yuzhen Xu ; Zhen Liu ; Keping Yan
IEEE Trans. Plasma Sci., Vol: 44, No: 6 , published: 01 June 2016
Образование кристаллических структур на поверхности «горячей» мишени ZnO при магнетронном распылении
Исмаилов А. М., Гамматаев С. Л., Рабаданов М. Р., Алиев И. Ш., Эмирасланова Л. Л.
Прикл. физ., Vol: 2016, No: 3 , published: 01 June 2016
Metastable helium atom density in a single electrode atmospheric plasma jet during sample treatment
R. Zaplotnik, M. Bišćan, D. Popović, M. Mozetič and S. Milošević
Plasma Sources Sci. and Technol., Vol: 25, No: 3 , published: 01 June 2016
Plasma Treatment of Onychomycosis
Zilan Xiong, Jeffrey Roe, Timothy C. Grammer and David B. Graves
Plasma Processes and Polymers, Vol: 13, No: 6 , published: 01 June 2016
Sputtering of Spherical SiO2 Samples
Marek Vyšinka ; Zdeněk Němeček ; Jana Šafránková ; Jiří Pavlů ; Jakub Vaverka ; Jaroslava Lavková
IEEE Trans. Plasma Sci., Vol: 44, No: 6 , published: 01 June 2016
Development of Plasma Cleaning at Cornell University
Proc. 7th International Particle Accelerator Conference (IPAC 2016) , Busan, Korea, May 8-13, 2016
G.M. Ge, F. Furuta, M. Liepe, V. Veshcherevich
Proc. International Particle Accelerator Conference (IPAC), Vol: 2016, No: , published: 08 May 2016
Fabrication of Ferrite-Copper Block by Spark Plasma Sintering (SPS)
Proc. 7th International Particle Accelerator Conference (IPAC 2016) , Busan, Korea, May 8-13, 2016
Y. Suetsugu, T. Ishibashi, S. Terui,H. Ishizaki, A. Kimura, T. Sawhata
Proc. International Particle Accelerator Conference (IPAC), Vol: 2016, No: , published: 08 May 2016
Ion energy control in reactive ion etching using 1-MHz pulsed-DC square-wave-superimposed 100-MHz RF capacitively coupled plasma
Akio Ui, Hisataka Hayashi, Itsuko Sakai, Takeshi Kaminatsui, Tokuhisa Ohiwa, Katsumi Yamamoto and Keisuke Kikutani
J. Vac. Sci. Technol., A, Vol: 34, No: 3 , published: 01 May 2016
Impact of hydrofluorocarbon molecular structure parameters on plasma etching of ultra-low-K dielectric
Chen Li, Rahul Gupta, Venkateswara Pallem and Gottlieb S. Oehrlein
J. Vac. Sci. Technol., A, Vol: 34, No: 3 , published: 01 May 2016
Source development for extreme ultraviolet lithography and water window imaging
19th International Conference on Atomic Processes in Plasmas, 4-8 April 2016, Paris, France
Gerry O'Sullivan, Padraig Dunnea, Deirdre Kilbane, Bowen Li, Ragava Lokasani, Elaine Long, Fergal O'Reilly, John Sheil, Emma Sokell, Chihiro Suzuki, Tao Wu and Takeshi Higashiguchi
Int. Conf. on Atomic Processes in Plasmas (APiP), Vol: 2016, No: , published: 04 April 2016
The Chodura layer formation in an active and collisional plasma under the action of a constant magnetic field
R. Morales Crespo
Plasma Sources Sci. and Technol., Vol: 25, No: 2 , published: 01 April 2016
Treatment of Omethoate on Edible Wolfberry by Atmospheric Pressure Air Surface Dielectric Barrier Discharge
Zichao Zong, Renwu Zhou, Dongping Liu, Ying Song and Jinhai Niu
Plasma Processes and Polymers, Vol: 13, No: 4 , published: 01 April 2016
Initiation of 2-Hydroxyethyl Methacrylate Polymerization by Tert-Butyl Peroxide in a Planar PECVD System
Mehmet Gürsoy, Tuba Uçar, Zahide Tosun and Mustafa Karaman
Plasma Processes and Polymers, Vol: 13, No: 4 , published: 01 April 2016
Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance
Shailesh Sharma, David Gahan, Paul Scullin, James Doyle, Jj Lennon, Rajani K. Vijayaraghavan, Stephen Daniels and M. B. Hopkins
Rev. Sci. Instrum. , Vol: 87, No: 4 , published: 01 April 2016
Microwave-Driven Plasma Gasification for Biomass Waste Treatment at Miniature Scale
G. S. J. Sturm, A. N. Muñoz, P. V. Aravind, G. D. Stefanidis
IEEE Trans. Plasma Sci. Pt 3, Vol: 44, No: 4 , published: 01 April 2016
Biodeactivation of Lipopolysaccharide Correlates with Surface-Bound NO3 After Cold Atmospheric Plasma Treatment
Elliot A. J. Bartis, Pingshan Luan, Andrew J. Knoll, David B. Graves, Joonil Seog and Gottlieb S. Oehrlein
Plasma Processes and Polymers, Vol: 13, No: 4 , published: 01 April 2016
Treatment of Ribonucleoside Solution With Atmospheric-Pressure Plasma
Xianhui Zhang, Renwu Zhou, Rusen Zhou, Maodong Chen, Jiangwei Li, Yue Sun, Qiang Chen, Size Yang and Qing Huo Liu
Plasma Processes and Polymers, Vol: 13, No: 4 , published: 01 April 2016
Surface Treatment of Polydimethylsiloxane (PDMS) with Atmospheric Pressure Rotating Plasma Jet. Modeling and Optimization of the Surface Treatment Conditions
José Antonio Jofre-Reche, Jérôme Pulpytel, Houssam Fakhouri, Farzaneh Arefi-Khonsari and José Miguel Martín-Martínez
Plasma Processes and Polymers, Vol: 13, No: 4 , published: 01 April 2016
Chemical analysis of H2–B2H6 and H2–CH4–B2H6 microwave CVD plasmas used for diamond deposition
Catherine Rond et al
Plasma Sources Sci. and Technol., Vol: 25, No: 2 , published: 01 April 2016
Nitrogen Incorporated Ultrananocrystalline Diamond Microstructures From Bias-Enhanced Microwave N2/CH4-Plasma Chemical Vapor Deposition
Kamatchi Jothiramalingam Sankaran, Bohr-Ran Huang, Adhimoorthy Saravanan, Divinah Manoharan, Nyan-Hwa Tai and I.-Nan Lin
Plasma Processes and Polymers, Vol: 13, No: 4 , published: 01 April 2016
Thin Film Deposition on Open-Cell Foams by Atmospheric Pressure Dielectric Barrier Discharges
Fiorenza Fanelli and Francesco Fracassi
Plasma Processes and Polymers, Vol: 13, No: 4 , published: 01 April 2016
Stability of Plasma Treated Non-vulcanized Polybutadiene Surfaces: Role of Plasma Parameters and Influence of Additives
Alicia Henry , Marie-France Vallat , Gauthier Schrodj , Philippe Fioux , Vincent Roucoules , Gregory Francius , Jalal Bacharouche
Plasma Chem. Plasma Process., Vol: 36, No: 2 , published: 01 March 2016
Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
Sergey A. Starostin, Wytze Keuning, Jean-Paul Schalken, Mariadriana Creatore, Wilhelmus M. M. (Erwin) Kessels, Jan B. Bouwstra, Mauritius C. M. (Richard) van de Sanden and Hindrik W. de Vries
Plasma Processes and Polymers, Vol: 13, No: 3 , published: 01 March 2016
Toward a Better Understanding of the Influence of the Hydrocarbon Precursor on the Mechanical Properties of a-C:H Coatings Synthesized by a Hybrid PECVD/PVD Method
Damien Thiry, Aurore De Vreese, Fabian Renaux, Julien L. Colaux, Stéphane Lucas, Yannick Guinet, Laurent Paccou, Etienne Bousser and Rony Snyders
Plasma Processes and Polymers, Vol: 13, No: 3 , published: 01 March 2016
Applying the Macroscopic Kinetic Approach to Plasma Polymerization to the Plasma Surface Modification of Micropowders: Attempt of Correlating Powder Flowability and Plasma Process Parameters
Vito Roberto Giampietro, Christian Roth, Michal Gulas, Vanessa Wood and Philipp Rudolf von Rohr
Plasma Processes and Polymers, Vol: 13, No: 3 , published: 01 March 2016
Effects of Ar and O2 Plasma Etching on Parylene C: Topography versus Surface Chemistry and the Impact on Cell Viability
Dimitrios Kontziampasis, Tatiana Trantidou, Anna Regoutz, Eleanor J. Humphrey, Daniela Carta, Cesare M. Terracciano and Themistoklis Prodromakis
Plasma Processes and Polymers, Vol: 13, No: 3 , published: 01 March 2016
Surface Modification by Atmospheric Pressure Air Plasma Treatment to Improve Dyeing with Natural Dyes: An Environment Friendly Approach for Leather Processing
Hemen Dave, Lalita Ledwani, S. K. Nema
Plasma Chem. Plasma Process., Vol: 36, No: 2 , published: 01 March 2016
Design and Characteristics of a Laminar Plasma Torch for Materials Processing
Xiuquan Cao , Deping Yu , Meng Xiao , Jianguo Miao , Yong Xiang , Jin Yao
Plasma Chem. Plasma Process., Vol: 36, No: 2 , published: 01 March 2016
Ag:TiN-Coated Polyurethane for Dry Biopotential Electrodes: From Polymer Plasma Interface Activation to the First EEG Measurements
Paulo Pedrosa, Patrique Fiedler, Cláudia Lopes, Eduardo Alves, Nuno P. Barradas, Jens Haueisen, Ana V. Machado, Carlos Fonseca and Filipe Vaz
Plasma Processes and Polymers, Vol: 13, No: 3 , published: 01 March 2016
Initial Growth of Functional Plasma Polymer Nanofilms
Marianne Vandenbossche , Maria-Isabel Butron Garcia , Urs Schütz , Patrick Rupper , Martin Amberg , Dirk Hegemann
Plasma Chem. Plasma Process., Vol: 36, No: 2 , published: 01 March 2016
Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
M. Hur , D. J. Kim , W. S. Kang , J. O. Lee , Y.-H. Song , S. J. Kim , I. D. Kim
Plasma Chem. Plasma Process., Vol: 36, No: 2 , published: 01 March 2016
Ion temperature and gas pressure effects on the magnetized sheath dynamics during plasma immersion ion implantation
M. Khoram, H. Ghomi and N. Navab Safa
Phys. Plasmas, Vol: 23, No: 3 , published: 01 March 2016
Effect of plasma parameters on characteristics of silicon nitride film deposited by single and dual frequency plasma enhanced chemical vapor deposition
B. B. Sahu, Yongyi Yin and Jeon G. Han
Phys. Plasmas, Vol: 23, No: 3 , published: 01 March 2016
Hydrogen atom density in narrow-gap microwave hydrogen plasma determined by calorimetry
Takahiro Yamada, Hiromasa Ohmi, Hiroaki Kakiuchi and Kiyoshi Yasutake
J. Appl. Phys. , Vol: 119, No: 6 , published: 14 February 2016
Experimental Demonstration of the Stabilizing Effect of Dielectric Coatings on Magnetically Accelerated Imploding Metallic Liners
T.  J. Awe, K. J. Peterson, E. P. Yu, R. D. McBride, D. B. Sinars, M. R. Gomez, C. A. Jennings, M. R. Martin, S. E. Rosenthal, D. G. Schroen, A. B. Sefkow, S. A. Slutz, K. Tomlinson, and R. A. Vesey
Phys. Rev. Lett., Vol: 116, No: 6 , published: 12 February 2016
Разработка базы данных ab initio бинарных потенциалов и сечений упругого взаимодействия для описания плазменного травления. Пара AR-SI
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Сычева А.А., 2Палов А.П. (1Московский Государственный Университет им. М.В. Ломоносова, Москва, Россия, 2НИИ Ядерной физики им. Д.В. Скобельцына, МГУ, Москва Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Плазменное нанесение нанокомпозитного металлоалмазного покрытия на алюминий
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Петряков С.Ю., 1Гайсин Аз.Ф., 1Гайсин Ф.М., 1Гайсин Ал.Ф., 2Баталов А.В. (1Казанский национальный исследовательский технический университет им. А.Н. Туполева, Казань, Россия, 2Казанский государственный энергетический университет, Казань, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Об эффективности стерилизации неравновесной плазмой, полученной в тлеющем и барьерном разряде атмосферного давления
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1,2Акишев Ю.С., 1Балакирев A.А., 1Каральник В.Б., 3Медведев М.А., 1Петряков А.В., 1Трушкин Н.И., 3Шафиков А.Г., 4Кириллов A.А., 4Павлова A.В., 4Симончик Л.В., 5Дудчик Н.В., 5Нежвинская О.Е. (1Троицкий Институт Инновационных и Термоядерных Исследований, Административный округ Троицк, Москва, Россия, 2Московский инженерно-физический институт, Москва, Россия, 3Московский Физико-Технический Институт (Государственный университет), Долгопрудный, Московская обл., Россия, 4Институт физики им. Б.И. Степанова НАН Беларуси, Минск, Беларусь, 5Республиканское унитарное предприятие "Научно-практический центр гигиены", Минск, Беларусь)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Повышение коррозионной стойкости оболочек твэлов из стали ЭП823 в свинце с использованием лазерных и плазменных потоков излучения
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Борисов В.М., 1Трофимов В.Н., 1Сапожков А.Ю., 1Кузьменко В.А., 1Михайлов В.Б., 1,2Якушкин А.А., 2Якушин В.Л., 2Джумаев П.С. (1Троицкий Институт Инновационных и Термоядерных Исследований, Административный округ Троицк, Москва, Россия, 2Московский инженерно-физический институт, Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
О возможности дистанционного обеззараживания объектов
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
Архипов В.П., Камруков А.С., Козлов Н.П., Макарчук А.А. (Московский Государственный Технический Университет им. Н.Э. Баумана, Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Балансные измерения в экспериментах по синтезу веществ в плазмохимическом реакторе в микроволновых разрядов, инициируемых гиротроном в смеси порошков вольфрам-бор
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Укрюков Г.В., 1,2Малахов Д.В. (1Московский Государственный Технический Университет им. Н.Э. Баумана, Москва, Россия, 2Институт Общей Физики им. А.М. Прохорова РАН, Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Создание рельефа на молибденовых и кварцевых пластинах в разрядах, инициируемых излучением гиротрона в порошках металл-диэлектрик
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Скворцова Н.Н., 1Степахин В.Д., 1Малахов Д.В., 2Сорокин А.А., 1Батанов Г.М., 1Борзосеков В.Д., 2Глявин М.Ю., 1Колик Л.В., 1Кончеков Е.М., 1Летунов А.А., 1Петров А.Е., 3Рябикина И.Г., 1Сарксян К.А., 3Соколов А.С., 3Смирнов В.А., 1Харчев Н.К. (1Институт Общей Физики им. А.М. Прохорова РАН, Москва, Россия, 2Институт прикладной физики РАН, Нижний Новгород, Россия, 3Московский технологический университет (МГТУ МИРЭА), Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Микроволновый метод синтеза частиц микро и нано размеров в разрядах высокого давления, инициируемых излучением гиротрона в порошках металл-диэлектрик
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Скворцова Н.Н., 1Батанов Г.М., 1Борзосеков В.Д., 3Исхакова Л., 1Колик Л.В., 1Кончеков Е.М., 1Летунов А.А., 1Малахов Д.В., 2Милович Ф., 1Образцова Е.Д., 1Образцова Е.А., 1Петров А.Е., 4Рябикина И.Г., 1Сарксян К.А., 1Степахин В.Д., 1Харчев Н.К. (1Институт Общей Физики им. А.М. Прохорова РАН, Москва, Россия, 2Национальный исследовательский технологический университет МИСиС, Москва, Россия, 3Научный центр волоконной оптики РАН, Москва, Россия, 4Московский технологический университет (МГТУ МИРЭА), Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Модифицирование натуральных и синтетических волокнистых материалов с использованием разряда атмосферного давления в потоке воздуха
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
Кузьмичева Л.А., Никитин Д.И., Титова Ю.В., Титов В.А. (Институт химии растворов РАН им. Г.А. Крестова, Иваново, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Упрочнение приповерхностного слоя титана при воздействии микроплазменных разрядов
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Иванов В.А., 1Коныжев М.Е., 1Дорофеюк А.А., 1Камолова Т.И., 2Куксенова Л.И., 2Лаптева В.Г., 2Алексеева М.С., 2Хренникова И.А. (1Институт Общей Физики им. А.М. Прохорова РАН, Москва, Россия, 2Институт машиноведения им. А.А. Благонравова РАН, Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Создание прочного микрорельефа на поверхности алюминия Д16Т с помощью микроплазменных разрядов
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Иванов В.А., 1Коныжев М.Е., 1Дорофеюк А.А., 1Камолова Т.И., 2Куксенова Л.И., 2Лаптева В.Г., 2Алексеева М.С., 2Хренникова И.А. (1Институт Общей Физики им. А.М. Прохорова РАН, Москва, Россия, 2Институт машиноведения им. А.А. Благонравова РАН, Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Физическая модель обработки полимеров в ВЧ-плазме пониженного давления
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
Желтухин В.С., Бородаев И.А. (Казанский национальный исследовательский технологический университет, Казань, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Исследование теплостойкости диоксид циркониевых покрытий, получаемых при плазменных воздействиях в электролитах
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Савушкина С.В., 1Полянский М.Н., 2Борисов А.М., 2Виноградов А.В., 2Людин В.Б., 1Данькова Т.Е., 1Агуреев Л.Е. (1Исследовательский центр имени М.В. Келдыша, Москва, Россия, 2МАТИ - Российский государственный технологический университет им. К.Э. Циолковского, Москва, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Модификация поверхности синтетического алмаза при воздействии СВЧ-плазмы и ионной бомбардировки
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1,2Андрианова Н.Н., 1,2Борисов А.М., 3Казаков В.А., 1Машкова Е.С., 4Пальянов Ю.Н., 5Попов В.П., 6Питиримова Е.А., 2Ризаханов Р.Н., 2Сигалаев С.К. (1НИИ Ядерной физики им. Д.В. Скобельцына, МГУ, Москва Россия, 2МАТИ - Российский государственный технологический университет им. К.Э. Циолковского, Москва, Россия, 3Исследовательский центр имени М.В. Келдыша, Москва, Россия, 4Институт геологии и минералогии им.В.С. Соболева СО РАН, Новосибирск, Россия, 5Институт физики полупроводников им. А. В. Ржанова СО РАН, Новосибирск, Россия, 6Нижегородский государственный университет им. Н.И. Лобачевского, Нижний Новгород, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Очистка молибденовых зеркал от алюминиевых осаждений в ВЧ-разряде
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Дмитриев А.М., 1Раздобарин А.Г., 1Самсонов Д.С., 1Масюкевич С.В., 1Мухин Е.Е., 1Толстяков С.Ю., 1Семенов В.В., 1Кочергин М.М., 1Kурскиев Г.С., 1Чернаков Ал.П., 1Чернаков Ан.П., 1Баженов А.Н., 1Коваль А.Н., 2Городецкий А.Е., 2Маркин А.В., 2Залавутдинов Р.Х., 2Буховец В.Л., 3Смирнов А.С., 3Черноизюмская Т.В., 3Кобелев А.А. (1Физико-Технический институт им. А.Ф. Иоффе РАН, С.-Петербург, Россия, 2Институт Физической Химии и Электрохимии им. А.Н. Фрумкина, РАН, Moсква, Россия, 3Санкт-Петербургский политехнический университет Петра Великого, С.-Петербург, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
Управление осаждением заряженных частиц из плазмы вакуумно-дугового разряда
XLIII конференция по физике плазмы и управляемому термоядерному синтезу, г. Звенигород Московской обл., 8 — 12 февраля 2016 г.
1Кострин Д.К., 2Лисенков А.А. (1Санкт-Петербургский государственный электротехнический университет "ЛЭТИ", С.-Петербург, Россия, 2Институт проблем машиноведения РАН, С.-Петербург, Россия)
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2016, No: , published: 08 February 2016
An unconventional ion implantation method for producing Au and Si nanostructures using intense laser-generated plasmas
L. Torrisi, M. Cutroneo, A. Mackova, V. Lavrentiev, M. Pfeifer and E. Krousky
Plasma Phys. and Contr. Fusion, Vol: 58, No: 2 , published: 01 February 2016
Integrated approach for low-temperature synthesis of high-quality silicon nitride films in PECVD using RF–UHF hybrid plasmas
B. B. Sahu, Kyung S. Shin and Jeon G. Han
Plasma Sources Sci. and Technol., Vol: 25, No: 1 , published: 01 February 2016
Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbO x film growth
Robert Franz, César Clavero, Jonathan Kolbeck and André Anders
Plasma Sources Sci. and Technol., Vol: 25, No: 1 , published: 01 February 2016
Study on Coulomb explosions of ion mixtures
E. Boella, B. Peiretti Paradisi, A. D’Angola, L. O. Silva and G. Coppa
J. Plasma Phys., Vol: 82, No: 1 , published: 01 February 2016
VII Conference on Low Temperature Plasma in the Processes of Functional Coating Preparation
K. Nail
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Additive manufactured Ti6Al4V scaffolds with the RF- magnetron sputter deposited hydroxyapatite coating
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
E. Chudinova, M. Surmeneva, A. Koptioug, P. Scoglund and R. Surmenev
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Characteristics of the electric arch and stream of plasma in the channel with porous cooling
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
G. Yu Dautov, R. R. Khairetdinova and I. G. Dautov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Obtaining fullerene-containing soot during combustion of gaseous hydrocarbons in an external electric field
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
I. G. Galeev and T. Ya Asadullin
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Low temperature plasma RF capacitive discharge in helium at atmospheric pressure
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
A. Hakki, I. Fayrushin and N. Kashapov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Influence of electric field on crater formation during laser treating of metals
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
A. Yu Ivanov and S. V. Vasil'ev
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Hydrogen transport through stainless steel under plasma irradiation
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
A. A. Airapetov, L. B. Begrambekov, A. S. Kaplevsky and Ya A. Sadovskiy
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Changes of thermal balance in a plasma-electrolyte system according to the shape of the applied voltage
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
L. N. Kashapov, N. F. Kashapov, R. N. Kashapov and V. D. Semushin
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Plasma electrolytic treatment of products after selective laser melting
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
L. N. Kashapov, N. F. Kashapov, R. N. Kashapov and D. G. Denisov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Plasma technology for increase of operating high pressure fuel pump diesel engines
R. Y. Solovev, S. N. Sharifullin and N. R. Adigamov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Opportunity some relationship tribo between plasma and service life of machines and mechanisms
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
V. B. Lomuhin, S. N. Sharifullin and I. V. Lapteva
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Highly non-linear resonance fluctuations of gas in a closed pipe
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
R. G. Zaripov, N. F. Kashapov, L. A. Tkachenko and L. R. Shaydullin
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
The influence of the method of cooling liquid electrolyte cathode on the energy balance in the gas discharge
Kh K. Tazmeev, I. M. Arslanov and G. Kh Tazmeev
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
The change in optical and electrical characteristics of tin oxide films under the action of argon ion beam
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
O. Asainov, S. Umnov and V. Temenkov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Antifriction coatings based on a-C for biomedicine applications
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
Y. N. Yurjev, D. V. Kiseleva, D. A. Zaitcev, D. V. Sidelev and O. S. Korneva
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Ion-plasma nitriding of machines and tools parts instrumental steels
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
V. V. Zvezdin, A. A. Spirin, Ruz R. Saubanov, N. M. Zvezdina and A. R. Fayruzova
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Improving the efficiency of plasma heat treatment of metals
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
Az. T. Gabdrakhmanov, I. H. Israphilov, A. T. Galiakbarov, A. D. Samigullin and Al. T. Gabdrakhmanov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Study of the petroleum schedules thermal cleaning process from asphalt, ressin and paraffin deposits using low- temperature plasma
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
A. D. Samigullin, A. T. Galiakbarov and R. T. Galiakbarov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
The effects of low-temperature plasma treatment on the capillary properties of inorganic fibers
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
A. R. Garifullin, I. Sh Abdullin, E. A. Skidchenko, I. V. Krasina and M. F. Shaekhov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Plasma technologies application for building materials surface modification
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
G. G. Volokitin, N. K. Skripnikova, O. G. Volokitin, V. V. Shehovtzov, A. G. Luchkin and N. F. Kashapov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Evaluation of the effectiveness of the use of arc plasma generator with distributed parameters for the deposition of functional coatings at low pressures.
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
N. F. Kashapov, G. Yu. Dautov, I. G. Dautov and G. R. Zakirova
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Features of hydrogen trapping and desorption during deposition of yttrium coating on zirconium in a gas discharge
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
A. E. Evsin, L. B. Begrambekov and S. S. Dovganyuk
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Enhancing of the glow discharge stability in chamber with cathode sections coated by a discontinuous dielectric coating
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
I. G. Galeev and T. Ya Asadullin
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Study of thermal and electrical parameters of workpieces during spray coating by electrolytic plasma jet
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
A. A. Khafizov, Yu I. Shakirov, R. A. Valiev, R. I. Valiev and G. M. Khafizova
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Generation of low-temperature plasma by low-pressure arcs for synthesis of nitride coatings
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
O. V. Krysina, N. N. Koval, I. V. Lopatin, V. V. Shugurov and S. S. Kovalsky
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Hybrid plasma system for magnetron deposition of coatings with ion assistance
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
K. V. Vavilin, E. A. Kralkina, P. A. Nekludova, A. K. Petrov, A. M. Nikonov, V. B. Pavlov, A. A. Airapetov, V. V. Odinokov, G. Ya Pavlov and V. A. Sologub
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Mathematical modeling of plasma deposition and hardening of coatings-switched electrical parameters
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
A. M. Kadyrmetov, S. N. Sharifullin and A.S. Pustovalov
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Structure of the local environment of titanium atoms in multicomponent nitride coatings produced by plasma-ion techniques
VII Conference on Low temperature Plasma in the Processes of Functional Coating Preparation, 4–7 November 2015, Kazan, Russia
O. V. Krysina, N. A. Timchenko, N. N. Koval and Ya V. Zubavichus
J. Phys.: Conf. Ser., Vol: 2016, No: 669 , published: 14 January 2016
Absolute energy distributions of Al, Cu, and Ta ions produced by nanosecond laser-generated plasmas at 1013 Wcm−2
M. Comet, M. Versteegen, F. Gobet, D. Denis-Petit, F. Hannachi, V. Meot and M. Tarisien
J. Appl. Phys. , Vol: 119, No: 1 , published: 07 January 2016
Распределение температуры и плотности тока при искровом плазменном спекании неоднородных образцов
Булат Л.П., Новотельнова А.В., Пшенай-Северин Д.А., Освенский В.Б., Сорокин А.И., Асач А.В., Тукмакова А.С.
Ж. техн. физ., Vol: 86, No: 1 , published: 01 January 2016
Энергетическая модель азотирования в тлеющем разряде
Пастух И.М.
Ж. техн. физ., Vol: 86, No: 1 , published: 01 January 2016
Simple method of improving harvest by nonthermal air plasma irradiation of seeds of Arabidopsis thaliana (L.)
Kazunori Koga, Sarinont Thapanut, Takaaki Amano, Hyunwoong Seo, Naho Itagaki, Nobuya Hayashi and Masaharu Shiratani
Appl. Phys. Express, Vol: 9, No: 1 , published: 01 January 2016
On reactive high power impulse magnetron sputtering
Invited papers from the 42nd European Physical Society Conference on Plasma Physics (Lisbon, Portugal 22-26 June 2015)
J. T. Gudmundsson
Plasma Phys. and Contr. Fusion, Vol: 58, No: 1 , published: 01 January 2016
Sterilization of Fusarium oxysporum by treatment of non-thermalequilibrium plasma in nutrient solution
Shinji Yasui, Satoshi Seki, Ryohei Yoshida, Kazuhiro Shoji and Hitoshi Terazoe
Jpn. J. Appl. Phys., Part 1, Vol: 55, No: 1S , published: 01 January 2016
Characteristics of plasma sterilizer using microwave torch plasma with AC high-voltage discharge plasma
Tomomasa Itarashiki, Nobuya Hayashi and Akira Yonesu
Jpn. J. Appl. Phys., Part 1, Vol: 55, No: 1S , published: 01 January 2016
Study on ozone treatment of soil for agricultural application of surface dielectric barrier discharge
Takuya Nagatomo, Tomoya Abiru, Fumiaki Mitsugi, Kenji Ebihara and Kazuhiro Nagahama
Jpn. J. Appl. Phys., Part 1, Vol: 55, No: 1S , published: 01 January 2016
Special Issue: Plasma Processing of Materials for Energy Conversion and Storage
Mariadriana Creatore and Antonella Milella
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Review of Low Pressure Plasma Processing of Proton Exchange Membrane Fuel Cell Electrocatalysts
Pascal Brault
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Gas-Phase Plasma Synthesis of Free-Standing Silicon Nanoparticles for Future Energy Applications
İlker Doğan and Mauritius C. M. van de Sanden
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Expanding Thermal Plasma Deposition of Al-Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms
Benjamin L. Williams, Mikhail V. Ponomarev, Marcel A. Verheijen, Harm C. M. Knoops, Abhinaya Chandramohan, Leo Duval, Mauritius C. M. van de Sanden and Mariadriana Creatore
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Low-Temperature Atmospheric Pressure Plasma Processes for “Green” Third Generation Photovoltaics
Davide Mariotti, Thierry Belmonte, Jan Benedikt, Tamilselvan Velusamy, Gunisha Jain and Vladimir Švrček
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Fuel Cell Electrodes From Organometallic Platinum Precursors: An Easy Atmospheric Plasma Approach
Delphine Merche, Thierry Dufour, Joffrey Baneton, Giuseppe Caldarella, Vinciane Debaille, Nathalie Job and François Reniers
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Plasma-Polymerized Membranes with High Proton Conductivity for a Micro Semi-Passive Direct Methanol Fuel Cell
Zhongqing Jiang and Zhong-Jie Jiang
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Silicon Nitride Encapsulated Silicon Nanocrystals for Lithium Ion Batteries
Stephen L. Weeks, Noemi Leick and Sumit Agarwal
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Plasma Processing of Electrospun Li-Ion Battery Separators to Improve Electrolyte Uptake
Romolo Laurita, Marco Zaccaria, Matteo Gherardi, Davide Fabiani, Andrea Merlettini, Antonino Pollicino, Maria Letizia Focarete and Vittorio Colombo
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
H2 and N2 Remote Plasma Processing of Wurtzite-Like Oxides: Implications for Energy Applications
Maria M. Giangregorio, Giuseppe V. Bianco, Pio Capezzuto, Giovanni Bruno and Maria Losurdo
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Scalable Production of Silicon Nanocone Solar Cells in Integrated Plasma Photovoltaic Nanofabrication Cluster
Shiyong Huang, Jian Wei Mark Lim, Chia Sern Chan, Shuyan Xu, Deyuan Wei, Yingnan Guo, Luxiang Xu and Kostya (Ken) Ostrikov
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
On the Interaction of Cold Atmospheric Pressure Plasma with Surfaces of Bio-molecules and Model Polymers
Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5-10 July 2015, Antwerp, Belgium
E. A. J. Bartis , A. J. Knoll , P. Luan , J. Seog , G. S. Oehrlein
Plasma Chem. Plasma Process., Vol: 36, No: 1 , published: 01 January 2016
Direct Synthesis of Carbon Nanotubes from Only CO2 by a Hybrid Reactor of Dielectric Barrier Discharge and Solid Oxide Electrolyser Cell
Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5-10 July 2015, Antwerp, Belgium
Shinsuke Mori , Naoki Matsuura , Lin Lin Tun , Masaaki Suzuki
Plasma Chem. Plasma Process., Vol: 36, No: 1 , published: 01 January 2016
Why Target Immune Cells for Plasma Treatment of Cancer
Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5-10 July 2015, Antwerp, Belgium
Vandana Miller, Abraham Lin, Alexander Fridman
Plasma Chem. Plasma Process., Vol: 36, No: 1 , published: 01 January 2016
Plasma Processing of Scaffolds for Tissue Engineering and Regenerative Medicine
Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5-10 July 2015, Antwerp, Belgium
F. Intranuovo , R. Gristina , L. Fracassi , L. Lacitignola , A. Crovace , P. Favia
Plasma Chem. Plasma Process., Vol: 36, No: 1 , published: 01 January 2016
Atmospheric-Pressure Plasma Reduction of Metal Cation-Containing Polymer Films to Produce Electrically Conductive Nanocomposites by an Electrodiffusion Mechanism
Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5-10 July 2015, Antwerp, Belgium
S. Ghosh , E. Ostrowski , R. Yang , D. Debnath , P. X.-L. Feng , C. A. Zorman , R. M. Sankaran
Plasma Chem. Plasma Process., Vol: 36, No: 1 , published: 01 January 2016
Atomic layer deposition of molybdenum oxide from (Nt Bu)2(NMe2)2Mo and O2 plasma
Martijn F. J. Vos, Bart Macco, Nick F. W. Thissen, Ageeth A. Bol and W. M. M. (Erwin) Kessels
J. Vac. Sci. Technol., A, Vol: 34, No: 1 , published: 01 January 2016
Образование поверхностных медно-углеродных микроструктур при распылении составной графитово-медной мишени магнетронным способом
Валянский С. И., Виноградов С. В., Кононов М. А., Кононов В. М., Растопов С. Ф.
Прикл. физ., Vol: 2016, No: 1 , published: 01 January 2016
Conversion of an atomic to a molecular argon ion and low pressure argon relaxation
M. N. Stankov, A. P. Jovanović, V. Lj Marković and S. N. Stamenković
Chin. Phys. B, Vol: 25, No: 1 , published: 01 January 2016
Oxygen and nitrogen plasma etching of three-dimensional hydroxyapatite/chitosan scaffolds fabricated by additive manufacturing
Sung-Woon Myung and Byung-Hoon Kim
Jpn. J. Appl. Phys., Part 1, Vol: 55, No: 1S , published: 01 January 2016
Real-time temperature monitoring of Si substrate during plasma processing and its heat-flux analysis
Takayoshi Tsutsumi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine and Masaru Hori
Jpn. J. Appl. Phys., Part 1, Vol: 55, No: 1S , published: 01 January 2016
Interaction of deuterium plasma with sputter-deposited tungsten nitride films
L. Gao, W. Jacob, G. Meisl, T. Schwarz-Selinger, T. Höschen, U. von Toussaint and T. Dürbeck
Nucl. Fusion, Vol: 56, No: 1 , published: 01 January 2016
Study of Plasma Properties for the Low-Temperature Deposition of Highly Conductive Aluminum Doped ZnO Film Using ICP Assisted DC Magnetron Sputtering
Bibhuti Bhusan Sahu, Jeon Geon Han, Jay Bum Kim, Manish Kumar, Subong Jin and Masaru Hori
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
Hydrogen Plasmas Processing of Graphene Surfaces
Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5-10 July 2015, Antwerp, Belgium
Emilie Despiau-Pujo , Alexandra Davydova , Gilles Cunge , David B. Graves
Plasma Chem. Plasma Process., Vol: 36, No: 1 , published: 01 January 2016
Effects of Atmospheric-Pressure Plasma Treatment on the Processes Involved in Fabrics Dyeing
Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5-10 July 2015, Antwerp, Belgium
G. B. Rusu , I. Topala , C. Borcia , N. Dumitrascu , G. Borcia
Plasma Chem. Plasma Process., Vol: 36, No: 1 , published: 01 January 2016
PECVD Synthesis of Flexible Optical Coatings for Renewable Energy Applications
Thomas F. Fuerst, Matthew O. Reese and Colin A. Wolden
Plasma Processes and Polymers, Vol: 13, No: 1 , published: 01 January 2016
A reference protocol for comparing the biocidal properties of gas plasma generating devices
A Shaw, P Seri, C A Borghi, G Shama and F Iza
J. Phys. D: Appl. Phys., Vol: 48, No: 48 , published: 09 December 2015
Non-uniform plasma distribution in dc magnetron sputtering: origin, shape and structuring of spokes
Matjaž Panjan, Simon Loquai, Jolanta Ewa Klemberg-Sapieha and Ludvik Martinu
Plasma Sources Sci. and Technol., Vol: 24, No: 6 , published: 01 December 2015
Low-z test for interacting dark energy
R. S. Gonçalves, G. C. Carvalho, and J. S. Alcaniz
Phys. Rev. D: Part. Fields , Vol: 92, No: 12 , published: 01 December 2015
Effective permittivity of single-walled carbon nanotube composites: Two-fluid model
Afshin Moradi, Hamid Reza Zangeneh and Firoozeh Karimi Moghadam
Phys. Plasmas, Vol: 22, No: 12 , published: 01 December 2015
Preface to Special Topic: Plasmas for Medical Applications
Michael Keidar and Eric Robert
Phys. Plasmas, Vol: 22, No: 12 , published: 01 December 2015
Evaluation of the effects of a plasma activated medium on cancer cells
S. Mohades, M. Laroussi, J. Sears, N. Barekzi and H. Razavi
Phys. Plasmas, Vol: 22, No: 12 , published: 01 December 2015
Intracellular effects of atmospheric-pressure plasmas on melanoma cancer cells
M. Ishaq, K. Bazaka and K. Ostrikov
Phys. Plasmas, Vol: 22, No: 12 , published: 01 December 2015
Cancer therapy using non-thermal atmospheric pressure plasma with ultra-high electron density
Hiromasa Tanaka, Masaaki Mizuno, Shinya Toyokuni, Shoichi Maruyama, Yasuhiro Kodera, Hiroko Terasaki, Tetsuo Adachi, Masashi Kato, Fumitaka Kikkawa and Masaru Hori
Phys. Plasmas, Vol: 22, No: 12 , published: 01 December 2015
Effects of atmospheric pressure cold plasma on human hepatocarcinoma cell and its 5-fluorouracil resistant cell line
H. Yang, R. Lu, Y. Xian, L. Gan, X. Lu and X. Yang
Phys. Plasmas, Vol: 22, No: 12 , published: 01 December 2015
New insights on the propagation of pulsed atmospheric plasma streams: From single jet to multi jet arrays
E. Robert, T. Darny, S. Dozias, S. Iseni and J. M. Pouvesle
Phys. Plasmas, Vol: 22, No: 12 , published: 01 December 2015
Impact of plasma jet vacuum ultraviolet radiation on reactive oxygen species generation in bio-relevant liquids
H. Jablonowski, R. Bussiahn, M. U. Hammer, K.-D. Weltmann, Th. von Woedtke and S. Reuter
Phys. Plasmas, Vol: 22, No: 12 , published: 01 December 2015
On the Reduction of Gas-Phase Naphthalene Using Char–Particles in a Packed–Bed Atmospheric Pressure Plasma
M. Hübner, R. Brandenburg, Y. Neubauer and J. Röpcke
Contrib. Plasma Phys., Vol: 55, No: 10 , published: 01 December 2015
In Situ Monitoring Capabiities of Quantum Cascade Laser Absorption Spectroscopy in Industrial Plasma Processes
N. Lang, U. Macherius, S. Glitsch, H. Zimmermann, J. Röpcke and J. H. van Helden
Contrib. Plasma Phys., Vol: 55, No: 10 , published: 01 December 2015
Plasma Processes and Cancer – Special Topical Cluster of the 2nd IWPCT Meeting
Masaru Hori, Mounir Laroussi, Kai Masur and Yuzuru
Plasma Processes and Polymers, Vol: 12, No: 12 , published: 01 December 2015
Histological and Nuclear Medical Comparison of Inflammation After Hemostasis with Non-Thermal Plasma and Thermal Coagulation
Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori, Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori, Hajime Sakakita, Yuzuru Ikehara and Shuichi Enomoto
Plasma Processes and Polymers, Vol: 12, No: 12 , published: 01 December 2015
Atmospheric Non-Equilibrium Plasma Promotes Cell Death and Cell-Cycle Arrest in a Lymphoma Cell Line
Matteo Gherardi, Eleonora Turrini, Romolo Laurita, Elena De Gianni, Lorenzo Ferruzzi, Anna Liguori, Augusto Stancampiano, Vittorio Colombo and Carmela Fimognari
Plasma Processes and Polymers, Vol: 12, No: 12 , published: 01 December 2015
Cold Plasma Accelerates the Uptake of Gold Nanoparticles Into Glioblastoma Cells
Xiaoqian Cheng, Kenan Rajjoub, Jonathan Sherman, Jerome Canady, Nina Recek, Dayun Yan, Ka Bian, Ferid Murad and Michael Keidar
Plasma Processes and Polymers, Vol: 12, No: 12 , published: 01 December 2015
Anti-Cancer Effects of Nonequilibrium Atmospheric Pressure Plasma on Cancer-Initiating Cells in Human Endometrioid Adenocarcinoma Cells
Jun-Ichiro Ikeda, Yoko Tsuruta, Satoshi Nojima, Hajime Sakakita, Masaru Hori and Yuzuru Ikehara
Plasma Processes and Polymers, Vol: 12, No: 12 , published: 01 December 2015
Cold Physical Plasmas in the Field of Hygiene—Relevance, Significance, and Future Applications
Axel Kramer, Sander Bekeschus, Rutger Matthes, Claudia Bender, Matthias B. Stope, Matthias Napp, Olaf Lademann, Jürgen Lademann, Klaus-Dieter Weltmann and Frieder Schauer
Plasma Processes and Polymers, Vol: 12, No: 12 , published: 01 December 2015
On the Impact of Electron Temperature in Magnetron Sputtering Benchmarked with Energy Flux Measurements
F. Haase, D. Lundin, S. Bornholdt and H. Kersten
Contrib. Plasma Phys., Vol: 55, No: 10 , published: 01 December 2015
Plasma Treatment of Food
J. Ehlbeck, U. Schnabel, M. Andrasch, J. Stachowiak, N. Stolz, A. Fröhling, O. Schlüter and K.-D. Weltmann
Contrib. Plasma Phys., Vol: 55, No: 10 , published: 01 December 2015
Plasma Blood Coagulation Without Involving the Activation of Platelets and Coagulation Factors
Sanae Ikehara, Hajime Sakakita, Kenji Ishikawa, Yoshihiro Akimoto, Takashi Yamaguchi, Masahiro Yamagishi, Jaeho Kim, Masashi Ueda, Jun-ichiro Ikeda, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori and Yuzuru Ikehara
Plasma Processes and Polymers, Vol: 12, No: 12 , published: 01 December 2015
Магнетронное осаждение покрытий с испарением мишени
Блейхер Г.А., Кривобоков В.П., Юрьева А.В.
Ж. техн. физ., Vol: 85, No: 12 , published: 01 December 2015
Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy
P. Vašina, M. Fekete, J. Hnilica, P. Klein, L. Dosoudilová, P. Dvořák and Z. Navrátil
Plasma Sources Sci. and Technol., Vol: 24, No: 6 , published: 01 December 2015
Energy Distribution of Secondary Particles in Ion Beam Deposition Process of Ag: Experiment, Calculation and Simulation
C. Bundesmann, R. Feder, T. Lautenschläger and H. Neumann
Contrib. Plasma Phys., Vol: 55, No: 10 , published: 01 December 2015
Pro-apoptotic NOXA is implicated in atmospheric-pressure plasma-induced melanoma cell death Special issue on plasma medicine
M. Ishaq, K. Bazaka and K. Ostrikov
J. Phys. D: Appl. Phys., Vol: 48, No: 46 , published: 25 November 2015
Atmospheric pressure argon surface discharges propagated in long tubes: physical characterization and application to bio-decontamination
Zuzana Kovalova, Magali Leroy, Carolyn Jacobs, Michael J. Kirkpatrick, Zdenko Machala, Filipa Lopes, Christophe O. Laux, Michael S. DuBow and Emmanuel Odic
J. Phys. D: Appl. Phys., Vol: 48, No: 46 , published: 25 November 2015
Kinetic Mie ellipsometry to determine the time-resolved particle growth in nanodusty plasmas
Sebastian Groth, Franko Greiner, Benjamin Tadsen and Alexander Piel
J. Phys. D: Appl. Phys., Vol: 48, No: 46 , published: 25 November 2015
Analysis of antibacterial efficacy of plasma-treated sodium chloride solutions Plasma and Liquids
Mareike A. C. Hänsch, Miriam Mann, Klaus-Dieter Weltmann and Thomas von Woedtke
J. Phys. D: Appl. Phys., Vol: 48, No: 45 , published: 18 November 2015
A Nanosecond Pulsed Plasma Brush for Surface Decontamination
57th Annual Meeting of the APS Division of Plasma Physics, November 16-20, 2015, Savannah, US
Johanna Neuber , Muhammad Malik , Shutong Song , Chunqi Jiang
Bull. Am. Phys. Soc., Vol: 60, No: 19 , published: 16 November 2015
Power Efficient Plasma Technique for Rapid Water Sterilization
57th Annual Meeting of the APS Division of Plasma Physics, November 16-20, 2015, Savannah, US
Ady Hershcovitch
Bull. Am. Phys. Soc., Vol: 60, No: 19 , published: 16 November 2015
Laser-Bioplasma Interaction: The Blood Type Transmutation Induced by Multiple Ultrashort Wavelength Laser Beams
57th Annual Meeting of the APS Division of Plasma Physics, November 16-20, 2015, Savannah, US
V. Alexander Stefan
Bull. Am. Phys. Soc., Vol: 60, No: 19 , published: 16 November 2015
Low-temperature plasma needle effects on cultured metastatic breast cancer cells
57th Annual Meeting of the APS Division of Plasma Physics, November 16-20, 2015, Savannah, US
Sean Knecht , Sven Bilen , Michael Micci , Timothy Brubaker , Michael Wilson , Ian Cook , Nicholas Czesak , Garret Hipkins
Bull. Am. Phys. Soc., Vol: 60, No: 19 , published: 16 November 2015
BiScO3-PbTiO3 Nanoceramics Prepared by Spark Plasma Sintering
57th Annual Meeting of the APS Division of Plasma Physics, November 16-20, 2015, Savannah, US
Xiaohui Wang
Bull. Am. Phys. Soc., Vol: 60, No: 19 , published: 16 November 2015
Generation of low-temperature air plasma for food processing
57th Annual Meeting of the APS Division of Plasma Physics, November 16-20, 2015, Savannah, US
Olga Stepanova , Maria Demidova , Alexander Astafiev , Mikhail Pinchuk , Pinar Balkir , Fulya Turantas
Bull. Am. Phys. Soc., Vol: 60, No: 19 , published: 16 November 2015
Enhancement of Particle Track Etch Rate in CR-39 by UV Exposure
57th Annual Meeting of the APS Division of Plasma Physics, November 16-20, 2015, Savannah, US
Micah Wiesner , Rubab Ume , James McLean , Craig Sangster , Sean Regan
Bull. Am. Phys. Soc., Vol: 60, No: 19 , published: 16 November 2015
The Effects of Using a Commercial Grade Plasma Etching Chamber to Etch Anodized Niobium Surfaces
57th Annual Meeting of the APS Division of Plasma Physics, November 16-20, 2015, Savannah, US
Christiana Epperson , Dereth Drake , Kalina Winska
Bull. Am. Phys. Soc., Vol: 60, No: 19 , published: 16 November 2015
A study of trap-limited conduction influenced by plasma damage on the source/drain regions of amorphous InGaZnO TFTs
Chih-Chieh Hsu, Jhen-Kai Sun and Chien-Hsun Wu
J. Phys. D: Appl. Phys., Vol: 48, No: 44 , published: 11 November 2015
Boriding of carbon steels by the electron beam treatment in vacuum
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
D. E. Dasheev, N. N. Smirnyagina, V. M. Khaltanova and A. P. Semenov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Magnetron discharge sputtering for fabrication of nanogradient optical coatings
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
O. D. Volpian, A. I. Kuzmichev, G. F. Ermakov, A. I. Krikunov, Yu A. Obod, N. V. Silin and S. V. Shkatula
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Synthesis of transition metal borides layers under pulsed electron-beams treatment in a vacuum for surface hardening of instrumental steels
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
A. S. Milonov, B. A. Danzheev, N. N. Smirnyagina, D. E. Dasheev, T. B. Kim and A. P. Semenov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Structure and properties of commercially pure titanium nitrided in the plasma of a low-pressure gas discharge produced by a PINK plasma generator
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
Yu F. Ivanov, Yu H. Akhmadeev, I. V. Lopatin, E. A. Petrikova, V. Krysina and N. N. Koval
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Surface structure of commercially pure VT1-0 titanium irradiated by an intense pulsed electron beam
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
Yu F. Ivanov, A. D. Teresov, E. A. Petrikova, O. V. Ivanova and I. A. Ikonnikova
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Effect of vacuum conditions and plasma concentration on the chemical composition and adhesion of vacuum-plasma coatings
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
D. P. Borisov, V. M. Kuznetsov and V. A. Slabodchikov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Non-equilibrium melting processes of silicate melts with different silica content at low-temperature plasma
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
V. Vlasov, G. Volokitin, N. Skripnikova, O. Volokitin, V. Shekhovtsov and A. Pfuch
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Magnetron sputtering system for coatings deposition with activation of working gas mixture by low-energy high-current electron beam
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
N. V. Gavrilov, A. S. Kamenetskikh, A. I. Men'shakov and O. A. Bureyev
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
The impact of the plasma volume discharge in the atmospheric-pressure air on the distribution of the surface potential in a V-defect region of epitaxial HgCdTe films
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
D. V. Grigoryev, V. A. Novikov, D. A. Bezrodnyy, V. F. Tarasenko and M. A. Shulepov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Surface hardening of stainless steel by runaway electrons preionized diffuse discharge in air atmosphere
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
M. V. Erofeev, M. A. Shulepov, K. V. Oskomov and V. F. Tarasenko
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Sterilization of dielectric containers using a fore-vacuum pressure plasma-cathode electron source
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
D. Zolotukhin, V. Burdovitsini, E. Oks, A. Tyunkov and Yu Yushkov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Magnetron deposition of TCO films using ion beam
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
O. Asainov, S. Umnov and A. Chinin
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Electro-explosive alloying of VT6 alloy surface by boron carbide powder with the subsequent electron-beam treatment
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
D. A. Romanov, S. V. Raykov, V. E. Gromov and Yu F. Ivanov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Modelling of underground geomechanical characteristics for electrophysical conversion of oil shale
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
A. A. Bukharkin, I. A. Koryashov, S. M. Martemyanov and A. A. Ivanov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
The application of an assisting gas plasma generator for low- temperature magnetron sputtering of Ti-C-Mo-S antifriction coatings on titanium alloys
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
A. I. Potekaev, V. M. Savostikov, A. N. Tabachenko, E. F. Dudarev, E. A. Melnikova and I. A. Shulepov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Application of Microsecond Voltage Pulses for Water Disinfection by Diaphragm Electric Discharge
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
S. V. Kakaurov, I. F. Suvorov, A. S. Yudin, T. L. Solovyova and N. S. Kuznetsova
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Using the low-temperature plasma in cement production
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
N. A .Sazonova and N. K. Skripnikova
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Features of formation of structural-phase states on the surface of titanium alloy VT1-0 after electron-ion-plasma treatment
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
Yu F. Ivanov, A. D. Teresov, O. V. Ivanova, V. E. Gromov, E. A. Budovskikh, V. A. Vlasov and A. A. Klopotov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Plasma treatment of heat-resistant materials
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
V. A. Vlasov, P. V. Kosmachev, N. K. Skripnikova and K. A. Bezukhov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
High-voltage electrode optimization towards uniform surface treatment by a pulsed volume discharge
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
A. V. Ponomarev, M. S. Pedos, S. V. Scherbinin, Y. I. Mamontov and S. V. Ponomarev
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
V. A. Tarala, A. S. Altakhov, V. Ya Martens and S. V. Lisitsyn
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Thermal Stability of Ti-C-Ni-Cr and Ti-C-Ni-Cr-Al-Si Nanocomposite Coatings
12th International Conference on Gas Discharge Plasmas and Their Applications, 6-11 September 2015, Tomsk, Russia
A. V. Andreev, I. Y. Litovchenko, A. D. Korotaev and D. P. Borisov
J. Phys.: Conf. Ser., Vol: 2015, No: 652 , published: 05 November 2015
Computational model of the interaction of a helium atmospheric-pressure jet with a dielectric surface
M. I. Hasan and J. W. Bradley
J. Phys. D: Appl. Phys., Vol: 48, No: 43 , published: 04 November 2015
Cryogenic etching processes applied to porous low-k materials using SF6/C4F8 plasmas
F. Leroy, L. Zhang, T. Tillocher, K. Yatsuda, K. Maekawa, E. Nishimura, P. Lefaucheux, J.-F. de Marneffe, M. R. Baklanov and R. Dussart
J. Phys. D: Appl. Phys., Vol: 48, No: 43 , published: 04 November 2015
Innovative medical technology in plasma disinfection of human body with low-temperature atmospheric-pressure plasmas ~ the reduced-pH method and the plasma-treated water (PTW)
25th International Toki Conference (ITC– 25) Creating the Future – Innovative Science of Plasma and Fusion
3 – 6 November, 2015 Ceratopia Toki, Toki-­city, Gifu, JAPAN
K. Kitano, S. Ikawa, Y. Nakashima, A. Tani, T. Yokoyama, T. Ohshima
International Toki Conference , Vol: 2015, No: , published: 03 November 2015
Study of H Production in DC H Source of Medical Cyclotron
25th International Toki Conference (ITC– 25) Creating the Future – Innovative Science of Plasma and Fusion
3 – 6 November, 2015 Ceratopia Toki, Toki-­city, Gifu, JAPAN
H. Etoh, M. Onai, Y. Aoki, H. Mitsubori, Y. Arakawa, J. Sakuraba, T. Kato, T. Mitsumoto, S. Yajima, T. Shibata, A. Hatayama, and Y. Okumura
International Toki Conference , Vol: 2015, No: , published: 03 November 2015
Magnetized plasma modelling: common approach interesting for fusion and processing plasmas
25th International Toki Conference (ITC– 25) Creating the Future – Innovative Science of Plasma and Fusion
3 – 6 November, 2015 Ceratopia Toki, Toki-­city, Gifu, JAPAN
T. Minea, A. Revel, S. Mochalskyy, A. Lifschitz
International Toki Conference , Vol: 2015, No: , published: 03 November 2015
Degradation of acetic acid in water using gas-liquid plasma with SPG membrane
25th International Toki Conference (ITC– 25) Creating the Future – Innovative Science of Plasma and Fusion
3 – 6 November, 2015 Ceratopia Toki, Toki-­city, Gifu, JAPAN
Guanyang Tang, Atsushi Komuro, Kazunori Takahashi and Akira Ando
International Toki Conference , Vol: 2015, No: , published: 03 November 2015
Hydrogen Gas-Driven Permeation through F82H Steel Coated with Vacuum Plasma-Sprayed Tungsten
25th International Toki Conference (ITC– 25) Creating the Future – Innovative Science of Plasma and Fusion
3 – 6 November, 2015 Ceratopia Toki, Toki-­city, Gifu, JAPAN
Y. Xu, Y. Hirooka , T. Nagasaka, H. Bi, J. Yagi
International Toki Conference , Vol: 2015, No: , published: 03 November 2015
Formation of Diamond-Like Carbon (DLC) on Silicon using Low Energy Ion Beam Deposition
25th International Toki Conference (ITC– 25) Creating the Future – Innovative Science of Plasma and Fusion
3 – 6 November, 2015 Ceratopia Toki, Toki-­city, Gifu, JAPAN
Juan Paulo N. Gonda, Christian Lorenz S. Mahinay
International Toki Conference , Vol: 2015, No: , published: 03 November 2015
Nitrogen Atmospheric-Pressure-Plasma-Jet Induced Oxidation of SnOx Thin Films
Guan-Wei Lin , Yu-Hao Jiang , Peng-Kai Kao , I-Chung Chiu , Yu-Han Wu , Cheng-Che Hsu , I-Chun Cheng , Jian-Zhang Chen
Plasma Chem. Plasma Process., Vol: 35, No: 6 , published: 01 November 2015
Generation of In-Package Cold Plasma and Efficacy Assessment Using Methylene Blue
N. N. Misra , K. M. Keener , P. Bourke , P. J. Cullen
Plasma Chem. Plasma Process., Vol: 35, No: 6 , published: 01 November 2015
On the Gas Heating Mechanism for the Fast Anode Arc Reattachment in a Non-transferred Arc Plasma Torch Operating with Nitrogen Gas in the Restrike Mode
L. Prevosto , H. Kelly , B. Mancinelli , J. C. Chamorro
Plasma Chem. Plasma Process., Vol: 35, No: 6 , published: 01 November 2015
Fluorophore-based sensor for oxygen radicals in processing plasmas
Faraz A. Choudhury, Grzegorz Sabat, Michael R. Sussman, Yoshio Nishi and J. Leon Shohet
J. Vac. Sci. Technol., A, Vol: 33, No: 6 , published: 01 November 2015
Characterization of CO2 plasma ashing for less low-dielectric-constant film damage
Yoshio Susa, Hiroto Ohtake, Zhao Jianping, Lee Chen and Toshihisa Nozawa
J. Vac. Sci. Technol., A, Vol: 33, No: 6 , published: 01 November 2015
Spatially resolved electron density and electron energy distribution function in Ar magnetron plasmas used for sputter-deposition of ZnO-based thin films
L. Maaloul, R. K. Gangwar, S. Morel and L. Stafford
J. Vac. Sci. Technol., A, Vol: 33, No: 6 , published: 01 November 2015
Understanding the Morphogenesis of Nanostructures in Maleic Anhydride Plasma Polymer Films via Growth Kinetics and Chemical Force Titration
Michel M. Brioude, Marie-Pierre Laborie, Hamidou Haidara and Vincent Roucoules
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
A Battery Powered, Portable, and Self-Contained Non-Thermal Helium Plasma Jet Device for Point-of-Injury Burn Wound Treatment
Jeffrey Parkey, Jenifer Cross, Ryan Hayes, Christi Parham, David Staack and Anjal C. Sharma
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
Two-Dimensional Integrated Model for Interaction of Liquid Droplets with Atmospheric Pressure Plasma
Muhammad M. Iqbal, Charlie P. Stallard, Denis P. Dowling and Miles M. Turner
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
Water Sensitive Coatings Deposited by Aerosol Assisted Atmospheric Plasma Process: Tailoring the Hydrolysis Rate by the Precursor Chemistry
Grégory Mertz, Thierry Fouquet, Hicham Ibn El Ahrach, Claude Becker, Trang N. T. Phan, Fabio Ziarelli, Didier Gigmes and David Ruch
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
Direct Plasma Deposition of Lysozyme-Embedded Bio-Composite Thin Films
Fabio Palumbo, Giuseppe Camporeale, Yi-Wei Yang, Jong-Shinn Wu, Eloisa Sardella, Giorgio Dilecce, Cosima Damiana Calvano, Laura Quintieri, Leonardo Caputo, Federico Baruzzi and Pietro Favia
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
Nanofluids Containing MWCNTs Coated with Nitrogen-Rich Plasma Polymer Films for CO2 Absorption in Aqueous Medium
Larissa Jorge, Sylvain Coulombe and Pierre-Luc Girard-Lauriault
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
Fabrication of Structurally Simple Index-Matched ITO Films Using Roll-to-Roll Sputtering for Touch Screen Panel Devices
Cheol Hwan Kim, Woo Jin Choi, Seong Keun Cho, Daiji Goshima, Dong Seok Ham, Kwang-Je Kim, Jongkoo Jeong, Jae Heung Lee and Sang-Jin Lee
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
Are the argon metastables important in high power impulse magnetron sputtering discharges?
J. T. Gudmundsson, D. Lundin, G. D. Stancu, N. Brenning and T. M. Minea
Phys. Plasmas, Vol: 22, No: 11 , published: 01 November 2015
Скорость образования и энергетический выход гидратированных электронов при газораз-рядной обработке воды
Хлюстова А. В., Титов В. А.
Прикл. физ., Vol: 2015, No: 6 , published: 01 November 2015
Microplasma: A New Generation of Technology for Functional Nanomaterial Synthesis
Liangliang Lin, Qi Wang
Plasma Chem. Plasma Process., Vol: 35, No: 6 , published: 01 November 2015
Pressure-Dependent Etching Mechanism and Induced Dielectric Properties Variation of BZN Thin Films in SF6/Ar Plasma
Liping Dai , Wenping Song , Shuya Wang , Zhiqin Zhong , Guojun Zhang
Plasma Chem. Plasma Process., Vol: 35, No: 6 , published: 01 November 2015
A Model-Based Comparative Study of HCl and HBr Plasma Chemistries for Dry Etching Purposes
Alexander Efremov, Joon Hyub Kim, Kwang-Ho Kwon
Plasma Chem. Plasma Process., Vol: 35, No: 6 , published: 01 November 2015
Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma
Min Hwan Jeon, Kyung Chae Yang, Sehan Lee and Geun Young Yeom
J. Vac. Sci. Technol., A, Vol: 33, No: 6 , published: 01 November 2015
Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model
Nobuyuki Kuboi, Tetsuya Tatsumi, Takashi Kinoshita, Takushi Shigetoshi, Masanaga Fukasawa, Jun Komachi and Hisahiro Ansai
J. Vac. Sci. Technol., A, Vol: 33, No: 6 , published: 01 November 2015
Deposition of Ni Coatings by Electrolytic Plasma Processing
A. Smith, R. Kelton, E. I. Meletis
Plasma Chem. Plasma Process., Vol: 35, No: 6 , published: 01 November 2015
Properties of Recycled Thermoplastic Polyurethane Filled with Plasma Treated Bentonite
Vitalija Skrockienė, Kristina Žukienė and Simona Tučkutė
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
In situ IR Spectroscopy as a Tool to Better Understand the Growth Mechanisms of Plasma Polymers Thin Films
Sylvie Ligot, Damien Thiry, Pierre-Antoine Cormier, Patrice Raynaud, Philippe Dubois and Rony Snyders
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
Atmospheric-Pressure Plasma Deposited Epoxy-Rich Thin Films as Platforms for Biomolecule Immobilization—Application for Anti-Biofouling and Xenobiotic-Degrading Surfaces
Giuseppe Camporeale, Maryline Moreno-Couranjou, Sébastien Bonot, Rodolphe Mauchauffé, Nicolas D. Boscher, Carine Bebrone, Cécile Van de Weerdt, Henry-Michel Cauchie, Pietro Favia and Patrick Choquet
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
Plasma Enhanced CVD of Organosilicon Thin Films on Electrospun Polymer Nanofibers
Eva Kedroňová, Lenka Zajíčková, Dirk Hegemann, Miloš Klíma, Miroslav Michlíček and Anton Manakhov
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
Nanoscale Mechanical and Tribological Properties of Plasma Nanotextured COP Surfaces with Hydrophobic Coatings
Dimitrios A. Dragatogiannis, Elias Koumoulos, Kosmas Ellinas, Angeliki Tserepi, Evangelos Gogolides and Costas A. Charitidis
Plasma Processes and Polymers, Vol: 12, No: 11 , published: 01 November 2015
A review of plasma–liquid interactions for nanomaterial synthesis
Qiang Chen, Junshuai Li and Yongfeng Li
J. Phys. D: Appl. Phys., Vol: 48, No: 42 , published: 28 October 2015
Molecular-dynamics analysis of mobile helium cluster reactions near surfaces of plasma-exposed tungsten
Lin Hu, Karl D. Hammond, Brian D. Wirth and Dimitrios Maroudas
J. Appl. Phys. , Vol: 118, No: 16 , published: 28 October 2015
Improved performance of parallel surface/packed-bed discharge reactor for indoor VOCs decomposition: optimization of the reactor structure
Nan Jiang, Chun-Xue Hui, Jie Li, Na Lu, Ke-Feng Shang, Yan Wu and Akira Mizuno
J. Phys. D: Appl. Phys., Vol: 48, No: 40 , published: 14 October 2015
Elementary surface processes during reactive magnetron sputtering of chromium
Sascha Monje, Carles Corbella and Achim von Keudell
J. Appl. Phys. , Vol: 118, No: 13 , published: 07 October 2015
Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics
J.-F. de Marneffe, L. Zhang, M. Heyne, M. Lukaszewicz, S. B. Porter, F. Vajda, V. Rutigliani, Z. el Otell, M. Krishtab, A. Goodyear, M. Cooke, P. Verdonck and M. R. Baklanov
J. Appl. Phys. , Vol: 118, No: 13 , published: 07 October 2015
Photocathodes based on Mg and Y metallic thin films deposited by pulsed laser ablation technique
7th PPLA Conference on Plasma Physics by Laser and Application ENEA Research Centre on 5-7 October 2015, Frascati (Roma), Italy
A. Lorusso , F. Gontad , A. Perrone and E. Chiadroni
Conf. Plasma Phys. Laser and Application (PPLA), Vol: 2015, No: 7 , published: 05 October 2015
Polyethylene laser welding based on optical absorption variations
7th PPLA Conference on Plasma Physics by Laser and Application ENEA Research Centre on 5-7 October 2015, Frascati (Roma), Italy
G. Galtieri, A. M Visco, D. Nocita, L. Torrisi, G. Ceccio, C. Scolaro
Conf. Plasma Phys. Laser and Application (PPLA), Vol: 2015, No: 7 , published: 05 October 2015
A Compact Mode Conversion Configuration in Relativistic Magnetron With a TE10 Output Mode
Shi D., Qian B., Wang H., Li W., Wang Y.
IEEE Trans. Plasma Sci. Pt 1, Vol: 43, No: 10 , published: 01 October 2015
Use of nonlocal helium microplasma for gas impurities detection by the collisional electron spectroscopy method
Anatoly A. Kudryavtsev, Margarita S. Stefanova and Petko M. Pramatarov
Phys. Plasmas, Vol: 22, No: 10 , published: 01 October 2015
Thermodynamic properties and transport coefficients of air thermal plasmas mixed with ablated vapors of Cu and polytetrafluoroethylene
JunMin Zhang, ChunRong Lu, YongGang Guan and WeiDong Liu
Phys. Plasmas, Vol: 22, No: 10 , published: 01 October 2015
Discharge Study of Argon DC Arc Jet Assisted by DBD Plasma for Metal Surface Treatment
Juyong Jang, Nishiyama H.
IEEE Trans. Plasma Sci. Pt 2, Vol: 43, No: 10 , published: 01 October 2015
Импульсные микроволновые разряды в порошковых смесях. состояние, проблемы, перспективы
Батанов Г.М., Коссый И.А.
Физ. плазмы, Vol: 41, No: 10 , published: 01 October 2015
Nucleation and growth of nanoparticles in a plasma by laser ablation in liquid
Francesco Taccogna
J. Plasma Phys., Vol: 81, No: 5 , published: 01 October 2015
A comparative study of capacitively coupled HBr/He, HBr/Ar plasmas for etching applications: Numerical investigation by fluid model
Banat Gul and Aman-ur-Rehman
Phys. Plasmas, Vol: 22, No: 10 , published: 01 October 2015
Study on re-sputtering during CNx film deposition through spectroscopic diagnostics of plasma
Peipei Liang, Xu Yang, Hui Li, Hua Cai, Jian Sun, Ning Xu and Jiada Wu
Phys. Plasmas, Vol: 22, No: 10 , published: 01 October 2015
Dry efficient cleaning of poly-methyl-methacrylate residues from graphene with high-density H2 and H2-N2 plasmas
G. Cunge, D. Ferrah, C. Petit-Etienne, A. Davydova, H. Okuno, D. Kalita, V. Bouchiat and O. Renault
J. Appl. Phys. , Vol: 118, No: 12 , published: 28 September 2015
Spectroscopic diagnostics of active screen plasma nitriding processes: on the interplay of active screen and model probe plasmas
S. Hamann, K. Börner, I. Burlacov, H.-J. Spies and J. Röpcke
J. Phys. D: Appl. Phys., Vol: 48, No: 34 , published: 04 September 2015
The effects of the Fermi level on ion induced electron emission from chemically and sputter cleaned semiconductors
David Urrabazo and Lawrence J. Overzet
J. Phys. D: Appl. Phys., Vol: 48, No: 34 , published: 04 September 2015
Improvement of the Water Stability of Plasma Polymerized Acrylic Acid/MBA Coatings Deposited by Atmospheric Pressure Air Plasma Jet
Olivier Carton, Dhia Ben Salem, Jérôme Pulpytel, Farzaneh Arefi-Khonsari
Plasma Chem. Plasma Process., Vol: 35, No: 5 , published: 01 September 2015
Promotion of Nonthermal Plasma on the SO2 and H2O Tolerance of Co–In/Zeolites for the Catalytic Reduction of NO x by C3H8 at Low Temperature
Hua Pan, Qingfa Su, Jianwen Wei, Yanfei Jian
Plasma Chem. Plasma Process., Vol: 35, No: 5 , published: 01 September 2015
Spatial distribution study of argon radio-frequency inductively coupled plasma in inverse hysteresis transition area
Lifen Zhou, Junfang Chen, Junhui Ma, Ye Li
Vacuum, Vol: 119, No: , published: 01 September 2015
Effects of plasma nitriding ion beam flux density and time on the properties of CoCrMo alloy
D.C. Ba, L. Xu, Q. Wang
Vacuum, Vol: 119, No: , published: 01 September 2015
Internal stress assisted nitrogen diffusion in plasma nitrided medical CoCr alloys
Arvaidas Galdikas, Akvilė Petraitienė, Teresa Moskalioviene
Vacuum, Vol: 119, No: , published: 01 September 2015
Large-area SiC membrane produced by plasma enhanced chemical vapor deposition at relatively high temperature
Yu Liu and Changqing Xie
J. Vac. Sci. Technol., A, Vol: 33, No: 5 , published: 01 September 2015
Hydrogen desorption kinetics for aqueous hydrogen fluoride and remote hydrogen plasma processed silicon (001) surfaces
Sean W. King, Robert F. Davis, Richard J. Carter, Thomas P. Schneider and Robert J. Nemanich
J. Vac. Sci. Technol., A, Vol: 33, No: 5 , published: 01 September 2015
High active nitrogen flux growth of GaN by plasma assisted molecular beam epitaxy
Brian M. McSkimming, Catherine Chaix and James S. Speck
J. Vac. Sci. Technol., A, Vol: 33, No: 5 , published: 01 September 2015
Strapped Magnetron Performance Affected by Dielectric Material Filling
Vyas S.K., Maurya S., Verma R.K., Singh V.P.
IEEE Trans. Plasma Sci. Pt 2, Vol: 43, No: 9 , published: 01 September 2015
Theoretical Investigation and Simulation of Resonant System of Sector and Hole-and-Slot Resonator Type Rising-Sun Magnetron
Song Yue, Zhaochuan Zhang, Dongping Gao
IEEE Trans. Plasma Sci. Pt 2, Vol: 43, No: 9 , published: 01 September 2015
Revisiting Power Flow and Pulse Shortening in a Relativistic Magnetron
Leopold J.G., Shlapakovski A.S., Sayapin A., Krasik Y.E.
IEEE Trans. Plasma Sci. Pt 2, Vol: 43, No: 9 , published: 01 September 2015
Characteristics of a PDP-Based Radiation Detector Dependent on Different Electrode Structures
Sangheum Eom, Jongseok Kim, Jungwon Kang
IEEE Trans. Plasma Sci. Pt 2, Vol: 43, No: 9 , published: 01 September 2015
Inactivation Effect of Low-Temperature Plasma on Pseudomonas aeruginosa for Nosocomial Anti-Infection
Xing-Min Shi, Wen-Long Liao, Zheng-Shi Chang, Guan-Jun Zhang, Xi-Li Wu, Xiao-Feng Dong, Cong-Wei Yao, Bing-Yu Ye, Ping Li, Gui-Min Xu, Si-Le Chen, Jing-Fen Cai
IEEE Trans. Plasma Sci. Pt 2, Vol: 43, No: 9 , published: 01 September 2015
Comparison between AlGaN surfaces etched by carbon tetrafluoride and argon plasmas: Effect of the fluorine impurities incorporated in the surface
Retsuo Kawakami, Masahito Niibe, Yoshitaka Nakano, Tatsuo Shirahama, Shodai Hirai, Takashi Mukai
Vacuum, Vol: 119, No: , published: 01 September 2015
Surface chemistry of InP ridge structures etched in Cl2-based plasma analyzed with angular XPS
Sophie Bouchoule, Romain Chanson, Arnaud Pageau, Edmond Cambril, Stephane Guilet, Ahmed Rhallabi and Christophe Cardinaud
J. Vac. Sci. Technol., A, Vol: 33, No: 5 , published: 01 September 2015
Properties of black silicon obtained at room-temperature by different plasma modes
Maria Gaudig, Jens Hirsch, Thomas Schneider, Alexander N. Sprafke, Johannes Ziegler, Norbert Bernhard and Ralf B. Wehrspohn
J. Vac. Sci. Technol., A, Vol: 33, No: 5 , published: 01 September 2015
Hydrogen desorption from hydrogen fluoride and remote hydrogen plasma cleaned silicon carbide (0001) surfaces
Sean W. King, Satoru Tanaka, Robert F. Davis and Robert J. Nemanich
J. Vac. Sci. Technol., A, Vol: 33, No: 5 , published: 01 September 2015
Characteristics of WNC films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)(NO) for Cu diffusion barrier
Hyunjung Kim, Jingyu Park, Heeyoung Jeon, Woochool Jang, Hyeongtag Jeon and Junhan Yuh
J. Vac. Sci. Technol., A, Vol: 33, No: 5 , published: 01 September 2015
Reduction of trapped-ion anomalous heating by in situ surface plasma cleaning
Robert McConnell, Colin Bruzewicz, John Chiaverini, and Jeremy Sage
Phys. Rev. A: At. Mol. Opt. Phys., Vol: 92, No: 2 , published: 28 August 2015
Profile simulation model for sub-50 nm cryogenic etching of silicon using SF6/O2 inductively coupled plasma
Valentyn Ishchuk, Deirdre L. Olynick, Zuwei Liu and Ivo W. Rangelow
J. Appl. Phys. , Vol: 118, No: 5 , published: 07 August 2015
Key plasma parameters for nanometric precision etching of Si films in chlorine discharges
P. Brichon, E. Despiau-Pujo, O. Mourey and O. Joubert
J. Appl. Phys. , Vol: 118, No: 5 , published: 07 August 2015
Cold atmospheric plasma activity on microorganisms. A study on the influence of the treatment time and surface
C. L. Xaplanteris, E. D. Filippaki, J. K. Christodoulakis, M. A. Kazantzaki, E. P. Tsakalos and L. C. Xaplanteris
J. Plasma Phys., Vol: 81, No: 4 , published: 01 August 2015
DC Discharge Plasma Modification of Chitosan Films: An Effect of Chitosan Chemical Structure
Tatiana S. Demina, Maria G. Drozdova, Michail Y. Yablokov, Anna I. Gaidar, Alla B. Gilman, Daria S. Zaytseva-Zotova, Elena A. Markvicheva, Tatiana A. Akopova and Alexander N. Zelenetskii
Plasma Processes and Polymers, Vol: 12, No: 8 , published: 01 August 2015
Modulating Low Energy Ion Plasma Fluxes for the Growth of Nanoporous Thin Films
Rafael Alvarez, Carmen Lopez-Santos, Francisco J. Ferrer, Victor Rico, José Cotrino, Agustín R. Gonzalez-Elipe and Alberto Palmero
Plasma Processes and Polymers, Vol: 12, No: 8 , published: 01 August 2015
A Revised Growth Model for Transparent Conducting Ga Doped ZnO Films: Improving Crystallinity by Means of Buffer Layers
Aslan Abduev, Akhmed Akmedov, Abil Asvarov and Alessandro Chiolerio
Plasma Processes and Polymers, Vol: 12, No: 8 , published: 01 August 2015
LDPE Surface Modifications Induced by Atmospheric Plasma Torches with Linear and Showerhead Configurations
Sami Abou Rich, Thierry Dufour, Perrine Leroy, François Reniers, Laurent Nittler and Jean-Jacques Pireaux
Plasma Processes and Polymers, Vol: 12, No: 8 , published: 01 August 2015
N2/H2o Plasma Assisted Functionalization of Poly(ε-caprolactone) Porous Scaffolds: Acidic/Basic Character versus Cell Behavior
Eloisa Sardella, Ellen R. Fisher, Jeffrey C. Shearer, Marta Garzia Trulli, Roberto Gristina and Pietro Favia
Plasma Processes and Polymers, Vol: 12, No: 8 , published: 01 August 2015
Plasma Parameter Aspects in the Fabrication of Stable Amine Functionalized Plasma Polymer Films
Carla Daunton, Louise E. Smith, Jason D. Whittle, Robert D. Short, David A. Steele and Andrew Michelmore
Plasma Processes and Polymers, Vol: 12, No: 8 , published: 01 August 2015
Design of magnetic field configuration for controlled discharge properties in highly ionized plasma
Jones Alami, Vitezslav Stranak, Ann-Pierra Herrendorf, Zdenek Hubicka and Rainer Hippler
Plasma Sources Sci. and Technol., Vol: 24, No: 4 , published: 01 August 2015
Multipactor Coating for Sapphire RF Windows Using Remote Plasma-Assisted Deposition
Ives R.L., Zeller D., Lucovsky G., Schamiloglu E., Marsden D., Collins G., Nichols K., Karimov R.
IEEE Trans. Plasma Sci. Pt 3, Vol: 43, No: 8 , published: 01 August 2015
Molecular Dynamics Calculations of CH3 Sticking Coefficient onto Diamond Surfaces
Laurent Schwaederlé, Pascal Brault, Cathy Rond and Alix Gicquel
Plasma Processes and Polymers, Vol: 12, No: 8 , published: 01 August 2015
High power impulse sputtering of chromium: correlation between the energy distribution of chromium ions and spoke formation
W. Breilmann, A. Eitrich, C. Maszl, A. Hecimovic, V. Layes, J. Benedikt and A. von Keudell
J. Phys. D: Appl. Phys., Vol: 48, No: 29 , published: 29 July 2015
Low temperature growth study of nano-crystalline TiO2 thin films deposited by RF sputtering
K. Safeen, V. Micheli, R. Bartali, G. Gottardi and N. Laidani
J. Phys. D: Appl. Phys., Vol: 48, No: 29 , published: 29 July 2015
Effect of electrode spacing on the density distributions of electrons, ions, and metastable and radical molecules in SiH4/NH3/N2/He capacitively coupled plasmas
Ho Jun Kim, Wonkyun Yang and Junghoon Joo
J. Appl. Phys. , Vol: 118, No: 4 , published: 28 July 2015
Characterization of ultrafast laser-ablation plasma plumes at various Ar ambient pressures
P. K. Diwakar, S. S. Harilal, M. C. Phillips and A. Hassanein
J. Appl. Phys. , Vol: 118, No: 4 , published: 28 July 2015
Selective production of atomic oxygen by laser photolysis as a tool for studying the effect of atomic oxygen in plasma medicine
Ryo Ono and Yusuke Tokumitsu
J. Phys. D: Appl. Phys., Vol: 48, No: 27 , published: 15 July 2015
Plasma column and nano-powder generation from solid titanium by localized microwaves in air
Simona Popescu, Eli Jerby, Yehuda Meir, Zahava Barkay, Dana Ashkenazi, J. Brian A. Mitchell, Jean-Luc Le Garrec and Theyencheri Narayanan
J. Appl. Phys. , Vol: 118, No: 2 , published: 14 July 2015
Generation of solution plasma over a large electrode surface area
Genki Saito, Yuki Nakasugi and Tomohiro Akiyama
J. Appl. Phys. , Vol: 118, No: 2 , published: 14 July 2015
Control of carbon content in amorphous GeTe films deposited by plasma enhanced chemical vapor deposition (PE-MOCVD) for phase-change random access memory applications
M. Aoukar, P. D. Szkutnik, D. Jourde, B. Pelissier, P. Michallon, P. Noé and C. Vallée
J. Phys. D: Appl. Phys., Vol: 48, No: 26 , published: 08 July 2015
Helium atmospheric pressure plasma jets touching dielectric and metal surfaces
Seth A. Norberg, Eric Johnsen and Mark J. Kushner
J. Appl. Phys. , Vol: 118, No: 1 , published: 07 July 2015
SF6/Ar plasma textured periodic glass surface morphologies with high transmittance and haze ratio of ITO:Zr films for amorphous silicon thin film solar cells
Shahzada Qamar Hussain, Gi Duk Kwon, Shihyun Ahn, Sunbo Kim, Hyeongsik Park, Anh Huy Tuan Le, Chonghoon Shin, Sangho Kim, Shahbaz Khan, Jayapal Raja, Nagarajan Balaji, S. Velumani, Didier Pribat, Junsin Yi
Vacuum, Vol: 117, No: , published: 01 July 2015
Thermal Ablation of Stabilized Zirconia/Metal Coated Polyimide Matrix Composites Via Plasma Spray Process
Wenzhi Huang, Haifeng Cheng, Chaoyang Zhang, Yongjiang Zhou, Xueqiang Cao
Plasma Chem. Plasma Process., Vol: 35, No: 4 , published: 01 July 2015
Effect of Low-Temperature Plasma on the Structure of Seeds, Growth and Metabolism of Endogenous Phytohormones in Pea (Pisum sativum L.)
Tibor Stolárik, Mária Henselová, Michal Martinka, Ondřej Novák, Anna Zahoranová, Mirko Černák
Plasma Chem. Plasma Process., Vol: 35, No: 4 , published: 01 July 2015
Surface Plasmas Versus Volume Plasma: Energy Deposition and Ozone Generation in Air and Oxygen
Muhammad Arif Malik, David Hughes, Richard Heller, Karl H. Schoenbach
Plasma Chem. Plasma Process., Vol: 35, No: 4 , published: 01 July 2015
Возможности применения плазменных технологий для переработки органосодержащих веществ. Влияние формы кривой напряжения на режим работы плазмотрона
Васильева О.Б., Кумкова И.И., Кузнецов В.Е., Рутберг А.Ф., Сафронов А.А., Ширяев В.Н.
Теплофиз. высок. температур, Vol: 53, No: 4 , published: 01 July 2015
Inactivation of possible microorganism food contaminants on packaging foils using the non-thermal plasma and hydrogen peroxide
Scholtz V., Khun J., Souskova H., Cerovsky M.
Физ. плазмы, Vol: 41, No: 7 , published: 01 July 2015
Particle formation and its control in dual frequency plasma etching reactors
Munsu Kim, Hee-Woon Cheong and Ki-Woong Whang
J. Vac. Sci. Technol., A, Vol: 33, No: 4 , published: 01 July 2015
Non-Thermal Plasma Treatment of Agricultural Seeds for Stimulation of Germination, Removal of Surface Contamination and Other Benefits: A Review
Lakshman K. Randeniya and Gerard J. J. B. de Groot
Plasma Processes and Polymers, Vol: 12, No: 7 , published: 01 July 2015
The Influence of H2 Plasma Treatment on LWR Mitigation: The Importance of EUV Photoresist Composition
Peter De Schepper, Ziad el Otell, Alessandro Vaglio Pret, Efrain Altamirano-Sanchez and Stefan De Gendt
Plasma Processes and Polymers, Vol: 12, No: 7 , published: 01 July 2015
An Optimized Two-Step Nitrogen-Based Plasma Treatment Procedure under Atmospheric-Pressure Condition and its Surface Amination Mechanism
Yi-Wei Yang, Jane-Yii Wu, Chih-Tung Liu, Guo-Chun Liao, Kuang-Yao Cheng, Ming-Hung Chiang and Jong-Shinn Wu
Plasma Processes and Polymers, Vol: 12, No: 7 , published: 01 July 2015
Determination of the number density of excited and ground Zn atoms during rf magnetron sputtering of ZnO target
L. Maaloul, R. K. Gangwar and L. Stafford
J. Vac. Sci. Technol., A, Vol: 33, No: 4 , published: 01 July 2015
Влияние частоты поля на особенности плазменной обработки полимеров
Марусин В. В., Щукин В.
Прикл. физ., Vol: 2015, No: 4 , published: 01 July 2015
Structure, micro-hardness and corrosion behaviour of the Al–Si/Al2O3 coatings prepared by laser plasma hybrid spraying on magnesium alloy
Jiangang Qian, Ying Yin, Tiejun Li, Xiaotian Hu, Chun Wang, Shuqing Li
Vacuum, Vol: 117, No: , published: 01 July 2015
Deposition of chromium nitride coatings using vacuum arc plasma in increased negative substrate bias voltage
V.D. Ovcharenko, A.S. Kuprin, G.N. Tolmachova, I.V. Kolodiy, A. Gilewicz, O. Lupicka, J. Rochowicz, B. Warcholinski
Vacuum, Vol: 117, No: , published: 01 July 2015
Formation mechanism of supersonic plasma-sprayed nanostructured composite ceramic coatings
Li Lin, Jia-jie Kang, Tian-shun Dong, Guo-lu Li, Hai-dou Wang, Jian-long Ma
Vacuum, Vol: 117, No: , published: 01 July 2015
Corrosion resistance of praseodymium-ion-implanted TiN coatings in blood and cytocompatibility with vascular endothelial cells
Ming Zhang, Shengli Ma, Kewei Xu, Paul K. Chu
Vacuum, Vol: 117, No: , published: 01 July 2015
Comparison of W–Cu composite coatings fabricated by atmospheric and vacuum plasma spray processes
Yaran Niu, Dan Lu, Liping Huang, Jun Zhao, Xuebin Zheng, Guang Chen
Vacuum, Vol: 117, No: , published: 01 July 2015
Microwave plasma reactor with conical-reflector for diamond deposition
K. An, S.W. Yu, X.J. Li, Y.Y. Shen, B. Zhou, G.J. Zhang, X.P. Liu
Vacuum, Vol: 117, No: , published: 01 July 2015
Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process
Kyung Sik Shin, Bibhuti Bhusan Sahu, Jeon Geon Han and Masaru Hori
Jpn. J. Appl. Phys., Vol: 54, No: 7 , published: 01 July 2015
Spectroscopic characterization of the plasma generated during the deposition of AlxGa1−xN films by pulsed laser co-ablation of Al and GaAs targets in electron cyclotron resonance nitrogen plasma
Peipei Liang, Hua Cai, Yanli Li, Xu Yang, Qinghu You, Jian Sun, Ning Xu and Jiada Wu
J. Phys. D: Appl. Phys., Vol: 48, No: 24 , published: 24 June 2015
Fast and reliable simulations of argon inductively coupled plasma using COMSOL
Angel Ochoa Brezmes, Cornelia Breitkopf
Vacuum, Vol: 116, No: , published: 01 June 2015
Plasma immersion ion implantation characteristics with q-nonextensive electron velocity distribution
N. Navab Safa, H. Ghomi and A. R. Niknam
J. Plasma Phys., Vol: 81, No: 3 , published: 01 June 2015
Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering
Kyung Sik Shin, Bibhuti Bhusan Sahu, Jeon Geon Han and Masaru Hori
Jpn. J. Appl. Phys., Vol: 54, No: 6 , published: 01 June 2015
Effect of III/V ratio on the polarity of AlN and GaN layers grown in the metal rich growth regime on Si(111) by plasma assisted molecular beam epitaxy
Manvi Agrawal, K. Radhakrishnan, Nethaji Dharmarasu and Stevin Snellius Pramana
Jpn. J. Appl. Phys., Vol: 54, No: 6 , published: 01 June 2015
Ti-Containing Cu3N Nanostructure Thin Films: Experiment and Simulation on Reactive Magnetron Sputter-Assisted Nitridation
Rahmati A.
IEEE Trans. Plasma Sci., Vol: 43, No: 6 , published: 01 June 2015
Smooth etching of epitaxially grown AlN film by Cl2/BCl3/Ar-based inductively coupled plasma
Xianwen Liu, Changzheng Sun, Bing Xiong, Lang Niu, Zhibiao Hao, Yanjun Han, Yi Luo
Vacuum, Vol: 116, No: , published: 01 June 2015
Monitoring of inner wall condition in mass-production plasma etching process using a load impedance monitoring system
Yuji Kasashima, Hiroyuki Kurita, Naoya Kimura, Akira Ando and Fumihiko Uesugi
Jpn. J. Appl. Phys., Vol: 54, No: 6 , published: 01 June 2015
Indium doped ZnO nano-powders prepared by RF thermal plasma treatment of In2O3 and ZnO
Mi-Yeon Lee, Min-Kyung Song, Jun-Ho Seo and Min-Ho Kim
Jpn. J. Appl. Phys., Vol: 54, No: 6 , published: 01 June 2015
Exploring the Structure of the Modified Top Layer of Polypropylene During Plasma Treatment
Carles Corbella, Simon Große-Kreul and Achim von Keudell
Plasma Processes and Polymers, Vol: 12, No: 6 , published: 01 June 2015
Low-Pressure Plasma After-Treatment of Pollutants Emitted During Semiconductor Manufacturing
Min Hur, Jae Ok Lee, Woo Seok Kang and Young-Hoon Song
Plasma Processes and Polymers, Vol: 12, No: 6 , published: 01 June 2015
Strategy for tuning the average charge state of metal ions incident at the growing film during HIPIMS deposition
G. Greczynski, I. Petrov, J.E. Greene, L. Hultman
Vacuum, Vol: 116, No: , published: 01 June 2015
Towards Roll-to-Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process
Sergey A. Starostin, Mariadriana Creatore, Jan B. Bouwstra, Mauritius C. M. van de Sanden and Hindrik W. de Vries
Plasma Processes and Polymers, Vol: 12, No: 6 , published: 01 June 2015
Influence of Tetramethyldisiloxane-Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post-Plasma Reactions
Colin J. Hall, Peter J. Murphy and Hans J. Griesser
Plasma Processes and Polymers, Vol: 12, No: 6 , published: 01 June 2015
Plasma Metallization Coating and Its Adhesion to Microwave Transistor Substrate—Part 2: Experimental Study of 3-D Composite Coating
Vysikaylo P.I., Mitin V.S., Mitin A.V., Krasnobaev N.N., Belyaev V.V.
IEEE Trans. Plasma Sci., Vol: 43, No: 6 , published: 01 June 2015
On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments
B. C. Zheng, D. Meng, H. L. Che and M. K. Lei
J. Appl. Phys. , Vol: 117, No: 20 , published: 28 May 2015
Practical silicon deposition rules derived from silane monitoring during plasma-enhanced chemical vapor depositiona)
Richard Bartlome, Stefaan De Wolf, Bénédicte Demaurex, Christophe Ballif, Eleftherios Amanatides and Dimitrios Mataras
J. Appl. Phys. , Vol: 117, No: 20 , published: 28 May 2015
Investigation of binding properties of microcapsules on low pressure plasma treated textiles
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Kutlu B., Turkoglu G.C., Aksit A., Sariisik M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Interaction between PT catalyst and ozone for catalytic carbon monoxide oxidation
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Kwan-Tae Kim, Sungkwon Jo, Hee Seok Kang, Sung Hyun Pyun, Dae Hoon Lee, Young-Hoon Song
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Drinking water disinfection based on strong electric field discharge and hydrodynamic cavitation
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Yiping Tian, Xiaoli Yuan, Shujing Xu, Xinying Zhou, Zhitao Zhang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
The influence of annealing on fluorene-type thin film produced by biphenyl and methane RF plasma system
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Mansuroglu D., Bilikmen S.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Large volume air plasma for fruit sterilization
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Mohamed A.-A.H., Al Shariff S.M., Almashraqi A.A., Benghanem M., Basher A.H., Ouf S.A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Study on the parameters of spark discharge plasma in a gas mixture of atmospheric pressure under metal treatment
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Zhuravlev M.V., Remnev G.E., Shubin B.G.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Assessment of physical correlations in a large DC discharge tube for multiple gases and electrode materials
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Gebhart T.E., Winfrey A.L., Lam D.C., Bean I.A., Bourham M.A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Combination of tumor therapeutics and cold plasma to fight cancer
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Masur K., von Behr M., Weltmann K.-D., Partecke L.I., von Woedtke T.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Effect of nonthermal atmospheric pressure plasma on breast cancer cells
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Mirpour S., Ghomi H.R., Farahani N.J., Nikkhah M., Soleimani N., Piroozmand S.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Characterization and evaluation of bactericidal effect and cytocompatibility of a low power ICP source for biomedical applications
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Colombo V., Barbieri D., Boselli M., Cavrini F., Gherardi M., Landini M.P., Laurita R., Liguori A., Stancampiano A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Electric field measurements during plasma jet operation on/in biological samples and tissues
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Darny T., Robert E., Dozias S., Pouvesle J.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Investigation of bacterial inactivation by various gas plasmas and electron microscopic observation of treated bacteria
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Takamatsu T., Azuma T., Kobayashi T., Kawano H., Sasaki Y., Watanabe Y., Matsumura Y., Miyahara H., Iwasawa A., Okino A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Sterilization of methicillin-resistant staphylococcus aureus with dielectric barrier discharge
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Ayan H., Sanaei N.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Plasma-catalytic oxidation of diluted formaldehyde over Cu-Ce oxide catalysts
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Xinbo Zhu, Xin Tu, Xiang Gao
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Plasma-catalytic dry reforming of methane over Al2O3 supported metal catalysts
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Yuxuan Zeng, Shiyun Liu, Danhua Mei, Xin Tu
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Plasma modified chitosan/N-acetyl-2-pyrazoline derivative nanofibers
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Cin G.T., Demirel Topel S., Maslakci N.N., Eren E., Oksuz A.U.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Modification of carbon nanotube with poly(3,4-ethylenedioxythiophene) by using RF rotating plasma
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Cogal S., Bozduman F., Yurdabak G., Oksuz A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Modification of carbon nanotube with poly(3-hexylthiophene) by using RF rotating plasma
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Cogal G.C., Cogal S., Oksuz A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Effect of polymer based nanocomposites on the electrical arcs in air
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Doddapaneni V., Bissal A., Magnusson J., Edin H., Toprak M.S., Gati R.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Corrosion resistance of SiO2 thin film coated biomedical Ti-13Nb-13Zr titanum alloy by E-Beam
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Ozaltin K., Bozduman F., Zwolinska M., Kulczyk M., Oksuz A., Oksuz L., Lewandowska M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Improving photovoltaic efficiency by RF rotating plasma modified nanotubes
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Ela S.E., Varlek A., Bozduman F., Kiristi M., Remskar M., Oksuz L., Oksuz A.U.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Effects of aged PAM on cancer cells
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Mohades S., Barekzi N., Razavi H., Laroussi M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Using fluorescence to measure hydrogen peroxide concentrations in plasma activated media
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Sears J., Mohades S., Razavi H., Laroussi M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Application of underwater elctric barrier discharfe as a washing system to inactivate salmonella typhimurium on perillar leaves
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Eun-Jung Lee, Joo-Sung Kim, Yun-Ji Kim
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Atmospheric pen plasma sterilizing help paper surface
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Bozduman F., Komur A.I., Ulusoy S., Oksuz L., Kiristi M., Oksuz A.U.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Inhibition by low-temperature plasma jet on the viability of hepatoma cells and its mechanism
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Xing-Min Shi, Jing-Fen Cai, Gui-Min Xu, Si-Le Chen, Cong-Wei Yao, Wen-Long Liao, Guan-jun Zhang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
A battery-operated atmospheric-pressure plasm a rod for biomedical applications
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Xuekai Pei, Xinpei Lu
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
The effect of non-thermal atmospheric pressure microwave-pulsed plasma on staphylococcus aureus and fibroblast L929 cells
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Sang-Hee Seo, Soo-Hyuk Uhm, Jae-Sung Kwon, Kyoung-Nam Kim, Kwang-Mahn Kim, Sang-Hee Seo, Jin Joo Choi, Eun Ha Choi, Gyungsoon Park
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Applications of non-thermal atmospheric pressure plasma in prevention and regeneration of oral diseases
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Soo-Hyuk Uhm, Jae-Sung Kwon, Eun-Jung Lee, Jung-Hwan Lee, Kwang-Mahn Kim, Kyoung-Nam Kim, Eun Ha Choi
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
RF-titanium dioxide plasma modified graphene coated electrodes for protein sensing
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Kuralay F., Tunc S., Bozduman F., Oksuz L., Oksuz A.U.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Measurement of sterilization ability and reactive species of various gas plasma bubbled-up water
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Kobayashi T., Watanabe Y., Oshita T., Matsumura Y., Miyahara H., Iwasawa A., Okino A., Matsubara H., Oshima S., Kamiya T., Takamatsu T., Azuma T.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
The treatment with non-thermal plasma on human keratinocyte can block TNF-α and IFN-γ mediated pro-inflammatory gene expressions
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Jeong-Hae Choi, Hae-June Lee, Jin-Woo Hong, Gyoo-Cheon Kim
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
RF rotating plasma modified of chitosan with 3,4-ethylenedioxythiophene, thiophene and furan: Investigation of nanofibers in-situ with quartz crystal microbalance (QCM) and electrospinning system
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Maslakci N.N., Oksuz A.U.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Electrospun fibers coated onto plasma modified and nonmodified wools
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Maslakci N.N., Oksuz A.U., Oksuz L., Bozduman F., Eren E.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Hydrophobic and wear-resistible surface coating of carbon steel using linear microwave plasma with TE-TEM mode power coupling
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Moon-Ki Han, Ju-Hong Cha, Taehwan Kim, Dong-Hyun Kim, Hae June Lee, Ho-Jun Lee, Min Wook Kim
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Sterilization of microorganism spores with plasma-excited neutral gas at atmospheric pressure
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Matsui K., Ikenaga N., Sakudo N.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Plasma treatment for the inactivation of Escherichia coli in water
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Ismael M., Bozduman F., Koc A.G., Noree S., Al-Mamoori M., Durmaz Y., Koc I.U., Ulusoy S.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Human health impact of multifunctional textiles obtained by using plasma technology
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Aileni R.M., Surdu L., Oksuz L.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Life cycle and environment impact for textile materials functionalized by using plasma technology
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Aileni R.M., Surdu L., Oksuz L.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Optimization of a laboratory scale biomass plasma gasification reactor
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Walt I.J.V.D., Makaringe N.P.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Combining catalysis with non-thermal plasma for volatile organic compounds abatement
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Zehua Xiao, Kefu Liu
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Simulation of nanocolumn formation in a plasma environment
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Abraham J.W., Strunskus T., Faupel F., Bonitz M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Control of tribolium castaneum in stored wheat by corona discharge treatment
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Amini M., Ghoranneviss M., Nikmaram H.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
About internationals standards in plasma medicine
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Mann M., Tiede R., Ahmed R., Wurster S., Weltmann K.-D., Daeschlein G., Emmert S., Von Woedtke T.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Combination of pulsed electric fields and non-thermal plasma jet for more effective bacterial decontamination
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Qian Zhang, Jie Zhuang, von Woedtke T., Kolb J.F., Weltmann K.-D., Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Investigation of antibacterial efficacy of a plasma gun source for endodontic applications
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Boselli M., Cavrini F., Colombo V., Gherardi M., Laurita R., Liguori A., Simoncelli E., Stancampiano A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
A battery-operated atmospheric-pressure plasma wand for biomedical applications
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Xuekai Pei, Xinpei Lu
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Characteristics of cold atmospheric pressure plasma jet and its antimicrobial activity
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Basher A.H., Ouf S.A., Al Shariff S.M., Benghanem M., Almashraqi A.A., Mohamed A.-A.H.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Preparation of antibacterial non-woven fabric via atmospheric pressure plasma process
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Denga X., Nikiforova A., Leys C., Vujosevicb D., Vuksanovic V.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Crosslinking of water-soluble pullulan nanofibrous mats through atmospheric plasma treatment
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Colombo V., Focarete M.L., Gherardi M., Gualandi C., Laurita R., Liguori A., Paltrinieri L., Stancampiano A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Atmospheric pressure non-thermal plasma for the production of composite materials
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Bloise N., Sampaolesi M., Visai L., Colombo V., Gherardi M., Focarete M.L., Gualandi C., Laurita R., Liguori A., Mauro N., Manfredi A., Ferruti P., Ranucci E.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Structural and electrical characterization of magnetron sputtered MoOX thin films
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Ghorannevis Z., Akbarnejad E., Ghoranneviss M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Investigation on the pulse-modulated ratio frequency discharge and its application on the NOX removal
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Qi Wang, Dezhen Wang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Plasma sources for biomedical applications: Past, present, and future
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Xinpei Lu
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
An atmospheric-pressure, room-temperature, cold micro plasma
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Xinpei Lu, JianMin Gou
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Plasma help preparation of electrospun carbon nanofibers
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Uygun E., Bozduman F., Nohut N., Oksuz A.U., Oksuz L.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Effects of plasma treatments on the adhesion between polyester fabrics and silicone rubber coating
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Berrak Sari Y., Kutlu B., Mizrak B.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Optimization of low-pressure plasma reactor for high-speed surface treatment of polyimide substrate
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Jae-Ok Lee, Woo Seok Kang, Min Hur, Young-Hoon Song
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Modification of the surface layer of metal materials under the combined influence of high intensity pulsed ion beam and magnetron sputtering
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Remnev G.E., Lebedynskiy A.M., Legostaev V.N., Pavlov S.K., Petrov A.V., Smolyanskiy E.V., Stepanov A.V.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Obtaining useful properties of different materials by using magnetron sputtering
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Senturk K., Sen T., Coruhlu T., Varturk I., Korachi M., Aslan N.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
The preparation of microporous PVDF membranes with dithiphosphates and modification of surface properties by Helicon plasma
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Koseoglu T.S., Ilgaz F., Calis O., Kir E., Aydin A., Gulec A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Solid state battery manufacturing with thermionic vacuum ARC and RF sputtering
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Pat S., Ozen S., Senay V., Korkmaz S., Pat Z.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Numerical study on heating gas in atmospheric pressure helium discharge
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Eliseev S.I., Kudryavtsev A.A., Stepanova O.M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Simulation of ion redistribution in a vacuum chamber during magnetron sputtering of coatings
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Saifullin E.R.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Plasma polymerized electrospun PEDOT-S nanofibers obtained by in-situ radio frequency plasma treatment
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Dulgerbaki C., Kiristi M., Oksuz A.U., Bozduman F., Oksuz L., Ahmad S.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Synthesis of few-layer graphene films by controllable Cr4rFr8r plasma etching SiC
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Jin C., Huang T., Zhuge L., Wu X.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Modeling of inductively coupled plasma source with argon/oxygen gas mixture for etching
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Balouza S.M., Abou-Gabal H.H., Abdelrazek A.M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
The effect of low-temperature plasma treatment on the plant seeds
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Zahoranova A., Kovacik D., Cernak M., Henselova M., Hudecova D., Kalinakova B.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Elemental composition and electric properties of polycrystalline alumina ceramic after metal ion beam treatment
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Oks E.M., Bugaev A.S., Nikolaev A.G., Savkin K.P., Yushkov G.Yu., Shandrikov M.V., Tuynkov A.V.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Nitriding of super-ferritic stainless steel by plasma immersion ion implantation in radio frequency and ECR-microwave plasma system
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Bhuyan H., Favre M., Cisternas M., Henriquez A., Wyndham E., Mandl S., Manova D., Walczak M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Characteristics of diabetic wound healing rate and enzymes activity after atmospheric pressure plasma treatment
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Asadi P., Shali P., Bigdeli M., Shokri B.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
High voltage atmospheric cold plasma treatment of fresh cantaloupe to improve safety and quality
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Jensen J., Lim T., Applegate B., Keener K.M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
High-speed low-cost surface treatments using a novel atmospheric-pressure plasma source
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Kovacik D., Stahel P., Rahel J., Cernak M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Investigation on atmospheric plasma surface treatment for structural bonding on titanium and CFRP
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Haag J., Mertens T., Kotte L., Kaskel S.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Multi-wall carbon nanotube functionalized with CdS nanoparticle by plasmadeposition method
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Akbarnejad E., Ghorannevis Z., Ghoranneviss M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Mo doped GaN thin film growth using Thermionic Vacuum Arc (TVA)
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Ozen S., Pat S., Korkmaz S., Senay V.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Direct and fast growth of a Si:GaAs thin film by means of thermionic vacuum arc (TVA)
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Senay V., Ozen S., Pat S., Korkmaz S.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Streptavidin coating on the surface of polystyrene microplates by plasma technique and development of elisa systems for human papilloma virus (HPV)
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Kose K.S.O., Yildiz E., Say R.B., Ersoz A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Protein a coating on the surface of polystyrene microplates by plasma technique and development of elisa systems for heat shock protein 70 (Hsp70)
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Yildiz B., Kose E., Ozgun K.S., Say R., Ersoz A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Magnetic thin films deposition using DC grid-attached magnetron
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Shandrikov M.V., Vizir A.V., Savkin K.P., Oks E.M., Tuynkov A.V.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Issue of particle formation in the high rate film deposition by plasma assisted deposition processes
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Han J.G., Sahu B.B., Shin K.S., Lee J.S., Jin S.B.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Modelling of tridimensional plasma enhanced chemical vapor deosition reactor at 2.45GHz
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Bouherine K., Tibouche A., Mokhtar L., Ikhlef N., Leroy O.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Initiated plasma enhanced chemical vapor deposition (i-PECVD) of poly(alkyl acrylates)
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Karaman M., Gursoy M., Ucar T., Demir E., Yenice E.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Microstructure evolution and magnetic properties of nanocrystalline Ni75Fe25 thin films: Effects of substrate and thickness
The 42nd IEEE International Conference on Plasma Science (ICOPS), May 24 – 28, Antalya, Turkey
Kaibi A., Guittoum A., Oksuzoglu R.M., Yavru C., Ozgun S., Boudissa M., Kechouane M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2015, No: , published: 24 May 2015
Hollow silicon carbide nanoparticles from a non-thermal plasma process
Devin Coleman, Thomas Lopez, Ozgul Yasar-Inceoglu and Lorenzo Mangolini
J. Appl. Phys. , Vol: 117, No: 19 , published: 21 May 2015
Etching mechanisms of graphene nanoribbons in downstream H2 plasmas: insights from molecular dynamics simulations
A. Davydova, E. Despiau-Pujo, G. Cunge and D. B. Graves
J. Phys. D: Appl. Phys., Vol: 48, No: 19 , published: 20 May 2015
Spatial phase-resolved optical emission spectroscopy for understanding plasma etching uniformity
V. Milosavljević and P. J. Cullen
Europhys. Lett. , Vol: 110, No: 4 , published: 15 May 2015
Interaction of F atoms with SiOCH ultra low-k films. Part II: etching
T. V. Rakhimova, D. V. Lopaev, Yu A. Mankelevich, K. A. Kurchikov, S. M. Zyryanov, A. P. Palov, O. V. Proshina, K. I. Maslakov, M. R. Baklanov
J. Phys. D: Appl. Phys., Vol: 48, No: 17 , published: 08 May 2015
Low-k material damage during photoresist ashing process
Woohyun Lee, Hyuk Kim, Wanjae Park, Wan-Soo Kim, Donghyun Kim, Ji-Won Kim, Hee-Woon Cheong and Ki-Woong Whang
J. Appl. Phys. , Vol: 117, No: 17 , published: 07 May 2015
Physical Vapour Deposition of Thin Films for Use in Superconducting RF Cavities
Proc. 6th International Particle Accelerator Conference (IPAC 2015) : Richmond, Virginia, USA, May 3-8, 2015
A.N. Hannah, D.O. Malyshev, O.B. Malyshev, S.M. Pattalwar, R. Valizadeh,S. Wilde, B. Chesca,G.B.G. Stenning
Proc. International Particle Accelerator Conference (IPAC), Vol: 2015, No: , published: 03 May 2015
Effects of Plasma Processing on Secondary Electron Yield of Niobium Samples
Proc. 6th International Particle Accelerator Conference (IPAC 2015) : Richmond, Virginia, USA, May 3-8, 2015
M. Basovic, S. Popović, M. Tomovic, L. Vušković,F. Čučkov, A. Samolov
Proc. International Particle Accelerator Conference (IPAC), Vol: 2015, No: , published: 03 May 2015
Experiment and Results on Plasma Etching of SRF Cavities
Proc. 6th International Particle Accelerator Conference (IPAC 2015) : Richmond, Virginia, USA, May 3-8, 2015
J. Upadhyay, J.J. Peshl, S. Popović, L. Vušković,H.L. Phillips, A-M. Valente-Feliciano
Proc. International Particle Accelerator Conference (IPAC), Vol: 2015, No: , published: 03 May 2015
Special Issue on Perspectives on Thermal Plasma Research for Industrial Applications: Introduction
Anthony B. Murphy
Plasma Chem. Plasma Process., Vol: 35, No: 3 , published: 01 May 2015
New Methods to Look at an Old Technology: Innovations to Diagnose Thermal Plasmas
J. Schein, K. Hartz-Behrend, S. Kirner, M. Kühn-Kauffeldt, B. Bachmann, E. Siewert
Plasma Chem. Plasma Process., Vol: 35, No: 3 , published: 01 May 2015
Perspectives on Thermal Plasma Modelling
Alain Gleizes
Plasma Chem. Plasma Process., Vol: 35, No: 3 , published: 01 May 2015
A Perspective on Arc Welding Research: The Importance of the Arc, Unresolved Questions and Future Directions
Anthony B. Murphy
Plasma Chem. Plasma Process., Vol: 35, No: 3 , published: 01 May 2015
On filament structure and propagation within a commercial plasma globe
M. J. Burin, G. G. Simmons, H. G. Ceja, S. J. Zweben, A. Nagy and C. Brunkhorst
Phys. Plasmas, Vol: 22, No: 5 , published: 01 May 2015
Review of electric discharge microplasmas generated in highly fluctuating fluids: Characteristics and application to nanomaterials synthesisa)
Sven Stauss, Hitoshi Muneoka, Keiichiro Urabe and Kazuo Terashima
Phys. Plasmas, Vol: 22, No: 5 , published: 01 May 2015
Contamination of Magnetron Sputtered Metallic Films by Oxygen From Residual Atmosphere in Deposition Chamber
Petr Pokorný, Jindřich Musil, Přemysl Fitl, Michal Novotný, Jan Lančok and Jiří Bulíř
Plasma Processes and Polymers, Vol: 12, No: 5 , published: 01 May 2015
Highly Conductive Cu Thin Film Deposition on Polyimide by RF-Driven Atmospheric Pressure Plasma Jets under Nitrogen Atmosphere
Peng Zhao, Wei Zheng, Jun Watanabe, Yue Dong Meng and Masaaki Nagatsu
Plasma Processes and Polymers, Vol: 12, No: 5 , published: 01 May 2015
Assessment of the Physicochemical Properties and Biological Effects of Water Activated by Non-thermal Plasma Above and Beneath the Water Surface
Ying Tian, Ruonan Ma, Qian Zhang, Hongqing Feng, Yongdong Liang, Jue Zhang and Jing Fang
Plasma Processes and Polymers, Vol: 12, No: 5 , published: 01 May 2015
Microwave Power and Phase Measurements on a Recirculating Planar Magnetron
Franzi M.A., Greening G.B., Jordan N.M., Gilgenbach R.M., Simon D.H., Lau Y.Y., Hoff B.W., Luginsland J.
IEEE Trans. Plasma Sci. Pt 2, Vol: 43, No: 5 , published: 01 May 2015
Development of a novel wafer-probe for in situ measurements of thin film properties
Z. el Otell, D. Marinov, V. Šamara, M. D. Bowden, J.-F. de Marneffe, P. Verdonck and N. St. J. Braithwaite
Plasma Sources Sci. and Technol., Vol: 24, No: 3 , published: 01 May 2015
Plasma for cancer treatment
Michael Keidar
Plasma Sources Sci. and Technol., Vol: 24, No: 3 , published: 01 May 2015
Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas Special Issue on Electron heating in technological plasmas
A. Derzsi, I. Korolov, E. Schüngel, Z. Donkó and J. Schulze
Plasma Sources Sci. and Technol., Vol: 24, No: 3 , published: 01 May 2015
Sustaining mechanism and spatial structure of high-density ring-shaped hollow cuspate magnetized rf plasma for low-pressure plasma processing
Y. Ohtsu and T. Yanagise
Plasma Sources Sci. and Technol., Vol: 24, No: 3 , published: 01 May 2015
Implications of electron heating and non-uniformities in a VHF-CCP for sterilization of medical instruments
Katharina Stapelmann, Marcel Fiebrandt, Tim Styrnoll, Sabrina Baldus, Nikita Bibinov and Peter Awakowicz
Plasma Sources Sci. and Technol., Vol: 24, No: 3 , published: 01 May 2015
Plasma parameters of the hollow cathode magnetron inside and downstream
N. P. Poluektov, Yu P. Tsar'gorodsev, I. I. Usatov, A. G. Evstigneev and I. A. Kamyschov
Plasma Sources Sci. and Technol., Vol: 24, No: 3 , published: 01 May 2015
The role of pulse length in target poisoning during reactive HiPIMS: application to amorphous HfO2
R. Ganesan, B. J. Murdoch, B. Treverrow, A. E. Ross, I. S. Falconer, A. Kondyurin, D. G. McCulloch, J. G. Partridge, D. R. McKenzie and M. M. M. Bilek
Plasma Sources Sci. and Technol., Vol: 24, No: 3 , published: 01 May 2015
Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
Daniel Lundin, Martin Čada and Zdeněk Hubička
Plasma Sources Sci. and Technol., Vol: 24, No: 3 , published: 01 May 2015
Portable microwave air plasma device for wound healing
S. K. Kang, H. Y. Kim, G .S. Yun and J. K. Lee
Plasma Sources Sci. and Technol., Vol: 24, No: 3 , published: 01 May 2015
Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles
Yiting Zhang, Mark J. Kushner, Saravanapriyan Sriraman, Alexei Marakhtanov, John Holland and Alex Paterson
J. Vac. Sci. Technol., A, Vol: 33, No: 3 , published: 01 May 2015
In-situ etch rate study of HfLaO in Cl/BCl plasmas using the quartz crystal microbalance
Nathan Marchack, Taeseung Kim, Hans-Olof Blom and Jane P. Chang
J. Vac. Sci. Technol., A, Vol: 33, No: 3 , published: 01 May 2015
Plasma Treatment to Improve the Surface Properties of Recycled Post-Consumer PVC
Sabrina Moretto Darbello Prestes, Sandro Donnini Mancini, Elidiane Cipriano Rangel, Nilson Cristino da Cruz, Wido Herwig Schreiner and Antonio Rodolfo Junior
Plasma Processes and Polymers, Vol: 12, No: 5 , published: 01 May 2015
Исследование параметров плазмы «геликонного» разряда в макете ВЧ гибридной плазменной системы
Александров А. Ф., Петров А. К., Вавилин К. В., Кралькина Е. А., Неклюдова П. А., Никонов А. М., Павлов В. Б., Айрапетов А. А., Одиноков В. В., Сологуб В. А., Павлов Г. Я.
Прикл. физ., Vol: 2015, No: 3 , published: 01 May 2015
Получение ориентированных тетраэдрических углеродных фуллеренов методом магнетронного распыления
Виноградов С. В., Кононов М. А., Кононов В. М.
Прикл. физ., Vol: 2015, No: 3 , published: 01 May 2015
Thermal Plasma Sources: How Well are They Adopted to Process Needs?
Javad Mostaghimi, Maher I. Boulos
Plasma Chem. Plasma Process., Vol: 35, No: 3 , published: 01 May 2015
A Perspective on Plasma Spray Technology
Armelle Vardelle, Christian Moreau, Nickolas J. Themelis, Christophe Chazelas
Plasma Chem. Plasma Process., Vol: 35, No: 3 , published: 01 May 2015
Key Challenges and Opportunities in Suspension and Solution Plasma Spraying
P. Fauchais, M. Vardelle, S. Goutier, A. Vardelle
Plasma Chem. Plasma Process., Vol: 35, No: 3 , published: 01 May 2015
Plasma sputtering robotic device for in-situ thick coatings of long, small diameter vacuum tubesa)
A. Hershcovitch, M. Blaskiewicz, J. M. Brennan, A. Custer, A. Dingus, M. Erickson, W. Fischer, N. Jamshidi, R. Laping, C.-J. Liaw, W. Meng, H. J. Poole and R. Todd
Phys. Plasmas, Vol: 22, No: 5 , published: 01 May 2015
Liquid Crystal Alignment on Thin Organic Films Deposited in a Low Pressure Plasma Enhanced CVD Reactor
Alibi Baitukha, Shinsuke Mori and Masaaki Suzuki
Plasma Processes and Polymers, Vol: 12, No: 5 , published: 01 May 2015
Glancing Angle Deposition of Silver Promoted by Pre-Deposited Nanoparticles
Pavel Solař, Ondřej Kylián, Martin Petr, Jan Hanuš, Andrei Choukourov, Danka Slavínská and Hynek Biederman
Plasma Processes and Polymers, Vol: 12, No: 5 , published: 01 May 2015
Use of BO films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
Bodo Kalkofen, Akinwumi A. Amusan, Muhammad S. K. Bukhari, Bernd Garke, Marco Lisker, Hassan Gargouri and Edmund P. Burte
J. Vac. Sci. Technol., A, Vol: 33, No: 3 , published: 01 May 2015
Structural modification of the skin barrier by OH radicals: a reactive molecular dynamics study for plasma medicine
J. Van der Paal, C. C. Verlackt, M. Yusupov, E. C. Neyts, A. Bogaerts
J. Phys. D: Appl. Phys., Vol: 48, No: 15 , published: 22 April 2015
Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study
Stefan Tinck, Thomas Tillocher, Rémi Dussart, Annemie Bogaerts
J. Phys. D: Appl. Phys., Vol: 48, No: 15 , published: 22 April 2015
Energy dissipation channels affecting photoluminescence from resonantly excited Er3+ ions doped in epitaxial ZnO host films
Housei Akazawa and Hiroyuki Shinojima
J. Appl. Phys. , Vol: 117, No: 15 , published: 21 April 2015
On uniform plasma generation for the large area plasma processing in intermediate pressures
Hyun Jun Kim, Hye-Ju Hwang, Dong Hwan Kim, Jeong Hee Cho, Hee Sun Chae and Chin-Wook Chung
J. Appl. Phys. , Vol: 117, No: 15 , published: 21 April 2015
Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
Halit Altuntas, Cagla Ozgit-Akgun, Inci Donmez and Necmi Biyikli
J. Appl. Phys. , Vol: 117, No: 15 , published: 21 April 2015
Microstructure evolution of Al-doped zinc oxide and Sn-doped indium oxide deposited by radio-frequency magnetron sputtering: A comparison
Man Nie, Andre Bikowski and Klaus Ellmer
J. Appl. Phys. , Vol: 117, No: 15 , published: 21 April 2015
Foreword to special issue on oxide coatings
Vladimir Vishnyakov, George Kiriakidis, Diederik Depla
Vacuum, Vol: 114, No: , published: 01 April 2015
Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films
J. Vlček, J. Rezek, J. Houška, T. Kozák, J. Kohout
Vacuum, Vol: 114, No: , published: 01 April 2015
Study of the character of gold nanoparticles deposited onto sputtered cerium oxide layers by deposition-precipitation method: Influence of the preparation parameters
T. Zahoranová, T. Mori, P. Yan, K. Ševčíková, M. Václavů, V. Matolín, V. Nehasil
Vacuum, Vol: 114, No: , published: 01 April 2015
Towards delafossite structure of Cu–Cr–O thin films deposited by reactive magnetron sputtering: Influence of substrate temperature on optoelectronics properties
Hui Sun, Mohammad Arab Pour Yazdi, Pascal Briois, Jean-Francois Pierson, Frederic Sanchette, Alain Billard
Vacuum, Vol: 114, No: , published: 01 April 2015
Interaction of SF6 and O2 plasma with porous poly phenyl methyl silsesquioxane low-κ films
J. F. Cherunilam, K. V. Rajani, C. Byrne, A. Heise, P. J. McNally, S. Daniels
J. Phys. D: Appl. Phys., Vol: 48, No: 12 , published: 01 April 2015
Plasma Apparatuses for Biomedical Applications
Kim Y., Jin S., Han G., Kwon G.C., Choi J.J., Choi E.H., Uhm H.S., Cho G.
IEEE Trans. Plasma Sci. Pt 1, Vol: 43, No: 4 , published: 01 April 2015
Efficiencies of Aloof-Scattered Electron Beam Excitation of Metal and Graphene Plasmons
Ooi K.J.A., Koh W.S., Chu H.S., Tan D.T.H., Ang L.K.
IEEE Trans. Plasma Sci. Pt 1, Vol: 43, No: 4 , published: 01 April 2015
Defining a parameter of plasma-enhanced CVD to characterize the effect of silicon-surface passivation in heterojunction solar cells
Wanwu Guo, Liping Zhang, Jian Bao, Fanying Meng, Jinning Liu, Dongliang Wang, Jieyu Bian, Wenzhu Liu, Zhiqiang Feng, Pierre J. Verlinden and Zhengxin Liu
Jpn. J. Appl. Phys., Vol: 54, No: 4 , published: 01 April 2015
Superhydrophobic treatment using atmospheric-pressure He/C4F8 plasma for buoyancy improvement
Sooryun Noh, A-Young Moon and Se Youn Moon
Jpn. J. Appl. Phys., Vol: 54, No: 4 , published: 01 April 2015
Radio frequency plasmas in pure water within hole in insulating plate
Ayaka Rachel Tanaka and Tsunehiro Maehara
Jpn. J. Appl. Phys., Vol: 54, No: 4 , published: 01 April 2015
Initial and long-term frequency degradation of ring oscillators caused by plasma-induced damage in 65 nm bulk and fully depleted silicon-on-insulator processes
Ryo Kishida, Azusa Oshima, Michitarou Yabuuchi and Kazutoshi Kobayashi
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 4S , published: 01 April 2015
Combined plasma-enhanced-atomic-layer-deposition gate dielectric and in situ SiN cap layer for reduced threshold voltage shift and dynamic ON-resistance dispersion of AlGaN/GaN high electron mobility transistors on 200 mm Si substrates
Nicolò Ronchi, Brice De Jaeger, Marleen Van Hove, Robin Roelofs, Tian-Li Wu, Jie Hu, Xuanwu Kang and Stefaan Decoutere
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 4S , published: 01 April 2015
Heteroepitaxial growth of diamond films on 3C-SiC/Si substrates with utilization of antenna-edge microwave plasma CVD for nucleation
Junya Yaita, Takayuki Iwasaki, Meralys Natal, Stephen E. Saddow and Mutsuko Hatano
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 4S , published: 01 April 2015
Effect of oxygen plasma treatment on horizontally aligned carbon nanotube thin film as pH-sensing membrane of extended-gate field-effect transistor
Kuang-Yu Wang, Wan-Lin Tsai, Po-Yu Yang, Chia-Hsin Chou, Yu-Ren Li, Chan-Yu Liao and Huang-Chung Cheng
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 4S , published: 01 April 2015
A feedback model of magnetron sputtering plasmas in HIPIMS
A. E. Ross, R. Ganesan, M. M. M. Bilek and D. R. McKenzie
Plasma Sources Sci. and Technol., Vol: 24, No: 2 , published: 01 April 2015
Plasma diagnostic approach for high rate nanocrystalline Si synthesis in RF/UHF hybrid plasmas using a PECVD process
B. B. Sahu, Jeon G. Han, Kyung S. Shin, K. Ishikawa, M. Hori and Yudai Miyawaki
Plasma Sources Sci. and Technol., Vol: 24, No: 2 , published: 01 April 2015
Characterisation of a Simple Non-Thermal Atmospheric Pressure Plasma Source for Biomedical Research Applications
J. Gruenwald, J. Reynvaan, T. Eisenberg and P. Geistlinger
Contrib. Plasma Phys., Vol: 55, No: 4 , published: 01 April 2015
Effect of different carrier gases and their flow rates on the growth of carbon nanotubes
Aarti Tewari and Suresh C. Sharma
Phys. Plasmas, Vol: 22, No: 4 , published: 01 April 2015
Ion energy-angle distribution functions at the plasma-material interface in oblique magnetic fields
Rinat Khaziev and Davide Curreli
Phys. Plasmas, Vol: 22, No: 4 , published: 01 April 2015
Adhesion Improvement between Epoxy and Stainless Steel Using a Silane Coupling Agent in an Atmospheric Plasma Process
Gabriella Da Ponte, Amit Kumar Ghosh, Alexandros Kakaroglou, Danny Van Hemelrijck, Bruno Van Mele and Bert Verheyde
Plasma Processes and Polymers, Vol: 12, No: 4 , published: 01 April 2015
Microplasma-Assisted Synthesis of Colloidal Gold Nanoparticles and Their Use in the Detection of Cardiac Troponin I
Ruixue Wang, Shasha Zuo, Dong Wu, Jue Zhang, Weidong Zhu, Kurt H. Becker and Jing Fang
Plasma Processes and Polymers, Vol: 12, No: 4 , published: 01 April 2015
Aerosol deposition-based micropatterning of barium titanate via sulphur hexafluoride inductively coupled plasma etching
C. Wang, H.K. Sung, N.Y. Kim
Vacuum, Vol: 114, No: , published: 01 April 2015
Silicon nitride etching performance of CH2F2 plasma diluted with argon or krypton
Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori
Jpn. J. Appl. Phys., Vol: 54, No: 4 , published: 01 April 2015
Fabrication of high-k/metal-gate MoS2 field-effect transistor by device isolation process utilizing Ar-plasma etching
Naruki Ninomiya, Takahiro Mori, Noriyuki Uchida, Eiichiro Watanabe, Daiju Tsuya, Satoshi Moriyama, Masatoshi Tanaka and Atsushi Ando
Jpn. J. Appl. Phys., Vol: 54, No: 4 , published: 01 April 2015
Plasma-Etching for Controlled Modification of Structural and Mechanical Properties of Electrospun PET Scaffolds
Houman Savoji, Sophie Lerouge, Abdellah Ajji and Michael R. Wertheimer
Plasma Processes and Polymers, Vol: 12, No: 4 , published: 01 April 2015
Anion sensing and interfering behaviors of electrolyte–insulator–semiconductor sensors with nitrogen plasma-treated samarium oxide
Yu-Ren Ye, Jer-Chyi Wang and Ya-Ting Chan
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 4S , published: 01 April 2015
Amination of NCD Films for Possible Application in Biosensing
Anna Artemenko, Halyna Kozak, Hynek Biederman, Andrei Choukourov and Alexander Kromka
Plasma Processes and Polymers, Vol: 12, No: 4 , published: 01 April 2015
Heteroepitaxial growth of diamond films on 3C-SiC/Si substrates with utilization of antenna-edge microwave plasma CVD for nucleation
Junya Yaita, Takayuki Iwasaki, Meralys Natal, Stephen E. Saddow and Mutsuko Hatano
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 4S , published: 01 April 2015
Laboratory Scale Systems for the Plasma Treatment and Coating of Particles
Thomas D. Michl, Bryan R. Coad, Amanda Hüsler, Krasimir Vasilev and Hans J. Griesser
Plasma Processes and Polymers, Vol: 12, No: 4 , published: 01 April 2015
Deposition of Plasma Polymer Films from Acetylene and Water Vapor
Sebastien Guimond, Barbara Hanselmann, Mokbul Hossain, Victoria Salimova and Dirk Hegemann
Plasma Processes and Polymers, Vol: 12, No: 4 , published: 01 April 2015
Deposition of Fluorine-Containing Thin Film by Atmospheric Pressure Plasma Jet and Film Surface Structural Transition
Wei-Chun Ma, Chin-Ho Lin and Chun Huang
Plasma Processes and Polymers, Vol: 12, No: 4 , published: 01 April 2015
Inhibition of Interfacial Oxidative Degradation During SiOx Plasma Polymer Barrier Film Deposition on Model Organic Substrates
Berkem Ozkaya, Felix Mitschker, Ozlem Ozcan, Peter Awakowicz and Guido Grundmeier
Plasma Processes and Polymers, Vol: 12, No: 4 , published: 01 April 2015
Plasma Metallization Coating and Its Adhesion to Microwave Transistor Substrate—Part 1: Methods of Experimental Research
Vysikaylo P.I., Mitin V.S., Mitin A.V., Krasnobaev N.N., Belyaev V.V.
IEEE Trans. Plasma Sci. Pt 2, Vol: 43, No: 4 , published: 01 April 2015
Nitrogen-atom endohedral fullerene synthesis with high efficiency by controlling plasma-ion irradiation energy and C60 internal energy
Soon Cheon Cho, Toshiro Kaneko, Hiroyasu Ishida, Rikizo Hatakeyama
J. Appl. Phys. , Vol: 117, No: 12 , published: 28 March 2015
Low temperature (150 °C) fabrication of high-performance TiO2 films for dye-sensitized solar cells using ultraviolet light and plasma treatments of TiO2 paste containing organic binder
Shungo Zen, Yuki Inoue, Ryo Ono
J. Appl. Phys. , Vol: 117, No: 10 , published: 14 March 2015
A study on asymmetric current in plasma-mediated electrosurgery
Y.B. Seol, J.H. Kim, B.K. Na, S.J. You, E.H. Choi, H.Y. Chang
Curr. Appl Phys., Vol: 15, No: 3 , published: 03 March 2015
Synthesis of single-walled carbon nanotubes by low-frequency bipolar pulsed arc discharge method
Kazi Hanium Maria, Tetsu Mieno
Vacuum, Vol: 113, No: , published: 01 March 2015
Charging effects of plasma impact on microconductor structures on an insulator in plasma processing technologies
V.P. Tarakanov, E.G. Shustin
Vacuum, Vol: 113, No: , published: 01 March 2015
Modeling and simulation of ion-filtered inductively coupled plasma using argon plasma
Chao Wu, Jian Wang, Weiwang Zhang, Yi Luo
Jpn. J. Appl. Phys., Vol: 54, No: 3 , published: 01 March 2015
Atmospheric-pressure-plasma nitriding of titanium alloy
Yuki Yoshimitsu, Ryuta Ichiki, Kotaro Kasamura, Masashi Yoshida, Shuichi Akamine, Seiji Kanazawa
Jpn. J. Appl. Phys., Vol: 54, No: 3 , published: 01 March 2015
Comparison of surface vacuum ultraviolet emissions with resonance level number densities. II. Rare-gas plasmas and Ar-molecular gas mixtures
John B. Boffard, Chun C. Lin, Shicong Wang, Amy E. Wendt, Cody Culver, Svetlana Radovanov, Harold Persing
J. Vac. Sci. Technol., A, Vol: 33, No: 2 , published: 01 March 2015
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime
Yu-Ru Zhang, Stefan Tinck, Peter De Schepper, You-Nian Wang, Annemie Bogaerts
J. Vac. Sci. Technol., A, Vol: 33, No: 2 , published: 01 March 2015
Atmospheric-pressure-plasma nitriding of titanium alloy
Yuki Yoshimitsu, Ryuta Ichiki, Kotaro Kasamura, Masashi Yoshida, Shuichi Akamine, Seiji Kanazawa
, Vol: 54, No: 3 , published: 01 March 2015
Optical and electrical investigation of a cylindrical diffuse-discharge chamber
Yun Teng (腾云 ), Lee Li (李黎 ), Yong Cheng (程勇 ), Ning Ma (马宁 ), Ming-yang Peng (彭明洋 ), Ming-hai Liu (刘明海 )
Phys. Plasmas, Vol: 22, No: 3 , published: 01 March 2015
Plasma-Activated Polypropylene Mesh-Gelatin Scaffold Composite as Potential Implant for Bioactive Hernia Treatment
Selestina Gorgieva, Martina Modic, Barbara Dovgan, Maja Kaisersberger-Vincek, Vanja Kokol
Plasma Processes and Polymers, Vol: 12, No: 3 , published: 01 March 2015
Characteristics of DC Gas-Liquid Phase Atmospheric-Pressure Plasma and Bacteria Inactivation Mechanism
Jie Shen, Qiang Sun, Zelong Zhang, Cheng Cheng, Yan Lan, Hao Zhang, Zimu Xu, Ying Zhao, Weidong Xia, Paul K. Chu
Plasma Processes and Polymers, Vol: 12, No: 3 , published: 01 March 2015
Нагрев газа и полимерного материала в низкотемпературной плазме высокочастотного разряда
Марков А.В., Юленец Ю.П.
Теплофиз. высок. температур, Vol: 53, No: 2 , published: 01 March 2015
Современное состояние исследований в области физики плазмы и плазменных технологий в России (обзор по материалам XLII Международной конференции по физике плазмы и УТС)
Гришина И. А., Иванов В. А., Коврижных Л. М.
Успехи прикл. физ., Vol: 3, No: 2 , published: 01 March 2015
Study on contact distortion during high aspect ratio contact SiO2 etching
Jong Kyu Kim, Sung Ho Lee, Sung Il Cho, Geun Young Yeom
J. Vac. Sci. Technol., A, Vol: 33, No: 2 , published: 01 March 2015
Investigation of electrochemical etch differences in AlGaAs heterostructures using Cl2 ion beam assisted etching
Kevin Anglin, William D. Goodhue, Reuel B. Swint, Jeanne Porter
J. Vac. Sci. Technol., A, Vol: 33, No: 2 , published: 01 March 2015
Formation of PtSi Schottky barrier MOSFETs using plasma etching
Young Min Woo, Wan Sik Hwang, Won Jong Yoo
J. Vac. Sci. Technol., A, Vol: 33, No: 2 , published: 01 March 2015
Molecular dynamic simulation of damage formation at Si vertical walls by grazing incidence of energetic ions in gate etching processes
Kohei Mizotani, Michiro Isobe, Satoshi Hamaguchi
J. Vac. Sci. Technol., A, Vol: 33, No: 2 , published: 01 March 2015
In-situ nitrogen plasma passivation of Al2O3/GaN interface states
Junwoo Son, Varistha Chobpattana, Brian M. McSkimming, Susanne Stemmer
J. Vac. Sci. Technol., A, Vol: 33, No: 2 , published: 01 March 2015
Generation of a direct-current, atmospheric-pressure microplasma at the surface of a liquid water microjet for continuous plasma-liquid processing
Souvik Ghosh, Brittany Bishop, Ian Morrison, Rohan Akolkar, Daniel Scherson, R. Mohan Sankaran
J. Vac. Sci. Technol., A, Vol: 33, No: 2 , published: 01 March 2015
Influence of CeO2 layer thickness on the properties of CeO2/Gd2O3 multilayers prepared by pulsed laser deposition
Maneesha Mishra, P. Kuppusami, V.R. Reddy, C. Ghosh, R. Divakar, R. Ramaseshan, Akash Singh, R. Thirumurugesan, E. Mohandas
Vacuum, Vol: 113, No: , published: 01 March 2015
Nitrogen mass transfer models for plasma-based low-energy ion implantation
Bocong Zheng, Kesheng Wang, Zhipeng Zhang, Honglong Che, Mingkai Lei
J. Vac. Sci. Technol., A, Vol: 33, No: 2 , published: 01 March 2015
Theoretical Model of Plasma Metallization of Ceramic Heat Sinks
Vysikaylo P.I., Mitin V.S., Mitin A.V., Krasnobaev N.N., Belyaev V.V.
IEEE Trans. Plasma Sci. Pt 2, Vol: 43, No: 3 , published: 01 March 2015
Treatment of Methylene Blue Water solution by Submerged Pulse Arc Multielectrode Reactor
The 17th Conference on Plasma Science and its Applications, February 16 (IPSTA 2015), 2015, Ariel
A.Meirovich, N. Parkansky, R.L. Boxman, O. Berkh, Yu. Rosenberg
Conf. Plasma Sci. and Applications (IPSTA), Vol: 2015, No: , published: 16 February 2015
Self-organisation processes in the carbon arc for nanosynthesis
J. Ng, Y. Raitses
J. Appl. Phys. , Vol: 117, No: 6 , published: 14 February 2015
Temporal characteristics of the pulsed electric discharges in small gaps filled with hydrocarbon oil
U. Maradia, Ch. Hollenstein, K. Wegener
J. Phys. D: Appl. Phys., Vol: 48, No: 5 , published: 11 February 2015
Theoretical modeling of temperature dependent catalyst-assisted growth of conical carbon nanotube tip by plasma enhanced chemical vapor deposition process
Aarti Tewari and Suresh C. Sharma
Phys. Plasmas, Vol: 22, No: 2 , published: 10 February 2015
A hybrid model for simulation of secondary electron emission in plasma immersion ion implantation under different pulse rise time
N. Navab Safa and H. Ghomi
Phys. Plasmas, Vol: 22, No: 2 , published: 10 February 2015
Simulation study of nanoparticle coating in a low pressure plasma reactor
N. Pourali and G. Foroutan
Phys. Plasmas, Vol: 22, No: 2 , published: 10 February 2015
Молекулярно-динамическое моделирование ионной обработки в ВЧ-плазме пониженного давления высокомолекулярных материалов случайно-неоднородной структуры (на примере полиэтилена)
XLII Международная Звенигородская конференция по физике плазмы и УТС, 9–13 февраля 2015 г.
В.С. Желтухин, И.А. Бородаев
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2015, No: , published: 09 February 2015
Формирование износостойких нанодиффузионных слоев на поверхности металлов и анализ физико-механических свойств металлорежущего и обрабатывающего инструмента при обработке ВЧ плазмой
XLII Международная Звенигородская конференция по физике плазмы и УТС, 9–13 февраля 2015 г. пониженного давления
И.Ш. Абдуллин, А.А. Хубатхузин, В.И. Христолюбова
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2015, No: , published: 09 February 2015
Теплофизические процессы при переработке частиц кварца в поликристаллический кремний в дисперсных газоплазменных водородосодержащих потоках
XLII Международная Звенигородская конференция по физике плазмы и УТС, 9–13 февраля 2015 г.
Ю.М. Гришин, Н.П. Козлов, А.С. Скрябин
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2015, No: , published: 09 February 2015
Модифицирование натуральных целлюлозных материалов с использованием плазмы в объеме растворов электролитов
XLII Международная Звенигородская конференция по физике плазмы и УТС, 9–13 февраля 2015 г.
Ю.В. Титова, В.Г. Стокозенко, В.А. Титов, Л.А. Кузьмичева
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2015, No: , published: 09 February 2015
Формирование прочного микрорельефа на образцах из стали 45 с помощью микроплазменных разрядов
XLII Международная Звенигородская конференция по физике плазмы и УТС, 9–13 февраля 2015 г.
В.А. Иванов, М.Е. Коныжев, А.А. Дорофеюк, Т.И. Камолова, Л.И. Куксенова, В.Г. Лаптева, И.А. Хренникова
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2015, No: , published: 09 February 2015
Плазменно-электролитическая модификация поверхности металлов и сплавов
XLII Международная Звенигородская конференция по физике плазмы и УТС, 9–13 февраля 2015 г.
Л.Н. Багаутдинова, Ф.М. Гайсин, Ш.Ч. Мастюков
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2015, No: , published: 09 February 2015
Многоэлектродный высоковольтный кольцевой импульсный разряд для обработки воды
XLII Международная Звенигородская конференция по физике плазмы и УТС, 9–13 февраля 2015 г.
A.M. Aнпилов, Э.M. Бархударов, A.В.Двоенко, И.А. Коссый, M.A.Mисакян, И.В. Моряков, M.И.Тактакишвили, Р.Р. Хабеев
Сб. тр. Междунар. Звенигородской конф. по физ. плазмы и УТС, Vol: 2015, No: , published: 09 February 2015
TiN films deposition inside stainless-steel tubes using magnetic field-enhanced arc ion plating
Yanhui Zhao, Chaoqian Guo, Wenjin Yang, Yuqiu Chen, Baohai Yu
Vacuum, Vol: 112, No: , published: 01 February 2015
Two-dimensional LIF measurements of humidity and OH density resulting from evaporated water from a wet surface in plasma for medical use
Ippei Yagi, Ryo Ono, Tetsuji Oda, Koichi Takaki
Plasma Sources Sci. and Technol., Vol: 24, No: 1 , published: 01 February 2015
Dissociation of carbon dioxide using a microhollow cathode discharge plasma reactor: effects of applied voltage, flow rate and concentration
O. Taylan,  H. Berberoglu
Plasma Sources Sci. and Technol., Vol: 24, No: 1 , published: 01 February 2015
Characterization of energetic and thermalized sputtered tungsten atoms using tuneable diode-laser induced fluorescence in direct current magnetron discharge
M. Desecures, L. de Poucques, J. Bougdira
Plasma Sources Sci. and Technol., Vol: 24, No: 1 , published: 01 February 2015
Benchmarking sheath subgrid boundary conditions for macroscopic-scale simulations
T. G. Jenkins,  D. N. Smithe
Plasma Sources Sci. and Technol., Vol: 24, No: 1 , published: 01 February 2015
Application of extremely non-equilibrium plasmas in the processing of nano and biomedical materials
Miran Mozetič, Gregor Primc, Alenka Vesel, Rok Zaplotnik, Martina Modic, Ita Junkar, Nina Recek, Marta Klanjšek-Gunde, Lukus Guhy, Mahendra K Sunkara, Maria C Assensio, Slobodan Milošević, Marian Lehocky, Vladimir Sedlarik, Marija Gorjanc, Kinga Kutasi, Karin Stana-Kleinschek
Plasma Sources Sci. and Technol., Vol: 24, No: 1 , published: 01 February 2015
Particle-in-Cell Simulation of Plasma Sheath Dynamics With Kinetic Ions
Huang C.,  Chen Y.,  Nishimura Y.
IEEE Trans. Plasma Sci., Vol: 43, No: 2 , published: 01 February 2015
Studying Magneto-Induced Iodine Sorption at Dielectric Surface
Selemir V.D.,  Tatsenko O.M.,  Platonov V.V.,  Filippov A.V.,  Bychkova E.A.,  Krivosheev S.I.,  Shneerson G.A.
IEEE Trans. Plasma Sci., Vol: 43, No: 2 , published: 01 February 2015
Plasma Treatment in Textile Industry
Andrea Zille, Fernando Ribeiro Oliveira, Antonio Pedro Souto
Plasma Processes and Polymers, Vol: 12, No: 2 , published: 01 February 2015
Generation of Silicon Nanostructures by Atmospheric Microplasma Jet: The Role of Hydrogen Admixture
Barbara Barwe, Adrian Stein, Ondřej E. Cibulka, Ivan Pelant, Jaafar Ghanbaja, Thierry Belmonte, Jan Benedikt
Plasma Processes and Polymers, Vol: 12, No: 2 , published: 01 February 2015
Fabrication of a Biomimetic Hierarchical Surface Replicated from a Lotus Leaf and In Vitro Cellular Activities
Jae Yoon Lee, Hyeongjin Lee, Yong Bok Kim, Geun Hyung Kim
Plasma Processes and Polymers, Vol: 12, No: 2 , published: 01 February 2015
Inactivation of the Endotoxic Biomolecule Lipid A by Oxygen Plasma Species: A Reactive Molecular Dynamics Study
Maksudbek Yusupov, Erik C. Neyts, Christof C. Verlackt, Umedjon Khalilov, Adri C. T. van Duin, Annemie Bogaerts
Plasma Processes and Polymers, Vol: 12, No: 2 , published: 01 February 2015
Bio-Activation of Polyether Ether Ketone Using Plasma Immersion Ion Implantation: A Kinetic Model
Edgar A. Wakelin, Alexey V. Kondyurin, Steven G. Wise, David R. McKenzie, Michael J. Davies, Marcela M.M. Bilek
Plasma Processes and Polymers, Vol: 12, No: 2 , published: 01 February 2015
Demagnification and Magnification Effects in One-Step Noncontact Pattern Transfer by Direct-Current Plasma Immersion Ion Implantation
Luo J.,  Cheng S.H.S.,  Kwok D.T.K.,  Wang C.X.,  Li L.,  Chu P.K.
IEEE Trans. Plasma Sci., Vol: 43, No: 2 , published: 01 February 2015
Pattern Roughness Mitigation of 22 nm Lines and Spaces: The Impact of a H2 Plasma Treatment
Peter De Schepper, Alessandro Vaglio Pret, Ziad el Otell, Terje Hansen, Efrain Altamirano-Sanchez, Stefan De Gendt
Plasma Processes and Polymers, Vol: 12, No: 2 , published: 01 February 2015
Oxidation kinetics of the AlPO4 ceramic coatings by pulse arc discharge deposition on SiC–C/C composites
Jianfeng Huang, Wei Hao, Hejun Li, Qiangang Fu, Liyun Cao, yongliang Zhang, Cuiyan Li, Lixiong Yin, Haibo Ouyang
Vacuum, Vol: 112, No: , published: 01 February 2015
Rapid Formation of Transparent Superhydrophobic Film on Glasses by He/CH4/C4F8 Plasma Deposition at Atmospheric Pressure
Duksun Han, Se Youn Moon
Plasma Processes and Polymers, Vol: 12, No: 2 , published: 01 February 2015
TiN Coatings on Titanium Substrates Using Plasma Assisted Ion Implantation
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
M. Cisternas, F. Mellero, M. Favre, H. Bhuyan and E. Wyndham
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Effect of Ion Irradiation on the Structural Properties and Hardness of a-C:H:Si:O:F Films
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
Elidiane C. Rangel, Nilson C. da Cruz, Rita C. C. Rangel, Richard Landers and Steven F. Durrant
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Electron Beam Plasma Application for Synthesis of Bioactive Titanium Oxide Coatings
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
T. M. Vasilieva, I. V. Sokolov and K. V. Balakin
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Copper deposition on fabrics by rf plasma sputtering for medical applications
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
G. Segura, P. Guzmán, P. Zuñiga, S. Chaves, Y. Barrantes, G. Navarro, J. Asenjo, S. Guadamuz, VI Vargas and J. Chaves
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Pulsed laser deposition of carbon nanodots
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
G. Muñoz, P. Homm, F. Guzmán, H. M. Ruiz, L. S. Caballero, M. Favre, M. Flores and S. Hevia
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Nitrogen oxides and methane treatment by non-thermal plasma
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
E. Alva, M. Pacheco, A. Colín, V. Sánchez, J. Pacheco, R. Valdivia and G. Soria
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Super-paramagnetic nanoparticles synthesis in a thermal plasma reactor assisted by magnetic bottle
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
R. Cartaya, J. Puerta and P. Martín
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Design of a Prototype of Water Purification by Plasma Technology as the Foundation for an Industrial Wastewater Plant
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
L. Barillas
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
From Inert Carbon Dioxide to Fuel Methanol by Activation in Plasma Atmosphere
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
Alejandro Suarez, Edbertho Leal-Quiros and Jorge Gonzalez
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
p-ZnO Thin Films Deposited by RF-Magnetron Sputtering
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
L. S. Zambom and R. D. Mansano
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Production of Silicon Oxide like Thin Films by the Use of Atmospheric Plasma Torch
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
E. M. Ozono, E. R. Fachini, M. L. P. Silva, L. F. Ruchko and R. M. O. Galvão
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
TiO2 thin and thick films grown on Si/glass by sputtering of titanium targets in an RF inductively coupled plasma
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
R. Valencia-Alvarado, A. de la Piedad-Beneitez, R. López-Callejas, A. Mercado-Cabrera, R. Peña-Eguiluz, A. E. Muñoz-Castro, B. G. Rodríguez-Méndez and J. M. de la Rosa-Vázquez
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Obtention of polymeric membrane fuel cells by low pressure plasma technique: Evaluation of total cell efficiency by function on the amount of platinum and the thickness of the deposited carbon support
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
A. J. Moreira, N. Ordonez and R. D. Mansano
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition
15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), 27–31 January 2014, San José, Costa Rica
A. P. Mousinho and R. D. Mansano
J. Phys.: Conf. Ser., Vol: 2015, No: 591 , published: 27 January 2015
Experimental evidence of warm electron populations in magnetron sputtering plasmas
B. B. Sahu, Jeon G. Han, Hye R. Kim, K. Ishikawa, M. Hori
J. Appl. Phys. , Vol: 117, No: 3 , published: 21 January 2015
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching
Banat Gul, Stefan Tinck, Peter De Schepper, Aman-ur- Rehman, Annemie Bogaerts
J. Phys. D: Appl. Phys., Vol: 48, No: 2 , published: 21 January 2015
On the HiPIMS benefits of multi-pulse operating mode
O. Antonin, V. Tiron, C. Costin, G. Popa, T. M. Minea
J. Phys. D: Appl. Phys., Vol: 48, No: 1 , published: 14 January 2015
Electronic oscillations in ionized sodium nanoclusters
Roman G. Bystryi,  Igor V. Morozov
J. Phys. B: At. Mol. Opt. Phys., Vol: 48, No: 1 , published: 14 January 2015
Plasma-induced surface textures of ZnO:Al transparent conductive films
Qingjun Jiang, Jianguo Lu, Zhizhen Ye
Vacuum, Vol: 111, No: , published: 01 January 2015
Properties of NiOx and its influence upon all-thin-film ITO/NiOx/LiTaO3/WO3/ITO electrochromic devices prepared by magnetron sputtering
Xingwang Song, Guobo Dong, Fangyuan Gao, Yu Xiao, Qirong Liu, Xungang Diao
Vacuum, Vol: 111, No: , published: 01 January 2015
Synthesis of submicron-sized rods and trees of Cu2O by radio-frequency magnetron sputtering
Vu Xuan Hien, Jae-Lok You, Kwang-Min Jo, Se-Yun Kim, Joon-Hyung Lee, Jeong-Joo Kim, Young-Woo Heo
Vacuum, Vol: 111, No: , published: 01 January 2015
Effects of O7+ and Ni9+ swift heavy ions irradiation on polyacrylamide grafted Gum acacia thin film and sorption of methylene blue
B.S. Kaith, Rachna Sharma, Kashma Sharma, Sukriti Choudhary, Vijay Kumar, S.P. Lochab
Vacuum, Vol: 111, No: , published: 01 January 2015
Nylon-sputtered plasma polymer particles produced by a semi-hollow cathode gas aggregation source
P. Solař, I. Melnichuk, A. Artemenko, O. Polonskyi, O. Kylián, A. Choukourov, D. Slavínská, H. Biederman
Vacuum, Vol: 111, No: , published: 01 January 2015
Optical observations of post-discharge phenomena of laser-triggered discharge produced plasma for EUV lithography
Soowon Lim, Seiya Kitajima, Peng Lu, Takashi Sakugawa, Hidenori Akiyama, Sunao Katsuki, Yusuke Teramoto
, Vol: 54, No: 1 , published: 01 January 2015
Microwave-excited atmospheric pressure plasma jet with wide aperture for the synthesis of carbon nanomaterials
Jaeho Kim, Hajime Sakakita, Hiroyuki Ohsaki, Makoto Katsurai
, Vol: 54, No: 1 , published: 01 January 2015
Measurement of energy flux to a substrate by thermal and Langmuir probes during inductively coupled plasma assisted DC magnetron sputtering
Yoshinobu Matsuda, Kenji Mine, Shintaro Wakiyama, Masanori Shinohara
, Vol: 54, No: 1 , published: 01 January 2015
Synthesis of SiOx–Ti nanostructured composite powders by plasma spray physical vapor deposition for negative electrode of lithium ion batteries
Toru Tashiro, Mashiro Kaga, Makoto Kambara
, Vol: 54, No: 1 , published: 01 January 2015
Diamond-like carbon films from CO source gas by RF plasma CVD method
Yuki Yasuoka, Toru Harigai, Jun-Seok Oh, Hiroshi Furuta, Akimitsu Hatta, Tsuneo Suzuki, Hidetoshi Saitoh
, Vol: 54, No: 1 , published: 01 January 2015
Enhanced cycle capacity retention of plasma-sprayed SiOx nanocomposite powders for negative electrode of lithium ion batteries
Makoto Kambara, Nobuhiko Oda, Keiichiro Homma
, Vol: 54, No: 1 , published: 01 January 2015
Quantitative clarification of inactivation mechanism of Penicillium digitatum spores treated with neutral oxygen radicals
Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Masafumi Ito
, Vol: 54, No: 1 , published: 01 January 2015
Effects of additional vapors on sterilization of microorganism spores with plasma-excited neutral gas
Kei Matsui, Noriaki Ikenaga, Noriyuki Sakudo
, Vol: 54, No: 1 , published: 01 January 2015
Application of a Novel CO2 DC Thermal Plasma Torch Submerged in Aqueous Solution for Treatment of Dissolved Carboxylic Acid
Sanaz Safa, Gervais Soucy
Plasma Chem. Plasma Process., Vol: 35, No: 1 , published: 01 January 2015
Enhanced Degradation of Gaseous Xylene Using Surface Acidized TiO2 Catalyst with Non-thermal Plasmas
Bolun Wei, Yanping Chen, Mingjie Ye, Zhenhua Shao, Yi He, Yao Shi
Plasma Chem. Plasma Process., Vol: 35, No: 1 , published: 01 January 2015
Plasma–Catalyst Synergy During Methanol Steam Reforming in Dielectric Barrier Discharge Micro-plasma Reactors for Hydrogen Production
Wenjie Ge, Xiaofei Duan, Yanping Li, Baowei Wang
Plasma Chem. Plasma Process., Vol: 35, No: 1 , published: 01 January 2015
Surface Treatment of Polyimide Substrates Using Dielectric Barrier Discharge Reactors Based on L-Shaped Electrodes
M. Hur, W. S. Kang, J. O. Lee, Y. H. Song
Plasma Chem. Plasma Process., Vol: 35, No: 1 , published: 01 January 2015
A Mathematical Modeling Study for the Flue Gas Removal of SO2 and NOx Using High Energy Electron Beams
Valentina Gogulancea, Vasile Lavric
Plasma Chem. Plasma Process., Vol: 35, No: 1 , published: 01 January 2015
Low-Pressure Plasma Methods for Generating Non-Reactive Hydrophilic and Hydrogel-Like Bio-Interface Coatings – A Review
Kim S. Siow, Sunil Kumar, Hans J. Griesser
Plasma Processes and Polymers, Vol: 12, No: 1 , published: 01 January 2015
Densification and Hydration of HMDSO Plasma Polymers
Noémi E. Blanchard, Barbara Hanselmann, Johannes Drosten, Manfred Heuberger, Dirk Hegemann
Plasma Processes and Polymers, Vol: 12, No: 1 , published: 01 January 2015
Influence of Particle Mass and Flow Rate on Plasma Polymerized Allylamine Coated Quartz Particles for Humic Acid Removal
Karyn L. Jarvis, Peter Majewski
Plasma Processes and Polymers, Vol: 12, No: 1 , published: 01 January 2015
Measurement of energy flux to a substrate by thermal and Langmuir probes during inductively coupled plasma assisted DC magnetron sputtering
Yoshinobu Matsuda, Kenji Mine, Shintaro Wakiyama, Masanori Shinohara
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Enhanced cycle capacity retention of plasma-sprayed SiOx nanocomposite powders for negative electrode of lithium ion batteries
Makoto Kambara, Nobuhiko Oda, Keiichiro Homma
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Numerically controlled atmospheric-pressure plasma sacrificial oxidation using electrode arrays for improving silicon-on-insulator layer uniformity
Hiroyasu Takei, Keinosuke Yoshinaga, Satoshi Matsuyama, Kazuto Yamauchi, Yasuhisa Sano
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Investigations on crack generation mechanism and crack reduction by buffer layer insertion in thermal-plasma-jet crystallization of amorphous silicon films on glass substrate
Keisuke Tanaka, Shohei Hayashi, Seiji Morisaki, Seiichiro Higashi
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Quantitative clarification of inactivation mechanism of Penicillium digitatum spores treated with neutral oxygen radicals
Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori and Masafumi Ito
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Effects of additional vapors on sterilization of microorganism spores with plasma-excited neutral gas
Kei Matsui, Noriaki Ikenaga, Noriyuki Sakudo
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Control of Plasma-Dielectric Boundary Sheath Potential for the Synthesis of Carbon Nanomaterials in Surface Wave Plasma CVD
Kim J.,  Ohsaki H.,  Katsurai M.
IEEE Trans. Plasma Sci. Pt 3, Vol: 43, No: 1 , published: 01 January 2015
Contribution of radicals and ions in catalyzed growth of single-walled carbon nanotubes from low-temperature plasmas
Z. Marvi, S. Xu, G. Foroutan, K. Ostrikov
Phys. Plasmas, Vol: 22, No: 1 , published: 01 January 2015
Dry etching of Co2MnSi magnetic thin films using a CH3OH/Ar based inductively coupled plasma
Adrian Adalberto Garay, Su Min Hwang, Chee Won Chung
Vacuum, Vol: 111, No: , published: 01 January 2015
A study on the etching characteristics of magnetic tunneling junction materials using DC pulse-biased inductively coupled plasma
Kyung Chae Yang, Min Hwan Jeon, Geun Young Yeom
, Vol: 54, No: 1 , published: 01 January 2015
Numerous flaked particles instantaneously generated by micro-arc discharge in mass-production plasma etching equipment
Yuji Kasashima, Taisei Motomura, Natsuko Nabeoka, Fumihiko Uesugi
, Vol: 54, No: 1 , published: 01 January 2015
Robust characteristics of semiconductor-substrate temperature measurement by autocorrelation-type frequency-domain low-coherence interferometry
Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, Masafumi Ito
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
A study on the etching characteristics of magnetic tunneling junction materials using DC pulse-biased inductively coupled plasmas
Kyung Chae Yang, Min Hwan Jeon, Geun Young Yeom
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Numerous flaked particles instantaneously generated by micro-arc discharge in mass-production plasma etching equipment
Yuji Kasashima, Taisei Motomura, Natsuko Nabeoka, Fumihiko Uesugi
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Effect of source frequency and pulsing on the SiO2 etching characteristics of dual-frequency capacitive coupled plasma
Hoe Jun Kim, Min Hwan Jeon, Anurag Kumar Mishra, In Jun Kim, Tae Ho Sin, Geun Young Yeom
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Numerical Simulation of Atomic Layer Oxidation of Silicon by Oxygen Gas Cluster Beams
Kohei MIZOTANI, Michiro ISOBE, Kazuhiro KARAHASHI and Satoshi HAMAGUCHI
J. Plasma and Fusion Res.: Regular Issue, Vol: 2015, No: 10 , published: 01 January 2015
Experimental study of the visible-light photocatalytic activity of oxygen-deficient TiO2 prepared with Ar/H2 plasma surface treatment
Takuma Nakano, Shota Yazawa, Shota Araki, Sumio Kogoshi, Noboru Katayama, Yusuke Kudo, Tetsuya Nakanishi
, Vol: 54, No: 1 , published: 01 January 2015
Surface treatment of glass and poly(dimethylsiloxane) using atmospheric-pressure plasma jet and analysis of discharge characteristics
Kwon-Sang Seo, Ju-Hong Cha, Moon-Ki Han, Chang-Seung Ha, Dong-Hyun Kim, Hae June Lee, Ho-Jun Lee
, Vol: 54, No: 1 , published: 01 January 2015
Performances Enhancement of H-Doped ZnO Nanorods by H2/Ar Plasma Treatment
Ruey-Chi Wang, Chiao-Fang Cheng
Plasma Processes and Polymers, Vol: 12, No: 1 , published: 01 January 2015
Experimental study of the visible-light photocatalytic activity of oxygen-deficient TiO2 prepared with Ar/H2 plasma surface treatment
Takuma Nakano, Shota Yazawa, Shota Araki, Sumio Kogoshi, Noboru Katayama, Yusuke Kudo, Tetsuya Nakanishi
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Surface treatment of glass and poly(dimethylsiloxane) using atmospheric-pressure plasma jet and analysis of discharge characteristics
Kwon-Sang Seo, Ju-Hong Cha, Moon-Ki Han, Chang-Seung Ha, Dong-Hyun Kim, Hae June Lee, Ho-Jun Lee
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Enhanced photocatalytic performance in atomic layer deposition grown TiO thin films via hydrogen plasma treatment
Alexander Sasinska, Trilok Singh, Shuangzhou Wang, Sanjay Mathur, Ralph Kraehnert
J. Vac. Sci. Technol., A, Vol: 33, No: 1 , published: 01 January 2015
Quantitative analysis of ionization rates of depositing particles in reactive plasma deposition using mass-energy analyzer and Langmuir probe
Hisashi Kitami, Masaru Miyashita, Toshiyuki Sakemi, Yasushi Aoki, Takanori Kato
, Vol: 54, No: 1 , published: 01 January 2015
Formation of amorphous carbon nitride films by reactive Ar/N2 high-power impulse magnetron sputtering
Takashi Kimura, Ryotaro Nishimura
, Vol: 54, No: 1 , published: 01 January 2015
Synthesis of hydrogen-doped zinc oxide transparent conductive films by RF magnetron sputtering
Ikki Takahashi, Yasuaki Hayashi
, Vol: 54, No: 1 , published: 01 January 2015
Investigations on crack generation mechanism and crack reduction by buffer layer insertion in thermal-plasma-jet crystallization of amorphous silicon films on glass substrate
Keisuke Tanaka, Shohei Hayashi, Seiji Morisaki, Seiichiro Higashi
, Vol: 54, No: 1 , published: 01 January 2015
Enhanced Adhesion Properties, Structure and Sintering Mechanism of Hydroxyapatite Coatings Obtained by Plasma Jet Deposition
Vukoman Jokanović, Miroljub Vilotijević, Božana Čolović, Monika Jenko, Ivan Anžel, Rebeka Rudolf
Plasma Chem. Plasma Process., Vol: 35, No: 1 , published: 01 January 2015
Quantitative analysis of ionization rates of depositing particles in reactive plasma deposition using mass-energy analyzer and Langmuir probe
Hisashi Kitami, Masaru Miyashita, Toshiyuki Sakemi, Yasushi Aoki, Takanori Kato
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Synthesis of SiOx–Ti nanostructured composite powders by plasma spray physical vapor deposition for negative electrode of lithium ion batteries
Toru Tashiro, Mashiro Kaga, Makoto Kambara
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Diamond-like carbon films from CO source gas by RF plasma CVD method
Yuki Yasuoka, Toru Harigai, Jun-Seok Oh, Hiroshi Furuta, Akimitsu Hatta, Tsuneo Suzuki, Hidetoshi Saitoh
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Formation of amorphous carbon nitride films by reactive Ar/N2 high-power impulse magnetron sputtering
Takashi Kimura, Ryotaro Nishimura
Jpn. J. Appl. Phys., Part 1, Vol: 54, No: 1S , published: 01 January 2015
Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
Hao Van Bui, Frank B. Wiggers, Anubha Gupta, Minh D. Nguyen, Antonius A. I. Aarnink, Michel P. de Jong, Alexey Y. Kovalgin
J. Vac. Sci. Technol., A, Vol: 33, No: 1 , published: 01 January 2015
Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
Duo Cao, Xinhong Cheng, Li Zheng, Zhongjian Wang, Dawei Xu, Chao Xia, Lingyan Shen, Qian Wang, Yuehui Yu, DaShen Shen
J. Vac. Sci. Technol., A, Vol: 33, No: 1 , published: 01 January 2015
Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
Sami Bolat, Burak Tekcan, Cagla Ozgit-Akgun, Necmi Biyikli, Ali Kemal Okyay
J. Vac. Sci. Technol., A, Vol: 33, No: 1 , published: 01 January 2015
Thermal and plasma enhanced atomic layer deposition of TiO: Comparison of spectroscopic and electric properties
Chittaranjan Das, Karsten Henkel, Massimo Tallarida, Dieter Schmeißer, Hassan Gargouri, Irina Kärkkänen, Jessica Schneidewind, Bernd Gruska, Michael Arens
J. Vac. Sci. Technol., A, Vol: 33, No: 1 , published: 01 January 2015
Improved film quality of plasma enhanced atomic layer deposition SiO using plasma treatment cycle
Haiwon Kim, Ilsub Chung, Seokyun Kim, Seungwoo Shin, Wooduck Jung, Ryong Hwang, Choonsik Jeong, Hanna Hwang
J. Vac. Sci. Technol., A, Vol: 33, No: 1 , published: 01 January 2015
Si etching with reactive neutral beams of very low energy
Yasuhiro Hara, Manabu Hamagaki, Takaya Mise, Naotaka Iwata, Tamio Hara
J. Appl. Phys. , Vol: 116, No: 22 , published: 14 December 2014
Two modes of surface roughening during plasma etching of silicon: Role of ionized etch products
Nobuya Nakazaki, Hirotaka Tsuda, Yoshinori Takao, Koji Eriguchi, Kouichi Ono
J. Appl. Phys. , Vol: 116, No: 22 , published: 14 December 2014
Reactive HiPIMS deposition of SiO/TaO optical interference filters
Matěj Hála, Richard Vernhes, Oleg Zabeida, Jolanta-Ewa Klemberg-Sapieha, Ludvik Martinu
J. Appl. Phys. , Vol: 116, No: 21 , published: 07 December 2014
Influence of Different CH4/N2 Ratios on Structural and Mechanical Properties of a-CNx:H Film Synthesized Using Plasma Focus
Z. A. Umar, R. Ahmad, R. S. Rawat, A. Hussnain, N. Khalid, Z. Chen, L. Shen, Z. Zhang, T. Hussain
J. Fusion Energy, Vol: 33, No: 6 , published: 01 December 2014
In situ TEM investigation of amorphization and recrystallization of Zr(Fe,Cr,Nb)2 precipitates under Ne ion irradiation
H.H. Shen, J.M. Zhang, S.M. Peng, X. Xiang, K. Sun, X.T. Zu
Vacuum, Vol: 110, No: , published: 01 December 2014
Influence of silicon content on the microstructure, mechanical and tribological properties of magnetron sputtered Ti–Mo–Si–N films
Junhua Xu, Hongbo Ju, Lihua Yu
Vacuum, Vol: 110, No: , published: 01 December 2014
Characterization of oxygen ion beams emitted from plasma focus
Mohamad Akel, Sami Alsheikh Salo, Sor Heoh Saw, Sing Lee
Vacuum, Vol: 110, No: , published: 01 December 2014
A study of the effect of propane addition on plasma nitrocarburizing for AISI 1045 steel
Xuemei Ye, Jiqiang Wu, Yongli Zhu, Jing Hu
Vacuum, Vol: 110, No: , published: 01 December 2014
Fabrication of glass fibers uniformly coated with metal films by magnetron sputtering by a two step process involving fixation by a photoresist
Mingming Lan, Huiqin Li, Dong Wang, Yan Li, Guangyin Xu
Vacuum, Vol: 110, No: , published: 01 December 2014
Structural peculiarities and aging effect in hydrogenated a-Si prepared by inductively coupled plasma assisted chemical vapor deposition technique
G. Nogay, E. Özkol, S. Ilday, R. Turan
Vacuum, Vol: 110, No: , published: 01 December 2014
One-Newton class thruster using arc discharge assisted combustion of nitrous oxide/ethanol bipropellant
Akira Kakami, Takuya Ishibashi, Keisuke Ideta, Takeshi Tachibana
Vacuum, Vol: 110, No: , published: 01 December 2014
Wall material interaction with the active species in a nitrogen–methane D.C. flowing discharge
L.C. Ciobotaru, D.S. Popa
Vacuum, Vol: 110, No: , published: 01 December 2014
Conductive and transparency characteristics of titanium-doped indium-tin oxide (InSnO2:Ti) films deposited by radio frequency magnetron sputtering
Jung-Woo Ok, Dong-Joo Kwak, Sang-Heum Kim, Youl-Moon Sung
Vacuum, Vol: 110, No: , published: 01 December 2014
The behavior of W, Be and C layers in interaction with plasma produced by terawatt laser beam pulses
C.P. Lungu, C. Porosnicu, I. Jepu, M. Lungu, A. Marcu, C. Luculescu, C. Ticos, A. Marin, C.E.A. Grigorescu
Vacuum, Vol: 110, No: , published: 01 December 2014
Sterilization effect of nitrogen oxide radicals generated by microwave plasma using air
Tomomasa Itarashiki, Nobuya Hayashi, Akira Yonesu
Vacuum, Vol: 110, No: , published: 01 December 2014
Sterilization of narrow tube inner surface using discharge plasma, ozone, and UV light irradiation
Satoshi Kitazaki, Akimasa Tanaka, Nobuya Hayashi
Vacuum, Vol: 110, No: , published: 01 December 2014
Plasmas for environmental issues: from hydrogen production to 2D materials assembly
E. Tatarova, N. Bundaleska, J. Ph Sarrette, C. M. Ferreira
Plasma Sources Sci. and Technol., Vol: 23, No: 6 , published: 01 December 2014
Nitric oxide PLIF measurement in a point-to-plane pulsed discharge in vitiated air of a propane/air flame
J. B. Schmidt, N. Jiang, B. N. Ganguly
Plasma Sources Sci. and Technol., Vol: 23, No: 6 , published: 01 December 2014
Analytical model and measurements of the target erosion depth profile of balanced and unbalanced planar magnetron cathodes
P. J. S. Pereira, M. L. Escrivão, M. R. Teixeira, M. J. P. Maneira, Y. Nunes
Plasma Sources Sci. and Technol., Vol: 23, No: 6 , published: 01 December 2014
Quantification of air plasma chemistry for surface disinfection
Matthew J. Pavlovich, Douglas S. Clark,  David B. Graves
Plasma Sources Sci. and Technol., Vol: 23, No: 6 , published: 01 December 2014
Control of particle flux and energy on substrate in an inverted cylindrical magnetron for plasma PVD
A. Todoran, M. Mantel, A. Bés, C. Vachey, A. Lacoste
Plasma Sources Sci. and Technol., Vol: 23, No: 6 , published: 01 December 2014
Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges
P. D. Machura, A. Hecimovic, S. Gallian, J. Winter, T. de los Arcos
Plasma Sources Sci. and Technol., Vol: 23, No: 6 , published: 01 December 2014
Reactive Species from Cold Atmospheric Plasma: Implications for Cancer Therapy
David B. Graves
Plasma Processes and Polymers, Vol: 11, No: 12 , published: 01 December 2014
From Killing Bacteria to Destroying Cancer Cells: 20 Years of Plasma Medicine
Mounir Laroussi
Plasma Processes and Polymers, Vol: 11, No: 12 , published: 01 December 2014
Interactions of a Non-Thermal Atmospheric Pressure Plasma Effluent with PC-3 Prostate Cancer Cells
Andrew R. Gibson, Helen O. McCarthy, Ahalm A. Ali, Deborah O'Connell, William G. Graham
Plasma Processes and Polymers, Vol: 11, No: 12 , published: 01 December 2014
Efficacy of Low Temperature Plasma against SCaBER Cancer Cells
Soheila Mohades, Nazir Barekzi, Mounir Laroussi
Plasma Processes and Polymers, Vol: 11, No: 12 , published: 01 December 2014
Reactive Molecular Dynamics Simulations for a Better Insight in Plasma Medicine
Annemie Bogaerts, Maksudbek Yusupov, Jonas Van der Paal, Christof C. W. Verlackt, Erik C. Neyts
Plasma Processes and Polymers, Vol: 11, No: 12 , published: 01 December 2014
Plasma Stimulation of Migration of Macrophages
Vandana Miller, Abraham Lin, Gregory Fridman, Danil Dobrynin, Alexander Fridman
Plasma Processes and Polymers, Vol: 11, No: 12 , published: 01 December 2014
Hydrogen Production From Hydrocarbons With Use of Plasma Discharges Under High Pressure Condition
Nishida Y., Cheng C., Iwasaki K.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Gate Leakage Characteristics for 28 nm HfZrOx pMOSFETs After DPN Process Treatment With Different Nitrogen Concentration
Lee W., Wang M., Wang S., Lian C., Huang L.S.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Effects of Oxygen Plasma and Dopamine Coating on Poly(Vinylidene Fluoride) Microfiltration Membrane for the Resistance to Protein Fouling
Yared I., Wang S., Wang M.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Sewage Sludge-to-Power
Matveev I.B., Serbin S.I., Washchilenko N.V.
IEEE Trans. Plasma Sci. Pt 2, Vol: 42, No: 12 , published: 01 December 2014
Plasma-Assisted Reforming of Natural Gas for GTL—Part I
Serbin S.I., Matveev I.B., Goncharova N.A.
IEEE Trans. Plasma Sci. Pt 2, Vol: 42, No: 12 , published: 01 December 2014
Применение диффузных разрядов атмосферного давления, формируемых за счет убегающих электронов, для модификации поверхности меди и нержавеющей стали
Тарасенко В.Ф., Шулепов М.А., Ерофеев М.В.
Ядерная физика и инжиниринг, Vol: 5, No: 11-12 , published: 01 December 2014
SF6 and C4F8 global kinetic models coupled to sheath models
Yehya Haidar, Amand Pateau, Ahmed Rhallabi, Marie Claude Fernandez, Arezki Mokrani, Fadia Taher, Fabrice Roqueta, Mohamed Boufnichel
Plasma Sources Sci. and Technol., Vol: 23, No: 6 , published: 01 December 2014
The GaN-Based Light Emitting Diode Grown on Nanopattern Sapphire Substrate Prepared by Inductively Coupled Plasma Etching
Lin J., Huang S., Su Y., Huang K.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Hydrophilic DLC Surface Induced by Nanostructures Formed by RF O2 Plasma Etching With Metal Micromasks
Harigai T., Iwasa K., Furuta H., Hatta A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Metallic glass coatings fabricated by gas tunnel type plasma spraying
Subramaniam Yugeswaran, Akira Kobayashi
Vacuum, Vol: 110, No: , published: 01 December 2014
Effect of Multiple Frequency H2/Ar Plasma Treatment on the Optical, Electrical, and Structural Properties of AZO Films
Wu M., Huang T., Jin C., Zhuge L., Han Q., Wu X.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Threshold Voltage Reduction and Mobility Improvement of LTPS-TFTs With NH3 Plasma Treatment
Ma W.C., Yuan S., Chan T., Huang C.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Reverse Electrical Behavior of N-Channel and P-Channel LTPS-TFTs by N2O Plasma Surface Treatment
Ma W.C., Huang C., Chan T., Yuan S.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Hydrophilic Stability of Plastic Surfaces Treated in Low- and Atmospheric-Pressure Radio-Frequency Plasmas
Hsiao R., Sung T., Liu C., Teii S., Chan T., Ono S., Teii K., Yang C., Zeng S.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Photo-catalytic titanium oxide film deposition by atmospheric TPCVD using vortex Ar plasma jet
Yasutaka Ando, Yoshimasa Noda, Akira Kobayashi
Vacuum, Vol: 110, No: , published: 01 December 2014
Plasma Deposition of Diamond at Low Pressures: A Review
Teii K.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 12 , published: 01 December 2014
Осаждение медных покрытий в магнетроне с расплавленным катодом
Тумаркин А.В., Казиев А.В., Колодко Д.В., Писарев А.А., Харьков М.М., Ходаченко Г.В.
Ядерная физика и инжиниринг, Vol: 5, No: 11-12 , published: 01 December 2014
Effects of sputtering power on properties of PbSe nanocrystalline thin films deposited by RF magnetron sputtering
Wenran Feng, Xiaoyang Wang, Hai Zhou, Fei Chen
Vacuum, Vol: 109, No: , published: 01 November 2014
Visible light activated photocatalytic TaON coatings deposited via pulsed-DC magnetron sputtering
M. Ratova, G.T. West, P.J. Kelly
Vacuum, Vol: 109, No: , published: 01 November 2014
Effect of N2/Ar flow ratio on the structural and electrical properties of SrHfON thin films prepared by magnetron sputtering
Hao Tian, Li-ping Feng, Zheng-tang Liu
Vacuum, Vol: 109, No: , published: 01 November 2014
Development of low-pressure high-frequency plasma chemical vapor deposition method on surface modification of silicon wafer
Nuttee Thungsuk, Peerapong Nuchuay, Daisuke Hirotani, Yoshimi Okamura, Kenichi Nakabayashi, Hiroyuki Kinoshita, Toshifumi Yuji, Narong Mungkung, Nat Kasayapanand
Vacuum, Vol: 109, No: , published: 01 November 2014
Effect of substrate on the dielectric properties of bismuth magnesium niobate thin films prepared by RF magnetron sputtering
Lingxia Li, Dan Xu, Shihui Yu, Helei Dong, Yuxin Jin, Haoran Zheng
Vacuum, Vol: 109, No: , published: 01 November 2014
Properties of TiSiN coatings deposited by hybrid HiPIMS and pulsed-DC magnetron co-sputtering
M. Arab Pour Yazdi, F. Lomello, J. Wang, F. Sanchette, Z. Dong, T. White, Y. Wouters, F. Schuster, A. Billard
Vacuum, Vol: 109, No: , published: 01 November 2014
Ion extraction from a flowing plasma using electrostatic field: Simulation and experiment
S. Baruah, B. Jana, A. Majumdar, G.K. Sahu, K.B. Thakur, A.K. Das
Vacuum, Vol: 109, No: , published: 01 November 2014
Strong and Durable Antibacterial Effect of Titanium Treated in Rf Oxygen Plasma: Preliminary Results
Tullio Monetta, Francesco Bellucci
Plasma Chem. Plasma Process., Vol: 34, No: 6 , published: 01 November 2014
Plasma-Initiated DT Graft Polymerization of Acrylic Acid on Surface of Porous Polypropylene Membrane for Pore Size Control
Saijie Shi, Yue Zhou, Xiao Lu, Yuansong Ye, Jian Huang, Xiaolin Wang
Plasma Chem. Plasma Process., Vol: 34, No: 6 , published: 01 November 2014
Fertilization of Radishes, Tomatoes, and Marigolds Using a Large-Volume Atmospheric Glow Discharge
Alex Lindsay, Brandon Byrns, Wesley King, Asish Andhvarapou, Jeb Fields, Detlef Knappe, William Fonteno, Steven Shannon
Plasma Chem. Plasma Process., Vol: 34, No: 6 , published: 01 November 2014
Effect of Ozone Addition to Lean NOx Trap Method Using Plasma-Catalyst System
Masato Nagata, Yasunari Hanaki, Atsushi Ikeda, Yasushi Sekine
Plasma Chem. Plasma Process., Vol: 34, No: 6 , published: 01 November 2014
Plasma-Enhanced Methane Direct Conversion over Particle-Size Adjusted MOx/Al2O3 (M = Ti and Mg) Catalysts
Palraj Kasinathan, Sunyoung Park, Woon Choon Choi, Young Kyu Hwang, Jong-San Chang, Yong-Ki Park
Plasma Chem. Plasma Process., Vol: 34, No: 6 , published: 01 November 2014
Acetic Acid Decomposition in a Coaxial Dielectric Barrier Discharge Tube with Mist Flow
Tomohiro Shibata, Hideya Nishiyama
Plasma Chem. Plasma Process., Vol: 34, No: 6 , published: 01 November 2014
Matrix IR Study of Benzene Transformations in a Pulsed Glow Discharge in the Absence and the Presence of Oxygen
Sergey E. Boganov, Sergey V. Kudryashov, Andrey Yu. Ryabov, Alexey I. Suslov, Stanislav S. Rynin, Mikhail P. Egorov, Oleg M. Nefedov
Plasma Chem. Plasma Process., Vol: 34, No: 6 , published: 01 November 2014
Growth of ZnO Thin Films by Spray Plasma Technique: Correlation Between Spectroscopic Measurements and Film Properties
Kamal Baba, Claudia Lazzaroni, Mehrdad Nikravech
Plasma Chem. Plasma Process., Vol: 34, No: 6 , published: 01 November 2014
Numerical Investigation of the Relativistic Magnetron Using a Novel Semitransparent Cathode
Yang W., Dong Z., Yang Y., Dong Y.
IEEE Trans. Plasma Sci., Vol: 42, No: 11 , published: 01 November 2014
Influence of Ar and N2 Pressure on Plasma Chemistry, Ion Energy, and Thin Film Composition During Filtered Arc Deposition From Ti3SiC2 Cathodes
Eriksson A.O., Mraz S., Jensen J., Hultman L., Zhirkov I., Schneider J.M., Rosen J.
IEEE Trans. Plasma Sci., Vol: 42, No: 11 , published: 01 November 2014
Property of the PVC Dust Collecting Plate Used in Wet Membrane Electrostatic Precipitator
Huang C.,Ma X., Wang M., Sun Y., Zhang C., Tong H.
IEEE Trans. Plasma Sci., Vol: 42, No: 11 , published: 01 November 2014
Thermal Plasma Vitrification of MSWI Fly Ash Mixed With Different Biomass Ashes
Huang Q., Cai X., Alhadj-Mallah M., Du C., Chi Y., Yan J.
IEEE Trans. Plasma Sci., Vol: 42, No: 11 , published: 01 November 2014
Inactivation of the Tomato Pathogen Cladosporium fulvum by an Atmospheric-Pressure Cold Plasma Jet
Qianqian Lu, Dongping Liu, Ying Song, Renwu Zhou, Jinhai Niu
Plasma Processes and Polymers, Vol: 11, No: 11 , published: 01 November 2014
Nitric Oxide Generation with an Air Operated Non-Thermal Plasma Jet and Associated Microbial Inactivation Mechanisms
Xiaolong Hao, Amber M. Mattson, Chelsea M. Edelblute, Muhammad A. Malik, Loree C. Heller, Juergen F. Kolb
Plasma Processes and Polymers, Vol: 11, No: 11 , published: 01 November 2014
Antireflection coatings with SiOx–TiO2 multilayer structures
Jong-Hong Lu, Jen-Wei Luo, Shiou-Ruei Chuang, Bo-Ying Chen
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Effects of thermal history on the electrical properties of amorphous carbon nitride films prepared by reactive sputtering
Naoyuki Tamura, Masami Aono, Hiroaki Kishimura, Nobuaki Kitazawa, Yoshihisa Watanabe
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Properties of p-type N-doped Cu2O thin films prepared by reactive sputtering
Yu Sup Jung, Hyung Wook Choi, Kyung Hwan Kim
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Expansion of lattice constants of aluminum nitride thin film prepared on sapphire substrate by ECR plasma sputtering method
Satoru Kaneko, Hironori Torii, Takao Amazawa, Takeshi Ito, Manabu Yasui, Masahito Kurouchi, Akinori Fukushima, Takashi Tokumasu, Seughwan Lee, Sungkyun Park, Hirofumi Takikawa, Mamoru Yoshimoto
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Effects of post exposure bake temperature and exposure time on SU-8 nanopattern obtained by electron beam lithography
Manabu Yasui, Elito Kazawa, Satoru Kaneko, Ryo Takahashi, Masahito Kurouchi, Takeshi Ozawa, Masahiro Arai
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Application of remote hydrogen plasma to selective processing for Ge-based devices: Crystallization, etching, and metallization
Katsunori Makihara, Mitsuhisa Ikeda, Tatsuya Okada, Seiichi Miyazaki
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Protein adsorption and cell adhesion on three-dimensional polycaprolactone scaffolds with respect to plasma modification by etching and deposition techniques
Sung Woon Myung, Yeong Mu Ko, Byung Hoon Kim
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Etching characteristics and mechanisms of Mo thin films in Cl2/Ar and CF4/Ar inductively coupled plasmas
Nomin Lim, Alexander Efremov, Geun Young Yeom, Bok-Gil Choi, Kwang-Ho Kwon
Jpn. J. Appl. Phys., Vol: 53, No: 11 , published: 01 November 2014
Electrochemical characteristics of plasma-etched black silicon as anodes for Li-ion batteries
Gibaek Lee, Stefan L. Schweizer, Ralf B. Wehrspohn
J. Vac. Sci. Technol., A, Vol: 32, No: 6 , published: 01 November 2014
Evolution of titanium residue on the walls of a plasma-etching reactor and its effect on the polysilicon etching rate
Kosa Hirota, Naoshi Itabashi, Junichi Tanaka
J. Vac. Sci. Technol., A, Vol: 32, No: 6 , published: 01 November 2014
Effects of Oxygen Plasma Treatment on the Physical and Chemical Properties of Wool Fiber Surface
Hossein Barani, Alfredo Calvimontes
Plasma Chem. Plasma Process., Vol: 34, No: 6 , published: 01 November 2014
Enhanced Long-Term Color Stability of Teeth Treated with Hydrogen Peroxide and Non-Thermal Atmospheric Pressure Plasma Jets
Seoul Hee Nam, Hyun Wook Lee, Jin Woo Hong, Hae June Lee, Gyoo Cheon Kim
Plasma Processes and Polymers, Vol: 11, No: 11 , published: 01 November 2014
Atmospheric Plasma Surface Modification of PMMA and PP Micro-Particles
Mary Gilliam, Susan Farhat, Ali Zand, Barrack Stubbs, Michael Magyar, Graham Garner
Plasma Processes and Polymers, Vol: 11, No: 11 , published: 01 November 2014
Surface Modification of Biodegradable Poly(L-Lactic Acid) by Argon Plasma: Fibroblasts and Keratinocytes in the Spotlight
Silvie Rimpelová, Lucie Peterková, Nikola Slepičková Kasálková, Petr Slepička, Václav Švorčík, Tomáš Ruml
Plasma Processes and Polymers, Vol: 11, No: 11 , published: 01 November 2014
Exploration of surface hydrophilic properties on AISI 304 stainless steel and silicon wafer against aging after atmospheric pressure plasma treatment
Shang-I Chuang, Jenq-Gong Duh
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
In situ ultraviolet–visible absorbance measurement during and after solution plasma sputtering for preparation of colloidal gold nanoparticles
Tsuyoshi Mizutani, Takaaki Murai, Hirofumi Nameki, Tomoko Yoshida, Shinya Yagi
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Localized plasma irradiation through a micronozzle for individual cell treatment
Ryutaro Shimane, Shinya Kumagai, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Masaru Hori, Minoru Sasaki
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Impact of nitrogen plasma passivation on the interface of germanium MOS capacitor
Yun Quan-Xin (云全新), Li Ming (黎 明), An Xia (安 霞), Lin Meng (林 猛), Liu Peng-Qiang (刘朋强), Li Zhi-Qiang (李志强), Zhang Bing-Xin (张冰馨), Xia Yu-Xuan (夏宇轩), Zhang Hao (张 浩), Zhang Xing (张 兴), Huang Ru (黄 如), Wang Yang-Yuan (王阳元)
Chin. Phys. B, Vol: 23, No: 11 , published: 01 November 2014
Realization of conformal doping on multicrystalline silicon solar cells and black silicon solar cells by plasma immersion ion implantation
Shen Ze-Nan (沈泽南), Xia Yang (夏 洋), Liu Bang-Wu (刘邦武), Liu Jin-Hu (刘金虎), Li Chao-Bo (李超波), Li Yong-Tao (李勇滔)
Chin. Phys. B, Vol: 23, No: 11 , published: 01 November 2014
Characterization and effect of pre-oxidation on D.C. plasma nitriding for AISI4140 steel
Han Liu, Jing-cai Li, Fei Sun, Jing Hu
Vacuum, Vol: 109, No: , published: 01 November 2014
Effect of growth temperature on structural and morphological evolution of epitaxial SrTiO3 thin films grown on LaAlO3 (001) substrates by ion beam sputter deposition
Gasidit Panomsuwan, Osamu Takai, Nagahiro Saito
Vacuum, Vol: 109, No: , published: 01 November 2014
Single Step Plasma Deposition of Platinum-Fluorocarbon Nanocomposite Films as Electrocatalysts of Interest for Micro Fuel Cells Technology
Antonella Milella, Fabio Palumbo, Elena Dilonardo, Gianni Barucca, Pinalysa Cosma, Francesco Fracassi
Plasma Processes and Polymers, Vol: 11, No: 11 , published: 01 November 2014
Deposition of Hydroxyl Functionalized Films by Means of Water Aerosol-Assisted Atmospheric Pressure Plasma
Yi-Wei Yang, Giuseppe Camporeale, Eloisa Sardella, Giorgio Dilecce, Jong-Shinn Wu, Fabio Palumbo, Pietro Favia
Plasma Processes and Polymers, Vol: 11, No: 11 , published: 01 November 2014
Effect of tetramethylsilane flow on the deposition and tribological behaviors of silicon doped diamond-like carbon rubbed against poly(oxymethylene)
Xingrui Deng, Yankuang Lim, Hiroyuki Kousaka, Takayuki Tokoroyama, Noritsugu Umehara
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Growth of non-polar ZnO thin films with different working pressures by plasma enhanced chemical vapor deposition
Chung-Hua Chao, Da-Hua Wei
Jpn. J. Appl. Phys., Part 1, Vol: 53, No: 11S , published: 01 November 2014
Effect of Ion Impact on Incubation Time of Single-Walled Carbon Nanotubes Grown by Plasma Chemical Vapor Deposition
Bin XU, Toshiaki KATO, Koshi MURAKOSHI and Toshiro KANEKO
J. Plasma and Fusion Res.: Regular Issue, Vol: 2014, No: 9 , published: 31 October 2014
Improvement of Electrical Device Performances for Graphene Directly Grown on a SiO2 Substrate by Plasma Chemical Vapor Deposition
Hiroo SUZUKI, Toshiaki KATO and Toshiro KANEKO
J. Plasma and Fusion Res.: Regular Issue, Vol: 2014, No: 9 , published: 31 October 2014
Transport of a helicon plasma by a convergent magnetic field for high speed and compact plasma etching
Kazunori Takahashi, Taisei Motomura, Akira Ando, Yuji Kasashima, Kazuya Kikunaga, Fumihiko Uesugi, Shiro Hara
J. Phys. D: Appl. Phys., Vol: 47, No: 42 , published: 22 October 2014
13th High-Tech Plasma Processes Conference (HTPP-2014)

J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Advanced oxide powders processing based on cascade plasma
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
O. P. Solonenko and A.V. Smirnov
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Effect of suspension characteristics on in-flight particle properties and coating microstructures achieved by suspension plasma spray
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
E. Aubignat, M. P. Planche, A. Allimant, D. Billières, L. Girardot, Y. Bailly and G. Montavon
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Pulsed laminar arc jet with synchronized suspension injection-spectroscopic studies
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
J. Krowka, V. Rat, C. Chazelas and J.-F. Coudert
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Development of super-hydrophobic PTFE and PET surfaces by means of plasma processes
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
S. Zanini, R. Bami, R. Della Pergola and C. Riccardi
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Manufacturing of composite titanium-titanium nitride coatings by reactive very low pressure plasma spraying (R-VLPPS)
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
B. Vautherin, M.-P. Planche, A. Quet, L. Bianchi and G. Montavon
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Numerical Simulation of Bosch Processing for Deep Silicon Plasma Etching
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
P. Moroz and D. J. Moroz
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Similarity criteria of HOSP formation at plasma processing of agglomerated particles
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
O. P. Solonenko
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Photoinduced superhydrophilicity of amorphous TiOx-like thin films by a simple room temperature sol-gel deposition and atmospheric plasma jet treatment
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
V. E. Vrakatseli, E. Pagonis, E. Amanatides and D. Mataras
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
ECWR plasma enhanced chemical vapour deposition of microcrystalline silicon thin films
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
E. Farsari, A. G. Kalampounias, E. Amanatides and D. Mataras
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Modelling radiative properties of participating species in a microwave plasma reactor for diamond deposition
13th High-Tech Plasma Processes Conference (HTPP-2014), 22–27 June 2014, Toulouse, France
S. Prasanna, Ph Rivière and A. Soufiani
J. Phys.: Conf. Ser., Vol: 2014, No: 550 , published: 16 October 2014
Crystal orientation effects on helium ion depth distributions and adatom formation processes in plasma-facing tungsten
Karl D. Hammond, Brian D. Wirth
J. Appl. Phys. , Vol: 116, No: 14 , published: 14 October 2014
Study of mass and cluster flux in a pulsed gas system with enhanced nanoparticle aggregation
Steffen Drache, Vitezslav Stranak, Zdenek Hubicka, Florian Berg, Milan Tichy, Christiane A. Helm, Rainer Hippler
J. Appl. Phys. , Vol: 116, No: 14 , published: 14 October 2014
Reduction and nitridation of graphene oxide (GO) films at room temperature using inductively coupled NH3 plasma
Hong Tak Kim, Chang-duk Kim, Chinho Park
Vacuum, Vol: 108, No: , published: 01 October 2014
High temperature oxidation of Cr–N coatings prepared by high power pulsed magnetron sputtering – Plasma immersion ion implantation & deposition
Zhongzhen Wu, Xiubo Tian, Shu Xiao, Chunzhi Gong, Feng Pan, Paul K. Chu
Vacuum, Vol: 108, No: , published: 01 October 2014
Study plasma electrolytic oxidation process and characterization of coatings formed in an alumina nanoparticle suspension
Sahand Sarbishei, Mohammad Ali Faghihi Sani, Mohammad Reza Mohammadi
Vacuum, Vol: 108, No: , published: 01 October 2014
Single material TiO2 double layers antireflection coating with photocatalytic property prepared by magnetron sputtering technique
Zhaoyong Wang, Ning Yao, Xing Hu
Vacuum, Vol: 108, No: , published: 01 October 2014
Hexagonal arrayed patterns with bright and dark spots observed in a compact plasma reactor based on a piezoelectric transformer
H. Itoh,  S. Suzuki
Plasma Sources Sci. and Technol., Vol: 23, No: 5 , published: 01 October 2014
Inactivation of Microorganisms Using Cold Atmospheric Pressure Plasma with Different Temporal Discharge Characteristics
Nina Mertens, Mostafa Mahmoodzada, Andreas Helmke, Petra Grünig, Petra Laspe, Steffen Emmert,  Wolfgang Viöl
Plasma Processes and Polymers, Vol: 11, No: 10 , published: 01 October 2014
Engineering of Composite Organosilicon Thin Films with Embedded Silver Nanoparticles via Atmospheric Pressure Plasma Process for Antibacterial Activity
Xiaolong Deng, Christophe Leys, Danijela Vujosevic, Vineta Vuksanovic, Uros Cvelbar, Nathalie De Geyter, Rino Morent, Anton Nikiforov
Plasma Processes and Polymers, Vol: 11, No: 10 , published: 01 October 2014
In Situ Generation of Plasma-Polymer Standards by Plasma Assisted Free Radical Polymerization
Thierry Fouquet, Grégory Mertz, Claude Becker, Ludivine Fetzer, Fabio Ziarelli,  David Ruch
Plasma Processes and Polymers, Vol: 11, No: 10 , published: 01 October 2014
Controlling the Morphogenesis of Needle-Like and Multibranched Structures in Maleic Anhydride Plasma Polymer Thin Films
Michel M. Brioude, Marie-Pierre Laborie, Aissam Airoudj, Hamidou Haidara,  Vincent Roucoules
Plasma Processes and Polymers, Vol: 11, No: 10 , published: 01 October 2014
Constructing Biomimic Catalytic Coating with Controlled Nitric Oxide Release Properties by Immobilizing 3,3-Diselenodipropionic Acid on Plasma Polymerized Allylamine Film
Pengkai Qi, Xiangyang Li, Ying Yang, Ru Shen, Jin Wang, Zhilu Yang, Qiufen Tu,  Nan Huang
Plasma Processes and Polymers, Vol: 11, No: 10 , published: 01 October 2014
Amorphization and Polymorphism Modification of Polyamide-6 Films via Open-Air Non-Equilibrium Atmospheric Pressure Plasma Jet Treatment
Dhia Ben Salem, Jérôme Pulpytel, Françoise Pillier, Alain Pailleret,  Farzaneh Arefi-Khonsari
Plasma Processes and Polymers, Vol: 11, No: 10 , published: 01 October 2014
Decontamination of Nosocomial Bacteria Including Clostridium difficile Spores on Dry Inanimate Surface by Cold Atmospheric Plasma
Tobias G. Klämpfl, Tetsuji Shimizu, Sylvia Koch, Martin Balden, Stefanie Gemein, Yang-Fang Li, Anindita Mitra, Julia L. Zimmermann, Jürgen Gebel, Gregor E. Morfill,  Hans-Ulrich Schmidt
Plasma Processes and Polymers, Vol: 11, No: 10 , published: 01 October 2014
In-Situ Chemical Trapping of Oxygen in the Splitting of Carbon Dioxide by Plasma
Robby Aerts, Ramses Snoeckx,  Annemie Bogaerts
Plasma Processes and Polymers, Vol: 11, No: 10 , published: 01 October 2014
Reactive Oxygen Species Controllable Nonthermal Atmospheric Pressure Plasmas Using Coaxial Geometry for Biomedical Applications
Park C., Kim D.Y., Kim S.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Multi-SWD Plasma Jet System for PECVD Deposition of Thin Films
Olejnicek J., Cada M., Smid J., Kment S., Hubicka Z.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Drifting Ionization Zone in DC Magnetron Sputtering Discharges at Very Low Currents
Anders A., Ni P., Andersson J.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Optical Multichannel Imaging of Pulsed Laser Deposition of ZnO
Jones J.G., Sun L., Murphy N.R., Jakubiak R.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Low Temperature Plasma Causes Double-Strand Break DNA Damage in Primary Epithelial Cells Cultured From a Human Prostate Tumor
Hirst A.M., Frame F.M., Maitland N.J., O'Connell D.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Temporal Evolution of the Discharge in U.S. Medical Innovations Electrosurgical System SS-200E/Argon-2
Scott D., Shashurin A., Canady J., Keidar M.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
iCCD Imaging of the Transition From Uncoupled to Coupled Mode in a Plasma Source for Biomedical and Materials Treatment Applications
Bianconi S., Cavrini F., Colombo V., Gherardi M., Laurita R., Liguori A., Sanibondi P., Stancampiano A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
High-Speed and Schlieren Imaging of a Low Power Inductively Coupled Plasma Source for Potential Biomedical Applications
Boselli M., Cavrini F., Colombo V., Ghedini E., Gherardi M., Laurita R., Liguori A., Sanibondi P., Stancampiano A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Optimization Design of Atmospheric Pressure Plasma Generator for Sterilization of Endoscope
Wang X., Wang S., Liu D., Li D., Li C., Kong M.G.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Modeling of Low Temperature Plasma for Surface and Airborne Decontamination
Mihailova D., van Dijk J., Hagelaar G., Belenguer P., Guillot P.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Energy Transferred From a Hot Nickel Target During Magnetron Sputtering
Caillard A., El'Mokh M., Semmar N., Dussart R., Lecas T., Thomann A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Plasma and Weld Pool Characteristics in a TIG Configuration
Mougenot J., Gonzalez J., Freton P., Stadler M., Masquere M.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Various Shapes of Plasma Spokes Observed in HiPIMS
Hecimovic A., von Keudell A., Gathen V.S.d., Winter J.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Fast Time Resolved Techniques as Key to the Understanding of Energy and Particle Transport in HPPMS-Plasmas
Maszl C., Breilmann W., Berscheid L., Benedikt J., von Keudell A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Influence of the High-Power Impulse Magnetron Sputtering Voltage on the Time-Resolved Platinum Ions Energy Distributions
Cuynet S., Caillard A., Lecas T., Dozias S., Lefaucheux P., Coudrat G., Thomann A., Bigarre J., Buvat P., Brault P.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Effect of Catalyst Type on Optical Emission
Teramoto Y., Kim H., Ogata A., Negishi N.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering
Andersson J., Ni P., Anders A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Characterization of Kilohertz-Ignited Nonthermal He and He/O2  Plasma Pencil for Biomedical Applications
Sarani A., Nicula C., Gonzales X.F., Thiyagarajan M.
IEEE Trans. Plasma Sci. Pt 2, Vol: 42, No: 10 , published: 01 October 2014
Performance of Electrode Materials During Food Processing by Pulsed Electric Fields
Gad A., Jayaram S.H., Pritzker M.
IEEE Trans. Plasma Sci. Pt 2, Vol: 42, No: 10 , published: 01 October 2014
Pulsed Electric Field Treatment of Microalgae: Inactivation Tendencies and Energy Consumption
Qin S., Timoshkin I.V., Maclean M., Wilson M.P., MacGregor S.J., Given M.J., Anderson J.G., Wang T.
IEEE Trans. Plasma Sci. Pt 2, Vol: 42, No: 10 , published: 01 October 2014
Shock Wave Generation in Water for Biological Studies
Kang D., Nah J.B., Cho M., Xiao S.
IEEE Trans. Plasma Sci. Pt 2, Vol: 42, No: 10 , published: 01 October 2014
Operation Characteristics of A6 Relativistic Magnetron Using Single-Stepped Cavities With Axial Extraction
Liu M., Fuks M.I., Schamiloglu E., Liu C.
IEEE Trans. Plasma Sci. Pt 3, Vol: 42, No: 10 , published: 01 October 2014
Low-Temperature Naturatron Sputtering System for Deposition of Indium Tin Oxide Film
Thungsuk N., Yuji T., Kasayapanand N., Mungkung N., Nuachauy P., Arunrungrusmi S., Nakabayashi K., Okamura Y., Kinoshita H., Kataoka H., Suzaki Y., Hirata T.
IEEE Trans. Plasma Sci. Pt 3, Vol: 42, No: 10 , published: 01 October 2014
Optical Diagnostics of Iron Oxide Nanoparticle Synthesis in Microwave Oxygen Plasma
Snirer M., Zelina P., Kudrle V.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Скорость травления кремния локализованным газовым разрядом
Абрамов А.В., Панкратова Е.А., Суровцев И.С.
Ж. техн. физ., Vol: 84, No: 10 , published: 01 October 2014
Effects of oxygen plasma pre-treatments on the characteristics of n-ZnO/p-Si heterojunction diodes
Changmin Kim, Hwangho Lee, Byoungho Lee, Youngmin Lee, Sejoon Lee, Deuk Young Kim
Curr. Appl Phys., Vol: 14, No: 10 , published: 01 October 2014
Sputter Deposition of Nanostructured TiO2 Thin Films
Horakova M., Cerny P., Kriz P., Bartos P., Spatenka P.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Fabrication of SnS Using PECVD Method With Combined Solid Sources
Chen J., Liu P., Chen M., Wang S., Wang G., Liu M.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Synthesis of Amorphous Silicon Films With High Growth Rate by Gas-Jet Electron Beam Plasma Chemical Vapor Deposition Method
Baranov E.A., Khmel S.Y., Zamchiy A.O.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Binary C-Ag Plasma Breakdown and Structural Characterization of the Deposited Thin Films by Thermionic Vacuum Arc Method
Mandes A., Vladoiu R., Dinca V., Prodan G.
IEEE Trans. Plasma Sci. Pt 1, Vol: 42, No: 10 , published: 01 October 2014
Infrared spectroscopic and modeling studies of H2/CH4 microwave plasma gas phase from low to high pressure and power
C. Rond, S. Hamann, M. Wartel, G. Lombardi, A. Gicquel, J. Röpcke
J. Appl. Phys. , Vol: 116, No: 9 , published: 07 September 2014
Amorphous silicon carbonitride films modified by plasma immersion ion implantation
R.G.S. Batocki, R.P. Mota, R.Y. Honda, D.C.R. Santos
Vacuum, Vol: 107, No: , published: 01 September 2014
Properties of Ti-doped Al2O3 thin films deposited by simultaneous RF and DC magnetron sputtering
Su-Shia Lin, Yu-Lun Gao, Shao-Yin Hu, Sheng-You Fan, Yung-Shiang Tsai
Vacuum, Vol: 107, No: , published: 01 September 2014
Dielectric properties of SiOx like films deposited from TMS/O2 mixture in low pressure microwave plasma
M. Kihel, S. Sahli, A. Zenasni, P. Raynaud, Y. Segui
Vacuum, Vol: 107, No: , published: 01 September 2014
Improved in dry routing performance with optimized diamond-like carbon films
C.T. Guo, H.Y. Ueng
Vacuum, Vol: 107, No: , published: 01 September 2014
Microstructural characterization and failure mechanism of vacuum plasma sprayed Ti-6Al-4V/B4C composite
Mina Moradi, Maryam Moazeni, Hamid Reza Salimijazi
Vacuum, Vol: 107, No: , published: 01 September 2014
Physical characteristics of twin-wire indirect arc plasma
Chuanwei Shi, Yong Zou, Zengda Zou, Hui Zhang
Vacuum, Vol: 107, No: , published: 01 September 2014
A dome-shaped cavity type microwave plasma chemical vapor deposition reactor for diamond films deposition
J.J. Su, Y.F. Li, M.H. Ding, X.L. Li, Y.Q. Liu, G. Wang, W.Z. Tang
Vacuum, Vol: 107, No: , published: 01 September 2014
Microstructural characterization of high-quality indium tin oxide films deposited by thermionically enhanced magnetron sputtering at low temperature
Ying-Feng Lan, Ying-Hung Chen, Ju-Liang He, Jing-Tang Chang
Vacuum, Vol: 107, No: , published: 01 September 2014
Influence of combined gas and vacuum breakdown mechanisms on memory effect in nitrogen
Emilija N. Živanović
Vacuum, Vol: 107, No: , published: 01 September 2014
Arc characteristics and microstructure evolution of W–Cu contacts during the vacuum breakdown
Xin Wei, Demei Yu, Zhanbo Sun, Zhimao Yang, Xiaoping Song, Bingjun Ding
Vacuum, Vol: 107, No: , published: 01 September 2014
InOx thin films deposited by plasma assisted evaporation: Application in light shutters
E.G. Merino, G. Lavareda, P. Brogueira, A. Amaral, C. Nunes de Carvalho, P.L. Almeida
Vacuum, Vol: 107, No: , published: 01 September 2014
Microstructure and tribological properties of iron-based metallic glass coatings prepared by atmospheric plasma spraying
Yulong An, Guoliang Hou, Jie Chen, Xiaoqin Zhao, Guang Liu, Huidi Zhou, Jianmin Chen
Vacuum, Vol: 107, No: , published: 01 September 2014
Influence of hydrogen plasma thermal treatment on the properties of ZnO:Al thin films prepared by dc magnetron sputtering
M.V. Castro, M.F. Cerqueira, L. Rebouta, P. Alpuim, C.B. Garcia, G.L. Júnior, C.J. Tavares
Vacuum, Vol: 107, No: , published: 01 September 2014
Unlocking the potential of voltage control for high rate zirconium and hafnium oxide deposition by reactive magnetron sputtering
Martynas Audronis, Allan Matthews, Kęstutis Juškevičius, Ramutis Drazdys
Vacuum, Vol: 107, No: , published: 01 September 2014
Non-Thermal Plasmas for VOCs Abatement
Gang Xiao,Weiping Xu, Rongbing Wu, Mingjiang Ni, Changming Du, Xiang Gao, Zhongyang Luo, Kefa Cen
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Hydrogen Peroxide Production in an Atmospheric Pressure RF Glow Discharge: Comparison of Models and Experiments
C. A. Vasko, D. X. Liu, E. M. van Veldhuizen, F. Iza, P. J. Bruggeman
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Comparison of Aluminium Nanostructures Created by Discharges in Various Dielectric Liquids
Ahmad Hamdan, Cédric Noël, Jaafar Ghanbaja, Thierry Belmonte
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Performance Evaluation of Hybrid Gas–Liquid Pulse Discharge Plasma-Induced Degradation of Polyvinyl Alcohol-Containing Wastewater
Tiecheng Wang, Tianzhuo Ma, Guangzhou Qu, Dongli Liang, Shibin Hu
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Plasma-Induced Synthesis of CuO Nanofibers and ZnO Nanoflowers in Water
Xiulan Hu, Xin Zhang, Xiaodong Shen, Hongtao Li, Osamu Takai, Nagahiro Saito
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Plasma-Catalytic Oxidation of Toluene on MnxOy at Atmospheric Pressure and Room Temperature

Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Plasma Characteristics and Plasma-Feedstock Interaction Under PS-PVD Process Conditions
Georg Mauer
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Low-Pressure Plasma Reactor with a Cylindrical Electrode for Eco-friendly Processing in the Semiconductor Industry
J. O. Lee, W. S. Kang, Y.-H. Song
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Response of Linear, Branched or Crosslinked Polyethylene Structures on the Attack of Oxygen Plasma
R. Mix, J. F. Friedrich, D. Neubert, N. Inagaki
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Chemical Investigation on Various Aromatic Compounds Polymerization in Low Pressure Helium Plasma
Mihai Asandulesa, Ionut Topala, Yves-Marie Legrand, Stephanie Roualdes, Vincent Rouessac, Valeria Harabagiu
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
Decomposition of Acetaldehyde Using an Electron Beam
Youn-Suk Son, Junghwan Kim, Jo-Chun Kim
Plasma Chem. Plasma Process., Vol: 34, No: 5 , published: 01 September 2014
An Experimental and Analytical Study of an Asymmetric Capacitively Coupled Plasma Used for Plasma Polymerization
Andrew Michelmore, Jason D. Whittle, Robert D. Short, Rod W. Boswell, Christine Charles
Plasma Processes and Polymers, Vol: 11, No: 9 , published: 01 September 2014
Atmospheric Pressure Gas–Liquid Diffuse Nanosecond Pulse Discharge Used for Sterilization in Sewage
De-Zheng Yang, Li Jia, Wen-Chun Wang, Sen Wang, Peng-Chao Jiang, Shuai Zhang, Qing-Xu Yu, Guang-Liang Chen
Plasma Processes and Polymers, Vol: 11, No: 9 , published: 01 September 2014
Approaches to Quantify Amine Groups in the Presence of Hydroxyl Functional Groups in Plasma Polymerized Thin Films
Juan-Carlos Ruiz, Shima Taheri, Andrew Michelmore, David E. Robinson, Robert D. Short, Krasimir Vasilev, Renate Förch
Plasma Processes and Polymers, Vol: 11, No: 9 , published: 01 September 2014
Decontamination of Bacteria by Gas-Liquid Gliding Arc Discharge: Application to (Escherichia~coli)
Du C., Tang J., Mo J., Ma D., Wang J., Wang K., Zeng Y.
IEEE Trans. Plasma Sci., Vol: 42, No: 9 , published: 01 September 2014
Multiple Voltage Driving Method for Reducing Invalid Power Caused by Unlighted Lines in PDPs
Wang Y., Liang Z., Zhang X., Liu C.
IEEE Trans. Plasma Sci., Vol: 42, No: 9 , published: 01 September 2014
Membrane Heating in Living Tissues Exposed to Nonthermal Pulsed EM Fields
Pierro V., De Vita A., Croce R.P., Pinto I.M.
IEEE Trans. Plasma Sci., Vol: 42, No: 9 , published: 01 September 2014
Совместное функционирование магнетронной распылительной системы и ионного источника на основе торцевого холловского ускорителя
Голосов Д.А., Eungsun Byon, Завадский С.М.
Ж. техн. физ., Vol: 84, No: 9 , published: 01 September 2014
Dry etching characteristics of TiO2 thin films using inductively coupled plasma for gas sensing
I. Hotovy, S. Hascik, M. Gregor, V. Rehacek, M. Predanocy, A. Plecenik
Vacuum, Vol: 107, No: , published: 01 September 2014
Etching and Post-Treatment Surface Stability of Track-Etched Polycarbonate Membranes by Plasma Processing Using Various Related Oxidizing Plasma Systems
Brendan D. Tompkins, Jordan M. Dennison, Ellen R. Fisher
Plasma Processes and Polymers, Vol: 11, No: 9 , published: 01 September 2014
Plasma and laser treatment of PMP for biocompatibility improvement
I. Michaljaničová, P. Slepička, N. Slepičková Kasálková, P. Sajdl, V. Švorčík
Vacuum, Vol: 107, No: , published: 01 September 2014
Duplex treatment of AISI 1045 steel by plasma nitriding and aluminizing
Farahnaz Haftlang, Ali Habibolahzadeh, Mahmoud Heydarzadeh Sohi
Vacuum, Vol: 107, No: , published: 01 September 2014
An Efficient and Specific Protection of Non-Thermal Plasma-Induced Live Yeast Cell Derivative (LYCD) for Cells against Plasma Damage
Ruonan Ma, Hongqing Feng, Jinsong Guo, Yongdong Liang, Qian Zhang, Ying Tian, Jue Zhang, Jing Fang
Plasma Processes and Polymers, Vol: 11, No: 9 , published: 01 September 2014
Supplementing Cold Plasma with Heat Enables Doping and Nano-Structuring of Metal Oxides
David Rubín de Celis, Zhiqiang Chen, Md Mohklesur Rahman, Tao Tao, Dougal G. McCulloch, Matthew R. Field, Peter R. Lamb, Ying Chen, Xiujuan J. Dai
Plasma Processes and Polymers, Vol: 11, No: 9 , published: 01 September 2014
Plasma Deposition of Thermo-Responsive Thin Films from N-Vinylcaprolactam
Maryline Moreno-Couranjou, Fabio Palumbo, Eloisa Sardella, Gilles Frache, Pietro Favia,  Patrick Choquet
Plasma Processes and Polymers, Vol: 11, No: 9 , published: 01 September 2014
Tribological Properties and Characterization of Diamond Like Carbon Coatings Deposited by MW/RF and RF Plasma-Enhanced CVD Method on Poly(ether-ether-ketone)
Witold Kaczorowski, Witold Szymanski, Damian Batory, Piotr Niedzielski
Plasma Processes and Polymers, Vol: 11, No: 9 , published: 01 September 2014
Excitation temperature of a solution plasma during nanoparticle synthesis
Genki Saito, Yuki Nakasugi, Tomohiro Akiyama
J. Appl. Phys. , Vol: 116, No: 8 , published: 28 August 2014
Effects of Zr addition on properties and vacuum arc characteristics of Cu-W alloy
Xiaohong Yang, Juntao Zou, Peng Xiao, Xianhui Wang
Vacuum, Vol: 106, No: , published: 01 August 2014
Carbon–ZnO nanocomposite thin films for enhanced electron field emission characteristics prepared by continuous wave CO2 laser ablation
Vishakha Kaushik, A.K. Shukla, V.D. Vankar
Vacuum, Vol: 106, No: , published: 01 August 2014
Deposition and characterization of Ti–Cx–Ny nanocomposite films by pulsed bias arc ion plating
Lin Zhang, Guojia Ma, Guoqiang Lin, He Ma, Kechang Han, Haiyong Liu
Vacuum, Vol: 106, No: , published: 01 August 2014
Low temperature plasma biomedicine: A tutorial reviewa)
David B. Graves
Phys. Plasmas, Vol: 21, No: 8 , published: 01 August 2014
Cell immobilization on polymer by air atmospheric pressure plasma jet treatment
Jung-Hwan Lee, Jae-Sung Kwon, Ji-yeon Om, Yong-Hee Kim, Eun-Ha Choi, Kwang-Mahn Kim, Kyoung-Nam Kim
Jpn. J. Appl. Phys., Vol: 53, No: 8 , published: 01 August 2014
Surface properties of ZrO2 thin film under Cl2/Ar plasma using angle-resolved X-ray photoelectron spectroscopy
Jong-Chang Woo, Chang-Auck Choi, Woo-Seok Yang, Yoon-Soo Chun, Chang-Il Kim
Jpn. J. Appl. Phys., Part 4 , Vol: 53, No: 8S3 , published: 01 August 2014
Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase during hollow cathode reactive ion etching plasma
L.L. Tezani, R.S. Pessoa, H.S. Maciel, G. Petraconi
Vacuum, Vol: 106, No: , published: 01 August 2014
Controlling ion fluxes during reactive sputter-deposition of SnO2:F
Timo Jäger, Yaroslav E. Romanyuk, Ayodhya N. Tiwari, André Anders
J. Appl. Phys. , Vol: 116, No: 3 , published: 21 July 2014
Surface loss probability of atomic hydrogen for different electrode cover materials investigated in H2-Ar low-pressure plasmas
M. Sode, T. Schwarz-Selinger, W. Jacob, H. Kersten
J. Appl. Phys. , Vol: 116, No: 1 , published: 07 July 2014
Mechanisms of sputtering of nanoparticles embedded into solid matrix by energetic ion bombardment
B.L. Oksengendler, F.G. Djurabekova, S.E. Maksimov, N.Yu. Turaev, N.N. Turaeva
Vacuum, Vol: 105, No: , published: 01 July 2014
Defect clustering in irradiation of GaN by single and molecular ions
M.W. Ullah, A. Kuronen, F. Djurabekova, K. Nordlund, A.I. Titov, P.A. Karaseov
Vacuum, Vol: 105, No: , published: 01 July 2014
Ion-photon emission under ion bombardment of garnet structures of different composition
N.A. Azarenkov, I.A. Afanas'eva, V.V. Bobkov, V.V. Gritsyna, V.T. Gritsyna, A.A. Peretyatko, D.A. Ryzhov, D.I. Shevchenko
Vacuum, Vol: 105, No: , published: 01 July 2014
Martensite transformation induced by plasma nitrocarburizing on AISI304 austenitic stainless steel
H.T. Chen, M.F. Yan, S.S. Fu
Vacuum, Vol: 105, No: , published: 01 July 2014
GeS2 and GeSe2 PECVD from GeCl4 and Various Chalcogenide Precursors
Patrick J. Whitham, Dennis P. Strommen, Sandra Lundell, Lisa D. Lau, Rene Rodriguez
Plasma Chem. Plasma Process., Vol: 34, No: 4 , published: 01 July 2014
Production and Characterization of Ag Nanoclusters Produced by Plasma Gas Condensation
Noora Kristiina Manninen, Nuno Miguel Figueiredo, Sandra Carvalho, Albano Cavaleiro
Plasma Processes and Polymers, Vol: 11, No: 7 , published: 01 July 2014
Numerical Simulation on the Production of Reactive Oxygen Species in Atmospheric Pulse-Modulated RF Discharges with He/O2 Mixtures
Yuan-Tao Zhang, Yang-Yang Chi, Jin He
Plasma Processes and Polymers, Vol: 11, No: 7 , published: 01 July 2014
Bio-Inspired Nanopatterned Polymer Adhesive: A Novel Elaboration Method and Performance Study
Maryline Moreno-Couranjou, Nicolas Blondiaux, Raphaël Pugin, Vincent Le Houerou, Christian Gauthier, Elmar Kroner, Patrick Choquet
Plasma Processes and Polymers, Vol: 11, No: 7 , published: 01 July 2014
Redox-Based Assay for Assessment of Biological Impact of Plasma Treatment
Kristian Wende, Stephan Reuter, Thomas von Woedtke, Klaus-Dieter Weltmann, Kai Masur
Plasma Processes and Polymers, Vol: 11, No: 7 , published: 01 July 2014
Incorporation of Fluorescent Dyes in Atmospheric Pressure Plasma Coatings for In-Line Monitoring of Coating Homogeneity
Wesley Somers, Marjorie F. Dubreuil, Erik C. Neyts, Dirk Vangeneugden, Annemie Bogaerts
Plasma Processes and Polymers, Vol: 11, No: 7 , published: 01 July 2014
Effect of Plasma Modification of Copper Nanoparticles on their Antibacterial Properties
Maribel Navarro-Rosales, Carlos Alberto Ávila-Orta, María Guadalupe Neira-Velázquez, Hortensia Ortega-Ortiz, Ernesto Hernández-Hernández, Silvia Guadalupe Solís-Rosales, Beatriz Liliana España-Sánchez, Pablo Gónzalez-Morones, Rosa Martha Jímenez-Barrera, Saúl Sánchez-Valdes, Pascual Bartólo-Pérez
Plasma Processes and Polymers, Vol: 11, No: 7 , published: 01 July 2014
Tailoring Carbon Nanotubes Surface for Gene Delivery Applications
Anna Cifuentes-Rius, Ana de Pablo, Victor Ramos-Pérez,  Salvador Borrós
Plasma Processes and Polymers, Vol: 11, No: 7 , published: 01 July 2014
Деградация вольфрама в результате воздействия плазменной струи
Воронин А.В., Судьенков Ю.В., Семенов Б.Н., Атрошенко С.А., Наумова Н.С.
Ж. техн. физ., Vol: 84, No: 7 , published: 01 July 2014
Attenuation of wall disturbances in an electron cyclotron resonance oxygen–argon plasma using real time control
Bernard Keville, Cezar Gaman, Yang Zhang, Anthony M. Holohan, Miles M. Turner, Stephen Daniels
J. Vac. Sci. Technol., A, Vol: 32, No: 4 , published: 01 July 2014
Синтез углеродных нанотрубок в плазмоструйном реакторе в присутствии катализаторов
Амиров Р.Х., Исакаев Э.Х., Шавелкина М.Б., Шаталова Т.Б.
Успехи прикл. физ., Vol: 2, No: 4 , published: 01 July 2014
Инактивация микроорганизмов в холодной аргоновой плазме атмосферного давления
Семенов А.П., Балданов Б.Б., Ранжуров Ц.В., Норбоев Ч.Н., Намсараев Б.Б., Дамбаев В.Б., Гомбоева С.В., Абидуева Л.Р.
Успехи прикл. физ., Vol: 2, No: 4 , published: 01 July 2014
Mitigation of energetic ion debris from Gd plasma using dual laser pulses and the combined effect with ambient gas
Dou Yin-Ping (窦银萍), Sun Chang-Kai (孙长凯), Liu Chao-Zhi (刘超智), Gao Jian (高 健), Hao Zuo-Qiang (郝作强), Lin Jing-Quan (林景全)
Chin. Phys. B, Vol: 23, No: 7 , published: 01 July 2014
Atmospheric pressure plasma jet utilizing Ar and Ar/H2O mixtures and its applications to bacteria inactivation
Cheng Cheng (程 诚), Shen Jie (沈 洁), Xiao De-Zhi (肖德志), Xie Hong-Bing (谢洪兵), Lan Yan (兰 彦), Fang Shi-Dong (方世东), Meng Yue-Dong (孟月东), Chu Paul K (朱剑豪)
Chin. Phys. B, Vol: 23, No: 7 , published: 01 July 2014
Threshold and criterion for ion track etching in SiO2 layers grown on Si
L.A. Vlasukova, F.F. Komarov, V.N. Yuvchenko, W. Wesch, E. Wendler, A.Yu. Didyk, V.A. Skuratov, S.B. Kislitsin
Vacuum, Vol: 105, No: , published: 01 July 2014
Tunable periodic graphene antidot lattices fabricated by e-beam lithography and oxygen ion etching
L.Z. Liu, S.B. Tian, Y.Z. Long, W.X. Li, H.F. Yang, J.J. Li, C.Z. Gu
Vacuum, Vol: 105, No: , published: 01 July 2014
Anisotropic Ta2O5 waveguide etching using inductively coupled plasma etching
Muhammad Firdaus A. Muttalib, Ruiqi Y. Chen, Stuart J. Pearce, Martin D. B. Charlton
J. Vac. Sci. Technol., A, Vol: 32, No: 4 , published: 01 July 2014
Surface Analysis of Titanium Cleaning and Activation Processes: Non-thermal Plasma Versus Other Techniques
Pieter Cools, Nathalie De Geyter, Els Vanderleyden, Peter Dubruel, Rino Morent
Plasma Chem. Plasma Process., Vol: 34, No: 4 , published: 01 July 2014
Low-Pressure Plasma Treatment of Polylactide Fibers for Enhanced Mechanical Performance of Fiber-Reinforced Calcium Phosphate Cements
Cristina Canal, Sara Gallinetti, Maria-Pau Ginebra
Plasma Processes and Polymers, Vol: 11, No: 7 , published: 01 July 2014
Low-temperature damage formation in ion-implanted SiC and its correlation with primary energy deposition
E. Wendler, M. Schilling, L. Wendler
Vacuum, Vol: 105, No: , published: 01 July 2014
Effect of Plasma Deposition Using Low-Power/Non-thermal Atmospheric Pressure Plasma on Promoting Adhesion of Composite Resin to Enamel
Geum-Jun Han, Jae-Hoon Kim, Sung-No Chung, Bae-Hyeock Chun, Chang-Keun Kim, Byeong-Hoon Cho
Plasma Chem. Plasma Process., Vol: 34, No: 4 , published: 01 July 2014
Numerical Modeling of Thin Film Deposition in Expanding Thermal Plasma
Anindya Kanti De, Subrata Pal, G. Thirupathi, Richa Khandelwal, Anand Biswas, Thomas Miebach, Steven M. Gasworth
Plasma Chem. Plasma Process., Vol: 34, No: 4 , published: 01 July 2014
Atomized Spray Plasma Deposition of Structurally Well-Defined Bioactive Coatings
T. J. Wood, P. S. Brown, J. P. S. Badyal
Plasma Chem. Plasma Process., Vol: 34, No: 4 , published: 01 July 2014
Power coupling and utilization efficiencies of silicon-depositing plasmas in mixtures of H2, SiH4, Si2H6, and Si3H8
Mark A. Sobolewski, Robert G. Ridgeway, Mark D. Bitner, Dino Sinatore, Patrick T. Hurley
J. Vac. Sci. Technol., A, Vol: 32, No: 4 , published: 01 July 2014
An integrated Mach–Zehnder interferometric biosensor with a silicon oxynitride waveguide by plasma-enhanced chemical vapor deposition
Sung Joong Choo, Jinsik Kim, Kyung Woon Lee, Dong Ho Lee, Hyun-Joon Shin, Jung Ho Park
Curr. Appl Phys., Vol: 14, No: 7 , published: 01 July 2014
Understanding plasma catalysis through modelling and simulation—a review
E. C. Neyts, A. Bogaerts
J. Phys. D: Appl. Phys., Vol: 47, No: 22 , published: 04 June 2014
Plasma–catalyst coupling for volatile organic compound removal and indoor air treatment: a review
F. Thevenet, L. Sivachandiran, O. Guaitella, C. Barakat, A. Rousseau
J. Phys. D: Appl. Phys., Vol: 47, No: 22 , published: 04 June 2014
Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium
C. Maszl, W. Breilmann, J. Benedikt, A. von Keudell
J. Phys. D: Appl. Phys., Vol: 47, No: 22 , published: 04 June 2014
The effect of surface reactions of O, O3 and N on film properties during the growth of silica-like films
K. Rügner, R. Reuter, A. von Keudell, J. Benedikt
J. Phys. D: Appl. Phys., Vol: 47, No: 22 , published: 04 June 2014
Plasma–surface interaction during low pressure microcrystalline silicon thin film growth
J. Palmans, W. M. M. Kessels, M. Creatore
J. Phys. D: Appl. Phys., Vol: 47, No: 22 , published: 04 June 2014
Molecular dynamics simulations of clusters and thin film growth in the context of plasma sputtering deposition
Lu Xie, Pascal Brault, Jean-Marc Bauchire, Anne-Lise Thomann, Larbi Bedra
J. Phys. D: Appl. Phys., Vol: 47, No: 22 , published: 04 June 2014
Dual Discharge Modes Operation of an Argon Plasma Generated by Commercial Electronic Ballast for Remote Plasma Removal Process
Cho T.S., Sen Y., Bokka R., Park S., Lubomirsky D., Venkataraman S.
IEEE Trans. Plasma Sci. Pt 2, Vol: 42, No: 6 , published: 01 June 2014
Optimization of Cyclopropylamine Plasma Polymerization toward Enhanced Layer Stability in Contact with Water
Anton Manakhov, Lenka Zajíčková, Marek Eliáš, Jan Čechal, Josef Polčák, Jaroslav Hnilica, Štěpánka Bittnerová and David Nečas
Plasma Processes and Polymers, Vol: 11, No: 6 , published: 01 June 2014
Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture
Mohammed Belmahi, Simon Bulou, Amanda Thouvenin, Ludovic de Poucques, Robert Hugon, Laurent Le Brizoual, Patrice Miska, Damien Genève, Jean-Luc Vasseur and Jamal Bougdira
Plasma Processes and Polymers, Vol: 11, No: 6 , published: 01 June 2014
On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles
Rafael Alvarez, Jose M. Garcia-Martin, Maria C. Lopez-Santos, Victor Rico, Francisco J. Ferrer, Jose Cotrino, Agustin R. Gonzalez-Elipe and Alberto Palmero
Plasma Processes and Polymers, Vol: 11, No: 6 , published: 01 June 2014
Morphology Transformations of Platelets on Plasma Activated Surfaces
Martina Modic, Ita Junkar, Karin Stana-Kleinschek, Rok Kostanjšek and Miran Mozetič
Plasma Processes and Polymers, Vol: 11, No: 6 , published: 01 June 2014
A Detailed Description of the Chemistry of Thiol Supporting Plasma Polymer Films
Damien Thiry, Remy Francq, Damien Cossement, Maxime Guillaume, Jérôme Cornil and Rony Snyders
Plasma Processes and Polymers, Vol: 11, No: 6 , published: 01 June 2014
Characteristics of dual-frequency capacitively coupled SF6/O2 plasma and plasma texturing of multi-crystalline silicon
Xu Dong-Sheng (徐东升), Zou Shuai (邹 帅), Xin Yu (辛 煜), Su Xiao-Dong (苏晓东), Wang Xu-Sheng (王栩生)
Chin. Phys. B, Vol: 23, No: 6 , published: 01 June 2014
Self-Aligned Selective Emitter Formation Using Commercial Screen-Printed Contacts as a Plasma Etch Mask
Rahul Khandelwal, Horst Windgassen, Tobias Markus Pletzer and Heinrich Kurz
Plasma Processes and Polymers, Vol: 11, No: 6 , published: 01 June 2014
The Reinforcement Ability of Plasma-Etched Carbon Nanofibers on Mechanical Properties of C-Epoxy Composites
Killi Krushnamurty, Pappireddy Manoj Kumar Reddy, Ivaturi Srikanth, Pinnelli S. R. Prasad, Partha Ghosal and Challapalli Subrahmanyam
Plasma Processes and Polymers, Vol: 11, No: 6 , published: 01 June 2014
Plasma Treatments for Metallic Surface Modification to Obtain Highly Adherent Diamond-Like Carbon Coatings
Capote G., Trava-Airoldi V.J., Bonetti L.F.
IEEE Trans. Plasma Sci. Pt 2, Vol: 42, No: 6 , published: 01 June 2014
Surface Functionalization by Plasma Treatment and Click Chemistry of a New Family of Fluorinated Polymeric Materials for Microfluidic Chips
Yoann Ladner, Fanny D'Orlyé, Camille Perréard, Bradley Da Silva, Cédric Guyon, Michael Tatoulian, Sophie Griveau, Fethi Bedioui and Anne Varenne
Plasma Processes and Polymers, Vol: 11, No: 6 , published: 01 June 2014
Depyrogenation by the Flowing Afterglow of a Reduced-Pressure N2–O2 Discharge (Gaseous Plasma Treatment)
Pierre Levif, Jacynthe Séguin, Michel Moisan and Jean Barbeau
Plasma Processes and Polymers, Vol: 11, No: 6 , published: 01 June 2014
Photo-assisted etching of silicon in chlorine- and bromine-containing plasmas
Weiye Zhu, Shyam Sridhar, Lei Liu, Eduardo Hernandez, Vincent M. Donnelly, Demetre J. Economou
J. Appl. Phys. , Vol: 115, No: 20 , published: 28 May 2014
Microplasma assisted synthesis of gold nanoparticles mediated by ultrasound
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Shasha Zuo, Ruixue Wang, Jue Zhang, Jing Fang, Weidong Zhu
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
The glass-silicon-glass sandwich structured microplasma chip as the electron source of a micro mass spectrometer
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Jiali Tang, Xinhai Yu, Youxing Chen, Shan-Tung Tu, Zhengdong Wang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Electron emission from micro-architectured materials for plasma applications
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Raitses Y., Jin C.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Detection of powerful terahertz pulses with use of termoacoustic probe
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Vdovin V.A., Andreev V.G., Kalynov Y.K.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Design of a prototype Multi-Frequency Recirculating Planar Magnetron
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Greening G., Franzi M., Lau Y.Y., Jordan N., Gilgenbach R.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Microwave extraction in the recirculating planar magnetron
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Franzi M., Gilgenbach R.M., Greening G., Jordan N.M., Hoff B.W., Simon D., Lau Y.Y., Luginsland J.W.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Mechanisms for the effect of residual pressure on field emission in vacuum
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Almaksour K., Teste P., Kirkpatrick M.J., Dessante P., Odic E.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Novel approach for zinc oxide nanomaterials functionalization based on dry plasma processing
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Ciolan M.A., Motrescu I., Luca D., Nagatsu M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Microstructure and corrosion behaviors of XC48 treated by rf magnetron sputtering TiAlN alloying
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Madaoui N., Saoula N., Ait Djafer A.Z., Zerizer A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Simulation of a faceted magnetron using discrete modulated current sources
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Fernandez-Gutierrez S.A., Browning J., Smithe D., Ming-Chieh Lin, Watrous J.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Compact high-voltage, low-impedance nanosecond pulse generators for biomedical applications
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Jie Zhuang, Zocher K., Koch F., Kolb J.F., Yongdong Liang, Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Nanosecond pulsed electric fields induce intracellular oxidation
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Shan Wu, Bo Su, Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Plasma medicine: The advent of the plasma kill - plasma heal paradigm
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Laroussi M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
A short retrospective on the impact of dr Robert Barker on plasma science the magic users group and plasma simulation
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Ludeking L.D., Woods A.J.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Global modeling of hiPIMS systems: Transition from homogeneous to self organized discharges
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Gallian S., Trieschmann J., Mussenbrock T., Hitchon W.N.G., Brinkmann R.P.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Noble gas meta-stable state excitation using carbon nanotube fiber cathodes
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Lockwood N.P., Pitz G.A., Fairchild S.B., Lange M.A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Brillouin flow in recirculating planar magnetron
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Simon D.H., Lau Y.Y., Franzi M., Greening G., Gilgenbach R.M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Operation characteristics of a 12-cavity relativistic magnetron with diffraction output when considering secondary and backscattered electrons emission
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Liu M., Li B., Liu C., Schamiloglu E., Fuks M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Axial leakage current reduction in a 12-cavity rising-sun relativistic magnetron with a “F” transparent cathode
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Liu M., Li B., Liu C., Schamiloglu E., Fuks M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Rapid formation of distributed plasma discharges using X-band microwaves
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Xiang X., Carrigan P., Booske J., Scharer J.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Electrophysical methods of bacteriological disinfection of water medium
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Gurbanov E.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
A battery-operated atmospheric-pressure plasma wand for biomedical applications
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
XinPei Lu, XueKai Pei
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Volume processing of gas using two-dimensional microplasma arrays
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Yuanwei Wu, Hoskinson A.R., Hopwood J.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Crystallizing compound film on plastics by ion irradiation in plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Sakudo N., Ikenaga N., Matsui K., Sakumoto N., Kishi Y., Yajima Z.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Induction of apoptosis in human myeloid leukemia cells by remote exposure of resistive barrier cold plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Thiyagarajan M., Anderson H., Gonzales X.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Molecular dynamics simulations of cold atmospheric plasma interactions with lipid bilayers
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Brayfield R.S., Oroskar P., Hinkle K., Murad S., Grama A.Y., Garner A.L.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
RF plasma nanocoating of PEDOT onto chitosan powders for nanofiber applications
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Kiristi M., Bozduman F., Teke E., Oksuz A.U., Oksuz L.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Synergistic antibacterial effects of low temperature plasma combined with pulsed electric fields
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Qian Zhang, Jie Zhuang, von Woedtke T., Kolb J.F., Weltmann K.-D., Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
The electrophysiological effect of nanosecond pulsed electric fields on magnetic fluid hyperthermia to treat hela cells
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Shasha Zuo, Rui Zhang, Ruixue Wang, Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Plasma surface engineering of biomaterials
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Chu P.K.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Study of water treatment by using underwater pulsed discharge plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Sakugawa T., Akiyama H.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Modular microplasma ozone generators for water treatment system
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Jin Hoon Cho, Min Hwan Kim, Herring C.M., Sung-Jin Park, Eden J.G.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Rapid allergen inactivation using atmospheric pressure cold plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Yongdong Liang, Wei Li, Jue Zhang, Yan Wu, Wei Kai, Maosheng Yao
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Inactivation of newcastle disease virus by cold plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Guomin Wang, Qian Zhang, Jue Zhang, Ruihao Zhu, Licong Yang, Bing Yang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Crystallizing compound film on plastics by ion irradiation in plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Sakudo N., Ikenaga N., Matsui K., Sakumoto N., Kishi Y., Yajima Z.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Uniform deposition of zirconium dioxide layers by atmospheric-pressure plasma-enhanced chemical vapor deposition
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Jae-Ok Lee, Woo Seok Kang, Min Hur, Young-Hoon Song
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
In vitro anticancer activity of a novel compound from the physically engineered Candida albicans with nanosecond pulsed electric fields (nsPEFs)
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Jinsong Guo, Xiaohui Yang, Yuanyuan Han, Jie Li, Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Cell apoptosis induced by atmospheric pressure plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Yong Yang, Zilan Xiong, Fei Zou, XinPei Lu, Xu Yan, Shasha Zhao, Guangxiao Yang, Guangyuan He
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Induction of apoptosis in human myeloid leukemia cells by remote exposure of resistive barrier cold plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Thiyagarajan M., Anderson H., Gonzales X.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Molecular dynamics simulations of cold atmospheric plasma interactions with lipid bilayers
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Brayfield R.S., Oroskar P., Hinkle K., Murad S., Grama A.Y., Garner A.L.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Synergistic antibacterial effects of low temperature plasma combined with pulsed electric fields
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Qian Zhang, Jie Zhuang, von Woedtke T., Kolb J.F., Weltmann K.-D., Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Effects of growth medium treated by plasma pencil on the viability of scaber cancer cells
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Mohades S., Barekzi N., Razavi H., Laroussi M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
The electrophysiological effect of nanosecond pulsed electric fields on magnetic fluid hyperthermia to treat hela cells
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Shasha Zuo, Rui Zhang, Ruixue Wang, Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Millimeter-wave sintering of ceramics with applied pressure
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Fliflet A.W., Rock B.Y., Imam M.A.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Plasma surface engineering of biomaterials
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Chu P.K.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Study of water treatment by using underwater pulsed discharge plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Sakugawa T., Akiyama H.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Modular microplasma ozone generators for water treatment system
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Jin Hoon Cho, Min Hwan Kim, Herring C.M., Sung-Jin Park, Eden J.G.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Rapid allergen inactivation using atmospheric pressure cold plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Yongdong Liang, Wei Li, Jue Zhang, Yan Wu, Wei Kai, Maosheng Yao
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Inactivation of newcastle disease virus by cold plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Guomin Wang, Qian Zhang, Jue Zhang, Ruihao Zhu, Licong Yang, Bing Yang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
A novel nanosecond pulsed plasma brush for biomedical applications
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Lane J., Malik M., Edelblute C., Heller L., Schoenbach K., Chunqi Jiang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Surface functionalization of graphite-encapsulated gold nanoparticles for multiple biomedical applications using RF plasma
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Enbo Yang, Han Chou, Nagatsu M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Biological and chemical effects of water activated by cold plasma above and beneath the water surface
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Ying Tian, Ruonan Ma, Qian Zhang, Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Prolonged preservation and inactivation of surface-borne microorganisms of fresh fruits by non-thermal plasma activated water
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Ruonan Ma, Ying Tian, Jinsong Guo, Hongqing Feng, Jue Zhang, Jing Fang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Evaluation of cold plasma treatment and safety in disinfecting 21-day root canal enterococcus faecalis biofilm in vitro
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Yinglong Li, Guomin Wang, Jue Zhang, Jing Fang, Jie Pan, Weidong Zhu
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Simulation of a phase controlled magnetron using a modulated, addressabel cathode
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Browning J., Fernandez-Gutierrez S.A., Smithe D., Ming-Chieh Lin, Watrous J.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
A flat panel detector
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Panpan Zhang, Yan Tu, Lanlan Yang, Tolner H., Wei Zhang
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
A Flat Panel Detector
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Zhang P., Tu Y., Yang L., Tolner H., Zhang W.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Lithium wetting of stainless steel studied via scanning auger microscopy
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Skinner C.H., Capece A.M., Koel B.E., Roszell J.P.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Plasma processing of PET in an oxygen decoupled plasma source
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Brake M.L., Rhoton R.L.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Development anti-dairy fouling surface of 316L 2B stainless steel by atmospheric pressure plasma treatment
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Al-ogaili G., Jimenez M., Bellayer S., Nuns N., Allion A., Beaurain A., Ronse G., Delaplace G., Traisnel M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Optimization of two-dimensional grid electrode geometry for ballistic-mode plasma immersion ion implantation
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Changho Yi, Won Namkung, Moohyun Cho
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Modeling of an electron beam generated Ar-N2 Plasma for plasma processing
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Petrov G.M., Boris D.R., Petrova T.B., Lock E.H., Fernsler R.F., Walton S.G.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Optimization of dielectric barrier discharge reactors for high-speed surface treatment of polymer substrate
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Min Hur, Dong Joo Kim, Woo Seok Kang, Young-Hoon Song
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Atmospheric pressure resistive barrier low temperature plasma treatment for food industry
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Thiyagarajan M., Gonzales X.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
A genome-wide profilling of cell response mechanisms to non-thermal plasma treatment
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Hongqing Feng, Fangting Li, Ruonan Ma, Ying Tian, Jue Zhang, Jing Fang, Li-lin Du, Fang Suo, Weidong Zhu
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Effects of growth medium treated by plasma pencil on the viability of scaber cancer cells
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Mohades S., Barekzi N., Razavi H., Laroussi M.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Effect of pulse repetition on Pulsed Plasma Nitriding of AISI 4340 steel and its fatigue crack growth (FCG) and polarization studies
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Arul Mozhi Varman J.P., Balasubramanian M., Huchel U.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Atmospheric pressure resistive barrier low temperature plasma treatment for food industry
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Thiyagarajan M., Gonzales X.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
A genome-wide profilling of cell response mechanisms to non-thermal plasma treatment
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Hongqing Feng, Fangting Li, Ruonan Ma, Ying Tian, Jue Zhang, Jing Fang, Li-lin Du, Fang Suo, Weidong Zhu
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Multipactor coatings for sapphire windows using remote plasma assisted deposition
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Ives R.L., Marsden D., Collins G., Zeller D., Lucovsky G., Schamiloglu E.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Re-deposition of lithium and boron coatings under high-flux plasma bombardment at normal and grazing magnetic incidence
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Abrams T., Jaworski M.A., Kaita R., Nichols J.H., De Temmerman G., van den Berg M.A., van der Meiden H.J., Morgan T.W.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Behaviour of dispersed ceramic particles in DC arc plasma jet during the spray deposition of coatings
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Valincius V., Grigaitiene V., Kezelis R.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Deposition of antibacterial nanocomposite films using an atmospehric pressure nonequilibrium plasma jet
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Xiaolong Deng, Nikiforov A., Leys C.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Deposition of crystalline silicon thin films in electrically asymmetric capacitively coupled plasmas
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Schungel E., Schulze J., Mohr S., Hofmann R., Czarnetzki U.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Comparatively plasma deposition of PEDOT thin films
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Kiristi M., Bozduman F., Teke E., Uygun Oksuz A., Oksuz L.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Uniform deposition of zirconium dioxide layers by atmospheric-pressure plasma-enhanced chemical vapor deposition
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Jae-Ok Lee, Woo Seok Kang, Min Hur, Young-Hoon Song
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Effect of pulse repetition on Pulsed Plasma Nitriding of AISI 4340 steel and its fatigue crack growth (FCG) and polarization studies
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C
Arul Mozhi Varman J.P., Balasubramanian M., Huchel U.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Comparatively plasma deposition of PEDOT thin films
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Kiristi M., Bozduman F., Teke E., Uygun Oksuz A., Oksuz L.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Behaviour of dispersed ceramic particles in DC arc plasma jet during the spray deposition of coatings
41st IEEE International Conference on Plasma Science (ICOPS) and the 20th International Conference on High Power Particle Beams (BEAMS), 25 - 29 May 2014, U.S.A, Washington, D.C.
Valincius V., Grigaitiene V., Valatkevicius P.
IEEE NPSS (Nuclear and Plasma Sciences Society) Plasma Science and Applications (PSAC), Vol: 2014, No: , published: 25 May 2014
Hybrid model of atmospheric pressure Ar/O2/TiCl4 radio-frequency capacitive discharge for TiO2 deposition
A. Leblanc, Ke Ding, M. A. Lieberman, De Xin Wang, Jing Zhang, Jian Jun Shi
J. Appl. Phys. , Vol: 115, No: 18 , published: 14 May 2014
Structures, electrical and optical properties of nickel oxide films by radio frequency magnetron sputtering
Y. Zhao, H. Wang, C. Wu, Z.F. Shi, F.B. Gao, W.C. Li, G.G. Wu, B.L. Zhang, G.T. Du
Vacuum, Vol: 103, No: , published: 01 May 2014
Effects of nitrogen gas ratio on magnetron sputtering deposited boron nitride films
Chuanbin Wang, Xiaoshuang Luo, Song Zhang, Qiang Shen, Lianmeng Zhang
Vacuum, Vol: 103, No: , published: 01 May 2014
Studies on the use of the coaxial plasma bulb for enhanced wettability of aluminum and polymethylmethacrylate surfaces
Julie Anne S. Ting, Leo Mendel D. Rosario, Henry V. Lee Jr., Henry J. Ramos, Roy B. Tumlos, Reinhard V. Fischer
Vacuum, Vol: 103, No: , published: 01 May 2014
Microstructure, oxidation resistance, mechanical and tribological properties of Mo–Al–N films by reactive magnetron sputtering
Junhua Xu, Hongbo Ju, Lihua Yu
Vacuum, Vol: 103, No: , published: 01 May 2014
Characterization of Cu-doped Cd1−xZnxTe thin films sputtered from multiple targets
Zhe Zhu, Lili Wu, Wei Li, Lianghuan Feng, Jingquan Zhang, Wenwu Wang, Guanggen Zeng, Dan Leng
Vacuum, Vol: 103, No: , published: 01 May 2014
Performance characterization on a novel intermetallic layer produced by interdiffusion between Ti film and 5083 Al alloy
F.Y. Zhang, M.F. Yan
Vacuum, Vol: 103, No: , published: 01 May 2014
Plasma Processing and Polymers: A Personal Perspective
Michael R. Wertheimer
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Investigation of Electrode Phenomena in an Innovative Thermal Plasma Process for Glass Melting
Takayuki Watanabe, Yaping Liu, Manabu Tanaka
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Measurement of Reactive Hydroxyl Radical Species Inside the Biosolutions During Non-thermal Atmospheric Pressure Plasma Jet Bombardment onto the Solution
Yong Hee Kim, Young June Hong, Ku Youn Baik, Gi Chung Kwon, Jin Joo Choi, Guang Sup Cho, Han Sup Uhm, Do Young Kim, Eun Ha Choi
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Aerosol-Assisted Atmospheric Pressure Cold Plasma Deposition of Organic–Inorganic Nanocomposite Coatings
Fiorenza Fanelli, Francesco Fracassi
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Two-Dimensional Geometry Control of Graphene Nanoflakes Produced by Thermal Plasma for Catalyst Applications
J.-L. Meunier, N.-Y. Mendoza-Gonzalez, R. Pristavita, D. Binny, D. Berk
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Three-Dimensionally Integrated Micro-solution Plasma: Numerical Feasibility Study and Practical Applications
Tatsuru Shirafuji, Ayano Nomura, Yuta Himeno
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Self-Assembly in Silane/Hydrogen Plasmas: from Silicon Atoms to Aromatic Silicon Nanocrystals
Nancy C. Forero-Martinez, Ha-Linh Thi Le, Holger Vach
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Nanoengineered Plasma Polymer Films for Biomaterial Applications
Krasimir Vasilev
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Two-Temperature Chemical-Nonequilibrium Modelling of a High-Velocity Argon Plasma Flow in a Low-Power Arcjet Thruster
Hai-Xing Wang, Wei-Ping Sun, Su-Rong Sun, A. B. Murphy, Yiguang Ju
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Fundamentals and Environmental Applications of Non-thermal Plasmas: Multi-pollutants Emission Control from Coal-Fired Flue Gas
Shuran Li, Yifan Huang, Feifei Wang, Ji Liu, Fada Feng, Xinjun Shen, Qinzhen Zheng, Zhen Liu, Lihong Wang, Keping Yan
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Adhesion of Thin CVD Films on Pulsed Plasma Pre-Treated Polypropylene
Henrik Behm, Karim Bahroun, Hendrik Bahre, Dennis Kirchheim, Felix Mitschker, Nikita Bibinov, Marc Böke, Rainer Dahlmann, Peter Awakowicz, Christian Hopmann,  Jörg Winter
Plasma Processes and Polymers, Vol: 11, No: 5 , published: 01 May 2014
Bactericidal Agents Produced by Surface Micro-Discharge (SMD) Plasma by Controlling Gas Compositions
Jin Jeon, Tanja M. Rosentreter, Yangfang Li, Georg Isbary, Hubertus M. Thomas, Julia L. Zimmermann, Gregor E. Morfill,  Tetsuji Shimizu
Plasma Processes and Polymers, Vol: 11, No: 5 , published: 01 May 2014
Rapid Synthesis of Aqueous-Phase Magnetite Nanoparticles by Atmospheric Pressure Non-Thermal Microplasma and their Application in Magnetic Resonance Imaging
Ruixue Wang, Shasha Zuo, Weidong Zhu, Jue Zhang,  Jing Fang
Plasma Processes and Polymers, Vol: 11, No: 5 , published: 01 May 2014
Characterization of direct current He-N2 mixture plasma using optical emission spectroscopy and mass spectrometry
O. Flores, F. Castillo, H. Martinez, M. Villa, S. Villalobos, P. G. Reyes
Phys. Plasmas, Vol: 21, No: 5 , published: 01 May 2014
PLASMA-2013: International Conference on Research and Applications of Plasmas (Warsaw, Poland, 2–6 September 2013)
Marek J. Sadowski
Phys. scr., Vol: 2014, No: T161 , published: 01 May 2014
Computational modelling of discharges within the impulse plasma deposition accelerator with a gas valve
Marek Rabiński, Rafał Choduń, Katarzyna Nowakowska-Langier, Krzysztof Zdunek
Phys. scr., Vol: 2014, No: T161 , published: 01 May 2014
The employment of a high density plasma jet for the investigation of thermal protection materials
R. Kezelis, V. Grigaitiene, R. Levinskas, K. Brinkiene
Phys. scr., Vol: 2014, No: T161 , published: 01 May 2014
Deposition and optimization of thin lead layers for superconducting accelerator photocathodes
Jerzy Lorkiewicz, Robert Nietubyć, Marek Barlak, Robert Mirowski, Andrzej Bartnik, Jerzy Kostecki, Jacek Sekutowicz, Aneta Malinowska, Peter Kneisel, Jan Witkowski
Phys. scr., Vol: 2014, No: T161 , published: 01 May 2014
Особенности лазерной сварки молибденового сплава и металлографические исследования сварных соединений
Успенский С.А., Петровский В.Н., Джумаев П.С., Польский В.И., Прокопова Н.М.
Ядерная физика и инжиниринг, Vol: 5, No: 3 , published: 01 May 2014
Effect of surface derived hydrocarbon impurities on Ar plasma properties
Nick Fox-Lyon, Gottlieb S. Oehrlein, Valery Godyak
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Comparative study of GaN mesa etch characteristics in Cl2 based inductively coupled plasma with Ar and BCl3 as additive gases
Dipendra Singh Rawal, Henika Arora, Bhupender Kumar Sehgal, Rangarajan Muralidharan
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Синтез углеродных нанотрубок в плазмоструйном реакторе в присутствии катализаторов
Амиров Р.Х., Исакаев Э.Х., Шавелкина М.Б., Шаталова Т.Б.
Успехи прикл. физ., Vol: 2, No: 3 , published: 01 May 2014
Инактивация микроорганизмов в холодной аргоновой плазме атмосферного давления
Семенов А.П., Балданов Б.Б., Ранжуров Ц.В., Норбоев Ч.Н., Намсараев Б.Б., Дамбаев В.Б., Гомбоева С.В., Абидуева Л.Р.
Успехи прикл. физ., Vol: 2, No: 3 , published: 01 May 2014
Воздействие низкотемпературной аргоновой плазмы слаботочных высоковольтных разрядов на микроор-ганизмы
Семенов А.П., Балданов Б.Б., Ранжуров Ц.В., Норбоев Ч.Н., Намсараев Б.Б., Дамбаев В.Б., Гомбоева С.В., Абидуева Л.Р.
Прикл. физ., Vol: 2014, No: 3 , published: 01 May 2014
Plasma Processing Based Synthesis of Functional Nanocarbons
Rikizo Hatakeyama, Toshiaki Kato, Yongfeng Li, Toshiro Kaneko
Plasma Chem. Plasma Process., Vol: 34, No: 3 , published: 01 May 2014
Precision plasma etching of Si, Ge, and Ge:P by SF6 with added O2
Chalermwat Wongwanitwattana, Vishal A. Shah, Maksym Myronov, Evan H. C. Parker, Terry Whall, David R. Leadley
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Observation of radio frequency ring-shaped hollow cathode discharge plasma with MgO and Al electrodes for plasma processing
Yasunori Ohtsu, Naoki Matsumoto
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Effect of NH3/N2 ratio in plasma treatment on porous low dielectric constant SiCOH materials
Jun-Fu Huang, Tain-Cih Bo, Wei-Yuan Chang, Yu-Min Chang, Jihperng Leu, Yi-Lung Cheng
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Low-temperature growth of gallium nitride films by inductively coupled-plasma-enhanced reactive magnetron sputtering
Chih-Jui Ni, Franklin Chau-Nan Hong
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
An Insight into Grain Refinement Mechanism of Ultrananocrystalline Diamond Films Obtained by Direct Current Plasma-Assisted Chemical Vapor Deposition
Hak-Joo Lee, Jung-Min Cho, Inho Kim, Seung-Cheol Lee, Jong-Keuk Park, Young-Joon Baik,  Wook-Seong Lee
Plasma Processes and Polymers, Vol: 11, No: 5 , published: 01 May 2014
Effect of Catalyst Deactivation on Kinetics of Plasma-Catalysis for Methanol Decomposition
Dae Hoon Lee, Taegyu Kim
Plasma Processes and Polymers, Vol: 11, No: 5 , published: 01 May 2014
An Innovative Pathway towards Nano-Sized Parylene-Based Materials Prepared by Plasma-Based Deposition: Example of Application to the Production of Antimicrobial Materials
Gianluigi Maggioni, Ignazio Castagliuolo
Plasma Processes and Polymers, Vol: 11, No: 5 , published: 01 May 2014
Influence of Deposition Conditions on Structure and Aging of C:H:O Plasma Polymer Films Prepared from Acetone/CO2 Mixtures
Martin Drabik, Jaroslav Kousal, Coralie Celma, Patrick Rupper, Hynek Biederman, Dirk Hegemann
Plasma Processes and Polymers, Vol: 11, No: 5 , published: 01 May 2014
Influence of plasma density on the chemical composition and structural properties of pulsed laser deposited TiAlN thin films
J. G. Quiñones-Galván, Enrique Camps, S. Muhl, M. Flores, E. Campos-González
Phys. Plasmas, Vol: 21, No: 5 , published: 01 May 2014
On coating adhesion during impulse plasma deposition
Katarzyna Nowakowska-Langier, Krzysztof Zdunek, Rafal Chodun, Sebastian Okrasa, Roch Kwiatkowski, Karol Malinowski, Elzbieta Składnik-Sadowska,  Marek J. Sadowski
Phys. scr., Vol: 2014, No: T161 , published: 01 May 2014
Influence of pulse power amplitude on plasma properties and film deposition in high power pulsed plasma enhanced chemical vapor deposition
Daniel Lundin, Jens Jensen, Henrik Pedersen
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Atmospheric-pressure low-temperature plasma processes for thin film deposition
Hiroaki Kakiuchi, Hiromasa Ohmi, Kiyoshi Yasutake
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
Micheal Burke, Alan Blake, Ian M. Povey, Michael Schmidt, Nikolay Petkov, Patrick Carolan, Aidan J. Quinn
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Optical characteristics of nanocrystalline AlxGa1−xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
Eda Goldenberg, Cagla Ozgit-Akgun, Necmi Biyikli, Ali Kemal Okyay
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
Ki-Moon Jeon, Jae-Su Shin, Ju-Young Yun, Sang Jun Lee, Sang-Woo Kang
J. Vac. Sci. Technol., A, Vol: 32, No: 3 , published: 01 May 2014
Nano-composite Si particle formation by plasma spraying for negative electrode of Li ion batteries
M. Kambara, A. Kitayama, K. Homma, T. Hideshima, M. Kaga, K.-Y. Sheem, S. Ishida, T. Yoshida
J. Appl. Phys. , Vol: 115, No: 14 , published: 14 April 2014
Up-conversion fluorescence characteristics and mechanism of Er3+-doped TiO2 thin films
Xinguang Mao, Bingxi Yan, Jun Wang, Jie Shen
Vacuum, Vol: 102, No: , published: 01 April 2014
Investigation of low resistance transparent F-doped SnO2/Cu bi-layer films for flexible electronics
S. Yu, L. Li, W. Zhang, H. Dong, D. Xu, Y. Jin
Vacuum, Vol: 102, No: , published: 01 April 2014
New Advances in Plasma Technology for Textile
Sheila Shahidi, Mahmood Ghoranneviss, Bahareh Moazzenchi
J. Fusion Energy, Vol: 33, No: 2 , published: 01 April 2014
Flame Retardant Properties of Plasma Pretreated/Metallic Salt Loaded Cotton Fabric Before and After Direct Dyeing
Mahmood Ghoranneviss, Sheila Shahidi
J. Fusion Energy, Vol: 33, No: 2 , published: 01 April 2014
Role of the Charged Particles in Bacteria Inactivation by Plasma of a Positive and Negative Corona in Ambient Air
Elena Sysolyatina, Andrey Mukhachev, Maria Yurova, Michael Grushin, Vladimir Karalnik, Alexander Petryakov, Nikolay Trushkin, Svetlana Ermolaeva, Yuri Akishev
Plasma Processes and Polymers, Vol: 11, No: 4 , published: 01 April 2014
About the Influence of Double Bonds in the APPECVD of Acrylate-Like Precursors: A Mass Spectrometry Study of the Plasma Phase
Bernard Nisol, Grégory Arnoult, Thomas Bieber, Alexandros Kakaroglou, Iris De Graeve, Guy Van Assche, Herman Terryn, François Reniers
Plasma Processes and Polymers, Vol: 11, No: 4 , published: 01 April 2014
Differential Sensitivity of Mammalian Cell Lines to Non-Thermal Atmospheric Plasma
Mariam Naciri, Denis Dowling, Mohamed Al-Rubeai
Plasma Processes and Polymers, Vol: 11, No: 4 , published: 01 April 2014
A dc plasma source for plasma–material interaction experiments
T. S. Matlock, D. M. Goebel, R. Conversano, R. E. Wirz
Plasma Sources Sci. and Technol., Vol: 23, No: 2 , published: 01 April 2014
On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics
Chunqing Huo, Daniel Lundin, Michael A Raadu, André Anders, Jon Tomas Gudmundsson, Nils Brenning
Plasma Sources Sci. and Technol., Vol: 23, No: 2 , published: 01 April 2014
The effects of total gas pressure and Xe partial pressure on the properties of plasma display panels with two-opposite-electrode cells
Jung-Woo Ok, Byoung-Seob Lee, Seyong Choi, Mi-Sook Won, Dong-Hyun Kim, Hae June Lee, Ho-Jun Lee
Plasma Sources Sci. and Technol., Vol: 23, No: 2 , published: 01 April 2014
Parallel 2D Axisymmetric Fluid Modeling of CF4 Discharge in an Inductively Coupled Plasma Source During SiO2 Etching
Yuan-Ming Chiu, Chung-Hua Chiang, Chieh-Tsan Hung, Meng-Hua Hu, Jong-Shinn Wu, Feng-Nan Hwang
Plasma Processes and Polymers, Vol: 11, No: 4 , published: 01 April 2014
Effects of the surface oxide layer on platelet growth in H2+-implanted Si
B.S. Li, Z.G. Wang
Vacuum, Vol: 102, No: , published: 01 April 2014
Strip hollow cathode method for plasma thermochemical treatment for surface modification of thin metal strips: Plasma nitriding of austenitic stainless steel sheets for bipolar plates
K. Nikolov, K. Köster, P. Kaestner, G. Bräuer, C.-P. Klages
Vacuum, Vol: 102, No: , published: 01 April 2014
Enhanced Antibacterial Activity of Melt Processed Poly(propylene) Ag and Cu Nanocomposites by Argon Plasma Treatment
Beatriz L. España-Sánchez, Carlos A. Ávila-Orta, Felipe Padilla-Vaca, María G. Neira-Velázquez, Pablo González-Morones, José A. Rodríguez-González, Ernesto Hernández-Hernández, Ángeles Rangel-Serrano, Enrique Díaz Barriga-C., Luis Yate, Ronald F. Ziolo
Plasma Processes and Polymers, Vol: 11, No: 4 , published: 01 April 2014
Atmospheric Pressure Plasma Deposition of Poly Lactic Acid-Like Coatings with Embedded Elastin
Gabriella Da Ponte, Eloisa Sardella, Fiorenza Fanelli, Sabine Paulussen, Pietro Favia
Plasma Processes and Polymers, Vol: 11, No: 4 , published: 01 April 2014
Dynamics of pulsed reactive RF discharges in response to thin film deposition
B. Sikimić, I. Stefanović, I. B. Denysenko, J. Winter, N. Sadeghi
Plasma Sources Sci. and Technol., Vol: 23, No: 2 , published: 01 April 2014
Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
Sanghun Lee, Hagyoung Choi, Seokyoon Shin, Joohyun Park, Giyul Ham, Hyunsoo Jung, Hyeongtag Jeon
Curr. Appl Phys., Vol: 14, No: 4 , published: 01 April 2014
Synthesis of nonstoichiometric titanium oxide nanoparticles using discharge in HCl solution
Yuki Nakasugi, Genki Saito, Toru Yamashita, Tomohiro Akiyama
J. Appl. Phys. , Vol: 115, No: 12 , published: 28 March 2014
Optical emission spectroscopy of microwave-plasmas at atmospheric pressure applied to the growth of organosilicon and organotitanium nanopowders
A. Kilicaslan, O. Levasseur, V. Roy-Garofano, J. Profili, M. Moisan, C. Côté, A. Sarkissian, L. Stafford
J. Appl. Phys. , Vol: 115, No: 11 , published: 21 March 2014
The effect of metallic bonding layer on the corrosion behavior of plasma sprayed Al2O3 ceramic coatings in simulated seawater
Zhe Liu, Zhenhua Chu, Yanchun Dong, Yong Yang, Xueguang Chen, Xiangjiao Kong, Dianran Yan
Vacuum, Vol: 101, No: , published: 01 March 2014
RF magnetron sputtered indium tin oxide films with high transmittance and work function for a-Si:H/c-Si heterojunction solar cells
Shahzada Qamar Hussain, Woong-Kyo Oh, ShiHyun Ahn, Anh Huy Tuan Le, Sunbo Kim, Youngseok Lee, Junsin Yi
Vacuum, Vol: 101, No: , published: 01 March 2014
Preparation and properties of nitrogen doped p-type zinc oxide films by reactive magnetron sputtering
ZhanWu Wang, Yonggao Yue, Yan Cao
Vacuum, Vol: 101, No: , published: 01 March 2014
Effect of reducing impurity concentration of microcrystalline silicon thin films for solar cells using radio frequency hollow electrode enhanced glow plasma
T. Tabuchi, Y. Toyoshima, M. Takashiri
Vacuum, Vol: 101, No: , published: 01 March 2014
A comparative study on gray and nodular cast irons surface melted by plasma beam
Xiu Cheng, Shubing Hu, Wulin Song, Xuesong Xiong
Vacuum, Vol: 101, No: , published: 01 March 2014
Characteristics of ITO-resistive touch film deposited on a PET substrate by in-line DC magnetron sputtering
Min Hyung Ahn, Eou Sik Cho, Sang Jik Kwon
Vacuum, Vol: 101, No: , published: 01 March 2014
External magnetic field effect on the sheath dynamics and implantation profiles in the vicinity of a long step shaped target in plasma immersion ion implantation
Nasrin Navab Safa, Hamid Ghomi, Mansour Khoramabadi, Saeed Ghasemi, Ali Reza Niknam
Vacuum, Vol: 101, No: , published: 01 March 2014
Formation of Co, Fe, and Co–Fe nanoparticles through solid-state dewetting in the presence of hydrogen plasma and their electrical properties
Muhammad Aniq Shazni Mohammad Haniff, Hing Wah Lee, Daniel C.S. Bien, Ishak Hj.Abd. Azid, Mai Woon Lee, Saat Shukri Embong
Vacuum, Vol: 101, No: , published: 01 March 2014
Production of radio frequency magnetron plasma by monopole arrangement of magnets for target uniform utilization
Yasunori Ohtsu, Masakazu Shigyo, Morito Akiyama, Tatsuo Tabaru
Vacuum, Vol: 101, No: , published: 01 March 2014
Threshold ionisation mass spectrometry (TIMS); a complementary quantitative technique to conventional mass resolved mass spectrometry
S. Davies, J.A. Rees, D.L. Seymour
Vacuum, Vol: 101, No: , published: 01 March 2014
Plasma Polymerization Inside Tubes in Hexamethyldisiloxanes and Ethyne Glow Discharges: Effects of Deposition Atmosphere on Wetting and Ageing in Solvents
Juergen M. Lackner, Martin Wiesinger, Reinhard Kaindl, Wolfgang Waldhauser, Daniel Heim, Paul Hartmann
Plasma Chem. Plasma Process., Vol: 34, No: 2 , published: 01 March 2014
Atmospheric-Pressure Cold Plasma for Preparation of High Performance Pt/TiO2 Photocatalyst and Its Mechanism
Lanbo Di, Xiuling Zhang, Zhijian Xu, Kai Wang
Plasma Chem. Plasma Process., Vol: 34, No: 2 , published: 01 March 2014
Chemical Kinetics of Methane Pyrolysis in Microwave Plasma at Atmospheric Pressure
Mirosław Dors, Helena Nowakowska, Mariusz Jasiński, Jerzy Mizeraczyk
Plasma Chem. Plasma Process., Vol: 34, No: 2 , published: 01 March 2014
Carboxyl Surface Functionalization of Poly(L-lactic acid) Electrospun Nanofibers through Atmospheric Non-Thermal Plasma Affects Fibroblast Morphology
Luisa Stella Dolci, Santiago David Quiroga, Matteo Gherardi, Romolo Laurita, Anna Liguori, Paolo Sanibondi, Andrea Fiorani, Laura Calzà, Vittorio Colombo and Maria Letizia Focarete
Plasma Processes and Polymers, Vol: 11, No: 3 , published: 01 March 2014
Pulsed Electrical Discharges in Silicone Emulsion
Camelia Miron, Mihaela Balan, Lucia Pricop, Valeria Harabagiu, Ionut Jepu, Corneliu Porosnicu, Cristian Petrica Lungu
Plasma Processes and Polymers, Vol: 11, No: 3 , published: 01 March 2014
Carbon Nanotube-Polypyrrole Composite Electrode Materials Produced In Situ by Electron Bombardment in Radio-Frequency Plasma Afterglows
Leron Vandsburger, Sylvain Coulombe, Jean-Luc Meunier
Plasma Processes and Polymers, Vol: 11, No: 3 , published: 01 March 2014
Protein Patterning on Microplasma-Activated PEO-Like Coatings
Sameer A. Al-Bataineh, Robert D. Short
Plasma Processes and Polymers, Vol: 11, No: 3 , published: 01 March 2014
Influence of laser pulse duration on extreme ultraviolet and ion emission features from tin plasmas
A. Roy, S. S. Harilal, M. P. Polek, S. M. Hassan, A. Endo, A. Hassanein
Phys. Plasmas, Vol: 21, No: 3 , published: 01 March 2014
Absorption-aided x-ray emission tomography of planar targets
E. Stambulchik, E. Kroupp, Y. Maron, U. Zastrau, I. Uschmann, G. G. Paulus
Phys. Plasmas, Vol: 21, No: 3 , published: 01 March 2014
A Method of Cyanobacteria Treatment Using Underwater Pulsed Streamer-Like Discharge
Sakugawa T., Aoki N., Akiyama H., Ishibashi K., Watanabe M., Kouda A., Suematsu K.
IEEE Trans. Plasma Sci. Pt 2, Vol: 42, No: 3 , published: 01 March 2014
Спектральная диагностика паро-плазменного факела при сварке титана мощным иттербиевым волоконным лазером
Успенский С.А., Быковский Д.П., Петровский В.Н., Миронов В.Д., Прокопова Н.М.
Ядерная физика и инжиниринг, Vol: 5, No: 2 , published: 01 March 2014
Plasma damage mechanisms in low k organosilicate glass and their inhibition by Ar ion bombardment
Haseeb Kazi, Jeffry A. Kelber
J. Vac. Sci. Technol., A, Vol: 32, No: 2 , published: 01 March 2014
Mechanical and transparent conductive properties of ZnO and Ga-doped ZnO films sputtered using electron-cyclotron-resonance plasma on polyethylene naphtalate substrates
Housei Akazawa
J. Vac. Sci. Technol., A, Vol: 32, No: 2 , published: 01 March 2014
Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
Jialing Yang, Brianna S. Eller, Manpuneet Kaur, Robert J. Nemanich
J. Vac. Sci. Technol., A, Vol: 32, No: 2 , published: 01 March 2014
Effect of hydrogen plasma irradiation of catalyst films on growth of carbon nanotubes filled with iron nanowires
Hideki Sato, Nobuo Kubonaka, Atsushi Nagata, Yuji Fujiwara
J. Vac. Sci. Technol., A, Vol: 32, No: 2 , published: 01 March 2014
Low-temperature synthesis of diamond films by photoemission-assisted plasma-enhanced chemical vapor deposition
Mayuri Kawata, Yoshihiro Ojiro, Shuichi Ogawa, Tomoaki Masuzawa, Ken Okano, Yuji Takakuwa
J. Vac. Sci. Technol., A, Vol: 32, No: 2 , published: 01 March 2014
Hydrothermal growth of ZnO microstructures on Ar plasma treated graphite
Yong-Jin Kim, Hadiyawarman Tukiman, Chul-Ho Lee, Sung-Soo Kim, Jinho Park, Byeong-Hyeok Sohn, Miyoung Kim, Gyu-Chul Yi, Ranju Jung, Chunli Liu
Curr. Appl Phys., Vol: 14, No: 3 , published: 01 March 2014
Preparation of biomedical Ag incorporated hydroxyapatite/titania coatings on Ti6Al4V alloy by plasma electrolytic oxidation
Zhou Lan (周 澜), Lü Guo-Hua (吕国华), Mao Fei-Fei (毛菲菲), Yang Si-Ze (杨思泽)
Chin. Phys. B, Vol: 23, No: 3 , published: 01 March 2014
Non Thermal Plasma Functionalized 2D Carbon–Carbon Composites as Supports for Co Nanoparticles
Julien Souquet-Grumey, Philippe Ayrault, Olivier Heintz, Joël Barrault, Jean-Michel Tatibouët, Hervé Plaisantin, Jacques Thébault, Sabine Valange, Elodie Fourré
Plasma Chem. Plasma Process., Vol: 34, No: 2 , published: 01 March 2014
Formation of SiO2 surface textures via CHF3/Ar plasma etching process of poly methyl methacrylate self-formed masks
Maryam Alsadat Rad, Kamarulazizi Ibrahim, Khairudin Mohamed
Vacuum, Vol: 101, No: , published: 01 March 2014
Gas discharge devices generating the directed fluxes of off-electrode plasma
N.L. Kazanskiy, V.A. Kolpakov, V.V. Podlipnov
Vacuum, Vol: 101, No: , published: 01 March 2014
Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar and CH4/Ar plasmas
Il Hoon Lee, Tea Young Lee, Su Min Hwang, Chee Won
Vacuum, Vol: 101, No: , published: 01 March 2014
On the LPCVD-Formed SiO2 Etching Mechanism in CF4/Ar/O2 Inductively Coupled Plasmas: Effects of Gas Mixing Ratios and Gas Pressure
Jinyoung Son, Alexander Efremov, Inwoo Chun, Geun Young Yeom, Kwang-Ho Kwon
Plasma Chem. Plasma Process., Vol: 34, No: 2 , published: 01 March 2014
Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma
Dominik Metzler, Robert L. Bruce, Sebastian Engelmann, Eric A. Joseph, Gottlieb S. Oehrlein
J. Vac. Sci. Technol., A, Vol: 32, No: 2 , published: 01 March 2014
Radio-frequency magnetized ring-shaped hollow cathode discharge plasma for low-pressure plasma processing
Yasunori Ohtsu, Junta Eguchi, Yoshiki Yahata
Vacuum, Vol: 101, No: , published: 01 March 2014
Effect of oxygen plasma treatment on the electrical properties in Ag/bulk ZnO Schottky diodes
Hogyoung Kim, Haeri Kim, Dong-Wook Kim
Vacuum, Vol: 101, No: , published: 01 March 2014
The Role of Argon Metastables in an Inductively Coupled Plasma for Treatment of PET
Sandra Schröter, Hendrik Bahre, Marc Böke, Jörg Winter
Plasma Processes and Polymers, Vol: 11, No: 3 , published: 01 March 2014
Atmospheric Pressure Non-Equilibrium Plasma Treatment to Improve the Electrospinnability of Poly(L-Lactic Acid) Polymeric Solution
Vittorio Colombo, Davide Fabiani, Maria Letizia Focarete, Matteo Gherardi, Chiara Gualandi, Romolo Laurita, Marco Zaccaria
Plasma Processes and Polymers, Vol: 11, No: 3 , published: 01 March 2014
Performance improvement of gadolinium oxide resistive random access memory treated by hydrogen plasma immersion ion implantation
Jer-Chyi Wang, Chih-Hsien Hsu, Yu-Ren Ye, Chi-Fong Ai, Wen-Fa Tsai
J. Vac. Sci. Technol., A, Vol: 32, No: 2 , published: 01 March 2014
Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge
Algirdas Lazauskas, Jonas Baltrusaitis, Viktoras Grigaliūnas, Dalius Jucius, Asta Guobienė, Igoris Prosyčevas, Pranas Narmontas
Plasma Chem. Plasma Process., Vol: 34, No: 2 , published: 01 March 2014
Surface Coating of Bonded PDMS Microchannels by Atmospheric Pressure Microplasma
Muhammad Bashir, Shazia Bashir, Julia M. Rees, William. B. Zimmerman
Plasma Processes and Polymers, Vol: 11, No: 3 , published: 01 March 2014
c-C4F8 Plasmas for the Deposition of Fluorinated Carbon Films
Antonia Terriza, Manuel Macías-Montero, Maria C. López-Santos, Francisco Yubero, José Cotrino, Agustín R. González-Elipe
Plasma Processes and Polymers, Vol: 11, No: 3 , published: 01 March 2014
Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties
Kirsten Bobzin, Nazlim Bagcivan, Sebastian Theiß, Jan Trieschmann, Ricardo Henrique Brugnara, Sven Preissing, Ante Hecimovic
J. Vac. Sci. Technol., A, Vol: 32, No: 2 , published: 01 March 2014
Clinical Plasma Medicine: State and Perspectives of in Vivo Application of Cold Atmospheric Plasma
Th. von Woedtke, H.-R. Metelmann, K.-D. Weltmann
Contrib. Plasma Phys., Vol: 54, No: 2 , published: 02 February 2014
Plasma-Substrate Interaction during Plasma Deposition on Polymers
D. Hegemann, B. Hanselmann, N. Blanchard, M. Amberg
Contrib. Plasma Phys., Vol: 54, No: 2 , published: 02 February 2014
SF6 gas breakdown mechanism in the range of pd product values from 10−4 mbar-mm to 102 mbar-mm
Zoran Rajović, Koviljka Stanković, Miloš Vujisić, Predrag Osmokrović
Vacuum, Vol: 100, No: , published: 01 February 2014
Influence of Si on the target oxide poisoning during reactive arc evaporation of (Al,Cr)2O3 coatings
Jörg Paulitsch, Richard Rachbauer, Jürgen Ramm, Peter Polcik, Paul Heinz Mayrhofer
Vacuum, Vol: 100, No: , published: 01 February 2014
Real-time stress evolution during early growth stages of sputter-deposited metal films: Influence of adatom mobility
G. Abadias, A. Fillon, J.J. Colin, A. Michel, C. Jaouen
Vacuum, Vol: 100, No: , published: 01 February 2014
Surface modification of low-density polyethylene with poly(2-ethyl-2-oxazoline) using a low-pressure plasma treatment
A. Popelka, J. Kronek, I. Novák, A. Kleinová, M. Mičušík, M. Špírková, M. Omastová
Vacuum, Vol: 100, No: , published: 01 February 2014
Hydrophobic and super-hydrophobic coatings based on nanoparticles overcoated by fluorocarbon plasma polymer
Ondřej Kylián, Martin Petr, Anton Serov, Pavel Solař, Oleksandr Polonskyi, Jan Hanuš, Andrei Choukourov, Hynek Biederman
Vacuum, Vol: 100, No: , published: 01 February 2014
Ion sputter-deposition and in-air crystallisation of Cr2AlC films
V. Vishnyakov, O. Crisan, P. Dobrosz, J.S. Colligon
Vacuum, Vol: 100, No: , published: 01 February 2014
Nanostructures of mixed-phase boron nitride via biased microwave plasma-assisted CVD
Po-Chih Huang, Ming-Show Wong
Vacuum, Vol: 100, No: , published: 01 February 2014
Enhanced superhydrophilicity of N+ implanted multiwalled carbon nanotubes-TiO2 composite thin films
Xinggang Hou, Kun Yao, Xueming Wang, Dejun Li, Bin Liao
Vacuum, Vol: 100, No: , published: 01 February 2014
Designing functionalized gold surfaces and nanostructures for Laser Desorption Ionisation Mass Spectrometry
Rosa Pilolli, Nicoletta Ditaranto, Antonio Monopoli, Angelo Nacci, Francesco Palmisano, Luigia Sabbatini, Nicola Cioffi
Vacuum, Vol: 100, No: , published: 01 February 2014
Effect of Plasma Pretreatment Followed by Nanoclay Loading on Flame Retardant Properties of Cotton Fabric
Sheila Shahidi, Mahmood Ghoranneviss
J. Fusion Energy, Vol: 33, No: 1 , published: 01 February 2014
Inactivation of Vegetative Microorganisms and Bacillus atrophaeus Endospores by Reactive Nitrogen Species (RNS)
Uta Schnabel, Mathias Andrasch, Klaus-Dieter Weltmann, Jörg Ehlbeck
Plasma Processes and Polymers, Vol: 11, No: 2 , published: 01 February 2014
Nano-Sized Surface Patterns on Electrospun Microfibers Fabricated Using a Modified Plasma Process for Enhancing Initial Cellular Activities
Ho Jun Jeon, Hyeongjin Lee, Geun Hyung Kim
Plasma Processes and Polymers, Vol: 11, No: 2 , published: 01 February 2014
Plasma Modification of PCL Porous Scaffolds Fabricated by Solvent-Casting/Particulate-Leaching for Tissue Engineering
Francesca Intranuovo, Roberto Gristina, Francesco Brun, Sara Mohammadi, Giacomo Ceccone, Eloisa Sardella, François Rossi, Giuliana Tromba, Pietro Favia
Plasma Processes and Polymers, Vol: 11, No: 2 , published: 01 February 2014
The Selective Characterization of Nonthermal Atmospheric Pressure Plasma Jet on Treatment of Human Breast Cancer and Normal Cells
Mirpour S., Ghomi H., Piroozmand S., Nikkhah M., Tavassoli S.H., Azad S.Z.
IEEE Trans. Plasma Sci., Vol: 42, No: 2 , published: 01 February 2014
Oxidation of SiC in low-pressure CO2 plasma: Formation of silica nano-needles
Miran Mozetič, Marianne Balat-Pichelin
Vacuum, Vol: 100, No: , published: 01 February 2014
Plasma Deposition of Superhydrophobic Ag@TiO2 Core@shell Nanorods on Processable Substrates
Manuel Macias-Montero, Ana Borras, Pablo Romero-Gomez, Jose Cotrino, Fabian Frutos, Agustin R. Gonzalez-Elipe
Plasma Processes and Polymers, Vol: 11, No: 2 , published: 01 February 2014
Tuning extreme ultraviolet emission for optimum coupling with multilayer mirrors for future lithography through control of ionic charge states
Hayato Ohashi, Takeshi Higashiguchi, Bowen Li, Yuhei Suzuki, Masato Kawasaki, Tatsuhiko Kanehara, Yuya Aida, Shuichi Torii, Tetsuya Makimura, Weihua Jiang, Padraig Dunne, Gerry O'Sullivan, Nobuyuki Nakamura
J. Appl. Phys. , Vol: 115, No: 3 , published: 21 January 2014
Fine-lamellar structured thermal barrier coatings fabricated by high efficiency supersonic atmospheric plasma spraying
Y. Bai, L. Zhao, K. Liu, J.J. Tang, Z.H. Han
Vacuum, Vol: 99, No: , published: 01 January 2014
Formation of Au–Ge nanodots by Au ion sputtering of Ge
Safiul Alam Mollick, Debabrata Ghose, Biswarup Satpati
Vacuum, Vol: 99, No: , published: 01 January 2014
Surface characteristics of titanium deuteride film implanted with deuterium ion beam
Jiwei Liu, Yang Liu, Xiubo Qin, Boyu Wang
Vacuum, Vol: 99, No: , published: 01 January 2014
Microstructure and tribological properties of W-implanted PVD TiN coatings on 316L stainless steel
Bin Tian, Wen Yue, Zhiqiang Fu, Yanhong Gu, Chengbiao Wang, Jiajun Liu
Vacuum, Vol: 99, No: , published: 01 January 2014
Sputtered molybdenum films: Structure and property evolution with film thickness
A.M. Hofer, J. Schlacher, J. Keckes, J. Winkler, C. Mitterer
Vacuum, Vol: 99, No: , published: 01 January 2014
Structural and opto-electrical properties of Cu–Al–O thin films prepared by magnetron sputtering method
Yongjian Zhang, Zhengtang Liu, Duyang Zang, Liping Feng
Vacuum, Vol: 99, No: , published: 01 January 2014
Monophase γ-In2Se3 thin film deposited by magnetron radio-frequency sputtering
Shasha Li, Yong Yan, Yong Zhang, Yufeng Ou, Yaxin Ji, Lian Liu, Chuanpeng Yan, Yong Zhao, Zhou Yu
Vacuum, Vol: 99, No: , published: 01 January 2014
Reactive magnetron sputtering deposition and characterization of niobium carbide films
Kan Zhang, M. Wen, G. Cheng, X. Li, Q.N. Meng, J.S. Lian, W.T. Zheng
Vacuum, Vol: 99, No: , published: 01 January 2014
Cell Repellent Coatings Developed by an Open Air Atmospheric Pressure Non-Equilibrium Argon Plasma Jet for Biomedical Applications
S. Bhatt, J. Pulpytel, S. Mori, M. Mirshahi,  F. Arefi-Khonsari
Plasma Processes and Polymers, Vol: 11, No: 1 , published: 01 January 2014
Thin Film Plasma Functionalization of Polyethylene Terephthalate to Induce Bone-Like Hydroxyapatite Nanocrystals
Mazeyar Parvinzadeh Gashti, Dirk Hegemann, Manuela Stir,  Jürg Hulliger
Plasma Processes and Polymers, Vol: 11, No: 1 , published: 01 January 2014
Microplasma-Assisted Growth of Colloidal Silver Nanoparticles for Enhanced Antibacterial Activity
Ruixue Wang, Shasha Zuo, Weidong Zhu, Shan Wu, Weifeng Nian, Jue Zhang,  Jing Fang
Plasma Processes and Polymers, Vol: 11, No: 1 , published: 01 January 2014
Formation of a Nanoscale SiO2 Capping Layer on Photoresist Lines with an Ar/SiCl4/O2 Inductively Coupled Plasma: A Modeling Investigation
Stefan Tinck, Efrain Altamirano-Sánchez, Peter De Schepper,  Annemie Bogaerts
Plasma Processes and Polymers, Vol: 11, No: 1 , published: 01 January 2014
Mechanically Responsive Antibacterial Plasma Polymer Coatings for Textile Biomaterials
Emilia Kulaga, Lydie Ploux, Lavinia Balan, Gautier Schrodj,  Vincent Roucoules
Plasma Processes and Polymers, Vol: 11, No: 1 , published: 01 January 2014
Increased Fibroblast Cell Proliferation and Migration Using Atmospheric N2/Ar Micro-Plasma for the Stimulated Release of Fibroblast Growth Factor-7
Minh-Hien Thi Ngo, Jiunn-Der Liao, Pei-Lin Shao, Chih-Chang Weng,  Chen-Young Chang
Plasma Processes and Polymers, Vol: 11, No: 1 , published: 01 January 2014
Atmospheric Pressure Glow Discharges Generated in Contact with Flowing Liquid Cathode: Production of Active Species and Application in Wastewater Purification Processes
Piotr Jamróz, Krzysztof Gręda, Paweł Pohl, Wiesław Żyrnicki
Plasma Chem. Plasma Process., Vol: 34, No: 1 , published: 01 January 2014
Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
Claudia Richter, Tony Schenk, Uwe Schroeder, Thomas Mikolajick
J. Vac. Sci. Technol., A, Vol: 32, No: 1 , published: 01 January 2014
Quantum Breathing Mode of Trapped Particles: From Nanoplasmas to Ultracold Gases
J. W. Abraham,  M. Bonitz
Contrib. Plasma Phys., Vol: 54, No: 1 , published: 01 January 2014
Crystallization phase transition in the precursors of CIGS films by Ar-ion plasma etching process
Wei-Ting Lin, Sheng-Hui Chen, Shih-Hao Chan, Sung-Cheng Hu, Wan-Xuan Peng, Yung-Tien Lu
Vacuum, Vol: 99, No: , published: 01 January 2014
Superhydrophobic polytetrafluoroethylene surfaces with leaf-like micro-protrusions through Ar + O2 plasma etching process
Harish C. Barshilia, Nitant Gupta
Vacuum, Vol: 99, No: , published: 01 January 2014
Effect of reactant transport on the trench profile evolution for silicon etching in chlorine plasmas
Sai-Qian Zhang, Zhong-Ling Dai, Yuan-Hong Song, You-Nian Wang
Vacuum, Vol: 99, No: , published: 01 January 2014
Etching of Blood Proteins in the Early and Late Flowing Afterglow of Oxygen Plasma
Alenka Vesel, Metod Kolar, Nina Recek, Kinga Kutasi, Karin Stana-Kleinschek, Miran Mozetic
Plasma Processes and Polymers, Vol: 11, No: 1 , published: 01 January 2014
The use of atmospheric pressure plasma treatment on enhancing the pigment application to cotton fabric
W.S. Man, C.W. Kan, S.P. Ng
Vacuum, Vol: 99, No: , published: 01 January 2014
Effects of Cold Plasma Treatment on the Performance of Polyurethane Laminated Glass
Xibao Li, Jinshan Lu, Junming Luo, Haizhong Zheng, Gangqin Shao
Plasma Chem. Plasma Process., Vol: 34, No: 1 , published: 01 January 2014
O2/HMDSO-Plasma-Deposited Organic–Inorganic Hybrid Film for Gate Dielectric of MgZnO Thin-Film Transistor
Chih-Hung Tsai, Yun-Shiuan Li, I-Chun Cheng,  Jian-Zhang Chen
Plasma Processes and Polymers, Vol: 11, No: 1 , published: 01 January 2014
Deposition of a Continuous and Conformal Copper Seed Layer by a Large-Area Electron Cyclotron Resonance Plasma Source with Embedded Lisitano Antenna
Soo Ouk Jang, Hyun Jong You, Young-Woo Kim, Yong Ho Jung, In Uk Hwang, Jae Yang Park, Heon Lee
Plasma Chem. Plasma Process., Vol: 34, No: 1 , published: 01 January 2014
Improvement of microstructural and mechanical properties of plasma sprayed mo coatings deposited on Al-Si substrates by pre-mixing of mo with tin powder
Debasish D., Mantry S., Behera D., Jha B.B.
Теплофиз. высок. температур, Vol: 52, No: 1 , published: 01 January 2014
Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
John Pointet, Patrice Gonon, Lawrence Latu-Romain, Ahmad Bsiesy, Christophe Vallée
J. Vac. Sci. Technol., A, Vol: 32, No: 1 , published: 01 January 2014
Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
Wenyan Wan, Xinhong Cheng, Duo Cao, Li Zheng, Dawei Xu, Zhongjian Wang, Chao Xia, Lingyan Shen, Yuehui Yu,  DaShen Shen
J. Vac. Sci. Technol., A, Vol: 32, No: 1 , published: 01 January 2014
Controlled deposition of sulphur-containing semiconductor and dielectric nano-structured films on metals in SF6 ion-ion plasma
Dmytro Rafalskyi, Jérôme Bredin, Ane Aanesland
J. Appl. Phys. , Vol: 114, No: 21 , published: 07 December 2013
Erosion of amorphous carbon layers in the afterglow of oxygen microwave plasma
A. Drenik, L. Salamon, R. Zaplotnik, A. Vesel, M. Mozetič
Vacuum, Vol: 98, No: , published: 01 December 2013
Physical Properties of Titanium Oxide Thin Films Prepared by DC Magnetron Sputtering: Influence Substrate Temperature and O2/Ar in the Gas Mixture
M. R. Hantehzadeh, M. Amou Amouha, S. Solaymani, T. Osati, B. Ghobadi
J. Fusion Energy, Vol: 32, No: 6 , published: 01 December 2013
Removing of Mixed Coatings by Plasma Discharges
E. Vassallo, R. Caniello, S. Deambrosis, D. Dellasega, F. Ghezzi, L. Laguardia, E. Miorin, M. Passoni
J. Fusion Energy, Vol: 32, No: 6 , published: 01 December 2013
Monitoring particle growth in deposition plasmas
T. Schlebrowski, H. Bahre, M. Böke, J. Winte
Plasma Sources Sci. and Technol., Vol: 22, No: 6 , published: 01 December 2013
Development of a quasi-direct temperature control system of modulated induction thermal plasmas for advanced materials processing
Yasunori Tanaka, Y. Tsubokawa, Y. Uesaka, Y. Uesugi
Plasma Sources Sci. and Technol., Vol: 22, No: 6 , published: 01 December 2013
Integrated Plasma Coal Gasification Power Plant
Matveev I.B., Washcilenko N.V., Serbin S.I., Goncharova N.A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 12 , published: 01 December 2013
A Study of an Energetically Enhanced Plasma Ignition System for Internal Combustion Engines
Thelen B.C., Chun D., Toulson E., Lee T.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 12 , published: 01 December 2013
Efficiency of Renewable Organic Raw Materials Conversion Using Plasma Technology
Zhovtyansky V.A., Petrov S.V., Lelyukh Y.I., Nevzglyad I.O., Goncharuk Y.A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 12 , published: 01 December 2013
Kinetic Model of Pulsed Discharge in Humid Air
Ardelyan N.V., Bychkov V.L., Kochetov I.V., Kosmachevskii K.V.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 12 , published: 01 December 2013
Dielectric Barrier Discharge-Induced Vortex Generation With Discharge-Actuated Boundary Layer Bleed
Im S.-K., Bak M.S., Mungal M.G., Cappelli M.A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 12 , published: 01 December 2013
Induced Flow and Optical Emission Generated by a Pulsed 13.56 MHz–5 kHz Plasma Actuator
Dedrick J.,Im S.-K., Cappelli M., Boswell R.W., Charles C.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 12 , published: 01 December 2013
Arc Mitigation via Solar Panel Grouting and Curing Under Simulated LEO-Like Plasma Environment
Ranjan M., Vaghela N.K.P., Mukherjee S., Sankaran M., Puthanveettil S.E.
IEEE Trans. Plasma Sci. Pt 2, Vol: 41, No: 12 , published: 01 December 2013
Electrostatic Discharge Tests on Solar Array Wire Coupons Subjected to Simulated Space Environment Aging
Wong F.K., Gardiner G., Hoang B., Redick T., Gahart R.L., Wright K.H., Vaughn J.A., Schneider T.A.
IEEE Trans. Plasma Sci. Pt 2, Vol: 41, No: 12 , published: 01 December 2013
Experimental test of whether electrostatically charged micro-organisms and their spores contribute to the onset of arcs across vacuum gaps
L. R. Grisham, A. von Halle, A. F. Carpe, K. R. Gilton, Guy Rossi, T. N. Stevenson
Phys. Plasmas, Vol: 20, No: 12 , published: 01 December 2013
Surface Modification of Absorbable Magnesium Stents by Reactive Ion Etching
E. Galvin, M. M. Morshed, C. Cummins, S. Daniels, C. Lally, B. MacDonald
Plasma Chem. Plasma Process., Vol: 33, No: 6 , published: 01 December 2013
Controllable fabrication of amorphous Si layer by energetic cluster ion bombardment
Vasily Lavrentiev, Vladimir Vorliček, Alexandr Dejneka, Dagmar Chvostova, Aleš Jäger, Jiri Vacik, Lubomir Jastrabik, Hiroshi Naramoto, Kazumasa Narumi
Vacuum, Vol: 98, No: , published: 01 December 2013
Properties of tantalum oxynitride thin films produced by magnetron sputtering: The influence of processing parameters
D. Cristea, D. Constantin, A. Crisan, C.S. Abreu, J.R. Gomes, N.P. Barradas, E. Alves, C. Moura, F. Vaz, L. Cunha
Vacuum, Vol: 98, No: , published: 01 December 2013
Plasma treatment of amorphous and semicrystalline polymers for improved biocompatibility
Ita Junkar
Vacuum, Vol: 98, No: , published: 01 December 2013
Improved proliferation of human osteosarcoma cells on oxygen plasma treated polystyrene
Nina Recek, Miran Mozetič, Morana Jaganjac, Lidija Milkovič, Neven Žarkovic, Alenka Vesel
Vacuum, Vol: 98, No: , published: 01 December 2013
HF Plasma Discharge for Surface Modification of Cellulose-Based Materials
Ioanid E.G., Rusu D.E., Ursescu M.C., Totolin M., Vlad A.M.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 12 , published: 01 December 2013
Treatment of Reticulated Vitreous Carbon by Dielectric Barrier Discharge Plasma for Electrodes Production
Da Silva L.L.G.D., Ferreira L.G., Santos A.L., Botelho E.C., Toth A., Kostov K.G.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 12 , published: 01 December 2013
Plasma-Assisted Combustion System for Incineration of Oil Slimes
Korolev Y.D., Frants O.B., Landl N.V., Geyman V.G., Karengin A.G., Pobereznikov A.D., Kim Y., Rosocha L.A., Matveev I.B.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 12 , published: 01 December 2013
Increase of secondary electron yield of amorphous carbon coatings under high vacuum conditions
Adérito Santos, Nenad Bundaleski, Bobbie-Jean Shaw, Ana G. Silva, Orlando M.N.D. Teodoro
Vacuum, Vol: 98, No: , published: 01 December 2013
Dynamics of femtosecond laser produced tungsten nanoparticle plumes
S. S. Harilal, N. Farid, A. Hassanein, V. M. Kozhevin
J. Appl. Phys. , Vol: 114, No: 20 , published: 28 November 2013
Growth and characterization of group-II-alloyed ZnAlO UV-range transparent conductive films prepared by RF magnetron sputtering
Jang Ho Park, Hoang Ba Cuong, Sang Hun Jeong, Byung Teak Lee
Vacuum, Vol: 97, No: , published: 01 November 2013
On the cyclic hot corrosion behaviour of atmospheric plasma sprayed Lanthanum Zirconate based coatings in contact with a mixture of sodium sulphate and vanadate salts: A comparison with the traditional Ysz duplex and NiCrAlY coated samples
C.S. Ramachandran, V. Balasubramanian, P.V. Ananthapadmanabhan
Vacuum, Vol: 97, No: , published: 01 November 2013
Nitrogen Plasma Modification and Chemical Derivatization of Polyethylene Surfaces – An In Situ Study Using FTIR-ATR Spectroscopy
Claus-Peter Klages, Alena Hinze,  Zohreh Khosravi
Plasma Processes and Polymers, Vol: 10, No: 11 , published: 01 November 2013
Polystyrene Surface Modification for Localized Cell Culture Using a Capillary Dielectric Barrier Discharge Atmospheric-Pressure Microplasma Jet
Kyle G. Doherty, Jun-Seok Oh, Paul Unsworth, Andrew Bowfield, Carl M. Sheridan, Peter Weightman, James W. Bradley, Rachel L. Williams
Plasma Processes and Polymers, Vol: 10, No: 11 , published: 01 November 2013
Mathematical model of gas plasma applied to chronic wounds
J. G. Wang, X. Y. Liu, D. W. Liu, X. P. Lu, Y. T. Zhang
Phys. Plasmas, Vol: 20, No: 11 , published: 01 November 2013
Electrospun Microfibrous Membranes with Atmospheric-Pressure Plasma Surface Modification for the Application in Dye-Sensitized Solar Cells
Chun Huang, Pin-Jen Lin, Ching-Yuan Tsai,  Ruey-Shin Juang
Plasma Processes and Polymers, Vol: 10, No: 11 , published: 01 November 2013
Mineralization of Phenol in Water by Catalytic Non-Thermal Plasma Reactor – An Eco-Friendly Approach for Wastewater Treatment
Pathpireddy Manoj Kumar Reddy, Allumolu Dayamani, Shaik Mahammadunnisa, Challapalli Subrahmanyam
Plasma Processes and Polymers, Vol: 10, No: 11 , published: 01 November 2013
Effects of plasma-induced epoxy coatings on surface properties of Twaron fibers and improved adhesion with PPESK resins
Xiangyi Zhang, Ping Chen, Qi Yu, Keming Ma, Zhenfeng Ding, Xiuling Zhu
Vacuum, Vol: 97, No: , published: 01 November 2013
Nanofilms Produced by Magnetron Enhanced Plasma Polymerization from Methane and Oxygen for Coating of Rigid Contact Lenses
Michael Bergmann, Loic Ledernez, Gregory Dame, Sebastian Lickert, Frank Widmer, Yvonne Gier,  Gerald Urban
Plasma Processes and Polymers, Vol: 10, No: 11 , published: 01 November 2013
Control the Composition of Tantalum Oxynitride Films by Sputtering a Tantalum Target in Ar/O2/N2 Radiofrequency Magnetron Plasmas
Angélique Bousquet, Fadi Zoubian, Joël Cellier, Thierry Sauvage,  Eric Tomasella
Plasma Processes and Polymers, Vol: 10, No: 11 , published: 01 November 2013
Characterization of nanoparticle flow produced by gas aggregation source
Jaroslav Kousal, Oleksandr Polonskyi, Ondřej Kylián, Andrei Choukourov, Anna Artemenko, Josef Pešička, Danka Slavínská, Hynek Biederman
Vacuum, Vol: 96, No: , published: 01 October 2013
Preparing of nanostructured Al2O3–TiO2–ZrO2 composite powders and plasma spraying nanostructured composite coating
Yong Yang, Dianran Yan, Yanchun Dong, Xueguang Chen, Lei Wang, Zhenhua Chu, Jianxin Zhang, Jining He
Vacuum, Vol: 96, No: , published: 01 October 2013
Study of structural and free volume properties of swift heavy ion irradiated Polyallyl diglycol carbonate polymer films
Paramjit Singh, Rajesh Kumar
Vacuum, Vol: 96, No: , published: 01 October 2013
Synthesis and structure characterization of low dielectric constant MSQ films by using octamethyl cyclotetrasiloxane (D4) as a porosity promotion agent
Guiqin Yin, Qianghua Yuan, Zhaoyuan Ning
Vacuum, Vol: 96, No: , published: 01 October 2013
Применение микроволнового разряда для синтеза нано- и микрокристаллов TiB2 и BN в смеси порошков Ti-B в атмосфере азота
Г. М. Батанов, Н. К. Бережецкая, В. Д. Борзосеков, Л. Д. Исхакова, Л. В. Колик, Е. М. Кончеков, А. А. Летунов, Д. В. Малахов, Ф. О. Милович, Е. А. Образцова, Е. Д. Образцова, А. Е. Петров, К. А. Сарксян, Н. Н. Скворцова, В. Д. Степахин, Н. К. Харчев
Физ. плазмы, Vol: 39, No: 10 , published: 01 October 2013
Pulse Power Nanosecond-Range DSRD-Based Generators for Electric Discharge Technologies
Lyublinsky A.G., Korotkov S.V., Aristov Y.V., Korotkov D.A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 10 , published: 01 October 2013
Surface Layer Dynamics During E-Beam Treatment
Fetzer R., An W., Weisenburger A., Mueller G.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 10 , published: 01 October 2013
Steady-State Corona Discharges in Atmospheric Air for Cleaning and Decontamination
Li S., Timoshkin I.V., Maclean M., MacGregor S.J., Wilson M.P., Given M.J., Anderson J.G., Wang T.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 10 , published: 01 October 2013
Microsecond Range RSD-Based Generators for Pulse Power Technologies
Korotkov S.V., Lyublinsky A.G., Aristov Y.V., Zhmodikov A.L., Kozlov A.K.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 10 , published: 01 October 2013
Pulse Plasma-Chemical Synthesis of Ultradispersed Powders of Titanium and Silicon Oxide
Ponomarev D.V., Remnev G.E., Sazonov R.V., Kholodnaya G.E.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 10 , published: 01 October 2013
Pulsed Corona Demonstrator for Semi-Industrial Scale Air Purification
Beckers F.J.C.M., Hoeben W.F.L.M., Huiskamp T., Pemen A.J.M., van Heesch E.J.M.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 10 , published: 01 October 2013
Study of Reactive Oxygen or/and Nitrogen Species Binding Processes on E. coli Bacteria with Mass Spectrometry Isotopic Nanoimaging
David Duday, Franck Clément, Elodie Lecoq, Christian Penny, Jean-Nicolas Audinot, Thierry Belmonte, Kinga Kutasi, Henry-Michel Cauchie, Patrick Choquet
Plasma Processes and Polymers, Vol: 10, No: 10 , published: 01 October 2013
Investigation of the Formation Mechanism of Aligned Nano-Structured Siloxane Coatings Deposited Using an Atmospheric Plasma Jet
Charlie P. Stallard, Muhammad M. Iqbal, Miles M. Turner, Denis P. Dowling
Plasma Processes and Polymers, Vol: 10, No: 10 , published: 01 October 2013
Synergistic sterilization effect of microwave-excited nonthermal Ar plasma, H2O2, H2O and TiO2, and a global modeling of the interactions
H. Wk. Lee, H. W. Lee, S. K. Kang, H. Y. Kim, I. H. Won, S. M. Jeon, J. K. Lee
Plasma Sources Sci. and Technol., Vol: 22, No: 5 , published: 01 October 2013
Gliding Arc Plasma Synthesis of Crystalline TiO2Nanopowders with High Photocatalytic Activity
Shi-Xin Liu, Xiao-Song Li, Xiaobing Zhu, Tian-Liang Zhao, Jing-Lin Liu, Ai-Min Zhu
Plasma Chem. Plasma Process., Vol: 33, No: 5 , published: 01 October 2013
Non-Thermal Plasma Assisted Regeneration of Acetone Adsorbed TiO2 Surface
L. Sivachandiran, F. Thevenet, A. Rousseau
Plasma Chem. Plasma Process., Vol: 33, No: 5 , published: 01 October 2013
Decomposition of Dissolved Methylene Blue in Water Using a Submerged Arc Between Titanium Electrodes
Naum Parkansky, Evelina Faktorovich Simon, Boris A. Alterkop, Raymond L. Boxman, O. Berkh
Plasma Chem. Plasma Process., Vol: 33, No: 5 , published: 01 October 2013
An Extreme Learning Machine Algorithm to Predict the In-flight Particle Characteristics of an Atmospheric Plasma Spray Process
T. A. Choudhury, C. C. Berndt, Zhihong Man
Plasma Chem. Plasma Process., Vol: 33, No: 5 , published: 01 October 2013
Carbon Ion Production Using a High-Power Impulse Magnetron Sputtering Glow Plasma
Yukimura K., Nakano H.O.S., Nakao S., Takaki K.
IEEE Trans. Plasma Sci. Pt 2, Vol: 41, No: 10 , published: 01 October 2013
An experimental study of photoresist material etching by an atmospheric-pressure plasma jet with Ar/air mixed gas
Lijun Wang, Wenjun Ning, Mingzheng Fu, Chen Wu, Shenli Jia
J. Plasma Phys., Vol: 79, No: 5 , published: 01 October 2013
On the “Growth” of Nano-Structures on c-Silicon via Self-Masked Plasma Etching Processes
Rosa Di Mundo, Fabio Palumbo, Gianni Barucca, Gianfranco Sabato, Riccardo d'Agostino
Plasma Processes and Polymers, Vol: 10, No: 10 , published: 01 October 2013
Real-Time Endpoint Detection of Small Exposed Area SiO2 Films in Plasma Etching Using Plasma Impedance Monitoring with Modified Principal Component Analysis
Haegyu Jang, Jaewook Nam, Chang-Koo Kim, Heeyeop Chae
Plasma Processes and Polymers, Vol: 10, No: 10 , published: 01 October 2013
On the plasma uniformity of multi-electrode CCPs for large-area processing
Park Gi Jung, Seo Sang Hoon, Chung Chin Wook, Chang Hong Young
Plasma Sources Sci. and Technol., Vol: 22, No: 5 , published: 01 October 2013
Plasma Treatment of Glass Surfaces Using Diffuse Coplanar Surface Barrier Discharge in Ambient Air
Tomáš Homola, Jindřich Matoušek, Martin Kormunda, Linda Y. L. Wu, Mirko Černák
Plasma Chem. Plasma Process., Vol: 33, No: 5 , published: 01 October 2013
Atmospheric Pressure Plasma Treatment of Fused Silica, Related Surface and Near-Surface Effects and Applications
Christoph Gerhard, Tobias Weihs, Daniel Tasche, Stephan Brückner, Stephan Wieneke, Wolfgang Viöl
Plasma Chem. Plasma Process., Vol: 33, No: 5 , published: 01 October 2013
Activation of PET Using an RF Atmospheric Plasma System
Mick Donegan, Vladimir Milosavljević, Denis P. Dowling
Plasma Chem. Plasma Process., Vol: 33, No: 5 , published: 01 October 2013
Formation and Mechanical Properties of CoNiCuFeCr High-Entropy Alloys Coatings Prepared by Plasma Transferred Arc Cladding Process
J. B. Cheng, X. B. Liang, Z. H. Wang, B. S. Xu
Plasma Chem. Plasma Process., Vol: 33, No: 5 , published: 01 October 2013
Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry
Peter J. Cumpson, Jose F. Portoles, Anders J. Barlow, Naoko Sano
J. Appl. Phys. , Vol: 114, No: 12 , published: 28 September 2013
Swift heavy ion induced modifications in structural, optical & magnetic properties of pure and V doped ZnO films
G. Jayalakshmi, K. Saravanan, S. Balakumar, T. Balasubramanian
Vacuum, Vol: 95, No: , published: 01 September 2013
Time dependence of microstructure and hardness in plasma carbonized Ti–6Al–4V alloys
Ya-Zhe Xing, Chao-Ping Jiang, Jian-Min Hao
Vacuum, Vol: 95, No: , published: 01 September 2013
Enhanced printability of polyethylene through air plasma treatment
Jorge López-García, František Bílek, Marian Lehocký, Ita Junkar, Miran Mozetič, Musa Sowe
Vacuum, Vol: 95, No: , published: 01 September 2013
Modification of polymer velvet cathode via metallic Mo coating for enhancement of high-current electron emission performances
Ying Xiong, Bing Wang, Liansheng Xia, Huang Zhang, Yong Yi
Phys. Plasmas, Vol: 20, No: 9 , published: 01 September 2013
A Feasibility Study of an Application of Fusion Neutron Beam Source Based on Cylindrical Discharge Device for Cancer Therapy
Yasunori Nakai, Kazuyuki Noborio, Yuto Takeuchi, Ryuta Kasada, Yasushi Yamamoto, Satoshi Konishi
Fusion Science and Technology, Vol: 64, No: 2 , published: 25 August 2013
A novel route to compact, high performance pumping in UHV–XHV vacuum systems
Paolo Manini, Andrea Conte, Luca Viale, Antonio Bonucci, Luciano Caruso
Vacuum, Vol: 94, No: , published: 01 August 2013
Effect of sputtering pressure on the properties of ZnMgO: Ti transparent conducting thin films
Yan Sun, Hanfa Liu, Huafu Zhang
Vacuum, Vol: 94, No: , published: 01 August 2013
Structural and opto-electric properties of Ga and F codoped ZnO thin films on PC substrates
Qian Shi, Kesong Zhou, Mingjiang Dai, Songsheng Lin, Huijun Hou, Chunbei Wei, Fang Hu
Vacuum, Vol: 94, No: , published: 01 August 2013
Large phase-transition hysteresis for nanostructured VOx film prepared on ITO conductive glass by DC reactive magnetron sputtering
Huafu Zhang, Zhiming Wu, Wenyao Yang, Yadong Jiang
Vacuum, Vol: 94, No: , published: 01 August 2013
Light trapping scheme of ICP-RIE glass texturing by SF6/Ar plasma for high haze ratio
Shahzada Qamar Hussain, ShiHyun Ahn, Hyeongsik Park, Giduk Kwon, Jayapal Raja, Youngseok Lee, Nagarajan Balaji, HeeSeok Kim, Anh Huy Tuan Le, Junsin Yi
Vacuum, Vol: 94, No: , published: 01 August 2013
Friction and wear of Cr-doped DLC films under different lubrication conditions
Jian Sun, Zhi-qiang Fu, Wei Zhang, Cheng-biao Wang, Wen Yue, Song-sheng Lin, Ming-jiang Dai
Vacuum, Vol: 94, No: , published: 01 August 2013
Tribological performance of DLC coatings deposited by ion beam deposition under dry friction and oil lubricated conditions
Fu Zhiqiang, Sun Jian, Wang Chengbiao, Zhang Wei, Yue Wen, Peng Zhijian, Yu Xiang, Lin Songsheng, Dai Mingjiang
Vacuum, Vol: 94, No: , published: 01 August 2013
Ellipsometrical characterization of complex refractive index depth profile of 50 keV silicon ion implanted PMMA
Stoyan C. Russev, Gichka G. Tsutsumanova, Ivan L. Stefanov, Georgi B. Hadjichristov
Vacuum, Vol: 94, No: , published: 01 August 2013
Fabrication of magnesium silicide thin films by pulsed ion beam ablation in a 1.6 kJ plasma focus device
M.T. Hosseinnejad, Mahmood Ghoranneviss, G. Reza Etaati, Farhad Shahgoli
Vacuum, Vol: 94, No: , published: 01 August 2013
Structural and oxidation behavior of atmospheric heat treated plasma sprayed WC–Co coatings
Farzin Ghadami, Soheil Ghadami, Hassan Abdollah-Pour
Vacuum, Vol: 94, No: , published: 01 August 2013
Fabrication and Electrowetting Properties of Poly Si Nanostructure Based Superhydrophobic Platform
K. Rajkumar, R. T. Rajendrakumar
Plasma Chem. Plasma Process., Vol: 33, No: 4 , published: 01 August 2013
DLC Coating by HiPIMS: The Influence of Substrate Bias Voltage
Nakao S., Yukimura K., Nakano S., Ogiso H.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 8 , published: 01 August 2013
Ultrahigh-Speed Coating of DLC at Over 100 \mu{\rm m}/{\rm h} by Using Microwave-Excited High-Density Near Plasma
Kousaka H., Okamoto T., Umehara N.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 8 , published: 01 August 2013
Microstructure and Platelet Adhesion Behavior of Titanium Oxide Films Synthesized by Reactive High-Power Pulse Magnetron Sputtering
Yin T.-L., Jing F.-J., Sun H., Leng Y., Yukimura K., Huang N.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 8 , published: 01 August 2013
Wear and Failure Process of TiN and DLC Films Monitored With Open Circuit Potential
Wang X., Liu J., Chen J.Y., Leng Y., Huang N.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 8 , published: 01 August 2013
Effect of O2 in O2/Ar Gas Mixture on Morphological and Optical Properties of TiO2 Thin Films Deposited by DC Cylindrical Magnetron Sputtering
S. A. Hoseini, M. R. Hantehzadeh, P. Salavati Dezfooli, Sadjad Salavati Dezfooli, S. Najmodein Hoseini
J. Fusion Energy, Vol: 32, No: 4 , published: 01 August 2013
Study on the Addressing Characteristics of an ac PDP With Sc-Doped MgO-Protecting Layer
Kim J.-K.
IEEE Trans. Plasma Sci. Pt 3, Vol: 41, No: 8 , published: 01 August 2013
Effect of Plasma and UV Radiation of Multigap Sliding Discharge in Air on Bacteria
Spirov G.M., Bochkaryev A.V., Dubinov A.E., Loboda A.V., Zuimatch E.A., Bespalova A.N.
IEEE Trans. Plasma Sci. Pt 3, Vol: 41, No: 8 , published: 01 August 2013
Magnetic dipole discharges. I. Basic properties
R. L. Stenzel, J. M. Urrutia, C. T. Teodorescu-Soare, C. Ionita, R. Schrittwieser
Phys. Plasmas, Vol: 20, No: 8 , published: 01 August 2013
Magnetic dipole discharges. II. Cathode and anode spot discharges and probe diagnostics
R. L. Stenzel, J. M. Urrutia, C. Ionita, R. Schrittwieser
Phys. Plasmas, Vol: 20, No: 8 , published: 01 August 2013
Magnetic dipole discharges. III. Instabilities
R. L. Stenzel, J. M. Urrutia, C. Ionita, R. Schrittwieser
Phys. Plasmas, Vol: 20, No: 8 , published: 01 August 2013
2-dimensional ion velocity distributions measured by laser-induced fluorescence above a radio-frequency biased silicon wafer
Nathaniel B. Moore, Walter Gekelman, Patrick Pribyl, Yiting Zhang, Mark J. Kushner
Phys. Plasmas, Vol: 20, No: 8 , published: 01 August 2013
Effect of H2 Flow Rate on High-Rate Etching of Si by Narrow-Gap Microwave Hydrogen Plasma
Takahiro Yamada, Hiromasa Ohmi, Hiroaki Kakiuchi, Kiyoshi Yasutake
Plasma Chem. Plasma Process., Vol: 33, No: 4 , published: 01 August 2013
Evolution of Hydride Components Generated by Hydrogen Plasma Irradiation of a Si(110) Surface Investigated With In Situ Infrared Absorption Spectroscopy in Multiple Internal Reflection Geometry
Shinohara M., Takami Y., Takabayashi S., Oda A., Matsuda Y., Fujiyama H.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 8 , published: 01 August 2013
Electroluminescence and Photoluminescence of Conjugated Polymer Films Prepared by Plasma Enhanced Chemical Vapor Deposition of Naphthalene
M. Rajabi, A. R. Ghassami, M. Abbasi Firouzjah, S. I. Hosseini, B. Shokri
Plasma Chem. Plasma Process., Vol: 33, No: 4 , published: 01 August 2013
Time-resolved temperature study in a high-power impulse magnetron sputtering discharge
Nikolay Britun, Maria Palmucci, Stephanos Konstantinidis, Mireille Gaillard, Rony Snyders
J. Appl. Phys. , Vol: 114, No: 1 , published: 07 July 2013
Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C
V. Vishnyakov, J. Lu, P. Eklund, L. Hultman, J. Colligon
Vacuum, Vol: 93, No: , published: 01 July 2013
A study of the surface reaction on the etched ITO thin films by using inductively coupled plasma
Han-Soo Kim, Jong-Chang Woo, Young-Hee Joo, Chang-Il Kim
Vacuum, Vol: 93, No: , published: 01 July 2013
Anisotropic IV characteristics of spontaneously emerged periodic stripes of superconducting NbN thin films on Si trench sidewall by RF magnetron sputtering
Noriaki Sugimoto, Tomoyoshi Motohiro
Vacuum, Vol: 93, No: , published: 01 July 2013
Monitoring of sterilization in an oxygen plasma apparatus, employing a quartz crystal microbalance (QCM) method
Kiyoshi Yoshino, Hiroyuki Matsumoto, Tatsuyuki Iwasaki, Shinobu Kinoshita, Kazutoshi Noda, Satoru Iwamori
Vacuum, Vol: 93, No: , published: 01 July 2013
Mass Spectrometric Characterizations of Ions Generated in RF Magnetron Discharges during Sputtering of Silver in Ne, Ar, Kr an.d Xe Gases
Petr Pokorný, Michal Novotný, Jindřich Musil, Přemysl Fitl, Jiří Bulíř, Ján Lančok
Plasma Processes and Polymers, Vol: 10, No: 7 , published: 01 July 2013
Surface and Electrochemical Properties of Plasma-Treated Polypropylene Track Membrane
Liubov Kravets, Alla Gilman, Mikhail Yablokov, Vera Elinson, Bogdana Mitu, Gheorghe Dinescu
Plasma Processes and Polymers, Vol: 10, No: 7 , published: 01 July 2013
Formation of ROS and RNS in Water Electro-Sprayed through Transient Spark Discharge in Air and their Bactericidal Effects
Zdenko Machala, Barbora Tarabova, Karol Hensel, Eva Spetlikova, Libusa Sikurova, Petr Lukes
Plasma Processes and Polymers, Vol: 10, No: 7 , published: 01 July 2013
Etch characteristics of HfO2 thin films by using CF4/Ar inductively coupled plasma
Pil-Seung Kang, Jong-Chang Woo, Young-Hee Joo, Chang-Il Kim
Vacuum, Vol: 93, No: , published: 01 July 2013
Effects of annealing temperature on buried oxide precipitates in He and O co-implanted Si
B.S. Li, C.H. Zhang, Z.G. Wang, Y.R. Zhong, B.Y. Wang, X.B. Qin, L.Q. Zhang, Y.T. Yang, R. Wang, Y.F. Jin
Vacuum, Vol: 93, No: , published: 01 July 2013
Chemical and electrical properties of HMDSO plasma coated polyimide
Z. Ziari, I. Nouicer, S. Sahli, S. Rebiai, A. Bellel, Y. Segui, P. Raynaud
Vacuum, Vol: 93, No: , published: 01 July 2013
Study on behavior of NiAl coating with different Ni/Al ratios
Qiong Wu, Shusuo Li, Yue Ma, Shengkai Gong
Vacuum, Vol: 93, No: , published: 01 July 2013
High-Power Test of Chemical Vapor Deposited Diamond Window for an ECRH System in SST-1
Shukla B.K., Babu R., Kushwah M., Sathyanarayana K., Patel J., Rao S.L., Dhorajiya P., Patel H., Belsare S., Rathod V., Patel S.D., Bhavsar V., Solanki P.A., Sharma A., Shah R., Bora D., Shmelev M., Belov Y., Belousov V.
IEEE Trans. Plasma Sci., Vol: 41, No: 7 , published: 01 July 2013
Deposition of a TMDSO-Based Film by a Non-Equilibrium Atmospheric Pressure DC Plasma Jet
Xiaolong Deng, Anton Yu Nikiforov, Nathalie De Geyter, Rino Morent, Christophe Leys
Plasma Processes and Polymers, Vol: 10, No: 7 , published: 01 July 2013
Optical emission spectroscopic diagnostics of a non-thermal atmospheric pressure helium-oxygen plasma jet for biomedical applications
Magesh Thiyagarajan, Abdollah Sarani, Cosmina Nicula
J. Appl. Phys. , Vol: 113, No: 23 , published: 21 June 2013
Nucleation and growth of Nb nanoclusters during plasma gas condensation
K. R. Bray, C. Q. Jiao, J. N. DeCerbo
J. Appl. Phys. , Vol: 113, No: 23 , published: 21 June 2013
Laser ablation of ceramic Al2O3 at 193 nm and 248 nm: The importance of single-photon ionization processes
R. J. Peláez, C. N. Afonso, M. Bator, T. Lippert
J. Appl. Phys. , Vol: 113, No: 22 , published: 14 June 2013
Study of the neutral gas flow on discharges of capacitively coupled plasma in a PECVD reactor
Xiang Xu, Jie Feng, Xiang-Mei Liu, You-Nian Wang, Jia Yan
Vacuum, Vol: 92, No: , published: 01 June 2013
CuIn(S,Se)2 thin films prepared by selenization and sulfurization of sputtered Cu–In precursors
Chaozheng Wang, Chengjun Zhu, Tianwei Zhang, Jian Li
Vacuum, Vol: 92, No: , published: 01 June 2013
Effect of Ta incorporation on the microstructure, electrical and optical properties of Hf1−xTaxO high-k film prepared by dual ion beam sputtering deposition
T. Yu, C.G. Jin, H.Y. Zhang, L.J. Zhuge, Z.F. Wu, X.M. Wu, Z.C. Feng
Vacuum, Vol: 92, No: , published: 01 June 2013
Deposition and characterization of MAX-phase containing Ti–Si–C thin films by sputtering using elemental targets
Tsutomu Sonoda, Setsuo Nakao, Masami Ikeyama
Vacuum, Vol: 92, No: , published: 01 June 2013
Surface Treatment of Polyethylene Terephthalate to Improving Hydrophilicity Using Atmospheric Pressure
Z. Fang, J. Yang, Y. Liu, T. Shao, C. Zhang
IEEE Trans. Plasma Sci., Vol: 41, No: 6 , published: 01 June 2013
Исследование движения заряженных частиц в различных конфигурациях полей для развития концепции плазменной сепарации отработавшего ядерного топлива
В. П. Смирнов, А. А. Самохин, Н. А. Ворона, А. В. Гавриков
Физ. плазмы, Vol: 39, No: 6 , published: 01 June 2013
Elimination of E. Faecalis by a New Non-Thermal Atmospheric Pressure Plasma Handheld Device for Endodontic Treatment. A Preliminary Investigation
Lukasz Jablonowski, Ina Koban, Marie H. Berg, Eckhard Kindel, Kathrin Duske, Karsten Schröder, Klaus-Dieter Weltmann, Thomas Kocher
Plasma Processes and Polymers, Vol: 10, No: 6 , published: 01 June 2013
In Situ Polymerization of Aqueous Solutions of NIPAAm Initiated by Atmospheric Plasma Treatment
Ricardo Molina, Cristina Ligero, Petar Jovančić, Enric Bertran
Plasma Processes and Polymers, Vol: 10, No: 6 , published: 01 June 2013
X-Ray Reflectometry Characterization of Plasma Polymer Films Synthesized from Triallylamine: Density and Swelling in Water
Mauricio Schieda, Fethi Salah, Stéphanie Roualdès, Arie van der Lee, Eric Beche, Jean Durand
Plasma Processes and Polymers, Vol: 10, No: 6 , published: 01 June 2013
Protein Adhesion on Atmospheric Plasma Deposited Quaternary Ammonium Salt Coatings
Mick Donegan, Denis P. Dowling
Plasma Processes and Polymers, Vol: 10, No: 6 , published: 01 June 2013
Effects of Ar–N2–O2 Microwave Plasma on Poly-L-Lactic Acid Thin Films Designed for Tissue Engineering
Emna Chichti, Gerard Henrion, Franck Cleymand, Majid Jamshidian, Michel Linder, Elmira Arab-Tehrany
Plasma Processes and Polymers, Vol: 10, No: 6 , published: 01 June 2013
Nonequilibrium Plasma-Activated Antimicrobial Solutions are Broad-Spectrum and Retain their Efficacies for Extended Period of Time
Utku K. Ercan, Hong Wang, Haifeng Ji, Gregory Fridman, Ari D. Brooks, Suresh G. Joshi
Plasma Processes and Polymers, Vol: 10, No: 6 , published: 01 June 2013
Evaluation of precursor evaporation in Si nanoparticle synthesis by inductively coupled thermal plasmas
V. Colombo, E. Ghedini, M. Gherardi, P. Sanibondi
Plasma Sources Sci. and Technol., Vol: 22, No: 3 , published: 01 June 2013
Plasma Radiofrequency Discharges as Cleaning Technique for the Removal of C–W Coatings
A. Cremona, E. Vassallo, R. Caniello, F. Ghezzi, G. Grosso, L. Laguardia
J. Fusion Energy, Vol: 32, No: 3 , published: 01 June 2013
Limited Sheath-Collision for Plasma Immersion Ion Implantation and its Influence on Impact Energy and Dose Uniformity
Lu Y., Wang  L., Wang X.
IEEE Trans. Plasma Sci., Vol: 41, No: 6 , published: 01 June 2013
Plasma Deposition of an Organophosphorus Coating at Atmospheric Pressure
Florian Hilt, David Duday, Nicolas Gherardi, Gilles Frache, Julien Bardon, Patrick Choquet
Plasma Processes and Polymers, Vol: 10, No: 6 , published: 01 June 2013
Surface Characterization of Atmospheric Pressure Plasma-Deposited Allyl Methacrylate and Acrylic Acid Based Coatings
Bernard Nisol, Abdelkrim Batan, François Dabeux, Alexandros Kakaroglou, Iris De Graeve, Guy Van Assche, Bruno Van Mele, Herman Terryn, François Reniers
Plasma Processes and Polymers, Vol: 10, No: 6 , published: 01 June 2013
Reduction of vacuum sublimation by ion beam treatment for e-beam deposited SiC films
Jae-Won Park, Zuhair S. Khan, Hyung-Jin Kim, Sung-Deok Hong, Yong-Wan Kim
Vacuum, Vol: 91, No: , published: 01 May 2013
Получение карбонитридных пленок на стадиях тлеющего разряда и его послесвечения
Г. М. Григорьян, И. В. Кочетов
Физ. плазмы, Vol: 39, No: 5 , published: 01 May 2013
Laser produced plasma sources for nanolithography—Recent integrated simulation and benchmarking
A. Hassanein, T. Sizyuk
Phys. Plasmas, Vol: 20, No: 5 , published: 01 May 2013
Atmospheric-pressure air microplasma jets in aqueous media for the inactivation of Pseudomonas fluorescens cells
Xianhui Zhang, Dongping Liu, Ying Song, Yue Sun, Si-ze Yang
Phys. Plasmas, Vol: 20, No: 5 , published: 01 May 2013
Cold atmospheric plasma in cancer therapy
Michael Keidar, Alex Shashurin, Olga Volotskova, Mary Ann Stepp, Priya Srinivasan, Anthony Sandler, Barry Trink
Phys. Plasmas, Vol: 20, No: 5 , published: 01 May 2013
Central peaking of magnetized gas discharges
Francis F. Chen, Davide Curreli
Phys. Plasmas, Vol: 20, No: 5 , published: 01 May 2013
Tailoring Surface Properties of Polymeric Separators for Lithium-Ion Batteries by Cyclonic Atmospheric-Pressure Plasma
Chun Huang, Chi-Cheng Lin, Ching-Yuan Tsai, Ruey-Shin Juang
Plasma Processes and Polymers, Vol: 10, No: 5 , published: 01 May 2013
Surface Patterning by Local Plasma Jet Sacrificial Oxidation of Silicon
Hendrik Paetzelt, Thomas Arnold, Georg Böhm, Fred Pietag, Axel Schindler
Plasma Processes and Polymers, Vol: 10, No: 5 , published: 01 May 2013
Plasma Induced Graft Polymerization of C6 Fluorocarbons on Cotton Fabrics for Sustainable Finishing Applications
Amsarani Ramamoorthy, Ahmed El-Shafei, Peter Hauser
Plasma Processes and Polymers, Vol: 10, No: 5 , published: 01 May 2013
A Facile Approach for Direct Decomposition of Nitrous Oxide Assisted by Non-Thermal Plasma
Shaik Mahammadunnisa, Enkonda Linga Reddy, Pathpi Reddy Manoj Kumar Reddy, Challapalli Subrahmanyam
Plasma Processes and Polymers, Vol: 10, No: 5 , published: 01 May 2013
The Mechanism of Plasma Destruction of Enalapril and Related Metabolites in Water
Monica Magureanu, Daniela Dobrin, Nicolae Bogdan Mandache, Corina Bradu, Andrei Medvedovici, Vasile I. Parvulescu
Plasma Processes and Polymers, Vol: 10, No: 5 , published: 01 May 2013
Chemically Polymerization Mechanism of Aromatic Compounds under Atmospheric Pressure Plasma Conditions
Mihai Asandulesa, Ionut Topala, Valentin Pohoata, Yves Marie Legrand, Marius Dobromir, Marian Totolin, Nicoleta Dumitrascu
Plasma Processes and Polymers, Vol: 10, No: 5 , published: 01 May 2013
Plasma Etching of Silk Fibroin: Experiments and Models
Jayasri Narayanamoorthy, Konstantinos Tsioris, Fiorenzo G. Omenetto, Jeffrey Hopwood
Plasma Processes and Polymers, Vol: 10, No: 5 , published: 01 May 2013
Superhydrophobic Transparent Surface of Nanostructured Poly(Methyl Methacrylate) Enhanced by a Hydrolysis Reaction
E. K. Her, T.-J. Ko, B. Shin, H. Roh, W. Dai, W. K. Seong, H.-Y. Kim, K.-R. Lee, K. H. Oh, M.-W. Moon
Plasma Processes and Polymers, Vol: 10, No: 5 , published: 01 May 2013
Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher
Vladimir Milosavljević, Niall MacGearailt, P. J. Cullen, Stephen Daniels, Miles M. Turner
J. Appl. Phys. , Vol: 113, No: 16 , published: 28 April 2013
Free carrier plasma optical response and dynamics in strongly pumped silicon nanopillars
D. Chekulaev, V. Garber, A. Kaplan
J. Appl. Phys. , Vol: 113, No: 14 , published: 14 April 2013
Photoluminescence of nanoparticles in vapor phase of colliding plasma
Shyam L. Gupta, Raj K. Thareja
J. Appl. Phys. , Vol: 113, No: 14 , published: 14 April 2013
The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition
Johnson Wong, Davit Yeghikyan, Nazir P. Kherani
J. Appl. Phys. , Vol: 113, No: 13 , published: 07 April 2013
Optical spectroscopy and spectroscopic ellipsometry as a monitor for thin film growth by dc magnetron sputtering
N. Abundiz-Cisneros, A. Perez-Garcia, M. Gomez-Muñoz, R. Machorro
J. Appl. Phys. , Vol: 113, No: 13 , published: 07 April 2013
Helium plasma implantation on metals: Nanostructure formation and visible-light photocatalytic response
Shin Kajita, Tomoko Yoshida, Daiki Kitaoka, Reo Etoh, Miyuki Yajima, Noriyasu Ohno, Hisao Yoshida, Naoaki Yoshida, Yoshitaka Terao
J. Appl. Phys. , Vol: 113, No: 13 , published: 07 April 2013
Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution
İlker Doğan, Nicolaas J. Kramer, René H. J. Westermann, Kateřina Dohnalová, Arno H. M. Smets, Marcel A. Verheijen, Tom Gregorkiewicz, Mauritius C. M. van de Sanden
J. Appl. Phys. , Vol: 113, No: 13 , published: 07 April 2013
Synthesis and magnetic properties of Cr doped ZnO films via radio frequency plasma deposition
Z.F. Wu, Y.J. Cao, F. Zhang
Vacuum, Vol: 90, No: , published: 01 April 2013
Low-energy ion beam bombardment of human cancer cells in vacuum to induce DNA transfection
W. Wongkham, R. Sririwichitchai, K. Inthanon, T. Puangwanna, M. Nambuddee, P. Thongkumkoon, K. Prakrajang, L.D. Yu
Vacuum, Vol: 90, No: , published: 01 April 2013
Growth of WC–Cr–N and WC–Al–N coatings in a RF-magnetron sputtering process
Andrei V. Stanishevsky, Michael J. Walock, Yujiao Zou, Luc Imhoff, Amel Zairi, Corinne Nouveau
Vacuum, Vol: 90, No: , published: 01 April 2013
The influence of temperature and nitrogen pressure on S-phase coatings deposition by reactive magnetron sputtering
J. Baranowska, S. Fryska, T. Suszko
Vacuum, Vol: 90, No: , published: 01 April 2013
Relation between microstructure and hardness of nano-composite CrN/Si3N4 coatings obtained using CrSi single target magnetron system
Jerzy Morgiel, Justyna Grzonka, Ryszard Mania, Sławomir Zimowski, Janos L. Labar, Zsolt Fogarassy
Vacuum, Vol: 90, No: , published: 01 April 2013
Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges
Steffen Drache, Vitezslav Stranak, Ann-Pierra Herrendorf, Martin Cada, Zdenek Hubicka, Milan Tichy, Rainer Hippler
Vacuum, Vol: 90, No: , published: 01 April 2013
Superhigh-Rate Epitaxial Silicon Thick Film Deposition from Trichlorosilane by Mesoplasma Chemical Vapor Deposition
Sudong Wu, Makoto Kambara, Toyonobu Yoshida
Plasma Chem. Plasma Process., Vol: 33, No: 2 , published: 01 April 2013
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma: modeling and experimental investigation
K. Van Laer, S. Tinck, V. Samara, J. F. de Marneffe, A. Bogaerts
Plasma Sources Sci. and Technol., Vol: 22, No: 2 , published: 01 April 2013
Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films
S. Bornholdt, N. Itagaki, K. Kuwahara, H. Wulff, M. Shiratani, H. Kersten
Plasma Sources Sci. and Technol., Vol: 22, No: 2 , published: 01 April 2013
Plasma Science and Technology in the Limit of the Small: Microcavity Plasmas and Emerging Applications
Eden J.G., Park S.-J., Cho J.H., Kim M.H., Houlahan T.J., Li  B., Kim E.S., Kim T.L., Lee S.K., Kim K.S., Yoon J.K., Sung S.H., Sun P., Herring C.M., Wagner C.J.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 4 , published: 01 April 2013
Control of Surface Degradation on Biodegradable Magnesium Alloys by Plasma-Based Technology
Chu P.K.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 4 , published: 01 April 2013
Effects of Increasing Magnetic Field and Decreasing Pressure on Asymmetric Magnetron Radio Frequency {\rm Ar}/{\rm O}_{2} Discharges
Benyoucef D., Yousfi M.
IEEE Trans. Plasma Sci. Pt 3, Vol: 41, No: 4 , published: 01 April 2013
New Solutions of the Corona Discharge Equation for Applications in Waveguide Filters in SAT-COM
Chavarria P.A.C., Sanchez I.M.
IEEE Trans. Plasma Sci. Pt 3, Vol: 41, No: 4 , published: 01 April 2013
Improvement of Luminous Efficacy Using Short Sustain Pulsewidth and Long Off-Time Between Sustain Pulses in AC Plasma Display Panel
Kim D.-M., Shin B.J., Tae H.-S., Seo J.H.
IEEE Trans. Plasma Sci. Pt 3, Vol: 41, No: 4 , published: 01 April 2013
Study on Plasma Agent Effect of a Direct-Current Atmospheric Pressure Oxygen-Plasma Jet on Inactivation of E. coli Using Bacterial Mutants
Li J., Sakai N., Watanabe M., Hotta E., Wachi M.
IEEE Trans. Plasma Sci. Pt 3, Vol: 41, No: 4 , published: 01 April 2013
Influence of a Circuit Parameter for Plasma Water Treatment by an Inductive Energy Storage Circuit Using Semiconductor Opening Switch
Sugai T., Liu W., Tokuchi A., Jiang W., Minamitani Y.
IEEE Trans. Plasma Sci. Pt 3, Vol: 41, No: 4 , published: 01 April 2013
Experimental Study of a Submillimeter Spark-Gap
Santamaria F., Roman F.
IEEE Trans. Plasma Sci. Pt 3, Vol: 41, No: 4 , published: 01 April 2013
Design and Experimental Realization of a New Pulsed Power Supply Based on the Energy Transfer Between Two Capacitors and an HTS Air-Core Pulsed Transformer
Wu R., Wang Y., Yan Z., Luo W., Gui Z.
IEEE Trans. Plasma Sci. Pt 3, Vol: 41, No: 4 , published: 01 April 2013
Morphological Description of Ultra-Smooth Organo-Silicone Layers Synthesized Using Atmospheric Pressure Dielectric Barrier Discharge Assisted PECVD
Peter Antony Premkumar, Sergey A. Starostin, Hindrik de Vries, Mariadriana Creatore, Paul M. Koenraad, Mauritius C. M. van de Sanden
Plasma Processes and Polymers, Vol: 10, No: 4 , published: 01 April 2013
“Plasma-Click” Based Strategy for Obtaining Antibacterial Surfaces on Implants
Iñigo Braceras, Joseba Oyarbide, Patxi Azpiroz, Nerea Briz, Enrique Ipiñazar, Noelia Álvarez, Garbiñe Atorrasagasti, Raluca M. Fratila, Jesus M. Aizpurua
Plasma Processes and Polymers, Vol: 10, No: 4 , published: 01 April 2013
Plasma Polymer Membranes for Immobilising Metalloporphyrins
Nicolas D. Boscher, David Duday, Philip Heier, Katja Heinze, Florian Hilt, Patrick Choquet
Plasma Processes and Polymers, Vol: 10, No: 4 , published: 01 April 2013
Rapid Micro-Scale Patterning of Alkanethiolate Self-Assembled Monolayers on Au Surface by Atmospheric Micro-Plasma Stamp
Chih-Chiang Weng, Jen-Chih Hsueh, Jiunn-Der Liao, Chia-Hao Chen, Masahiro Yoshimura
Plasma Processes and Polymers, Vol: 10, No: 4 , published: 01 April 2013
Fluorocarbon Plasma Polymer Deposition by an Atmospheric Pressure Microplasma Jet Using Different Precursor Molecules – A Comparative Study
Andreas Vogelsang, Andreas Ohl, Rüdiger Foest, Klaus-Dieter Weltmann
Plasma Processes and Polymers, Vol: 10, No: 4 , published: 01 April 2013
Enhancing the efficiency of slow-wave electron cyclotron masers with the tapered refractive index
Ling-Bao Kong, Zhi-Ling Hou, Jian Jing, Hai-Bo Jin, Chao-Hai Du
Phys. Plasmas, Vol: 20, No: 4 , published: 01 April 2013
The effect of microscopic texture on the direct plasma surface passivation of Si solar cells
S. Mehrabian, S. Xu, A. A. Qaemi, B. Shokri, C. S. Chan, K. Ostrikov
Phys. Plasmas, Vol: 20, No: 4 , published: 01 April 2013
Growth of tungsten nanoparticles in direct-current argon glow discharges
Kishor Kumar K., L. Couëdel, C. Arnas
Phys. Plasmas, Vol: 20, No: 4 , published: 01 April 2013
Designing Atmospheric-Pressure Plasma Sources for Surface Engineering of Nanomaterials
Wei Yan, Zhao Jun Han, Wen Zheng Liu, Xin Pei Lu, B. Toan Phung, Kostya Ostrikov
Plasma Chem. Plasma Process., Vol: 33, No: 2 , published: 01 April 2013
Sustainable Nanoscience for a Sustainable Future
Ostrikov K.
IEEE Trans. Plasma Sci. Pt 1, Vol: 41, No: 4 , published: 01 April 2013
Etching Characteristics and Mechanisms of Mo and Al2O3 Thin Films in O2/Cl2/Ar Inductively Coupled Plasmas: Effect of Gas Mixing Ratios
Sungchil Kang, Alexander Efremov, Sun Jin Yun, Jinyoung Son, Kwang-Ho Kwon
Plasma Chem. Plasma Process., Vol: 33, No: 2 , published: 01 April 2013
Chemical Characterization of the Long-Term Ageing of Nitrogen-Rich Plasma Polymer Films under Various Ambient Conditions
Pierre-Luc Girard-Lauriault, Paul M. Dietrich, Thomas Gross, Thomas Wirth, Wolfgang E. S. Unger
Plasma Processes and Polymers, Vol: 10, No: 4 , published: 01 April 2013
Characteristics of high-purity Cu thin films deposited on polyimide by radio-frequency Ar/H2 atmospheric-pressure plasma jet
P. Zhao, W. Zheng, Y. D. Meng, M. Nagatsu
J. Appl. Phys. , Vol: 113, No: 12 , published: 28 March 2013
Elementary processes of H2 plasma-graphene interaction: A combined molecular dynamics and density functional theory study
E. Despiau-Pujo, A. Davydova, G. Cunge, L. Delfour, L. Magaud, D. B. Graves
J. Appl. Phys. , Vol: 113, No: 11 , published: 21 March 2013
Ion impact distribution over plasma exposed nanocone arrays
S. Mehrabian, S. Xu, A. A. Qaemi, B. Shokri, K. Ostrikov
Phys. Plasmas, Vol: 20, No: 3 , published: 01 March 2013
Modeling of InP Etching Under ICP Cl2/Ar/N2 Plasma Mixture: Effect of N2 on the Etch Anisotropy Evolution
Romain Chanson, Ahmed Rhallabi, Marie Claude Fernandez, Christophe Cardinaud
Plasma Processes and Polymers, Vol: 10, No: 3 , published: 01 March 2013
Chemical and Physical Sputtering of Polyethylene Terephthalate (PET)
Simon Große-Kreul, Carles Corbella, Achim von Keudell
Plasma Processes and Polymers, Vol: 10, No: 3 , published: 01 March 2013
Antimicrobial Activity and Cyto-Compatibility of Plasma Polymerized Zinc Acetylacetonate Thin Films
Kerstin Malzahn, Luis Duque, Peter Ciernak, Steffi Wiesenmüller, Katja Bender, Renate Förch
Plasma Processes and Polymers, Vol: 10, No: 3 , published: 01 March 2013
Plasma Polymerization of APTES to Elaborate Nitrogen Containing Organosilicon Thin Films: Influence of Process Parameters and Discussion About the Growing Mechanisms
Elodie Lecoq, David Duday, Simon Bulou, Gilles Frache, Florian Hilt, Rémy Maurau, Patrick Choquet
Plasma Processes and Polymers, Vol: 10, No: 3 , published: 01 March 2013
Modification of Enamel and Dentin Surfaces by Non-Thermal Atmospheric Plasma
Antje Lehmann, André Rueppell, Axel Schindler, Isabella-Maria Zylla, Hans Jürgen Seifert, Frank Nothdurft, Matthias Hannig,  Stefan Rupf
Plasma Processes and Polymers, Vol: 10, No: 3 , published: 01 March 2013
Insights in the Architecture of Silicon-Based Plasma Polymers Using Partial Network Ethanolysis Combined with Electrospray Tandem Mass Spectrometry
Thierry Fouquet, Julien Petersen, Fabio Ziarelli, Jérôme Bour, Valérie Toniazzo, David Ruch, Laurence Charles
Plasma Processes and Polymers, Vol: 10, No: 3 , published: 01 March 2013
Effect of Particle Size on Silver Nanoparticle Deposition onto Dielectric Barrier Discharge (DBD) Plasma Functionalized Polyamide Fabric
Nguyen Khanh Vu, Andrea Zille, Fernando Ribeiro Oliveira, Noémia Carneiro, Antonio Pedro Souto
Plasma Processes and Polymers, Vol: 10, No: 3 , published: 01 March 2013
Examination of the Degreasing of Metal Surfaces by the Use of a Plasma Torch
K.T.A.L. Burm
Contrib. Plasma Phys., Vol: 53, No: 3 , published: 01 March 2013
Ultrathin Polymer Films for Short-Pulse Laser-Driven Proton, Deuteron, and Carbon Ion Beams
Christopher E. Hamilton, Nickolaus A. Smith, Kimberly A. Defriend Obrey
Fusion Science and Technology, Vol: 63, No: 2 , published: 01 March 2013
Recent Advances in the Fabrication of Very Thick, Multistepped Iron and Tantalum Films for EOS Targets
P. B. Mirkarimi, K. A. Bettencourt, N. E. Teslich, S. C. Peterson
Fusion Science and Technology, Vol: 63, No: 2 , published: 01 March 2013
Hexagonally Arranged Nanopore Film Fabricated via Selective Etching by 172-nm Vacuum Ultraviolet Light Irradiation
Motonori Komura, Kaori Kamata, Tomokazu Iyoda, Keiji Nagai
Fusion Science and Technology, Vol: 63, No: 2 , published: 01 March 2013
Dental Applications of Low-Temperature Nonthermal Plasmas
Gyoo Cheon Kim, Hyun Wook Lee, June Ho Byun, Jin Chung, Young Chan Jeon, Jae Koo Lee
Plasma Processes and Polymers, Vol: 10, No: 3 , published: 01 March 2013
Examination of aluminium and zinc plasmas from an inductive furnace by spectroscopy
K. T. A. L. Burm
J. Plasma Phys., Vol: 79, No: 1 , published: 01 February 2013
Effect of voltage pulse characteristics on high-power impulse magnetron sputtering of copper
Tomáš Kozák, Jaroslav Vlček
Plasma Sources Sci. and Technol., Vol: 22, No: 1 , published: 01 February 2013
Measurement of the plasma and neutral gas flow velocities in a low-pressure hollow-cathode plasma jet sputtering system
J. Klusoň, P. Kudrna, M. Tichý
Plasma Sources Sci. and Technol., Vol: 22, No: 1 , published: 01 February 2013
Simulation of transient energy distributions in sub-ns streamer formation
C. S. MacLachlan, H. E. Potts, D. A. Diver
Plasma Sources Sci. and Technol., Vol: 22, No: 1 , published: 01 February 2013
Adsorption of Acid Orange II from Aqueous Solution by Plasma Modified Activated Carbon Fibers
Du ChangMing, Huang DongWei, Li HongXia, Xiao MuDan, Wang Kui, Zhang Lu, Li ZhiYi, Chen TengFei, Mo JianMin, Gao Dong, Huang YuHao, Liu ShangKun, Yu Liao, Zhang ChuangRong
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
High Power DC Diaphragm Discharge Excited in a Vapor Bubble for the Treatment of Water
P. Lukes, M. Clupek, V. Babicky, E. Spetlikova, I. Sisrova, E. Marsalkova, B. Marsalek
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Low-Pressure Plasma Polymerization of Acetylene–Ammonia Mixtures for Biomedical Applications
Angel Contreras-García, Michael R. Wertheimer
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Applications of Plasma Technology in Development of Superhydrophobic Surfaces
Reza Jafari, Siavash Asadollahi, Masoud Farzaneh
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Synthesis and Swelling Behaviors of P(AMPS-co-AAc) Superabsorbent Hydrogel Produced by Glow-Discharge Electrolysis Plasma
Jie Yu, Yuanpei Pan, Quanfang Lu, Wu Yang, Jinzhang Gao, Yan Li
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Mapping Plasma Chemistry in Hydrocarbon Fuel Processing Processes
Dae Hoon Lee, Kwan-Tae Kim, Young-Hoon Song, Woo Suk Kang, Sungkwon Jo
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Study of the Production of Hydrogen and Light Hydrocarbons by Spark Discharges in Diesel, Kerosene, Gasoline, and Methane
Muhammad Arif Malik, David Hughes, Areej Malik, Shu Xiao, Karl H. Schoenbach
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Experimental Investigation of Plasma Oxidization of Diesel Particulate Matter
Xiujuan Tang, Haiquan Lu, Lili Lin, Shuiliang Yao
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Degradation of PCDD/Fs in Fly Ash by Vortex-shaped Gliding Arc Plasma
Yong Ren, Xiaodong Li, Liang Yu, Kui Cheng, Jianhua Yan, Changming Du
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Fullerene C60 Trichloromethylation Through CCl4 Plasmalysis or Sonolysis
Franco Cataldo, Ornella Ursini, Pietro Ragni
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Physical Properties of Silver Oxide Thin Film Prepared by DC Magnetron Sputtering: Effect of Oxygen Partial Pressure During Growth
Hamid Entezar Mehdi, M. R. Hantehzadeh, Sh. Valedbagi
J. Fusion Energy, Vol: 32, No: 1 , published: 01 February 2013
Quasimonoenergetic proton bunches generation from doped foil targets irradiated by intense lasers
Yun-Qian Cui, Wei-Min Wang, Zheng-Ming Sheng, Yu-Tong Li, Jie Zhang
Phys. Plasmas, Vol: 20, No: 2 , published: 01 February 2013
Plasma Functionalization of Carbon Nanotubes for the Synthesis of Stable Aqueous Nanofluids and Poly(vinyl alcohol) Nanocomposites
Nathan Hordy, Sylvain Coulombe, Jean-Luc Meunier
Plasma Processes and Polymers, Vol: 10, No: 2 , published: 01 February 2013
Understanding the Synthesis of Ethylene Glycol Pulsed Plasma Discharges
Gabriel Padron Wells, Isabel Cristina Estrada-Raygoza, P. L. Stephan Thamban, Caleb T. Nelson, Chin-Wook Chung, Lawrence J. Overzet, Matthew J. Goeckner
Plasma Processes and Polymers, Vol: 10, No: 2 , published: 01 February 2013
Non-Oxidative Conversion of 1,2-Dichloroethane in a Non-Thermal Plasma and Characterisation of the Polymer Formed
Vaibhav Gaikwad, Eric Kennedy, John Mackie, Clovia Holdsworth, Scott Molloy, Sazal Kundu,  Bogdan Dlugogorski
Plasma Processes and Polymers, Vol: 10, No: 2 , published: 01 February 2013
Wood Protective Fungicidal Treatment: Quaternary Ammonium Molecules Grafting on Cellulose Assisted by Afterglows at Atmospheric Pressure
Elodie Lecoq, Jacques Desbrieres, Franck Clement, Charlotte Leclaire, Bernard Held
Plasma Processes and Polymers, Vol: 10, No: 2 , published: 01 February 2013
Antimicrobial Efficacy of an Atmospheric Pressure Plasma Jet Against Biofilms of Pseudomonas aeruginosa and Staphylococcus epidermidis
Rutger Matthes, Ina Koban, Claudia Bender, Kai Masur, Eckhard Kindel, Klaus-Dieter Weltmann, Thomas Kocher, Axel Kramer,  Nils-Olaf Hübner
Plasma Processes and Polymers, Vol: 10, No: 2 , published: 01 February 2013
Plasma Deactivation of Endotoxic Biomolecules: Vacuum Ultraviolet Photon and Radical Beam Effects on Lipid A
Ting-Ying Chung, Ning Ning, Jhih-Wei Chu, David B. Graves, Elliot Bartis, Joonil Seog, Gottlieb S. Oehrlein
Plasma Processes and Polymers, Vol: 10, No: 2 , published: 01 February 2013
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma
Shu-Xia Zhao, Fei Gao, You-Nian Wang, Annemie Bogaerts
Plasma Sources Sci. and Technol., Vol: 22, No: 1 , published: 01 February 2013
Deposition of π-Conjugated Polycyanate Ester Thin Films and Their Dielectric Properties
Xiong-Yan Zhao, Ming-Zhu Wang
Plasma Chem. Plasma Process., Vol: 33, No: 1 , published: 01 February 2013
Plasma processing of low-k dielectrics
Mikhail R. Baklanov, Jean-Francois de Marneffe, Denis Shamiryan, Adam M. Urbanowicz, Hualiang Shi, Tatyana V. Rakhimova, Huai Huang, Paul S. Ho
J. Appl. Phys. , Vol: 113, No: 4 , published: 28 January 2013
Criteria of radio-frequency ring-shaped hollow cathode discharge using H2 and Ar gases for plasma processing
Yasunori Ohtsu, Yujiro Kawasaki
J. Appl. Phys. , Vol: 113, No: 3 , published: 21 January 2013
Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells
Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
J. Appl. Phys. , Vol: 113, No: 3 , published: 21 January 2013
Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition
Ryan Comes, Man Gu, Mikhail Khokhlov, Hongxue Liu, Jiwei Lu, Stuart A. Wolf
J. Appl. Phys. , Vol: 113, No: 2 , published: 14 January 2013
Revisiting the mechanisms involved in Line Width Roughness smoothing of 193 nm photoresist patterns during HBr plasma treatment
M. Brihoum, R. Ramos, K. Menguelti, G. Cunge, E. Pargon, O. Joubert
J. Appl. Phys. , Vol: 113, No: 1 , published: 07 January 2013
Surface loss probability of H radicals on silicon thin films in SiH4/H2 plasma
Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
J. Appl. Phys. , Vol: 113, No: 1 , published: 07 January 2013
Measuring the energy flux at the substrate position during magnetron sputter deposition processes
P.-A. Cormier, A. Balhamri, A.-L. Thomann, R. Dussart, N. Semmar, J. Mathias, R. Snyders, S. Konstantinidis
J. Appl. Phys. , Vol: 113, No: 1 , published: 07 January 2013
Evaluation of the effects of plasma nitriding temperature and time on the characterisation of Ti 6Al 4V alloy
S.R. Hosseini, A. Ahmadi
Vacuum, Vol: 87, No: 1 , published: 01 January 2013
Plasma Low-Pressure Nonsteady Diffusion Fluid Model for Pulsed Plasma Recovery
Li Y., Zheng B., Lei M. K.
IEEE Trans. Plasma Sci., Vol: 41, No: 1 , published: 01 January 2013
Hydrogen Production From Partial Oxidation of Methane Using an AC Rotating Gliding Arc Reactor
Li X. D., Zhang H., Yan S. X., Yan J. H., Du C. M.
IEEE Trans. Plasma Sci., Vol: 41, No: 1 , published: 01 January 2013
Gas Flow Effect on E. coli and B. subtilis Bacteria Inactivation in Water Using a Pulsed Dielectric Barrier Discharge
Rodriguez-Mendez B. G., Hernandez-Arias A. N., Lopez-Callejas R., Valencia-Alvarado R., Mercado-Cabrera A., Pena-Eguiluz R., Barocio-Delgado S. R., Munoz-Castro A. E., de la Piedad-Beneitez A.
IEEE Trans. Plasma Sci., Vol: 41, No: 1 , published: 01 January 2013
NH2 and NH Surface Production in Pulsed NH3 Plasmas on TiO2: A Steady-State Probe of Short Pulse Plasmas
Daniel J. V. Pulsipher, Ellen R. Fisher
Plasma Processes and Polymers, Vol: 10, No: 1 , published: 01 January 2013
Effects of Varying Heptylamine and Propionaldehyde Plasma Polymerization Parameters on Mesenchymal Stem Cell Attachment
Anne M. Sandstrom, Marek Jasieniak, Hans J. Griesser, Lisbeth Grøndahl, Justin J. Cooper-White
Plasma Processes and Polymers, Vol: 10, No: 1 , published: 01 January 2013
Deposition and Characterization of a Low-εr Thin Film Based on Plasma-Polymerized 4-Cumylphenol Cyanate Ester
Xiong-Yan Zhao, Ming-Zhu Wang, Zhan-Ying Sun
Plasma Processes and Polymers, Vol: 10, No: 1 , published: 01 January 2013
Plasma Polymerization of a Saturated Branched Hydrocarbon. The Case of Heptamethylnonane
Caroline De Vos, Nicolas Vandencasteele, Alexandros Kakaroglou, Bernard Nisol, Iris de Graeve, Guy Van Assche, Bruno Van Mele, Herman Terryn, François Reniers
Plasma Processes and Polymers, Vol: 10, No: 1 , published: 01 January 2013
Track by Track: The Structure of Single Tracks of Atmospheric Pressure Plasma Polymerized Hexamethyl Disiloxane (HMDSO) Analyzed by Infrared Microscopy
Christian Merten, Christoph Regula, Andreas Hartwig, Jörg Ihde, Ralph Wilken
Plasma Processes and Polymers, Vol: 10, No: 1 , published: 01 January 2013
Effect of Discharge Parameters and Surface Characteristics on Ambient-Gas Plasma Disinfection
Matthew J. Pavlovich, Zhi Chen, Yukinori Sakiyama, Douglas S. Clark, David B. Graves
Plasma Processes and Polymers, Vol: 10, No: 1 , published: 01 January 2013
Low Temperature Deposition of Antibacterially Active Silicon Oxide Layers Containing Silver Nanoparticles, Prepared by Atmospheric Pressure Plasma Chemical Vapor Deposition
Oliver Beier, Andreas Pfuch, Kerstin Horn, Jürgen Weisser, Matthias Schnabelrauch, Arnd Schimanski
Plasma Processes and Polymers, Vol: 10, No: 1 , published: 01 January 2013
The Brush-Shape Device Used to Generate Atmospheric and Homogeneous Plasmas for Biomedical Applications
Ying Song, Dongping Liu, Wenchun Wang, Longfei Ji, Qi Zhang, Weiyuan Ni, Jinhai Niu
Plasma Processes and Polymers, Vol: 10, No: 1 , published: 01 January 2013
Experimental Study of the Discharge in the Low Pressure Plasma Jet Sputtering System
J. Klusoiň, P. Kudrna, A. Kolpaková, I. Picková, Z. Hubička, M. Tichý
Contrib. Plasma Phys., Vol: 53, No: 1 , published: 01 January 2013
Modeling of plasma chemistry in an atmospheric pressure Ar/NH3 cylindrical dielectric barrier discharge described using the one-dimensional fluid model
Zhi Li, Zhen Zhao, Xuehui Li
Phys. Plasmas, Vol: 20, No: 1 , published: 01 January 2013
Plasma Etching of Poly(dimethylsiloxane): Roughness Formation, Mechanism, Control, and Application in the Fabrication of Microfluidic Structures
Maria-Elena Vlachopoulou, George Kokkoris, Christophe Cardinaud, Evangelos Gogolides, Angeliki Tserepi
Plasma Processes and Polymers, Vol: 10, No: 1 , published: 01 January 2013
Study on the Hydrogenated Diamond-Like Carbon Films Synthesized by RF-PECVD from n-decane
Feisal Kroushawi, Hamid Latifi, Seyed Iman Hosseini, Marzieh Abbasi Firuzjah, Babak Shokri
J. Fusion Energy, Vol: 31, No: 6 , published: 05 December 2012
Ion energy distributions measured inside a high-voltage cathode in a BF3 pulsed dc plasma used for plasma doping: experiments and ab initio calculations
Ludovic Godet, Svetlana Radovanov, Jay Sheuer, Christophe Cardinaud, Nicolas Fernandez, Yves Ferro, Gilles Cartry
Plasma Sources Sci. and Technol., Vol: 21, No: 6 , published: 03 December 2012
TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma
Y. Klenko, J. Pichal
Plasma Chem. Plasma Process., Vol: 32, No: 6 , published: 02 December 2012
Melting Refining Mechanisms in Supersonic Atmospheric Plasma Spraying
Wei Tao Zhao, Jiu Hui Wu, Yu Bai, Zhi Hai Han
Plasma Chem. Plasma Process., Vol: 32, No: 6 , published: 02 December 2012
Controllable Modification of Polymer Membranes by Long-Distance and Dynamic Low-Temperature Plasma Flow: Long-Distance and Dynamic Characteristics
Zhi-Ping Zhao, Ning Li, Mei-Sheng Li , Yue Zhang
Plasma Chem. Plasma Process., Vol: 32, No: 6 , published: 02 December 2012
Plasma Jet Ignition of Propane–Air Stoichiometric Mixture (Flat Jet)
Ardelyan N. V., Bychkov V. L., Kosmachevskii K. V.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 12 , published: 01 December 2012
Plasma Jet Ignition of a Propane–Air Stoichiometric Mixture (Cylindrical Jet)
Ardelyan N. V., Bychkov V. L., Kosmachevskii K. V.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 12 , published: 01 December 2012
Electrical Characterization of a Reverse Vortex Gliding Arc Reactor in Atmosphere
Guofeng X.
IEEE Trans. Plasma Sci. Pt 3, Vol: 40, No: 12 , published: 01 December 2012
Effect of Iron Addition on the Decomposition of Dye by Pulsed Discharge in Air With Water Droplets Spray
Nose T.
IEEE Trans. Plasma Sci. Pt 3, Vol: 40, No: 12 , published: 01 December 2012
Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition
Francoise Massines, Christian Sarra-Bournet, Fiorenza Fanelli, Nicolas Naudé and Nicolas Gherardi
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Plasma–Liquid Interactions at Atmospheric Pressure for Nanomaterials Synthesis and Surface Engineering
Davide Mariotti, Jenish Patel, Vladimir Švrček and Paul Maguire
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Atmospheric Pressure Deposition of Thin Functional Coatings: Polymer Surface Patterning by DBD and Post-Discharge Polymerization of Liquid Vinyl Monomer from Surface Radicals
Jean-Pascal Borra, Alexandre Valt, Farzi Arefi-Khonsari and Michael Tatoulian
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure
Rüdiger Reuter, Katja Rügner, Dirk Ellerweg, Teresa de los Arcos, Achim von Keudell and Jan Benedikt
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Localized Growth of Silicon Oxide Nanowires by Micro-Afterglow Oxidation
Grégory Arnoult, Thomas Gries, Gérard Henrion, Sylvie Migot, Vincent Fournée and Thierry Belmonte
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Insights into the Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition of Thin Films from Methyldisiloxane Precursors
Fiorenza Fanelli, Sara Lovascio, Riccardo d'Agostino and Francesco Fracassi
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Synthesis of Membrane-Electrode Assembly for Fuel Cells by Means of (Sub)-Atmospheric Plasma Processes
Delphine Merche, Thierry Dufour, Julie Hubert, Claude Poleunis, Sami Yunus, Arnaud Delcorte, Patrick Bertrand and François Reniers
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Plasma-Induced Damage and Surface Functionalization of Double-Walled Carbon Nanotubes Using Atmospheric Pressure RF Discharge
Tomohiro Nozaki, Shinpei Yoshida and Ken Okazaki
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Deposition of Hydrophobic Functional Groups on Wood Surfaces Using Atmospheric-Pressure Dielectric Barrier Discharge in Helium-Hexamethyldisiloxane Gas Mixtures
Olivier Levasseur, Luc Stafford, Nicolas Gherardi, Nicolas Naudé, Vincent Blanchard, Pierre Blanchet, Bernard Riedl and Andranik Sarkissian
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Plasma Deposition of PEO-Like Coatings with Aerosol-Assisted Dielectric Barrier Discharges
Gabriella Da Ponte, Eloisa Sardella, Fiorenza Fanelli, Riccardo d'Agostino, Roberto Gristina and Pietro Favia
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
New Insights into Plasma-Assisted Dissociation of Organometallic Vapors for Gas-Phase Synthesis of Metal Nanoparticles
Pin Ann Lin, Ajay Kumar and R. Mohan Sankaran
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Surface Dynamics of SiO2-like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure
Peter Antony Premkumar, Sergey A. Starostin, Hindrik de Vries, Mariadriana Creatore, Paul M. Koenraad, William A. MacDonald and Mauritius C. M. van de Sanden
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Reduction of Plasticizer Leaching from PVC by Barrier Coatings Deposited Using DBD Processes at Atmospheric Pressure
Mercedes Cerezuela Barreto, Jochen Borris, Michael Thomas, Renate Hänsel, Michael Stoll and Claus-Peter Klages
Plasma Processes and Polymers, Vol: 9, No: 11-12 , published: 01 December 2012
Control of nanoparticle synthesis using physical and chemical dynamics of gas–liquid interfacial non-equilibrium plasmas
T. Kaneko, S. Takahashi and R. Hatakeyama
Plasma Phys. and Contr. Fusion, Vol: 54, No: 12 , published: 01 December 2012
Formation of surface nano-structures by plasma expansion induced by highly charged ions
W. M. Moslem, A. S. El-Said
Phys. Plasmas, Vol: 19, No: 12 , published: 01 December 2012
Non-electrostatic diagnostics for ion beams and sputter effects
T. Trottenberg, A. Spethmann, J. Rutscher and H. Kersten
Plasma Phys. and Contr. Fusion, Vol: 54, No: 12 , published: 01 December 2012
Numerical simulation of enhanced glow discharge plasma immersion ion implantation using three-dimensional PIC/MC model
He Fu-Shun, Li Liu-He, Li Fen, Dun Dan-Dan, Tao Chan-Cai
Acta phys. sin., Vol: 61, No: 22 , published: 20 November 2012
Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films
Marina Prenzel, Teresa de los Arcos, Annika Kortmann, Jörg Winter, Achim von Keudell
J. Appl. Phys. , Vol: 112, No: 10 , published: 15 November 2012
Towards a Particle Based Simulation of Complex Plasma Driven Nanocomposite Formation
M. Bonitz, L. Rosenthal, K. Fujioka, V. Zaporojtchenko, F. Faupel and H. Kersten
Contrib. Plasma Phys., Vol: 52, No: 10 , published: 09 November 2012
Cyclic powder formation during pulsed injection of hexamethyldisiloxane in an axially asymmetric radiofrequency argon discharge
B. Despax, K. Makasheva, H. Caquineau
J. Appl. Phys. , Vol: 112, No: 9 , published: 01 November 2012
Surface Modification of Polycarbonate by Atmospheric-Pressure Plasma Jets
Mello C.B., Kostov K.G., Machida M., de Oliveira Hein L.R., de Campos K.A.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 11 , published: 01 November 2012
Deposition of YSZ Thin Films by Atmospheric Plasma-Assisted Pulsed Laser Ablation
Zihao Ouyang, Tae-Seung Cho, Ruzic D.N.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 11 , published: 01 November 2012
Studies on the Physical Characteristics of the Radio-Frequency Atmospheric-Pressure Glow Discharge Plasmas for the Genome Mutation of Methylosinus trichosporium
He-Ping Li, Zhi-Bin Wang, Nan Ge, Pei-Si Le, Hao Wu, Yuan Lu, Li-Yan Wang, Chong Zhang, Cheng-Yu Bao, Xin-Hui Xing
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 11 , published: 01 November 2012
Investigation of Surface Etching of Poly(Ether Ether Ketone) by Atmospheric-Pressure Plasmas
Fricke K., Reuter S., Schroder D., Schulz-von der Gathen V., Weltmann K., von Woedtke T.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 11 , published: 01 November 2012
Comparison of Nonthermal Plasma Processes on the Surface Properties of Polystyrene and Their Impact on Cell Growth
Fricke K., Duske K., Quade A., Nebe B., Schroder K., Weltmann K.-D., von Woedtke T.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 11 , published: 01 November 2012
Highly Effective Large-Area Inactivation of B. subtilis Spore Using a Planar Dielectric Barrier Discharge Jet With  \hbox {CF}_{4} /Air Mixture
Yi-Wei Yang, Wu, J.-Y., Ming-Hung Chiang, Jong-Shinn Wu
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 11 , published: 01 November 2012
Design of Single-Disk RF Window for High-Power Gyrotron
Alaria M.K.
IEEE Trans. Plasma Sci. Pt 3, Vol: 40, No: 11 , published: 01 November 2012
Preparation of Aqueous Dispersion of Titanium Dioxide Nanoparticles using Plasma on Liquid Surface
Michiko Ito, Masahiro Hayakawa, Seigo Takashima, Etsuo Asami, Takeshi Aoki, Masato Oka, Hiroyuki Asano, Michiro Kitahara, Satoru Nakata, Koichi Yamaguchi, Yoshiaki Murase
Jpn. J. Appl. Phys., Vol: 51, No: 11R , published: 01 November 2012
Properties of Indium–Zinc-Oxide Films Synthesized by Radio Frequency Magnetron Sputtering Based on Gas Phase Monitoring Using Multi-Micro Hollow Cathode Lamp
Mari Inoue, Takayuki Ohta, Naoki Takota, Shigeki Tsuchitani, Seigo Takashima, Koji Yamakawa, Hiroyuki Kano, Keigo Takeda, Masaru Hori, Masafumi Ito
Jpn. J. Appl. Phys., Vol: 51, No: 11R , published: 01 November 2012
Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4 Plasma Etching of Silicon
L.L. Tezani, R.S. Pessoa, R.S. Moraes, H.S. Medeiros, C.A. Martins, H.S. Maciel, G. Petraconi Filho, M. Massi, A. S. da Silva Sobrinho
Contrib. Plasma Phys., Vol: 52, No: 9 , published: 11 October 2012
Using Mather-Type Plasma Focus Device for Fabrication of Tungsten Thin Films
M. T. Hosseinnejad, M. Shirazi, Z. Ghorannevis, M. Ghoranneviss, F. Shahgoli
J. Fusion Energy, Vol: 31, No: 5 , published: 11 October 2012
Photochemical Removal of Gaseous Elemental Mercury in a Dielectric Barrier Discharge Plasma Reactor
Hongmin Yang, Hao Liu, Hao Wu, Meng Wang
Plasma Chem. Plasma Process., Vol: 32, No: 5 , published: 11 October 2012
Enhancement of CO2 Conversion Rate and Conversion Efficiency by Homogeneous Discharges
Shuang Wang, Yong Zhang, Xiaolin Liu, Xiangrong Wang
Plasma Chem. Plasma Process., Vol: 32, No: 5 , published: 11 October 2012
Plasma Surface Modification of Biomedical Polymers: Influence on Cell-Material Interaction
Tinneke Jacobs, Rino Morent, Nathalie De GeyterPeter Dubruel, Christophe Leys
Plasma Chem. Plasma Process., Vol: 32, No: 5 , published: 11 October 2012
Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma
O. Grulich, Z. Kregar, M. Modic, A. Vesel, U. Cvelbar, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 5 , published: 11 October 2012
DBD Plasma Treatment of Titanium in O2, N2 and Air
S. Dahle, R. Gustus, W. Viöl, W. Maus-Friedrichs
Plasma Chem. Plasma Process., Vol: 32, No: 5 , published: 11 October 2012
Nano-texturing of Transparent Polymers with Plasma Etching: Tailoring Topography for a Low Reflectivity
Rosa Di Mundo, Mariagrazia Troia, Fabio Palumbo, Massimo Trotta and Riccardo d'Agostino
Plasma Processes and Polymers, Vol: 9, No: 10 , published: 02 October 2012
Silicon Patterning Using Self-assembled PS-b-PAA Diblock Copolymer Masks for Black Silicon Fabrication via Plasma Etching
Xin Zhang, Andrei B. Sushkov, Christopher J. Metting, Sean Fackler, H. Dennis Drew and R. M. Briber
Plasma Processes and Polymers, Vol: 9, No: 10 , published: 02 October 2012
Silicon Patterning Using Self-assembled PS-b-PAA Diblock Copolymer Masks for Black Silicon Fabrication via Plasma Etching
Xin Zhang, Andrei B. Sushkov, Christopher J. Metting, Sean Fackler, H. Dennis Drew and R. M. Briber
Plasma Processes and Polymers, Vol: 9, No: 10 , published: 02 October 2012
Ion-Beam Induced Surface Roughening of Poly-(methyl methacrylate) (PMMA) Tuned by a Mixture of Ar and O2 Ions
Wei Dai, Tae-Jun Ko, Kyu Hwan Oh, Kwang-Ryeol Lee and Myoung-Woon Moon
Plasma Processes and Polymers, Vol: 9, No: 10 , published: 02 October 2012
Plasma Polymerization of Acrylic Acid by Atmospheric Pressure Nitrogen Plasma Jet for Biomedical Applications
Olivier Carton, Dhia Ben Salem, Sudhir Bhatt, Jérôme Pulpytel and Farzaneh Arefi-Khonsari
Plasma Processes and Polymers, Vol: 9, No: 10 , published: 02 October 2012
An Investigation into the Dominant Reactions for Ethylene Destruction in Non-Thermal Atmospheric Plasmas
Robby Aerts, Xin Tu, Christophe De Bie, J. Christopher Whitehead and Annemie Bogaerts
Plasma Processes and Polymers, Vol: 9, No: 10 , published: 02 October 2012
Guiding of Reactive Plasma Species by Micro-Channels
Yang-Fang Li, Julia L. Zimmermann, Tobias Klämpfl and Gregor E. Morfill
Plasma Processes and Polymers, Vol: 9, No: 10 , published: 02 October 2012
Improved Bonding and Conductivity of Polypyrrole on Polyester by Gaseous Plasma Treatment
Tariq Mehmood, Xiujuan J. Dai, Akif Kaynak and Abbas Kouzani
Plasma Processes and Polymers, Vol: 9, No: 10 , published: 02 October 2012
Interaction of Argon, Hydrogen and Oxygen Plasma Early Afterglow with Polyvinyl Chloride (PVC) Materials
Zlatko Kregar, Marijan Bišćan, Slobodan Milošević, Miran Mozetič and Alenka Vesel
Plasma Processes and Polymers, Vol: 9, No: 10 , published: 02 October 2012
An investigation of the temporal evolution of plasma potential in a 60 MHz/2 MHz pulsed dual-frequency capacitively coupled discharge
Anurag Mishra, Min Hwan Jeon, Kyong Nam Kim and Geun Young Yeom
Plasma Sources Sci. and Technol., Vol: 21, No: 5 , published: 01 October 2012
Control of ion density distribution by magnetic traps for plasma electrons
Oleg Baranov, Maxim Romanov, Jinghua Fang, Uros Cvelbar, Kostya (Ken) Ostrikov
J. Appl. Phys. , Vol: 112, No: 7 , published: 01 October 2012
Synthesis of diamond fine particles on levitated seed particles in a rf CH4/H2 plasma chamber equipped with a hot filament
S. Shimizu, T. Shimizu, H. M. Thomas, G. Matern, R. W. Stark, M. Balden, S. Lindig, Y. Watanabe, W. Jacob, N. Sato, G. E. Morfill
J. Appl. Phys. , Vol: 112, No: 7 , published: 01 October 2012
Bactericidal Effect of Corona Discharges in Atmospheric Air
Timoshkin I.V., Maclean M., Wilson M.P., Given M.J., MacGregor S.J., Tao Wang,  Anderson J.G.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 10 , published: 01 October 2012
FPGA-Controlled All-Solid-State Nanosecond Pulse Generator for Biological Applications
Chenguo Yao, Ximing Zhang, Fei Guo, Shoulong Dong, Yan Mi, Caixin Sun
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 10 , published: 01 October 2012
Surface Cleaning Using an Atmospheric-Pressure Plasma Jet in \hbox {O}_{2}/\hbox {Ar} Mixtures
Ying Jin, Chun-Sheng Ren, Qian-Qian Fan, Huijie Yan, Zhifen Li, Jialiang Zhang, Dezhen Wang
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 10 , published: 01 October 2012
Effect of Low-Temperature Plasma on Deactivation of Hepatitis B Virus
Xing-Min Shi, Guan-Jun Zhang, Xi-Li Wu, Zhao-Yu Peng, Zeng-Hui Zhang, Xian-Jun Shao, Zheng-Shi Chang
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 10 , published: 01 October 2012
Surface Modification of DLC Film Due to Oxygen-Plasma Exposure, Observed by IR Absorption Spectroscopy in Multiple-Internal-Reflection Geometry
Shinohara M., Takaki Y., Takami Y., Matuda Y., Fujiyama H.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 10 , published: 01 October 2012
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl2/Ar Inductively Coupled Plasma
Daehee Kim, Alexander Efremov, Hanbyeol Jang, Sungchil Kang, Sun Jin Yun, Kwang-Ho Kwon
Jpn. J. Appl. Phys., Vol: 51, No: 10R , published: 01 October 2012
Modelling for the optimization of the reaction chamber in silicon nanoparticle synthesis by a radio-frequency induction thermal plasma
V Colombo, E Ghedini, M Gherardi and P Sanibondi
Plasma Sources Sci. and Technol., Vol: 21, No: 5 , published: 01 October 2012
Electrical and luminescent properties and deep traps spectra in GaN nanopillar layers prepared by dry etching
A. Y. Polyakov, Dae-Woo Jeon, N. B. Smirnov, A. V. Govorkov, E. A. Kozhukhova, E. B. Yakimov, In-Hwan Lee
J. Appl. Phys. , Vol: 112, No: 7 , published: 01 October 2012
Reconciling the Physical and Chemical Environments of Plasma: A Commentary on “Mechanisms of Plasma Polymerisation – Reviewed from a Chemical Point of View”
Jason David Whittle, David A. Steele and Robert D. Short
Plasma Processes and Polymers, Vol: 9, No: 9 , published: 11 September 2012
Comment on “Ion-Assisted Processes of Polymerization in Low-Pressure Plasmas”
Riccardo d'Agostino,  Fabio Palumbo
Plasma Processes and Polymers, Vol: 9, No: 9 , published: 11 September 2012
Etching and Deposition Mechanism of an Alcohol Plasma on Polycarbonate and Poly(Methyl Methacrylate): An Adhesion Promotion Mechanism for Plasma Deposited a:SiOxCyHz Coating
Colin J. Hall, Peter J. Murphy,  Hans J. Griesser
Plasma Processes and Polymers, Vol: 9, No: 9 , published: 11 September 2012
Plasma Directed Organization of Nanodots on Polymers: Effects of Polymer Type and Etching Time on Morphology and Order
Dimitrios Kontziampasis, Vassilios Constantoudis, Evangelos Gogolides
Plasma Processes and Polymers, Vol: 9, No: 9 , published: 11 September 2012
Plasma Processing: Technology for the Batch Fabrication of Carbon Nanotube Film Electrodes for Biointerfaces
Joon Hyub Kim, Myung Jin Lee, Eun Jin Park, Jun-Yong Lee, Cheol Jin Lee, Nam Ki Min
Plasma Processes and Polymers, Vol: 9, No: 9 , published: 11 September 2012
UV Grafting of a Vinyl Monomer Onto a Methanol Plasma Polymer
Benjamin W. Muir, Anna Tarasova
Plasma Processes and Polymers, Vol: 9, No: 9 , published: 11 September 2012
Cost Effective Deposition System for Nitrogen Incorporated Diamond-like Carbon Coatings
Sushil Kumar, Neeraj Dwivedi,  Manas Kumar Dalai
Plasma Processes and Polymers, Vol: 9, No: 9 , published: 11 September 2012
Mass Spectrometric Investigations on Aluminum Isopropoxide Containing Plasmas
Stefan Niemietz, Maik Fröhlich, Holger Kersten
Plasma Processes and Polymers, Vol: 9, No: 9 , published: 11 September 2012
Introduction of Basic Functionalities on the Surface of Granular Adsorbers by Low Pressure Plasma Processes
Nicoletta De Vietro, Riccardo d'Agostino, Francesco Fracassi
Plasma Processes and Polymers, Vol: 9, No: 9 , published: 11 September 2012
Numerical and Experimental Study of Residual Stress of Multilayer Diamond-Like Carbon Films Prepared by Filtered Cathodic Vacuum Arc Deposition
Xu Z.Y., Zheng Y.J., Sun H., Yong-xiang Leng, Huang N.
IEEE Trans. Plasma Sci., Vol: 40, No: 9 , published: 07 September 2012
Carbon-Nanotube-Triggered Pseudospark Switch
Haitao Zhao, Kirkici H.
IEEE Trans. Plasma Sci., Vol: 40, No: 9 , published: 07 September 2012
\hbox {BCl}_{3}/\hbox {Cl}_{2} -Based Inductively Coupled Plasma Etching of GaN/AlGaN Using Photoresist Mask
Rawal D.S., Malik H.K., Agarwal V.R., Kapoor A.K., Sehgal B.K., Muralidharan R.
IEEE Trans. Plasma Sci., Vol: 40, No: 9 , published: 07 September 2012
Photocatalytic thin Films Prepared by Plasma Curing of Non-Reactive Siloxane Dispersions Containing TiO2 Particles
M. Ott, C. Dölle, V. Danilov, A. Hartwig, J. Meichsner, D. Salz, C. Schmüser, O. Schorsch, M. Sebald, H.-E. Wagner and K.-D. Vissing
Contrib. Plasma Phys., Vol: 52, No: 7 , published: 30 August 2012
Comparison of (Cr0.75Al0.25)N Coatings Deposited by Conventional and High Power Pulsed Magnetron Sputtering
N. Bagcivan, K. Bobzin and S. Theiß
Contrib. Plasma Phys., Vol: 52, No: 7 , published: 30 August 2012
Microwave Plasma Sources -Applications in Industry
M. Kaiser, K.-M. Baumgärtner and A. Mattheus
Contrib. Plasma Phys., Vol: 52, No: 7 , published: 30 August 2012
Objectives of Laser-Induced Energy Deposition for Active Flow Control
D. Sperber, H.-A. Eckel, S. Steimer and S. Fasoulas
Contrib. Plasma Phys., Vol: 52, No: 7 , published: 30 August 2012
Plasma Processes and Plasma Sources in Medicine
K.-D. Weltmann, M. Polak, K. Masur, T. von Woedtke, J. Winter and S. Reuter
Contrib. Plasma Phys., Vol: 52, No: 7 , published: 30 August 2012
Plasma Health Care - Old Problems, New Solutions
G. E. Morfill and J. L. Zimmermann
Contrib. Plasma Phys., Vol: 52, No: 7 , published: 30 August 2012
Hydrogen-Peroxide-Enhanced Nonthermal Plasma Effluent for Biomedical Applications
Golkowski, M.; Golkowski, C.; Leszczynski, J.; Plimpton, S.R.; Maslowski, P.; Foltynowicz, A.; Jun Ye; McCollister, B.
IEEE Trans. Plasma Sci., Vol: 40, No: 8 , published: 30 August 2012
Modeling and Simulation of Ion Energy Distribution Functions in Technological Plasmas
T. Mussenbrock
Contrib. Plasma Phys., Vol: 52, No: 7 , published: 30 August 2012
Effect of the Surface Bond States in as-Deposited DLC Films on the Incorporation of Nitrogen and Oxygen Atoms
Nitta, Y.; Okamoto, K.; Nakatani, T.; Shinohara, M.
IEEE Trans. Plasma Sci., Vol: 40, No: 8 , published: 30 August 2012
Characterization of Tantalum Oxide Thin Films Prepared by Cylindrical Magnetron Sputtering: Influence of O2% in the Gas Mixture
M. R. Hantehzadeh, E. Hassani Sadi, E. Darabi
J. Fusion Energy, Vol: 31, No: 4 , published: 18 August 2012
The Effect of High Temperature He+ Implantation on Polycrystalline Tungsten in IR-IECF
S. Semsari, A. Sadighzadeh, A. Zakeri, S. Khademzade, M. Torabi, et al.
J. Fusion Energy, Vol: 31, No: 4 , published: 18 August 2012
Coating of Titanium Nitride on Stainless Steel Targets by a 4 kJ Plasma Focus Device
M. Omrani, M. Habibim R. Amrollahi
J. Fusion Energy, Vol: 31, No: 4 , published: 18 August 2012
The Application of Nano-SiOx Coatings as Migration Resistance Layer by Plasma Enhanced Chemical Vapor Deposition
Fei Fei, Chen Qiang, Liu Zhongwei, Liu Fuping, Anastasiia Solodovnyk
Plasma Chem. Plasma Process., Vol: 32, No: 4 , published: 16 August 2012
Surface and Bulk Structure of Thin Spin Coated and Plasma-Polymerized Polystyrene Films
Alaa Fahmy, Renate Mix, Andreas Schönhals, Jörg Friedrich
Plasma Chem. Plasma Process., Vol: 32, No: 4 , published: 16 August 2012
Plasma Modification of Surface Wettability and Morphology for Optimization of the Interactions Involved in Blood Constituents Spreading on Some Novel Copolyimide Films
D. Popovici, A. I. Barzic, I. Stoica, M. Butnaru, G. E. Ioanid, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 4 , published: 16 August 2012
On the Use of Atmospheric Pressure Plasma for the Bio-Decontamination of Polymers and Its Impact on Their Chemical and Morphological Surface Properties
K. Fricke, H. Tresp, R. Bussiahn, K. Schröder, Th. von Woedtke, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 4 , published: 16 August 2012
Role of Plasma Parameters on the Conjugated Structure Retention in Polyaniline Thin Film
Amreen A. Hussain, Shyamalima Sharma, Arup R. Pal, Heremba Bailung, Joyanti Chutia, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 4 , published: 16 August 2012
Functional Military Textile: Plasma-Induced Graft Polymerization of DADMAC for Antimicrobial Treatment on Nylon-Cotton Blend Fabric
Priya Malshe, Maryam Mazloumpour, Ahmed El-Shafei, Peter Hauser
Plasma Chem. Plasma Process., Vol: 32, No: 4 , published: 16 August 2012
Effect of Low Temperature Air Plasma Treatment on Wetting and Flow Properties of Kaolinite Powders
Lubomír Lapčík, Barbora Lapčíková, Ivo Krásny, Ivana Kupská, Richard W. Greenwood, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 4 , published: 16 August 2012
One-Dimensional Modeling on the Asymmetric Features of a Radio-Frequency Atmospheric Helium Glow Discharge Produced Using a Co-Axial-Type Plasma Generator
Zhi-Bin Wang, Pei-Si Le, Nan Ge, Qiu-Yue Nie, He-Ping Li, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 4 , published: 16 August 2012
Atmospheric-pressure plasma sources for biomedical applications
G Y Park, S J Park, M Y Choi, I G Koo, J H Byun, J W Hong, J Y Sim, G J Collins, J K Lee
Plasma Sources Sci. and Technol., Vol: 21, No: 4 , published: 16 August 2012
Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses
Chunqing Huo, Michael A Raadu, Daniel Lundin, Jon Tomas Gudmundsson, André Anders, Nils Brenning
Plasma Sources Sci. and Technol., Vol: 21, No: 4 , published: 16 August 2012
Fluid-dynamic characterization of a radio-frequency induction thermal plasma system for nanoparticle synthesis
V Colombo, C Deschenaux, E Ghedini, M Gherardi, C Jaeggi, M Leparoux, V Mani, P Sanibondi
Plasma Sources Sci. and Technol., Vol: 21, No: 4 , published: 16 August 2012
Impact of Xe partial pressure on the production of excimer vacuum ultraviolet emission for plasma display panels
Di Zhu, Xiong Zhang, Hiroshi Kajiyama
J. Appl. Phys. , Vol: 112, No: 3 , published: 13 August 2012
Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses
G. Dingemans, M. C. M. van de Sanden, W. M. M. Kessels
Plasma Processes and Polymers, Vol: 9, No: 8 , published: 12 August 2012
The Use of Non-Equilibrium Plasmas for the Synthesis of Heterogeneous Catalysts
Toon Witvrouwen, Sabine Paulussen, Bert Sels
Plasma Processes and Polymers, Vol: 9, No: 8 , published: 12 August 2012
Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses
G. Dingemans, M. C. M. van de Sanden and W. M. M. Kessels
Plasma Processes and Polymers, Vol: 9, No: 8 , published: 12 August 2012
Pre-polymerization Kinetics in Continuous and Pulsed Glow Discharge in Tetrafluoroethylene
Alena V. Andreeva, Ilya Kutsarev, Alexander V. Shatsky, Alexander M. Shterenberg and Vladislav I. Zyn
Plasma Processes and Polymers, Vol: 9, No: 8 , published: 12 August 2012
PEO-like Plasma Polymers Prepared by Atmospheric Pressure Surface Dielectric Barrier Discharge
Ivan Gordeev, Andrei Choukourov, Milan Šimek, Václav Prukner and Hynek Biederman
Plasma Processes and Polymers, Vol: 9, No: 8 , published: 12 August 2012
Disinfection Through Different Textiles Using Low-Temperature Atmospheric Pressure Plasma
Julia L. Zimmermann, Tetsuji Shimizu, Veronika Boxhammer and Gregor E. Morfill
Plasma Processes and Polymers, Vol: 9, No: 8 , published: 12 August 2012
Deposition and Characterisation of Plasma Polymerised Allyl Methacrylate Based Coatings
Alexandros Kakaroglou, Gill Scheltjens, Bernard Nisol, Iris De Graeve, Guy Van Assche, Bruno Van Mele, Rudolph Willem, Monique Biesemans, François Reniers and Herman Terryn
Plasma Processes and Polymers, Vol: 9, No: 8 , published: 12 August 2012
The Diffusion-reaction Model on the Wettability Gradient Created by SF6 Plasma
Dave Mangindaan, Chang-Cheng Kuo, Shi-Yow Lin and Meng-Jiy Wang
Plasma Processes and Polymers, Vol: 9, No: 8 , published: 12 August 2012
PTFE Surface Etching in the Post-discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species
Thierry Dufour, Julie Hubert, Pascal Viville, Corinne Y. Duluard, Simon Desbief, Roberto Lazzaroni and François Reniers
Plasma Processes and Polymers, Vol: 9, No: 8 , published: 12 August 2012
Optimization of extreme ultraviolet photons emission and collection in mass-limited laser produced plasmas for lithography application
T. Sizyuk, A. Hassanein
J. Appl. Phys. , Vol: 112, No: 3 , published: 02 August 2012
Enhancing extreme ultraviolet photons emission in laser produced plasmas for advanced lithography
T. Sizyuk, A. Hassanein
Phys. Plasmas, Vol: 19, No: 8 , published: 01 August 2012
Modeling the chemical kinetics of atmospheric plasma for cell treatment in a liquid solution
H. Y. Kim, H. W. Lee, S. K. Kang, H. Wk. Lee, G. C. Kim, J. K. Lee
Phys. Plasmas, Vol: 19, No: 7 , published: 27 July 2012
The properties of Ba0.5Sr0.5TiO3 thin film prepared by RF magnetron sputtering from powder target
Guisheng Zhu, Zupei Yang, Huarui Xu
Vacuum, Vol: 86, No: 12 , published: 20 July 2012
Sputtering yields for low-energy Ar+- and Ne+-ion bombardment
Z. Somogyvári, G.A. Langer, G. Erdélyi, L. Balázs
Vacuum, Vol: 86, No: 12 , published: 20 July 2012
Effects of applied power on hydrogenated amorphous carbon (a-C:H) film deposition by low frequency (60 Hz) plasma-enhanced chemical vapor deposition (PECVD)
Hong Tak Kim, Sang Ho Sohn
Vacuum, Vol: 86, No: 12 , published: 20 July 2012
Plasma emission monitoring (PEM) controlled DC reactive sputtered ZnO:Al thin films
P.D. Nsimama, G.A. Niklasson, M.E. Samiji, G.W. Mbise, J. Wennerberg
Vacuum, Vol: 86, No: 12 , published: 20 July 2012
Effects of screen-grid bias voltage on the microstructure and properties of the ultrahigh molecular weight polyethylene (UHMWPE) modified by oxygen plasma
Yanan Pei, Dong Xie, Yongxiang Leng, Linmao Qian, Hong Sun, Nan Huang
Vacuum, Vol: 86, No: 12 , published: 20 July 2012
Comparison of models for silicon etching in CF4 + O2 plasma
R. Knizikevičius
Vacuum, Vol: 86, No: 12 , published: 20 July 2012
High-density polyethylene functionalized by cold plasma and silanes
I. Novák, A. Popelka, I. Krupa, I. Chodák, I. Janigová, T. Nedelčev, M. Špírková, A. Kleinová
Vacuum, Vol: 86, No: 12 , published: 20 July 2012
Titanium film deposition by high-power impulse magnetron sputtering: Influence of pulse duration
F.J. Jing, T.L. Yin, K. Yukimura, H. Sun, Y.X. Leng, N. Huang
Vacuum, Vol: 86, No: 12 , published: 20 July 2012
Effect of BCl3 concentration and process pressure on the GaN mesa sidewalls in BCl3/Cl2 based inductively coupled plasma etching
D.S. Rawal, B.K. Sehgal, R. Muralidharan, H.K. Malik, Amitava Dasgupta
Vacuum, Vol: 86, No: 12 , published: 20 July 2012
Control of the Growth Regimes of Nanodiamond and Nanographite in Microwave Plasmas
Cheng C. Y.; Teii K.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 7 , published: 19 July 2012
Effects of Dielectric Barrier Discharge Treatment Conditions on the Uprightness of Carbon Nanofibers
Sugioka Y.; Suda Y.; Tanoue H.; Takikawa H.; Ue H.; Shimizu K.; Umeda Y.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 7 , published: 19 July 2012
Production of Low Electron Temperature Plasma and Coating of Carbon-Related Water-Repellent Films on Plastic Plate
Ohtsu Y.; Kihara K.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 7 , published: 19 July 2012
Investigation of Affecting Factors on the Hardness of Fluorine-Containing Amorphous Carbon Film Coated by Pulsed-Plasma Ablation
Kawara S.; Hamajima E.; Koizumi H.; Kousaka H.; Yamada K.; Umehara N.; Arakawa Y.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 7 , published: 19 July 2012
Wettability of Amorphous Diamond-Like Carbons Deposited on Si and PMMA in Pulse-Modulated Plasmas
Sung T.-L.; Yang J. H.-C.; Teii K.; Teii S.; Liu C.-M.; Tseng W.-Y.; Lin L.-D.; Ono S.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 7 , published: 19 July 2012
Maskless Patterning by Pulsed-Power Plasma Printing
Huiskamp T.; Brok W. J. M.; Stevens A. A. E.; van Heesch E. J. M.; Pemen A. J. M.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 7 , published: 19 July 2012
Solid Thoriated Tungsten Cathode Arc Discharges for Electrically Propelled Spacecraft
Codron D.; Goodfellow K. D.; Downey R. T.; Erwin D. A.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 7 , published: 19 July 2012
Correction to “Studies of the Frequency-Agile Relativistic Magnetron” [May 12 1344-1349]
Li T.; Li J.; Hu B.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 7 , published: 19 July 2012
Numerical simulation of carbon arc discharge for nanoparticle synthesis
M. Kundrapu, M. Keidar
Phys. Plasmas, Vol: 19, No: 7 , published: 18 July 2012
Fabrication and Operation of a Microcavity Plasma Array Device for Microscale Surface Modification
Sameer A. Al-Bataineh, Endre J. Szili, Philipp J. Gruner, Craig Priest, Hans J. Griesser, Nicolas H. Voelcker, Robert D. Short and David A. Steele
Plasma Processes and Polymers, Vol: 9, No: 7 , published: 16 July 2012
Synthesis of Polymer-like Hydrogenated Amorphous Carbon by fs-pulsed Laser Induced Plasma Processing of Solid Hexane
Michal J. Wesolowski, Brad Moores, Zoya Leonenko, Reza Karimi, Joseph H. Sanderson and Walter W. Duley
Plasma Processes and Polymers, Vol: 9, No: 7 , published: 16 July 2012
Nanocomposite Thin Films with Hybrid Inorganic/Organic Matrix for the Modification of Silicon-Based Implants
Jorge Nunes, Rita J. Santos, Vera Loureiro and Ana P. Piedade
Plasma Processes and Polymers, Vol: 9, No: 7 , published: 16 July 2012
Practical Amine Functionalization of Multi-Walled Carbon Nanotubes for Effective Interfacial Bonding
Zhiqiang Chen, Xiujuan J. Dai, Peter R. Lamb, David R. de Celis Leal, Bronwyn L. Fox, Ying Chen, Johan du Plessis, Matthew Field and Xungai Wang
Plasma Processes and Polymers, Vol: 9, No: 7 , published: 16 July 2012
Inspired Chemistry for a Simple but Highly Effective Immobilization of Vascular Endothelial Growth Factor on Gallic Acid-functionalized Plasma Polymerized Film
Zhilu Yang, Jing Wu, Xin Wang, Jin Wang and Nan Huang
Plasma Processes and Polymers, Vol: 9, No: 7 , published: 16 July 2012
Treatment of enterococcus faecalis bacteria by a helium atmospheric cold plasma brush with oxygen addition
Wei Chen, Jun Huang, Ning Du, Xiao-Di Liu, Xing-Quan Wang, Guo-Hua Lv, Guo-Ping Zhang, Li-Hong Guo, Si-Ze Yang
J. Appl. Phys. , Vol: 112, No: 1 , published: 06 July 2012
Size dependent characteristics of plasma synthesized carbonaceous nanoparticles
Eva Kovacevic, Johannes Berndt, Thomas Strunskus, Laifa Boufendi
J. Appl. Phys. , Vol: 112, No: 1 , published: 06 July 2012
Synergistic etch rates during low-energetic plasma etching of hydrogenated amorphous carbon
T. A. R. Hansen, J. W. Weber, P. G. J. Colsters, D. M. H. G. Mestrom, M. C. M. van de Sanden, R. Engeln
J. Appl. Phys. , Vol: 112, No: 1 , published: 05 July 2012
Efficient and reliable green organic light-emitting diodes with Cl2 plasma-etched indium tin oxide anode
Y. Q. Zhang, R. Acharya, X. A. Cao
J. Appl. Phys. , Vol: 112, No: 1 , published: 03 July 2012
Dry Etching of Lead-Free (K,Na)NbO3 Piezoelectric Films by Ar/C4F8 Plasma
Fumimasa Horikiri, Kenji Shibata, Kazufumi Suenaga, Kazutoshi Watanabe, Akira Nomoto, Tomoyoshi Mishima, Fumiya Kurokawa, Isaku Kanno
Jpn. J. Appl. Phys., Vol: 51, No: 7R , published: 01 July 2012
ISPC-20
Gregory Fridman
Plasma Chem. Plasma Process., Vol: 32, No: 3 , published: 20 June 2012
Thermal Plasma Synthesis of Superparamagnetic Iron Oxide Nanoparticles
Pingyan Lei, Adam M. Boies, Steven Calder, Steven L. Girshick
Plasma Chem. Plasma Process., Vol: 32, No: 3 , published: 20 June 2012
Silicon Oxide Coatings with Very High Rates (>10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode
Hiroaki Kakiuchi, Hiromasa Ohmi, Takahiro Yamada, Keiji Yokoyama, Kohei Okamura, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 3 , published: 20 June 2012
Numerical Investigation of a Parallel-Plate Atmospheric-Pressure Nitrogen/Ammonia Dielectric Barrier Discharge
F.-L. Li, K.-M. Lin, Y.-W. Yang, C.-T. Hung, J.-S. Wu, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 3 , published: 20 June 2012
Catalytic Conversion of Simulated Biogas Mixtures to Synthesis Gas in a Fluidized Bed Reactor Supported by a DBD
Thorsten Kroker, Torsten Kolb, Andreas Schenk, Krzysztof Krawczyk, Michal Młotek, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 3 , published: 20 June 2012
Production of Hydrogen-Rich Syngas from Biogas Reforming with Partial Oxidation Using a Multi-Stage AC Gliding Arc System
Nongnuch Rueangjitt, Chalermrat Akarawitoo, Sumaeth Chavadej
Plasma Chem. Plasma Process., Vol: 32, No: 3 , published: 20 June 2012
Effects of Alkaline Ferrocyanide on Non-faradaic Yields of Anodic Contact Glow Discharge Electrolysis: Determination of the Primary Yield of OH· Radicals
Rajeshwar Singh, Urvashi Gangal, Susanta K. Sen Gupta
Plasma Chem. Plasma Process., Vol: 32, No: 3 , published: 20 June 2012
Tailor-Made Silver Release Properties of Silver-Containing Functional Plasma Polymer Coatings Adjusted Through a Macroscopic Kinetics Approach
Enrico Körner, Barbara Hanselmann, Peter Cierniak, Dirk Hegemann
Plasma Chem. Plasma Process., Vol: 32, No: 3 , published: 20 June 2012
Compound Finishing of Bombyx mori Silk: A Study of Cold Oxygen Plasma/Titania Sols Treatments and Their Influences on Fiber Structure and Performance
Chenghui Zheng, Guoqiang Chen, Zhenming Qi
Plasma Chem. Plasma Process., Vol: 32, No: 3 , published: 20 June 2012
Effect of Low-Temperature Plasma Jet on Thermal Stability and Physical Structure of Type I Collagen
Samouillan V.; Merbahi N.; Yousfi M.; Gardou J.; Delaunay F.; Dandurand J.; Lacabanne C.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 6 , published: 18 June 2012
ICEPIC Simulation of a Strapped Nonrelativistic High-Power CW UHF Magnetron With a Solid Cathode Operating in the Space-Charge Limited Regime
Andreev A.D.; Hendricks K.J.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 6 , published: 18 June 2012
Design and Simulation of a Mega-Watt Class Nonrelativistic Magnetron
Fleming T.P.; Lambrecht M.; Mardahl P.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 6 , published: 18 June 2012
Frequency Switching in a 12-Cavity Relativistic Magnetron With Axial Extraction of Radiation
Meiqin Liu; Fuks, M.I.; Schamiloglu, E.; Chun-Liang Liu
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 6 , published: 18 June 2012
Ballistic-Mode Plasma-Based Ion Implantation for Surface-Resistivity Modification of Polyimide Film
Byungjae Park; Jeehyun Kim; Moohyun Cho; Won Namkung; Sang Jung Kim; Hyo Yol Yoo
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 6 , published: 18 June 2012
The Role of VUV Radiation in the Inactivation of Bacteria with an Atmospheric Pressure Plasma Jet
Simon Schneider, Jan-Wilm Lackmann, Dirk Ellerweg, Benjamin Denis, Franz Narberhaus, Julia E. Bandow and Jan Benedikt
Plasma Processes and Polymers, Vol: 9, No: 6 , published: 16 June 2012
Decontamination of Microbiologically Contaminated Specimen by Direct and Indirect Plasma Treatment
Uta Schnabel, Rijana Niquet, Udo Krohmann, Jörn Winter, Oliver Schlüter, Klaus-Dieter Weltmann and Jörg Ehlbeck
Plasma Processes and Polymers, Vol: 9, No: 6 , published: 16 June 2012
Biological Decontamination Using High and Reduced Pressure Nitrogen Afterglows
Jean-Philippe Sarrette, Sarah Cousty, Franck Clement, Cristina Canal and André Ricard
Plasma Processes and Polymers, Vol: 9, No: 6 , published: 16 June 2012
Cold Atmospheric Plasma for Surface Disinfection
Yang-Fang Li, Tetsuji Shimizu, Julia L. Zimmermann and Gregor E. Morfill
Plasma Processes and Polymers, Vol: 9, No: 6 , published: 16 June 2012
Sterilization Method for Medical Container Using Microwave-Excited Volume-Wave Plasma
Masaaki Nagatsu, Ying Zhao, Iuliana Motrescu, Ryota Mizutani, Yuya Fujioka and Akihisa Ogino
Plasma Processes and Polymers, Vol: 9, No: 6 , published: 16 June 2012
Complex Responses of Microorganisms as a Community to a Flowing Atmospheric Plasma
Danny L. Bayliss, James L. Walsh, Felipe Iza, Gilbert Shama, John Holah and Michael G. Kong
Plasma Processes and Polymers, Vol: 9, No: 6 , published: 16 June 2012
Decontamination of Prions by the Flowing Afterglow of a Reduced-pressure N2[BOND]O2 Cold-plasma
Benaïssa Elmoualij, Olivier Thellin, Stéphanie Gofflot, Ernst Heinen, Pierre Levif, Jacynthe Séguin, Michel Moisan, Annie Leduc, Jean Barbeau and Willy Zorzi
Plasma Processes and Polymers, Vol: 9, No: 6 , published: 16 June 2012
Plasma Sterilization of Pharmaceutical Products: From Basics to Production
Benjamin Denis, Simon Steves, Egmont Semmler, Nikita Bibinov, Wenzel Novak and Peter Awakowicz
Plasma Processes and Polymers, Vol: 9, No: 6 , published: 16 June 2012
Effect of O2/Ar Mixture on the Structural and Optical Properties of ZnO Thin Films Fabricated by DC Cylindrical Magnetron Sputtering
M. R. Hantehzadeh, P. Salavati Dezfooli, S. A. Hoseini
J. Fusion Energy, Vol: 31, No: 3 , published: 15 June 2012
Numerical analysis of a mixture of Ar/NH3 microwave plasma chemical vapor deposition reactor
Zhi Li, Zhen Zhao, Xuehui Li
J. Appl. Phys. , Vol: 111, No: 11 , published: 13 June 2012
Enhancement of optical absorption by modulation of the oxygen flow of TiO2 films deposited by reactive sputtering
André L. J. Pereira, Paulo N. Lisboa Filho, Javier Acuña, Iuri S. Brandt, André A. Pasa, Antonio R. Zanatta, Johnny Vilcarromero, Armando Beltrán, José H. Dias da Silva
J. Appl. Phys. , Vol: 111, No: 11 , published: 05 June 2012
Nanoporosity induced by ion implantation in deposited amorphous Ge thin films
L. Romano, G. Impellizzeri, L. Bosco, F. Ruffino, M. Miritello, M. G. Grimaldi
J. Appl. Phys. , Vol: 111, No: 11 , published: 05 June 2012
Free radical kinetics in a plasma immersion ion implanted polystyrene: Theory and experiment
Elena A. Kosobrodova, Alexey V. Kondyurin, Keith Fisher, Wolfhard Moeller, David R. McKenzie, Marcela M.M. Bilek
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 280, No: , published: 01 June 2012
Improvement of Temporal Image Sticking Characteristics Using Negative Sustain Waveform in AC Plasma Display Panel
Park C.-S., Kim J. H., Tae H.-S., Chien S.-I.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 5 , published: 24 May 2012
Perspectives on the Interaction of Plasmas With Liquid Water for Water Purification
Foster J., Sommers B. S., Gucker S. N., Blankson I. M., Adamovsky G.
IEEE Trans. Plasma Sci. Pt 1, Vol: 40, No: 5 , published: 23 May 2012
Generation of the simplest rotational wave packet in a diatomic molecule: Tracing a two-level superposition in the time domain
A. Przystawik, A. Kickermann, A. Al-Shemmary, S. Düsterer, A. M. Ellis, K. von Haeften, M. Harmand, S. Ramakrishna, H. Redlin, L. Schroedter, M. Schulz, T. Seideman, N. Stojanovic, J. Szekely, F. Tavella, S. Toleikis, and T. Laarmann
Phys. Rev. A: At. Mol. Opt. Phys., Vol: 85, No: 5 , published: 07 May 2012
Paschen Curve and Film Growth in Low Pressure Capacitively Coupled Magnetron Plasma Polymerization
L. Ledernez, F. Olcaytug and G. Urban
Contrib. Plasma Phys., Vol: 52, No: 4 , published: 03 May 2012
Synthesis and Dielectric Property of Novel Conjugated Polynitriles From Cyanate Ester
Xiong-Yan Zhao, Ming-Zhu Wang, Zhan-Ying Sun, Chun-Mei Niu, Ji-Jun Xiao and Er-Jun Tang
Plasma Processes and Polymers, Vol: 9, No: 5 , published: 01 May 2012
Vacuum-ultraviolet (VUV) Photo-polymerization of Amine-rich Thin Films from Ammonia–Hydrocarbon Gas Mixtures
Florina Truica-Marasescu, Juan-Carlos Ruiz and Michael R. Wertheimer
Plasma Processes and Polymers, Vol: 9, No: 5 , published: 01 May 2012
Conducting Plasma Polymerized Polypyrrole Thin Films as Carbon Dioxide Gas Sensors
Jose Luis Yagüe and Salvador Borrós
Plasma Processes and Polymers, Vol: 9, No: 5 , published: 01 May 2012
Atmospheric Pressure Plasma Surface Modification of Poly(D,L-lactic acid) Increases Fibroblast, Osteoblast and Keratinocyte Adhesion and Proliferation
Filippo Renò, Domenico D'Angelo, Gloria Gottardi, Manuela Rizzi, Davide Aragno, Giacomo Piacenza, Federico Cartasegna, Miriam Biasizzo, Francesco Trotta and Mario Cannas
Plasma Processes and Polymers, Vol: 9, No: 5 , published: 01 May 2012
Plasma Functionalization of Multiwalled Carbon Nanotubes and Their Use in the Preparation of Nylon 6-Based Nanohybrids
Roberto Scaffaro, Andrea Maio, Simonpietro Agnello and Antonella Glisenti
Plasma Processes and Polymers, Vol: 9, No: 5 , published: 01 May 2012
Frequency Scaling Laws of Plasma Bulk in Atmospheric Radio Frequency Discharges
Yuantao T. Zhang and Wanli Shang
Plasma Processes and Polymers, Vol: 9, No: 5 , published: 01 May 2012
Modeling SiH4/O2/Ar Inductively Coupled Plasmas Used for Filling of Microtrenches in Shallow Trench Isolation (STI)
Stefan Tinck and Annemie Bogaerts
Plasma Processes and Polymers, Vol: 9, No: 5 , published: 01 May 2012
Loading and Release of Drugs from Oxygen-rich Plasma Polymer Coatings
Maria Jose Garcia-Fernandez, Laura Martinez-Calvo, Juan-Carlos Ruiz, Michael R. Wertheimer, Angel Concheiro and Carmen Alvarez-Lorenzo
Plasma Processes and Polymers, Vol: 9, No: 5 , published: 01 May 2012
Plasma parameter analysis of Ag sputter deposition using cathodes with different magnetic flux densities
Kazuhiro Kato, Hideo Omoto, Atsushi Takamatsu, Masaaki Yonekura
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
The effects of impurity and temperature for transparent conducting oxide properties of Al:ZnO deposited by dc magnetron sputtering
Wonkyun Yang, S.M. Rossnagel, Junghoon Joo
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Characterization and hot corrosion performance of LVPS and HVOF-CoNiCrAlYSi coatings
M. Mohammadi, S. Javadpour, S.A.J. Jahromi, K. Shirvani, A. Kobayashi
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Surface characterization of multiple coated H11 hot work tool steel by plasma nitriding and hard chromium electroplating processes
M. Soltanieh, H. Aghajani, F. Mahboubi, Kh.A. Nekouee
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Low-temperature preparation of flexible a-Si:H solar cells with hydrogenated nanocrystalline silicon p layer
Ke Tao, Jin Wang, Hongkun Cai, Dexian Zhang, Yanpin Sui, Yi Zhang, Yun Sun
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Effect of initial surface topography on the surface status of LY2 aluminum alloy treated by laser shock processing
F.Z. Dai, J.Z. Lu, Y.K. Zhang, K.Y. Luo, Q.W. Wang, L. Zhang, X.J. Hua
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Microwave synthesis, characterization and humidity sensing properties of single crystalline Zn2SnO4 nanorods
Mathivanan Parthibavarman, Kaliyan Vallalperuman, Chinnathambi Sekar, Gopal Rajarajan, Thanagaraju Logeswaran
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Annealing effect of ZnO/Au/ZnO transparent conductive films
H.M. Lee, Y.J. Lee, I.S. Kim, M.S. Kang, S.B. Heo, Y.S. Kim, Daeil Kim
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Relationship between chemical compositions of magnetron sputtered B–C–N films and various experimental parameters
Changyu Guan, Jijun Zhao, Fuchao Jia, Chunqiang Zhuang, Yizhen Bai, Xin Jiang
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Oxidation behavior of Ti–B–C–N coatings deposited by reactive magnetron sputtering
Xiangyang Chen, Shengli Ma, Kewei Xu, Paul K. Chu
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Stress analyses of GaN film manufactured by ECR plasma-enhanced chemical vapor deposition
Fu Silie, Chen Junfang, Gao Peng, Wang Chun-ann
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Evaluation of a method to reduce the redeposition of hydrogenated coatings containing carbon and tungsten in fusion reactors
E. Vassallo, M. Canetti, A. Cremona, F. Ghezzi, G. Grosso, L. Laguardia
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Stress induced and concentration dependent diffusion of nitrogen in plasma nitrided austenitic stainless steel
Teresa Moskalioviene, Arvaidas Galdikas
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Fabrication and characterization of heat and plasma treated SiC/Al2O3–YSZ feedstocks used for plasma spraying
Z.Y. Pan, Y. Wang, X.W. Li, C.H. Wang
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Structure, corrosion, and hardness properties of Ti/Al multilayers coated on NdFeB by magnetron sputtering
Tingting Xie, Shoudong Mao, Chao Yu, Shaojie Wang, Zhenlun Song
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
The study of graphite disordering using the temperature dependence of ion-induced electron emission
N.N. Andrianova, V.S. Avilkina, A.M. Borisov, E.S. Mashkova, E.S. Parilis
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Molecular effect on surface topography of GaN bombarded with PF4 ions
A.I. Titov, P.A. Karaseov, V.S. Belyakov, K.V. Karabeshkin, A.V. Arkhipov, S.O. Kucheyev, A.Yu. Azarov
Vacuum, Vol: 86, No: 10 , published: 27 April 2012
Electrophoretic Deposition of Carbon Nanotubes Auxiliary Layer for Power Saving in AC Plasma Display Panels
Liu Q., Wang Y., Yang Z., Ding H., Liu C., Ding G.
IEEE Trans. Plasma Sci., Vol: 40, No: 4 , published: 25 April 2012
Global Model of Cl2/Ar High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP
Chanson R., Rhallabi A., Fernandez M. C., Cardinaud C., Bouchoule S., Gatilova L., Talneau A.
IEEE Trans. Plasma Sci., Vol: 40, No: 4 , published: 25 April 2012
Synthesis and Characterization of Nanostructured a-C:H (Hydrogenated Amorphous Carbon) Thin Films by Gaseous Thermionic Vacuum Arc (G-TVA) Deposition Technique
Rodica Vladoiu, Victor Ciupina, Mirela Contulov, Virginia Dinca, Aurelia Mandes, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 2 , published: 20 April 2012
Dissociative Excitation of C2H2 in the Electron Cyclotron Resonance Plasma of Ar: Production of CH(A2Δ) Radicals and Formation of Hydrogenated Amorphous Carbon Films
Haruhiko Ito, Katsuaki Koshimura, Saori Onitsuka, Kohtaro Okada, Tsuneo Suzuki, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 2 , published: 20 April 2012
Moisture Removal from Natural Jute Fibre by Plasma Drying Process
M. M. Morshed, M. M. Alam, S. M. Daniels
Plasma Chem. Plasma Process., Vol: 32, No: 2 , published: 20 April 2012
Surface Modification of Banana Fibers by DBD Plasma Treatment
Fernando Ribeiro Oliveira, Laura Erkens, Raul Fangueiro, António Pedro Souto
Plasma Chem. Plasma Process., Vol: 32, No: 2 , published: 20 April 2012
Plasma-Electrospinning Hybrid Process and Plasma Pretreatment to Improve Adhesive Properties of Nanofibers on Fabric Surface
Narendiran Vitchuli, Quan Shi, Joshua Nowak, Rupesh Nawalakhe, Michael Sieber, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 2 , published: 20 April 2012
Improving the Antibacterial Property of Polyethylene Terephthalate by Cold Plasma Treatment
Mehmet Orhan, Dilek Kut, Cem Gunesoglu
Plasma Chem. Plasma Process., Vol: 32, No: 2 , published: 20 April 2012
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas
Hanbyeol Jang, Alexander Efremov, Daehee Kim, Sungchil Kang, Sun Jin Yun, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 2 , published: 20 April 2012
Studies on Optimal Gas Supply For a Maskless Etching System with Micro- Discharge Plasma Operated at Atmospheric Pressure
Toshiyuki Hamada, Takuya Arimura, Tatsuya Sakoda
Plasma Chem. Plasma Process., Vol: 32, No: 2 , published: 20 April 2012
Introduction of Primary Amino Groups on Poly(ethylene terephthalate) Surfaces by Ammonia and a Mix of Nitrogen and Hydrogen Plasma
Jessie Casimiro, Bénédicte Lepoittevin, Caroline Boisse-Laporte, Marie-Geneviève Barthés-Labrousse, Pascale Jegou, et al.
Plasma Chem. Plasma Process., Vol: 32, No: 2 , published: 20 April 2012
Plasma potential mapping of high power impulse magnetron sputtering discharges
Albert Rauch, Rueben J. Mendelsberg, Jason M. Sanders, André Anders
J. Appl. Phys. , Vol: 111, No: 8 , published: 15 April 2012
Plasma potential mapping of high power impulse magnetron sputtering discharges
Albert Rauch, Rueben J. Mendelsberg, Jason M. Sanders, André Anders
J. Appl. Phys. , Vol: 111, No: 8 , published: 15 April 2012
Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields
N. Brenning, C. Huo, D. Lundin, M. A. Raadu, C. Vitelaru, G. D. Stancu, T. Minea and U. Helmersson
Plasma Sources Sci. and Technol., Vol: 21, No: 2 , published: 07 April 2012
Effect of the target power density on high-power impulse magnetron sputtering of copper
Tomáš Kozák
Plasma Sources Sci. and Technol., Vol: 21, No: 2 , published: 07 April 2012
Post-synthesis Carbon Nanowalls Transformation under Hydrogen, Oxygen, Nitrogen, Tetrafluoroethane and Sulfur Hexafluoride Plasma Treatments
Sorin Vizireanu, Maria Daniela Ionita, Gheorghe Dinescu, Ionut Enculescu, Mihaela Baibarac and Ioan Baltog
Plasma Processes and Polymers, Vol: 9, No: 4 , published: 02 April 2012
Reactive Oxygen Species in a Non-thermal Plasma Microjet and Water System: Generation, Conversion, and Contributions to Bacteria Inactivation—An Analysis by Electron Spin Resonance Spectroscopy
Haiyan Wu, Peng Sun, Hongqing Feng, Haixia Zhou, Ruexue Wang, Yongdong Liang, Jingfen Lu, Weidong Zhu, Jue Zhang and Jing Fang
Plasma Processes and Polymers, Vol: 9, No: 4 , published: 02 April 2012
Initiated PECVD of Organosilicon Coatings: A New Strategy to Enhance Monomer Structure Retention
Anna Maria Coclite and Karen K. Gleason
Plasma Processes and Polymers, Vol: 9, No: 4 , published: 02 April 2012
Cell Adhesion to PEEK Treated by Plasma Immersion Ion Implantation and Deposition for Active Medical Implants
Firas Awaja, Daniel V. Bax, Shengnan Zhang, Natalie James and David R. McKenzie
Plasma Processes and Polymers, Vol: 9, No: 4 , published: 02 April 2012
Hydroxyl Radical Etching Improves Adhesion of Plasma-Deposited a-SiOxCyHz Films on Poly(Methylmethacrylate)
Colin J. Hall, Peter J. Murphy and Hans J. Griesser
Plasma Processes and Polymers, Vol: 9, No: 4 , published: 02 April 2012
Atmospheric Pressure Pulsed Plasma Copolymerisation of Maleic Anhydride and Vinyltrimethoxysilane: Influence of Electrical Parameters on Chemistry, Morphology and Deposition Rate of the Coatings
Anton Manakhov, Maryline Moreno-Couranjou, Nicolas D. Boscher, Vincent Rogé, Patrick Choquet and Jean-Jacques Pireaux
Plasma Processes and Polymers, Vol: 9, No: 4 , published: 02 April 2012
Non-stick Polymer Coatings for Energy-based Surgical Devices Employed in Vessel Sealing
Sung Kil Kang, Paul Y. Kim, Il Gyo Koo, Ho Young Kim, Jae-Chul Jung, Myeong Yeol Choi, Jae Koo Lee and George J. Collins
Plasma Processes and Polymers, Vol: 9, No: 4 , published: 02 April 2012
Oxidation Behavior of C- and Au-Ion-Implanted Biodegradable Polymers
Sokullu-Urkac E., Oztarhan A., Tihminlioglu F., Nikolaev A., Brown I.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 3 , published: 25 March 2012
Study of Damage Engineering—Quantitative Scatter Defect Measurements of Ultralow Energy Implantation Doping Using the Continuous Anodic Oxidation Technique/Differential Hall Effect
Shu Qin, McTeer A., Hu Y.J., Prussin S., Reyes J.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 3 , published: 25 March 2012
Isotopic fractionation of silicon negative ions sputtered from minerals by Cs+ bombardment
G. Slodzian, C. Engrand, J. Duprat
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 275, No: , published: 15 March 2012
Increase in coercivity of Fe–Pt thin film permanent magnets by image ion implantation and heat treatment in hydrogen gas
Ryoya Ishigami, Chuluunbaatar Batchuluun, Keisuke Yasuda
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 275, No: , published: 15 March 2012
Friction in near-surface regions of plasma-nitrided and post-oxidized plain steel at various hydrogen contents
C. Luvison, V. Sonda, A.C. Rovani, F. Cemin, F.G. Echeverrigaray, C. Aguzzoli, A.E. Crespi, C.L.G. Amorim, M.E.H. Maia da Costa, I.J.R. Baumvol, C.A. Figueroa
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Engineering the tube size for an inner surface modification by plasma-based ion implantation
Y. Li, B.C. Zheng, M.K. Lei
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Surface morphology and structural analysis of fluorocarbon nano-rings formation through EBL and SiO2 plasma etching
Maryam Alsadat Rad, Khairudin Mohamed, Kamarulazizi Ibrahim
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Nanocrystalline SnO2 and Au:SnO2 thin films prepared by direct current magnetron reactive sputtering
A. Sivasankar Reddy, N.M. Figueiredo, A. Cavaleiro
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Nanoindention study of indium nitride thin films grown using RF plasma-assisted molecular beam epitaxy
Chien-Huang Tsai
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Dry etch properties of IZO thin films in a CF4/Ar adaptively coupled plasma system
Jong-Chang Woo, Chang-Il Kim
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Annealing temperature effects on ferromagnetism and structure of Si1−xMnx films prepared by magnetron sputtering
Tiecheng Li, Liping Guo, Congxiao Liu, Guoliang Peng, Bo He, Zhiyun Pan, Zhongpo Zhou, Shuigang Xu, Zuci Quan
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Effects of buffer layer thickness on properties of ZnO thin films grown on porous silicon by plasma-assisted molecular beam epitaxy
Min Su Kim, Do Yeob Kim, Min Young Cho, Giwoong Nam, Soaram Kim, Dong-Yul Lee, Sung-O. Kim, Jae-Young Leem
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Low temperature preparation of transparent, antireflective TiO2 films deposited at different O2/Ar ratios by microwave electron cyclotron resonance magnetron sputtering
Wen Du, Yinping Ye, Hongxuan Li, Fei Zhao, Li Ji, Weilong Quan, Jianmin Chen, Huidi Zhou
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Corrosion behaviour of CrN/Cr multilayers on stainless steel deposited by unbalanced magnetron sputtering
Y.L. Chipatecua, J.J. Olaya, Diego F. Arias
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Deposition and characterization of magnetron sputtered amorphous Cr–C films
Matilda Andersson, Jonas Högström, Sigita Urbonaite, Andrej Furlan, Leif Nyholm, Ulf Jansson
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Advanced colloidal lithography for sub-100 nm lift-off structures
Nico Homonnay, Nadine Geyer, Bodo Fuhrmann, Hartmut S. Leipner
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Surface modifications of polymethylmetacrylate films using atmospheric pressure air dielectric barrier discharge plasma
Zhi Fang, Yuan Liu, Kun Liu, Tao Shao, Cheng Zhang
Vacuum, Vol: 86, No: 9 , published: 14 March 2012
Влияние кластеризации потока на толщину пленок, осажденных при магнетронном и импульсном лазерном распылении металлооксидов
Окунев В.Д., Lewandowski S.J., Szymczak R., Szymczak H., Дьяченко Т.А., Исаев В.А., Николаенко Ю.М., Abal'oshev A., Gier\l owski P., Bielska-Lewandowska H.
Письма в ЖТФ, Vol: 38, No: 5 , published: 12 March 2012
Adhesion of U-937 Monocytes on Different Amine-functionalised Polymer Surfaces
Amélie St-Georges-Robillard, Juan-Carlos Ruiz, Alain Petit, Hong Tian Wang, Fackson Mwale, Bentsian Elkin, Christian Oehr, Sophie Lerouge and Michael R. Wertheimer
Plasma Processes and Polymers, Vol: 9, No: 3 , published: 02 March 2012
Ammonia Plasma Functionalized Polycarbonate Surfaces Improve Cell Migration Inside an Artificial 3D Cell Culture Module
Claudia Bergemann, Antje Quade, Friederike Kunz, Stefan Ofe, Ernst-Dieter Klinkenberg, Michael Laue, Karsten Schröder, Volker Weissmann, Harald Hansmann, Klaus-Dieter Weltmann and Barbara Nebe
Plasma Processes and Polymers, Vol: 9, No: 3 , published: 02 March 2012
Structure of Plasma-Deposited Copolymer Films Prepared from Acrylic Acid and Styrene: Part I Dependence on the Duty Cycle
Alaa Fahmy, Renate Mix, Andreas Schönhals and Jörg Friedrich
Plasma Processes and Polymers, Vol: 9, No: 3 , published: 02 March 2012
Hierarchical, Plasma Nanotextured, Robust Superamphiphobic Polymeric Surfaces Structurally Stabilized Through a Wetting–drying Cycle
Arun Kumar Gnanappa, Dimitrios P. Papageorgiou, Evangelos Gogolides, Angeliki Tserepi, Athanasios G. Papathanasiou and Andreas G. Boudouvis
Plasma Processes and Polymers, Vol: 9, No: 3 , published: 02 March 2012
Plasma-Mediated Nanosilver-Organosilicon Composite Films Deposited on Stainless Steel: Synthesis, Surface Characterization, and Evaluation of Anti-Adhesive and Anti-Microbial Properties on the Model Yeast Saccharomyces cerevisiae
Claire Saulou, Bernard Despax, Patrice Raynaud, Sandrine Zanna, Antoine Seyeux, Philippe Marcus, Jean-Nicolas Audinot and Muriel Mercier-Bonin
Plasma Processes and Polymers, Vol: 9, No: 3 , published: 02 March 2012
Correlated Electrical and Optical Studies of Hybrid Argon Gas–Water Plasmas and their Application to Tooth Whitening
Myoung Soo Kim, Il Gyo Koo, Myeong Yeol Choi, Jae-Chul Jung, Fathala Eldali, Jae Koo Lee and George J. Collins
Plasma Processes and Polymers, Vol: 9, No: 3 , published: 02 March 2012
Nitrogen Introduction in pp-HMDSO Thin Films Deposited by Atmospheric Pressure Dielectric Barrier Discharge: An XPS Study
Rémy Maurau, Nicolas D. Boscher, Jérôme Guillot and Patrick Choquet
Plasma Processes and Polymers, Vol: 9, No: 3 , published: 02 March 2012
Kr and Xe ions implanted on the surfaces of Mo, Hf, Ta, W, Re, Au and platinum group elements
Takahito Osawa
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 274, No: , published: 01 March 2012
Track etch parameters and annealing kinetics assessment of protons of low energy in CR-39 detector
R.K. Jain, Ashok Kumar, B.K. Singh
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 274, No: , published: 01 March 2012
Collective Excitations of Finite-Temperature Nano Plasmas
T. Raitza,I. Broda,H. Reinholz,G. Röpke
Contrib. Plasma Phys., Vol: 52, No: 2 , published: 29 February 2012
Review: Developments in micro/nanoscale fabrication by focused ion beams
Chung-Soo Kim, Sung-Hoon Ahn, Dong-Young Jang
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Selection of metal ion irradiation for controlling Ti1−xAlxN alloy growth via hybrid HIPIMS/magnetron co-sputtering
G. Greczynski, J. Lu, M. Johansson, J. Jensen, I. Petrov, J.E. Greene, L. Hultman
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Structural, electrical and optical properties of indium tin oxide thin films prepared by RF sputtering using different density ceramic targets
Wei Zhang, Guisheng Zhu, Li Zhi, Huijuan Yang, Zupei Yang, Aibing Yu, Huarui Xu
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Reactive DC magnetron sputter deposited copper nitride nano-crystalline thin films: Growth and characterization
F. Hadian, A. Rahmati, H. Movla, M. Khaksar
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition
C.G. Jin, T. Yu, Y. Bo, Y. Zhao, H.Y. Zhang, Y.J. Dong, X.M. Wu, L.J. Zhuge, S.B. Ge
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Optical properties of NiO thin films fabricated by electron beam evaporation
D.Y. Jiang, J.M. Qin, X. Wang, S. Gao, Q.C. Liang, J.X. Zhao
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Modification of polycarbonate surface by Ar+ ion implantation for various opto-electronic applications
P.K. Goyal, V. Kumar, Renu Gupta, S. Mahendia, Anita, S. Kumar
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
The effect of substrate temperature on the oxidation behavior of erbium thick films
H.H. Shen, S.M. Peng, X.G. Long, X.S. Zhou, L. Yang, X.T. Zu
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Low-temperature growth of highly c-oriented InN films on glass substrates with ECR-PEMOCVD
An-Bo Zhi, Fu-Wen Qin, Dong Zhang, Ji-ming Bian, Bo Yu, Zhi-Feng Zhou, Xin Jiang
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Sputter deposited low-friction and tough Cr–Si3N4 nanocomposite coatings on plasma nitrided M2 steel
Harish C. Barshilia, B. Deepthi, G. Srinivas, K.S. Rajam
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Numerical estimates for energy of sputtered target atoms and reflected Ar neutrals in sputter processes
Junqing Lu, Chan Gyu Lee
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Structure, mechanical and tribological properties of diamond-like carbon films on aluminum alloy by arc ion plating
Y.S. Zou, K. Zhou, Y.F. Wu, H. Yang, K. Cang, G.H. Song
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Ar + H2 plasma etching for improved adhesion of PVD coatings on steel substrates
Harish C. Barshilia, A. Ananth, Jakeer Khan, G. Srinivas
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Microstructure and indentation mechanical properties of plasma sprayed nano-bimodal and conventional ZrO2–8wt%Y2O3 thermal barrier coatings
L. Wang, Y. Wang, X.G. Sun, J.Q. He, Z.Y. Pan, C.H. Wang
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Structure and mechanical properties of PVD coatings deposited onto the X40CrMoV5-1 hot work tool steel substrate
K. Lukaszkowicz, A. Czyżniewski, W. Kwaśny, M. Pancielejko
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Preparation and characterization of La0.9Sr0.1Ga0.8Mg0.2O3−δ thin film electrolyte deposited by RF magnetron sputtering on the porous anode support for IT-SOFC
Hongyan Sun, Wenhui Ma, Jie Yu, Xiuhua Chen, Wei Sen, Yang Zhou
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Growth and properties of ZnS thin films by sulfidation of sputter deposited Zn
Rengang Zhang, Baoyi Wang, Long Wei, Xin Li, Qianshan Xu, Shunjin Peng, Ibrahim Kurash, Haijie Qian
Vacuum, Vol: 86, No: 8 , published: 29 February 2012
Surface Treatment of Polyethylene Terephthalate Using Plasma Ion Implantation Based on Direct Coupling of RF and High-Voltage Pulse
Chunzhi Gong, Xiubo Tian, Shiqin Yang, Fu R.K.Y., Chu P.K.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 2 , published: 23 February 2012
A Novel Plasma Technique for Surface Treatment: The Plasma Expander
Rangel E.C., Machida M., Durrant S.F., Cruz N.C.
IEEE Trans. Plasma Sci. Pt 2, Vol: 40, No: 2 , published: 23 February 2012
The effect of temperature on the structure of tantalum nitride (TaN) thin films deposited by DC plasma
M. R. Hantehzadeh,S. H. Mortazavi,S. Faryadras,M. Ghoranneviss
J. Fusion Energy, Vol: 31, No: 1 , published: 15 February 2012
Low Pressure Radio Frequency Ammonia Plasma Surface Modification on Poly(ethylene terephthalate) Films and Fibers: Effect of the Polymer Forming Process
M. Ö. Öteyaka,P. Chevallier,S. Turgeon,L. Robitaille,G. Laroche
Plasma Chem. Plasma Process., Vol: 32, No: 1 , published: 15 February 2012
Saturation of deuterium retention in self-damaged tungsten exposed to high-flux plasmas
M.H.J. 't Hoen, B. Tyburska-Püschel, K. Ertl, M. Mayer, J. Rapp, A.W. Kleyn and P.A. Zeijlmans van Emmichoven
Nucl. Fusion, Vol: 52, No: 2 , published: 12 February 2012
Electron beam evaporation deposition and properties of Abrupt GST/Si heterojunction structure
Wenqiang Liu, Ling XU, Ni Liu, Yuanbao Liao, Dong Liu, Jun Xu, Zhongyuan Ma, Kunji Chen
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
Ion charge state distribution and ion velocities in the titanium hydride cathodic vacuum arc plasmas
Lei Chen, Dazhi Jin, Liang Cheng, Lei Shi, Xiaohua Tan, Wei Xiang, Jingyi Dai, Side Hu
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
A two-step deposition process for electrode fabrication of CdZnTe detectors
Kaifeng Qin, Linjun Wang, Jijun Zhang, Jiahua Min, Jian Huang, Xiaoyan Liang, Ke Tang, Yiben Xia
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
Wear behaviour and rolling contact fatigue life of Ti/TiN/DLC multilayer films fabricated on bearing steel by PIIID
Liu Hongxi, Jiang Yehua, Zhou Rong, Tang Baoyin
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
Calculation of the electrode surface temperature in the normal glow discharge
G.G. Bondarenko, V.I. Kristya, M.I. Supelnyak
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
Synthesis of metal oxide nanomaterials by plasma treatment – A SEM investigation of Nb2O5 nanowires
Miran Mozetic
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
Effect of heat treatment on characteristics of nanocrystalline ZnO films by electron beam evaporation
Mohsen Ghasemi Varnamkhasti, Hamid Reza Fallah, Mehdi Zadsar
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
A vacuum sensor using field emitters made by multiwalled carbon nanotube yarns
YuanChao Yang, Liang Liu, KaiLi Jiang, ShouShan Fan
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
CF3+ etching silicon surface: A molecular dynamics study
C. Zhao, X. Lu, P. He, P. Zhang, W. Sun, J. Zhang, F. Chen, F. Gou
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
Influence of modulation periods and modulation ratios on the structure and mechanical properties of nanoscale TiAlN/TiB2 multilayers prepared by IBAD
Y.D. Sun, J.Y. Yan, S. Zhang, F.Y. Xue, G.Q. Liu, D.J. Li
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
Diffusion barrier performance of nano-structured and amorphous Ru–Ge diffusion barriers for copper metallization
Guohua He, Ling Yao, Zhongxiao Song, Yanhuai Li, Kewei Xu
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
Material and surface processing in J-PARC vacuum system
Y. Saito, F. Naito, C. Kubota, S. Meigo, H. Fujimori, N. Ogiwara, J. Kamiya, M. Kinsho, Z. Kabeya, T. Kubo, M. Shimamoto, Y. Sato, Y. Takeda, M. Uota, Y. Hori
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
High rate deposition of microcrystalline silicon films using jet-type inductively coupled plasma chemical vapor deposition
Zewen Zuo, Yu Wang, Jin Lu, Junzhuan Wang, Lin Pu, Yi Shi, Youdou Zheng
Vacuum, Vol: 86, No: 7 , published: 08 February 2012
Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution
A. A. Howling, B. Legradic, M. Chesaux and Ch. Hollenstein
Plasma Sources Sci. and Technol., Vol: 21, No: 1 , published: 07 February 2012
Dual frequency capacitive plasmas in Fe and Ni sputter applications: correlation of discharge properties on thin film properties
S. Bienholz, E. Semmler, P. Awakowicz, H. Brunken and A. Ludwig
Plasma Sources Sci. and Technol., Vol: 21, No: 1 , published: 07 February 2012
Nanoparticle Synthesis and Growth in a Continuous Plasma Reactor from Organosilicon Precursors
Christian Roth, Gina Oberbossel, Elizabeth Buitrago, Roman Heuberger and Philipp Rudolf von Rohr
Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
Interface between Oxide Coatings and Plasma-damaged Polymers and Its Effects on Coating Adhesion and Structure
Jungheum Yun, Tae-Sung Bae, Sunghun Lee, Seunghun Lee, Jongjoo Rha and Gun-Hwan Lee
Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
The Role of Albumin and Fibronectin in the Adhesion of Fibroblasts to Plasma Polymer Surfaces
Mischa Zelzer, Darren Albutt, Morgan R. Alexander and Noah A. Russell
Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
Relevance of Surface Modification of Polyamide 6.6 Fibers by Air Plasma Treatment on the Release of Caffeine
Cédric Labay, José Mª Canal and Cristina Canal
Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
Free Radicals Generated by Ion Bombardment of a Semi-Crystalline PEEK Surface
Firas Awaja, Shengnan Zhang, Natalie James and David R. McKenzie
Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
Control of Wettability of Plasma Polymers by Application of Ti Nano-Clusters
Ondřej Kylián, Oleksandr Polonskyi, Jiří Kratochvíl, Anna Artemenko, Andrei Choukourov, Martin Drábik, Pavel Solař, Danka Slavínská and Hynek Biederman
Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
In situ Quartz Crystal Microbalance Measurements of Thin Protein Film Plasma Removal
Francesco Fumagalli, Jan Hanuš, Ondřej Kylián and François Rossi
Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
Surface Modification of Biopolymers by Argon Plasma and Thermal Treatment
Petr Slepička, Simona Trostová, Nikola Slepičková Kasálková, Zdeňka Kolská, Petr Sajdl and Václav Švorčík
Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
Interaction Mechanisms between Ar[BOND]O2 Post-discharge and Biphenyl

Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
White Luminescent Polymers by Plasma Polymerized Iridium Complexes from 1,10-Phenanthroline
Chun-Chih Chang, Ling-Wei Wang, Yu-Hsiang Chen, Kuo-Chu Hwang, Jwo-Huei Jou, Yee-Shyi Chang and Arnold C.-M.
Plasma Processes and Polymers, Vol: 9, No: 2 , published: 02 February 2012
Extra source implantation for suppression floating-body effect in partially depleted SOI MOSFETs
Jing Chen, Jiexin Luo, Qingqing Wu, Zhan Chai, Xiaolu Huang, Xing Wei, Xi Wang
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
FIB fabrication and irradiation test of stencil masks for heavy-ion patterned implantation for plasmonic application
B. Zheng, N. Iketa, Y. Takeda, K. Sato, R. Sato, H. Amekura, K. Oyoshi, K. Kono, M.E. Edwards, M. Song, D. Ila, N. Kishimoto
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
Plasma immersion ion implantation and deposition of DLC coating for modification of orthodontic magnets
W. Wongsarat, S. Sarapirom, S. Aukkaravittayapun, D. Jotikasthira, D. Boonyawan, L.D. Yu
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
Plasma impregnation of wood with fire retardants
Karel G. Pabeliña, Carmencita O. Lumban, Henry J. Ramos
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
Magnetic properties of Co, Ni, Pt and their alloy nanoparticles formed in SiO2 by ion beam synthesis
A.E. Malik, W.D. Hutchison, K. Nishimura, R.G. Elliman
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
3D patterning of Ag nanoparticles by ULE ion implantation and stencil soft lithography for plasmonic device applications
Gerard BenAssayag, Cosmin Farcau, Patrizio Benzo, Laura Cattaneo, Caroline Bonafos, Béatrice Pecassou, Antoine Zwick, Robert Carles
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
Structural, electrical and optical studies of gold nanostructures formed by Ar plasma-assisted sputtering
J. Siegel, O. Kvítek, P. SlepiÄ?ka, J. Náhlík, J. Heitz, V. ŠvorÄ?ík
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
Modifications in SnS thin films by plasma treatments
H. Martínez, D. Avellaneda
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
Biaxial texture development in the ion beam assisted deposition of magnesium oxide
James R. Groves, Robert H. Hammond, Vladimir Matias, Raymond F. DePaula, Liliana Stan, Bruce M. Clemens
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
Formation of c-BN nanoparticles by helium, lithium and boron ion implantation
Emily Aradi, Rudolph M. Erasmus, Trevor E. Derry
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
Improving mechanical characteristics of an aluminum cutting tool by depositing multilayer amorphous carbon with assistance of plasma immersion ion implantation
Noriaki Ikenaga, Yoichi Kishi, Zenjiro Yajima, Noriyuki Sakudo
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 272, No: , published: 01 February 2012
Novel plasma treatment in linear antenna microwave PECVD system
Neda Neykova, Halyna Kozak, Martin Ledinsky, Alexander Kromka
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Surface loss probability of atomic oxygen
J. Krištof, P. Macko, P. Veis
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Surface modification and ageing of PMMA polymer by oxygen plasma treatment
Alenka Vesel, Miran Mozetic
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
PTFE surface modification by Ar plasma and its characterization
Z. Kolská, A. Řezníčková, V. Hnatowicz, V. Švorčík
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
A comparative analysis of a-C:H films deposited from five hydrocarbons by thermal desorption spectroscopy
S. Peter, M. Günther, F. Richter
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Laser ablated ZnO layers for ALGaN/GaN HEMT passivation
G. Vanko, M. Vallo, J. Bruncko, T. Lalinský
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Design and fabrication of piezoresistive strain gauges based on nanocrystalline diamond layers
Pavel Kulha, Oleg Babchenko, Alexander Kromka, Miroslav Husak, Ken Haenen
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Direct growth of sub-micron diamond structures
O. Babchenko, E. Verveniotis, K. Hruska, M. Ledinsky, A. Kromka, B. Rezek
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Determination of hydrogen concentration in a-Si and a-Ge layers by elastic recoil detection analysis
N.Q. Khánh, M. Serényi, A. Csik, C. Frigeri
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Electrical properties of nickel electrodes for high-k MOS structures
P. Benko, A. Vincze, L. Harmatha, I. Novotný, V. Řeháček
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Mo/SiO2 nanocomposite films for optical coatings prepared by vacuum magnetron sputtering
I. Vávra, Z. Križanová, J. Dérer, J. Humlíček
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Gold catalysts for the abatement of environmentally harmful materials: Modeling the structure dependency
Krisztina Frey, Gábor Pető, Katalin V. Josepovits, László Guczi
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Electrical and structural characterization of AlGaN/GaN field-effect transistors with recessed gate
M. Mikulics, A. Fox, M. Marso, D. Grützmacher, D. Donoval, P. Kordoš
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
In-depth distribution of ion beam damage in SiC
A. Sulyok, M. Menyhárd, J.B. Malherbe
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Immobilization of protein streptavidin to the surface of PMMA polymer
Alenka Vesel, Kristina Elersic, Miran Mozetic
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Linear antenna microwave plasma CVD deposition of diamond films over large areas
A. Kromka, O. Babchenko, T. Izak, K. Hruska, B. Rezek
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Silica-coated ZnO nanowires
Hyoun Woo Kim, Hyo Sung Kim, Han Gil Na, Ju Chan Yang
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Surface density of growth defects in different PVD hard coatings prepared by sputtering
P. Panjan, M. Čekada, M. Panjan, D. Kek-Merl, F. Zupanič, L. Čurković, S. Paskvale
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Ion sputter etching of ZnO:Ga thin film surfaces
S. Flickyngerova, M. Netrvalova, I. Novotny, J. Bruncko, P. Gaspierik, P. Sutta, V. Tvarozek
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Analysis of single junction a-Si:H solar cells grown on different TCO’s
Lucie Prušáková, Soňa Flickyngerová, Marinus Fischer, Ivan Novotný, Martijn Tijssen, Marie Netrvalová, Miro Zeman, Vladimír Tvarožek, Pavol Šutta
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Comparative study on dry etching of polycrystalline diamond thin films
Tibor Izak, Alexander Kromka, Oleg Babchenko, Martin Ledinsky, Karel Hruska, Elisseos Verveniotis
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Structural and electronic studies of supported Pt and Au epitaxial clusters on tungsten oxide surface
K. Mašek, P. Blumentrit, J. Beran, T. Skála, I. Píš, J. Polášek, V. Matolín
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Dependence of microstructure and hardness of TiAlN/VN hard coatings on the type of substrate rotation
M. Panjan, M. Čekada, P. Panjan, F. Zupanič, W. Kölker
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Influence of deposition regime on physical properties of gallium doped zinc oxide films
M. Netrvalova, I. Novotny, L. Prusakova, V. Tvarozek, P. Sutta
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Nano-structuring of sputtered gold layers on glass by annealing
V. Švorčík, O. Kvítek, J. Říha, Z. Kolská, J. Siegel
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Relationships between the fretting wear behavior and mechanical properties of thin carbon films
E. Zdravecká, V.M. Tiainen, Y.T. Konttinen, L. Franta, M. Vojs, M. Marton, M. Ondáč, J. Tkáčová
Vacuum, Vol: 86, No: 6 , published: 27 January 2012
Comparison of various wall conditionings on the reduction of H content and particle recycling in EAST
G. Z. Zuo, J. S. Hu, S. Zhen, J. G. Li, D. K. Mansfield, B. Cao, J. H. Wu, L. E. Zakharov and the EAST Team
Plasma Phys. and Contr. Fusion, Vol: 54, No: 1 , published: 24 January 2012
Influence of oxidation on the structural and mechanical properties of TiAlSiN coatings synthesized by multi-plasma immersion ion implantation and deposition
Z.W. Xie, L.P. Wang, X.F. Wang, L. Huang, Y. Lu, J.C. Yan
Nucl. Instrum. Methods Phys. Res., Sect. B , Vol: 271, No: , published: 15 January 2012
First mirrors in ITER: material choice and deposition prevention/cleaning techniques
E.E. Mukhin, V.V. Semenov, A.G. Razdobarin, S. Yu. Tolstyakov, M.M. Kochergin, G.S. Kurskiev, K.A. Podushnikova, S.V. Masyukevich, D.A. Kirilenko, A.A. Sitnikova, P.V. Chernakov, A.E. Gorodetsky, V.L. Bukhovets, R. Kh. Zalavutdinov, A.P. Zakharov, I.I. Arkhipov, Yu.P. Khimich, D.B. Nikitin, V.N. Gorshkov, A.S. Smirnov, T.V. Chernoizumskaja, E.M. Khilkevitch, S.V. Bulovich, V.S. Voitsenya, V.N. Bondarenko, V.G. Konovalov, I.V. Ryzhkov, O.M. Nekhaieva, O.A. Skorik, K. Yu. Vukolov, V.I. Khripunov and P. Andrew
Nucl. Fusion, Vol: 52, No: 1 , published: 06 January 2012
Ultra-low gas sensing utilizing metal oxide thin films
G. Kiriakidis, K. Moschovis, I. Kortidis, V. Binas
Vacuum, Vol: 86, No: 5 , published: 05 January 2012
PECVD coatings for functionalization of point-of-care biosensor surfaces
Ram Prasad Gandhiraman, Vladimir Gubala, Christy Charlton O’Mahony, Th. Cummins, Jog Raj, Asmaa Eltayeb, Colin Doyle, Bryony James, Stephen Daniels, David E. Williams
Vacuum, Vol: 86, No: 5 , published: 05 January 2012
Derivatization of Plasma Polymerized Thin Films and Attachment of Biomolecules to Influence HUVEC-Cell Adhesion
Alexander Lotz, Martin Heller, Jürgen Brieger, Matthias Gabriel and Renate Förch
Plasma Processes and Polymers, Vol: 9, No: 1 , published: 02 January 2012
The Inactivation of Resistant Candida Albicans in a Sealed Package by Cold Atmospheric Pressure Plasmas
Ying Song, Dongping Liu, Longfei Ji, Wenchun Wang, Pengchao Zhao, Chunshan Quan, Jinhai Niu and Xianhui Zhang
Plasma Processes and Polymers, Vol: 9, No: 1 , published: 02 January 2012
Full-Thickness Characterization of Plasma Polymerized Hexane Films Irradiated by an Electron Beam
Rasmus H. Pedersen, David J. Scurr, Paul Roach, Morgan R. Alexander and Nikolaj Gadegaard
Plasma Processes and Polymers, Vol: 9, No: 1 , published: 02 January 2012
Tetraethyl Orthosilicate and Acrylic Acid Forming Robust Carboxylic Functionalities on Plastic Surfaces for Biodiagnostics
Conor Coyle, Ram Prasad Gandiraman, Vladimir Gubala, Nam Cao Hoai Le, Christy Charlton O'Mahony, Colin Doyle, Bryony James, Paul Swift, Stephen Daniels and David E. Williams
Plasma Processes and Polymers, Vol: 9, No: 1 , published: 02 January 2012
Does Cross-Link Density of PEO-Like Plasma Polymers Influence their Resistance to Adsorption of Fibrinogen?
Andrei Choukourov, Ivan Gordeev, Dmitry Arzhakov, Anna Artemenko, Jaroslav Kousal, Ondřej Kylián, Danka Slavínská and Hynek Biederman
Plasma Processes and Polymers, Vol: 9, No: 1 , published: 02 January 2012
Protein Inactivation by Low-temperature Atmospheric Pressure Plasma in Aqueous Solution
Eisuke Takai, Katsuhisa Kitano, Junpei Kuwabara and Kentaro Shiraki
Plasma Processes and Polymers, Vol: 9, No: 1 , published: 02 January 2012
Effects of Reactor Packing Materials on H2 Production by CO2 Reforming of CH4 in a Dielectric Barrier Discharge
Helen J. Gallon, Xin Tu and J. Christopher Whitehead
Plasma Processes and Polymers, Vol: 9, No: 1 , published: 02 January 2012
Multicentre Trials for Decontamination of Fine-Lumen PTFE Tubes Loaded with Bacterial Endospores by Low and Atmospheric Pressure Plasma
Uta Schnabel, Tanja Maucher, Johanna Köhnlein, Wolfram Volkwein, Rijana Niquet, Iris Trick, Manfred Stieber, Michael Müller, Heinz-Peter Werner, Jörg Ehlbeck, Christian Oehr and Klaus-Dieter Weltmann
Plasma Processes and Polymers, Vol: 9, No: 1 , published: 02 January 2012
Plasma-Induced Death of HepG2 Cancer Cells: Intracellular Effects of Reactive Species
Xu Yan, Zilan Xiong, Fei Zou, Shasha Zhao, Xinpei Lu, Guangxiao Yang, Guangyuan He and Kostya (Ken) Ostrikov
Plasma Processes and Polymers, Vol: 9, No: 1 , published: 02 January 2012
Modeling of electrical confined-capillary-discharge where the discharge zone is extended by an additional pipe
E. Weiss, D. Zoler, S. Wald, E. Elias
Phys. Lett. A, Vol: 373, No: 10 , published: 02 March 2009
Спектры СВЧ-колебаний в стационарном плазменном двигателе СПД-АТОН
Кирдяшев К.П./Бугрова А.И./Морозов А.И./и др.
Письма в ЖТФ, Vol: 34, No: 7 , published: 04 December 2008
Модификация приповерхностных слоев медной фольги при воздействии объемным наносекундным разрядом в воздухе атмосферного давления
Шулепов М.А./Тарасенко В.Ф./Гончаренко И.М./и др.
Письма в ЖТФ, Vol: 34, No: 7 , published: 04 December 2008
Влияние аммиака на перенос и осаждение углеводородных радикалов в различных областях тлеющего разряда с полым катодом
Буховец В.Л./Городецкий А.Е./Залавутдинов Р.Х./Захаров А.П.
Вопр. атом. науки и техн. Сер. Термоядер. синтез, Vol: 2008, No: 4 , published: 01 December 2008
Реактивное магнетронное напыление пленок оксидов ванадия для неохлаждаемых болометров
Марченко В.А.
Прикл. физ., Vol: 2008, No: 1 , published: 26 November 2008
Магнетронное нанесение оптических покрытий при питании магнетронов переменным напряжением средней диагностики
Вольпян О.Д./Куьмичев А.И.
Прикл. физ., Vol: 2008, No: 3 , published: 25 November 2008
Plasma activation of wood surface by diffuse coplanar surface barrier discharge
Odr~1a~3skov~1a M./R~1ahel' J./Ti~6no R./~3Cern~1ak M.
Plasma Chem. Plasma Process., Vol: 28, No: 2 , published: 18 November 2008
Controlled synthesis of _b-SiC nanopowders with variable stoichiometry using inductively coupled plasma
Leconte Y./Leparoux M./Portier X./Herlin-Boime N.
Plasma Chem. Plasma Process., Vol: 28, No: 2 , published: 18 November 2008
Articial intelligence computation to establish relationships between APS process parameters and almina-titania coating properties
Kanta A.-F./Montavon G./Planche M.-P./Coddet C.
Plasma Chem. Plasma Process., Vol: 28, No: 2 , published: 18 November 2008
W-C synthesis in a pulsed arc submerged in liquid
Parkansky N./Glikman L./Beilis I.I./et al.
Plasma Chem. Plasma Process., Vol: 28, No: 3 , published: 18 November 2008
Development of atmospheric pressure low temperature surface discharge plasma torch and application to polypropylene surface treatment
Kuwabara A./Kuroda S./Kubota H.
Plasma Chem. Plasma Process., Vol: 28, No: 2 , published: 18 November 2008
Mechanistic investigations of surface modification of carbon black and silica by plasma polymerisation
Mathew T./Datta R.N./Dierkes W.K./et al.
Plasma Chem. Plasma Process., Vol: 28, No: 2 , published: 18 November 2008
Surface properties of low density polyethylene upon low-temperature plasma treatment with various gases
Ataeefard M./Moradian S./Mirabedini M./et al.
Plasma Chem. Plasma Process., Vol: 28, No: 3 , published: 18 November 2008
Migration of processing oils of thermoplastic rubber treated with RF plasma
Ortiz-Magan A.B./Pastor-Blas M.M.
Plasma Chem. Plasma Process., Vol: 28, No: 3 , published: 18 November 2008
Термодесорбция дейтерия из углеродных материалов МПГ-8 и NB31 после плазменного облучения
Русинов А.А./Гаспарян Ю.М./Писарев А.А./и др.
Изв. РАН. Сер. физ., Vol: 72, No: 7 , published: 19 October 2008
Структурные изменения поверхности углеродных и полимерных материалов при воздействии потока кислородной плазмы
Черник В.Н./Акишин А.И./Бондаренко Г.Г./и др.
Изв. РАН. Сер. физ., Vol: 72, No: 7 , published: 19 October 2008
Моделирование отражения дейтерия от плазменно-напыленного вольфрама
Когут Д.К./Трифонов Н.Н./Курнаев В.А.
Изв. РАН. Сер. физ., Vol: 72, No: 7 , published: 19 October 2008
Фрактальная нано- и микроструктура осажденных пленок в термоядерных установках
Будаев В.П./Химченко Л.Н.
Вопр. атом. науки и техн. Сер. Термоядер. синтез, Vol: 2008, No: 3 , published: 19 October 2008
Degradation of methylene blue by RF plasma in water
Maehara T./Miyamoto I./Kurokawa K./et al.
Plasma Chem. Plasma Process., Vol: 28, No: 4 , published: 13 October 2008
Naphthalene and acenaphthene decomposition by electron bea generated palsma application
Ostapczuk A./Hakoda T./Shimada A./Kojima T.
Plasma Chem. Plasma Process., Vol: 28, No: 4 , published: 13 October 2008
Influence of polarity and rise time of pulse voltage waveforms on diesel particulate matter removal using an uneven dieletric barrrier discharge reactor
Fushimi C./Madokoro K./Yao S./et al.
Plasma Chem. Plasma Process., Vol: 28, No: 4 , published: 13 October 2008
The effects of gas composition on active species and byproducts formation in gas_-water gliding arc discharge
Du Ch.M./Sun Y.W./Zhuang X.F.
Plasma Chem. Plasma Process., Vol: 28, No: 4 , published: 13 October 2008
Influence of plasma treatments on the hemocompatibility of PET and PET+TiO[2[] films
Topala I./Dumitrascu N./Pohoata V.
Plasma Chem. Plasma Process., Vol: 28, No: 4 , published: 13 October 2008
Thermodynamic and transport properties of two-temperature nitrogen-oxygen plasma
Ghorui S./Heberlein J.V.R./Pfender E.
Plasma Chem. Plasma Process., Vol: 28, No: 4 , published: 13 October 2008
Plasma modification of the surface of constructional materials
Didyk O.G./Zhovtyansky V.A./Nazarenko V.G.Khomych V.O.
Укр. фiз. ж., Vol: 53, No: 5 , published: 13 October 2008
Aging and Prompt Effects on Space Material Properties
Levy, L.; Paulmier, T.; Dirassen, B.; Inguimbert, C.; Van Eesbeek, M.
IEEE Trans. Plasma Sci. Pt 2, Vol: 36, No: 5 , published: 01 October 2008
Synthesis of titania nanoparticles using a compact nonequilibrium plasma torch (communication)
Mingwei Li, José Gonzalez-Aguilar, and Laurent Fulcheri
Jpn. J. Appl. Phys., Vol: 47, No: 9R , published: 12 September 2008
Simulation and Visualization of Self-Assembled Nanodevice Networks Synthesized via Plasma–Surface Interaction
Levchenko, I.; Ostrikov, K.; Cvelbar, U.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Interaction of Oxygen Plasma With Aluminium Substrates
Mozetic, M.; Cvelbar, U.; Vesel, A.; Krstulovic, N.; Milosevic, S.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Inductively Coupled Plasma-Assisted RF Magnetron Sputtering Deposition of Highly Uniform SiC Nanoislanded Films
Qijin Cheng; Xu, S.; Shiyong Huang; Jidong Long; Ren, Y.; Xu, M.; Ostrikov, K.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
TCP Plasma Sputtering of Nanostructured Fuel Cell Electrodes
Rabat, H.; Andreazza, C.; Brault, P.; Thomann, A.-L.; Cavarroc, M.; Tessier, Y.; Caillard, A.; Charles, C.; Boswell, R.W.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Dynamics of the Profile Charging During $hbox{SiO}_{2}$ Etching in Plasma for High Aspect Ratio Trenches
Radjenovic, B.M.; Radmilovic-Radjenovic, M.D.; Petrovic, Z.L.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Surface Modification of Composite Electrodes by Electric Arc Discharge
Babich, I.L.; Minakova, R.V.; Veklich, A.N.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Stochastic Plasma Charging of Nanopatterned Dielectric Surfaces
Kenney, J.A.; Eunsu Paek; Hwang, G.S.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Optical Investigation of Surface Flashover Plasma Across Silicon Stimulated by Pulsed High Voltage in Vacuum Based on ICCD
Wen-Bin Zhao; Guan-Jun Zhang; Ming Dong; Zhang Yan
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Synthesis of Carbon Nanofibers and Pt-Nanocluster-Based Electrochemical Microsystems by Combining Low-Pressure Helicon Plasma Techniques
Caillard, A.; Charles, C.; Boswell, R.W.; Brault, P.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Transport and Deposition of Plasma-Sputtered Platinum Atoms: Comparison Between Experiments and Simulation
Caillard, A.; Charles, C.; Boswell, R.W.; Brault, P.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Improved Dual-Plasma Process for the Synthesis of Coated or Functionalized Metal Nanoparticles
Swanson, E.J.; Tavares, J.; Coulombe, S.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Two-Dimensional Spatial Profile of Volume Fraction of Nanoparticles Incorporated Into a-Si:H Films Deposited by Plasma CVD
Nakamura, W.M.; Miyahara, H.; Sato, H.; Matsuzaki, H.; Koga, K.; Shiratani, M.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Plasma-Enhanced Chemical Vapor Deposition of Amorphous Fluorocarbon Polymer Films ( $a$-C:F) on Spherical Surfaces
Biloiu, C.; Sakai, Y.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Plasma Emission Modifications and Instabilities Induced by the Presence of Growing Dust Particles
Mikikian, M.; Couedel, L.; Cavarroc, M.; Tessier, Y.; Boufendi, L.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Dust-Cloud Dynamics in a Complex Plasma Afterglow
Couedel, L.; Samarian, A.A.; Mikikian, M.; Boufendi, L.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Nanostructured Silicon Thin Films Deposited Under Dusty Plasma Conditions
Cavarroc, M.; Mikikian, M.; Tessier, Y.; Boufendi, L.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Plasma Density Measurements in a Developing Void
Stefanovic, I.; Scharwitz, C.; Kovacevic, E.; Berndt, J.; Winter, J.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
High-Speed Imaging of a Shock in a Complex Plasma
Samsonov, D.; Morfill, G.E.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Modeling the Spatiotemporal Evolution of a Nanodusty Plasma
Ravi, L.; Girshick, S.L.
IEEE Trans. Plasma Sci., Vol: 36, No: 4 , published: 01 August 2008
Review of Cold Cathode Research at the Air Force Research Laboratory
Shiffler, D.; Haworth, M.; Cartwright, K.; Umstattd, R.; Ruebush, M.; Heidger, S.; LaCour, M.; Golby, K.; Sullivan, D.; Duselis, P.; Luginsland, J.
IEEE Trans. Plasma Sci. Pt 1, Vol: 36, No: 3 , published: 01 June 2008
Pulsed-spray radiofrequency plasma enhanced chemical vapor deposition of CuInS[2] thin films
Rodriguez Rene G.\Pulsipher Daniel J.V.\Lau Lisa D.\et al.
Plasma Chem. Plasma Process., Vol: 26, No: 2 , published: 12 May 2008
Comparative study of plasma spray flow fields and particle behavior near to flat inclined substrates
Kang C.W.\Ng H.W.\Yu S.C.M.
Plasma Chem. Plasma Process., Vol: 26, No: 2 , published: 12 May 2008
Particle injection in direct current air plasma spray: salient observations and optimization strategies
Srinivasan V.\Friis M.\Vaidya A.\et al.
Plasma Chem. Plasma Process., Vol: 27, No: 5 , published: 12 May 2008
Acceleration of acetone destruction process under synergistic action of photocatalytic oxidation and barrier discharge
Besov A.S.\Vorontsov A.V.
Plasma Chem. Plasma Process., Vol: 27, No: 5 , published: 12 May 2008
Formation of pores in thermal spray coatings due to incomplete filling of crevices in patterned surfaces
Xue M.\Chandra S.\Mostaghimi J.\Salimijazi H.R.
Plasma Chem. Plasma Process., Vol: 27, No: 5 , published: 12 May 2008
Spectroscopic analysis of a pulsed-laser deposition system for fullerene-like Cn[x] film production
Riascos H.\Zambrano G.\Prieto P.
Plasma Chem. Plasma Process., Vol: 26, No: 3 , published: 04 May 2008
UV absorptance of titanium dioxide thin films by plasma enhanced deposition from mixtures of oxygen and titanium-tetrakis-isopropoxide
Sonnenfeld A.\Hauert R.\Von Rohr P.R.
Plasma Chem. Plasma Process., Vol: 26, No: 3 , published: 04 May 2008
Модификация поверхности пленки поливинилиденфторида под воздействием тлеющего низкочастотного разряда
Пискарев М.С.\Гильман А.Б.\Оболонкова Е.С.\Кузнецов А.А.
Химия высок. энергий, Vol: 41, No: 6 , published: 25 April 2008
Generation of carbon nanomaterials by plasma of a secondary discharge
Veremii Yu.P./Chernyak V.Ya./Filatov S.A./et al.
Укр. фiз. ж., Vol: 53, No: 4 , published: 20 April 2008
Влияние упругих взаимодействий на формирование кремниевых нанокристаллитов на некристаллических подложках в плазме СВЧ газового разряда низкого давления
Нефедов Д.В.\Яфаров Р.К.
Письма в ЖТФ, Vol: 33, No: 7 , published: 14 April 2008
Влияние энерговкладов в высоковольтный разряд атмосферного давления на эффективность конверсии этанола
Жданок С.А.\Крауклис А.В.\Самцов П.П.\Суворов А.В.
Инж.-физ. ж., Vol: 79, No: 6 , published: 05 April 2008
Влияние режимов работы плазмохимического реактора на эффективность конверсии этанола
Жданюк С.А.\Крауклис А.В.\Суворов А.В.\и др.
Инж.-физ. ж., Vol: 79, No: 6 , published: 05 April 2008
Магнетронная плазма и нанотехнология
Каштанов П.В.\Смирнов Б.М.\Хипплер Р.
Успехи физ. наук, Vol: 177, No: 5 , published: 01 April 2008
Properties of hybrid water/gas DC arc plasma torch
Hrabovsky Milan\Kopeck~1y Vladimir\Sember Viktor\et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 34, No: 4 , published: 01 April 2008
Research on the Inactivation Effect of Low-Temperature Plasma on Candida Albicans
Xing-Min Shi; Guan-Jun Zhang; Yu-Kang Yuan; Yue Ma; Gui-Min Xu; Yun Yang
IEEE Trans. Plasma Sci., Vol: 36, No: 2 , published: 01 April 2008
The 4 International Symposium on Nonthermal Medica and Biological Treatments Using Electromagneting Fields and Ionized Gases, Porland, OR, May 2250

IEEE Trans. Plasma Sci. Pt 2, Vol: 34, No: 4 , published: 31 March 2008
О скорости и каналах ионизации водной среды сильноточным импульсным высоковольтным разрядом
Скибенко Е.И.\Юферов В.Б.\Буравилов И.В.\Пономарев А.Н.
Ж. техн. физ., Vol: 77, No: 5 , published: 27 March 2008
Effect of rise-time patterns on dynamics of sheath expansion during plasma immersion ion implantation
Huang Yong-Xian\Tian Xiu-Bo\Yang Shi-Qin\et al.
Acta phys. sin., Vol: 56, No: 8 , published: 01 March 2008
Ion acceleration by multiple laser pulses and their spontaneous electromagnetic fields in plasma
Chen F.-C.
J. Plasma Phys., Vol: 74, No: 1 , published: 30 February 2008
Estimating electrons and ions energes in an RF capacitively-coupled argon discharge
Aflori M.\Ivan L.M.\Mihai-Plugaru M.\Dimitriu D.G.
Rom. J. Phys., Vol: 51, No: 1-2 , published: 21 January 2008
Characterization of carbon thin film deposited by thermionic vacuum arc (TVA) method
Valdoiu R.\Ciupina V.\Mustata I.\et al.
Rom. J. Phys., Vol: 51, No: 1-2 , published: 21 January 2008
Ponderomotive effects in an electromagnetic accelerator
Tolmachev Y.N.\Park Wontaek\Volynets V.N.\et al.
J. Plasma Phys., Vol: 72, No: 6 , published: 20 January 2008
Uneven dielectric barrier discharge reactors for diesel particulate matter removal
Yao S.\Fushimi C.\Madokoro K.\Yamada K.
Plasma Chem. Plasma Process., Vol: 26, No: 5 , published: 19 January 2008
Экспериментальная установка "ЭХО" для модифицирования гетерогенных органических сред совместным действием электрического разряда и электронного пучка
Долгачев Г.И./Масленников Д.Д./Мижирицкий В.И./и др.
Вопр. атом. науки и техн. Сер. Термоядер. синтез, Vol: 2008, No: 1 , published: 19 January 2008
Образование отрицательно заряженных частиц в термоэмиссионной плазме
Вишняков В.И./Драган Г.С./Флорко А.В.
Ж. эксперим. и теор. физ., Vol: 133, No: 1 , published: 15 January 2008
Фотоионизационная двухпотоковая неустойчивость в столкновительной плазме
Андрияш И.А./Быченков В.Ю.
Физ. плазмы, Vol: 33, No: 12 , published: 30 December 2007
Large-area and high-speed deposition of microcrystalline silicon film by inductive coupled plasma using internal low-inductance antenna
Takahashi Eiji\Nishigami Yasuaki\Tomyo Atsushi\et al.
Jpn. J. Appl. Phys., Part 1, Vol: 46, No: 3B , published: 28 December 2007
Плазменные керметные покрытия с наноразмерным карбонитридом титана
Калита В.И./Самохин А.В./Алексеев Н.В./и др.
Физ. и химия обраб. матер., Vol: 2007, No: 2 , published: 26 December 2007
Модель формирования макроструктуры покрытий при плазменном напылении
Гнедовец А.Г./Калита В.И.
Физ. и химия обраб. матер., Vol: 2007, No: 1 , published: 26 December 2007
Микроплазменное формирование оксидно-керамических покрытий в вакууме
Дорофеева Т.И./Мамаев А.И./Мамаева В.А./Бутягин П.И.
Физ. и химия обраб. матер., Vol: 2007, No: 3 , published: 26 December 2007
Влияние ионной имплантации и плазменной поверхностной обработки на эксплуатационные характеристики жаропрочного никелевого сплава
Смыслов А.М./Былин А.А./Невьянцева Р.Р.
Физ. и химия обраб. матер., Vol: 2007, No: 3 , published: 26 December 2007
Special issue on plasma-assisted combustion

IEEE Trans. Plasma Sci. Pt 1, Vol: 35, No: 6 , published: 21 December 2007
W_-C electrode erosion in a pulsed arc submerged in liquid
Pakansky N./Glikman L./Beilis I.I./et al.
Plasma Chem. Plasma Process., Vol: 27, No: 6 , published: 15 December 2007
Surface modification of fine particles with a SnO[2] film by using a polyhedral-barrel sputtering system
Abe T./Higashide S./Inoue M./Akamaru S.
Plasma Chem. Plasma Process., Vol: 27, No: 6 , published: 15 December 2007
Magnetically enhanced 15 kHz glow discharge of methane
Ledernez L./Olcaytug F./Urban G.A./Yasuda H.K.
Plasma Chem. Plasma Process., Vol: 27, No: 6 , published: 15 December 2007
Dielectric barrier discharge initiated gas-phase decomposition of CO[2] to CO and C[6]_-C[9] alkanes to C[1]_-C[3] hydrocarbons on glass, molecular sieve 10X and TiO[2]/ZnO surfaces
Dey G.R./Singh B.N./Kumar S.D./Das T.N.
Plasma Chem. Plasma Process., Vol: 27, No: 6 , published: 15 December 2007
Toward the achievement of substrate melting and controlled solidification in thermal spraying
Zhang W./Wei G.H./Zhang H./et al.
Plasma Chem. Plasma Process., Vol: 27, No: 6 , published: 15 December 2007
Механические эффекты в разреженной плазме
Дубинов А.Е.\Садовой С.А.
Физ. плазмы, Vol: 33, No: 4 , published: 10 December 2007
Silicon oxide selective etching employing dual frequency superimposed magnetron sputtering of acarbon using F[2]/Ar gases
Nagai Mikio\Hori Masaru
Jpn. J. Appl. Phys., Part 1, Vol: 46, No: 2 , published: 10 December 2007
Review of relaxation oscillations in plasma processing discharges
Zhou Zhu-Wen\Lieberman M.A.\Sungjin Kim
Chin. Phys., Vol: 16, No: 3 , published: 08 December 2007
Investigation of Bowing Reduction in SiO2 Etching Taking into Account Radical Sticking in a Hole
Masaru Izawa, Nobuyuki Negishi, Ken'etsu Yokogawa, and Yoshinori Momonoi<
Jpn. J. Appl. Phys., Part 1, Vol: 46, No: 12 , published: 06 December 2007
О возможности получения нанопорошков при соударении металлических фольг, ускоренных давлением магитного поля
Смирнов В.П./Алексеев Ю.А./Казеев М.Н./и др.
Прикл. физ., Vol: 2007, No: 5 , published: 01 December 2007
Ионно-плазменные процессы в технологии изготовления матричных фоточувствительных элементов из КРТ
Бурлаков И.Д./Болтарь К.О./Седнев М.В.
Прикл. физ., Vol: 2007, No: 5 , published: 01 December 2007
Плазмохимическое осаждение пленок диоксида и нитрида кремния для пассивации поверхности КРТ
Васильев В.В./Войцеховский А.В./Дульцев Ф.Н./и др.
Прикл. физ., Vol: 2007, No: 5 , published: 01 December 2007
Формирование и динамика плазменных слоев на поверхности фольги при протекании мощного импульса тока
Грабовский Е.В.\Левашов П.Р.\Олейник Г.М.\и др.
Физ. плазмы, Vol: 32, No: 9 , published: 01 December 2007
Формирование прочного микрорельефа на поверхности Co-Cr-сплава при взаимодействии с микроплазменными разрядами
Иванов В.А./Коныжев М.Е./Спирин А.М./и др.
Прикл. физ., Vol: 2007, No: 6 , published: 26 November 2007
Генерация озона в кислороде и воздухе при атмосферном давлении под действием плазменного факела СВЧ-горелки
Лукина Н.А./Сергейчев К.Ф.
Прикл. физ., Vol: 2007, No: 6 , published: 26 November 2007
Highly selective Si[3]N[4]/SiOC etching using dual frequency superimposed RF capacitively coupled plasma
Takase Akihiro\Nishiwaki Junya\Yamamoto Katsumi\et al.
Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 7 , published: 26 November 2007
Investigation of current on the conducting target biased with a large negative potential in the non-uniform plasma
Choe Jae-Myung\Chung Kyoung-Jae\Hwang Hui-Dong\et al.
Jpn. J. Appl. Phys., Part 2, Vol: 45, No: 24-28 , published: 26 November 2007
Density of O-atoms in an afterglow reactor during treatment of wool
Canal C./Gaboriau F./Ricard A./et al.
Plasma Chem. Plasma Process., Vol: 27, No: 4 , published: 18 November 2007
Effect of propene, n-decane, and toluene plasma kinetics on NO conversion in homogeneous oxygen-rich dry mixtures at ambient temperature
Lombardi G./Blin-Simiand N./Jorand F./et al.
Plasma Chem. Plasma Process., Vol: 27, No: 4 , published: 18 November 2007
Two-dimensional fluid model of pulse sheath in plasma immersion ion implantation with dielectric substrates
Li X.-C./Wang Y.-N.
IEEE Trans. Plasma Sci. Pt 2, Vol: 35, No: 5 , published: 13 November 2007
Impedance spectroscopy study of composite thin films of hydrated poleythylene glycol
Al-Hamarneh I.F./Pedrow P.D./Goheen S.C./Hartenstine M.J.
IEEE Trans. Plasma Sci. Pt 2, Vol: 35, No: 5 , published: 13 November 2007
Имплантация высокоэнергетичных ионов под действием фемтосекундного лазерного излучения
Волков Р.В.\Голишников Д.М.\Гордиенко В.М.\и др.
Квант. электрон., Vol: 35, No: 1 , published: 12 November 2007
DNA encapsulation inside carbon nanotubes using micro electrolyte plasmas
Kaneko T.\Okada T.\Hatakeyama R.
Contrib. Plasma Phys., Vol: 47, No: 1-2 , published: 10 November 2007
Antimicrobial treatment of heat sensitive materials by means of atmospheric pressure Rf-driven plasma jet
Brandenburg R.\Ehlbeck J.\Stieber M.\et al.
Contrib. Plasma Phys., Vol: 47, No: 1-2 , published: 10 November 2007
Создание неравновесной плазмы в гетерофазных средах газ-жидкость при атмосферном давлении и демонстрация ее возможностей для стерилизации
Акишев Ю.С.\Грушин М.Е.\Каральник В.Б.\и др.
Физ. плазмы, Vol: 32, No: 12 , published: 10 November 2007
Plasma etch rates of porous silica low-k films with different dielectric constants
Ono Tetsuo\Takahashi Hideki\Kinoshita Keizo\et al.
Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 11 , published: 10 November 2007
Modeling of feature profile evolution in SiO[2] as functions of radial position and bias voltage under competition among charging, deposition, and etching in two-frequency capacitively coupled plasma
Shimada Takashi\Yagisawa Takashi\Makabe Toshiaki
Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 11 , published: 10 November 2007
Glow discharge formation over water surface at saturated water vapor pressure and its application to wastewater treatment
Sugama Chie\Tochikubo Fumiyoshi\Uchida Satoshi
Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 11 , published: 10 November 2007
Characteristics of large area inductively coupled plasma using a multiple linear antennas with U-type parallel connection for flat panel display processing
Kim Kyong Nam\Seok Kyung\Yeom Geun Young
Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 11 , published: 10 November 2007
Experimental study on favorable properties of compound RF discharge plasmas with a tapered shape hollow cathode compared with a plane cathode
Yambe Kiyoyuki\Matsuoka Akio\Kondoh Yoshiomi
Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 11 , published: 10 November 2007
Radio frequency plasma in water
Maehara Tsunehiro\Toyota Hiromichi\Kuramoto Makoto\et al.
Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 11 , published: 10 November 2007
Модификация свойств материалов и осаждение покрытий с помощью плазменных струй
Погребняк А.Д.\Тюрин Ю.Н.
Успехи физ. наук, Vol: 175, No: 5 , published: 19 October 2007
Study on properties of M50 steel implanted with nitrogen by plasma-based ion implantation at elevated temperatures
Ma Xinxin\Xu Shuyan\Tang Guangze
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Ion extraction from magnetically driven carbon shunting arc plasma
Takaki Koichi\Kumagai Osamu\Mukaigawa Seiji\et al.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Numerical simulation of metal plasma immersion ion implantation and deposition on a dielectric wedge
Kwok Dixon Tat-Kun
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Surface degradation of silicone rubber exposed to corona discharge
Zhu Yong\Haji Kenichi\Otsubo Masahisa\Honda Chikahisa
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Surface modification of thin rods by theta-pinching metallic plasmas
Takeuchi Nozomi\Yasuoka Koichi\Ishii Shozo
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Theoretical study on dose distributions of the ball bearing treated by plasma immersion ion implantation
Yu Yonghao\Wang Langping\Wang Yuhang\Wang Xiaofeng
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Numerical simulation of magnetic-field-enhanced plasma immersion ion implantation in cylindrical geometry
Kostov Konstantin G.\Barroso Joaquim J.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Influence of microstructure on nitriding properties of stainless steel
Manova Darina\Eichentopf Inga-Maria\Hirsch Dietmar\et al.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Effects of the high-temperature plasma immersion ion-implantation treatment on corrosion behavior of Ti-6Al-4V
Da Silva Liede Lili G.\Ueda M~1ario\Da Silva Maria Margareth\Codaro Eduardo Norberto
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Dense gas discharge with runaway electrons as a new plasma source for surface modification and treatment
Maltsev Anatoly Nikolaevich
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Transient ion sheath in pulsed plasmas
Masamune Sadao\Yukimura Ken
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Dielectric barrier discharge in atmospheric air for glass-surface treatment to enhance hydrophobicity
Fang Zhi\Qiu Xinagqun\Qiu Yuchang\et al.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Oxide-layer thickness effect for surface roughness using low-pressure arc
Iwao Toru\Inagaki Yoshihiro\Sato Atsushi\et al.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Treatment of metal surface by atmospheric microwave plasma jet
Shin Dong H.\Bang Chan U.\Kim Jong H.\et al.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Topography evolution of dielectric thin films on grating surfaces in oblique deposition by multiple sources (ODMS)
Taguchi Masafumi\Kunisada Terufusa\Kusaka Satoru\Hamaguchi Satoshi
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Influence of O[2] flow rate on structure and properties of MgO[x] films prepared by cathodic-vacuum-arc ion deposition system
Zheng Changxi\Zhu Daoyun\Chen Dihu\et al.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
A study of ZrN/Zr coatings deposited on NiTi alloy by P~I~I~ID technique
Cheng Yan\Zheng Y.F.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
DLC film fabrication on the inner surface of a cylinder by carbon ion implantation
Wang Yuhang\Wang Langping\Yu Yonghao\et al.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Plasma polymer film as a model interlayer for polymer composites
Cech Vladimir
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Si_-N_-O films synthesized by plasma immersion ion implantation and deposition (P~I~I~I&D) for blood-contacting biomedical applications
Wan Guo Jiang\Kwok Sunny C.H.\Shao Zh.Y.\et al.
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Effect of ion implantation on DLC preparation using PB~I~ID process
Oka YoshihiroNishijima Masahiko\Hiraga Kenji\Yatsuzuka Mitsuyasu
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Investigation of BCN films deposited at various N[2]Ar flow ratios by DC reactive magnetron sputtering
Xu Shuyan\Ma Xinxin\Su Mingren
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Rapid deposition of photocatalytic oxide film by liquid feedstock injection TPCVD in open air
Ando Yasutaka\Tobe Shogo\Tahara Hirokazu
IEEE Trans. Plasma Sci., Vol: 34, No: 4 , published: 17 October 2007
Plasma treatment of polymer surfaces in different gases
Svirachev D.M.\Tabaliov N.A.
Bulg. J. Phys., Vol: 32, No: 1 , published: 14 October 2007
Plasma treatment of polymer surfaces in gas mixture
Svirachev D.M.\Tabaliov N.A.
Bulg. J. Phys., Vol: 32, No: 1 , published: 14 October 2007
Dielectric barrier discharge technique in improving the wettability and adhesion properties of polymer surfaces
Dumitrascu Nicoleta\Topala Ionut\Popa Gheorghe
IEEE Trans. Plasma Sci. Pt 2, Vol: 33, No: 5 , published: 11 October 2007
Образование наноуглеродных пленочных материалов в газоразрядной плазме
Золотухин А.А.\Образцов А.Н.\Устинов А.О.\Волков А.П.
Ж. эксперим. и теор. физ., Vol: 124, No: 6 , published: 25 September 2007
Effect of H[2] on polycrystalline Si films deposited by plasma-enhanced CVD using Ar-diluted SiH[4]
Qi Jing\Jin Jing\Hu Hai-Long\et al.
Acta phys. sin., Vol: 55, No: 11 , published: 25 September 2007
Magnetic control in vacuum arc deposition. A review
Boxman Raymond L.\Beilis Isak I.\Gidalevich Evgeny\Zhitomirsky Vladimir N.
IEEE Trans. Plasma Sci. Pt 1, Vol: 33, No: 5 , published: 20 September 2007
Определение удельной ионной эрозии катода вакуумной дуги на основе измерения полного ионного тока из разрядной плазмы
Андерс А.\Окс Е.М.\Юшков Г.Ю.\и др.
Ж. техн. физ., Vol: 76, No: 10 , published: 14 September 2007
Negative ion transfer model of low-temperature oxidation of silicon surface by high-density microwave plasma
Hasegawa Isahiro\Yamauchi Takeshi\Sugai Hideo
Jpn. J. Appl. Phys., Part 2, Vol: 45, No: 37-41 , published: 07 September 2007
Employing plasmas as gaseous electrodes at the free surface of ionic liquids: deposition of nanocrystalline silver particles
Meiss S.A.\Rohnke M.\Klenle L.\et al.
ChemPhysChem., Vol: 8, No: 1 , published: 06 September 2007
Inductively coupled plasma (ICP) and total dissolved solids (TDS) measurements of surface waters from Ialumi~Eta river
Stihi C.\Popescu I.V.\Bancuta A.\et al.
Rom. J. Phys., Vol: 50, No: 9-10 , published: 05 September 2007
Распределение малой добавки легкоионизируемого газа в плазме термоэмиссионного преобразователя энергии лазерного излучения в электрическую энергию
Жеребцов В.А.\Касиков И.И.
Письма в ЖТФ, Vol: 31, No: 17 , published: 31 August 2007
Development of a new atmospheric pressure cold plasma jet generator and application in sterilization
Cheng Cheng\Liu Peng\Xu Lei\et al.
Chin. Phys., Vol: 15, No: 7 , published: 24 August 2007
The 6th International Conference on Reactive Plasmas/23rd Symposium on Plasma Processing (ICRP-6/SPP-23), Matsushima, Jan. 24_-27, 2006

Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 10B , published: 22 August 2007
Самосогласованное моделирование импульсного и непрерывного СВЧ-разрядов в водороде
Колданов В.А.\Горбачев А.М.\Вихарев А.Л.\Радищев Д.Б.
Физ. плазмы, Vol: 31, No: 11 , published: 19 August 2007
SO-FDTD method and its application to the calculation of electromagnetic wave reflection coefficients of plasma
Yang Hong-Wei\Chen Ru-Shan\Zhang Yun
Acta phys. sin., Vol: 55, No: 7 , published: 15 August 2007
Ионно-индуцированное окисление бериллия
Залавутдинов Р.Х.\Алимов В.Х.\Городецкий А.Е.\Захаров А.П.
Изв. РАН. Сер. физ., Vol: 70, No: 8 , published: 14 August 2007
Моделирование процесса напыления тонких пленок низкоэнергетической ионной бомбардировкой в диффузионном приближении
Киприч В.И.\Корнич Г.В.\Бажин А.И.
Изв. РАН. Сер. физ., Vol: 70, No: 8 , published: 14 August 2007
Photoresist Etching by Atmospheric Pressure Uniform-Glow Plasma
Shouguo Wang, Xiangyu Xu, Lingli Zhao, and Tianchun Ye
Jpn. J. Appl. Phys., Part 1, Vol: 46, No: 8A , published: 06 August 2007
Measurement of Amount of Pattern Trim and Surface Chemistry for Organic Resist Etching in an Inductively Coupled Plasma in SO2–O2 Gas Mixtures
Takeshi K. Goto and Toshiaki Makabe
Jpn. J. Appl. Phys., Part 1, Vol: 46, No: 8A , published: 06 August 2007
Etching of high-k dielectric HfO[2] films in BCl[3]-containing plasmas enhanced with O[2] addition
Kitagawa Tomohiro\Nakamura Keisuke\Osari Kazushi\et al.
Jpn. J. Appl. Phys., Part 2, Vol: 45, No: 8-11 , published: 02 August 2007
Application of microwave plasma gate oxidation to strained-Si/SiGe-on-insulator
Nishisaka Mika\Asano Tanemasa
Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 4B , published: 25 July 2007
Ultra shallow junction formation using plasma doping and laser annealing for Sub-65 nm technology nodes
Yon Guk-Hyon\Buh Gyoung Ho\Park Tai-su\et al.
Jpn. J. Appl. Phys., Part 1, Vol: 45, No: 4B , published: 25 July 2007
Ограниченный пространственный зарядом ток при разрядке плоского вакуумного диода электронным импульсом
Солдатов А.В.
Физ. плазмы, Vol: 31, No: 4 , published: 23 July 2007
Исследование импульсного и непрерывного СВЧ-разрядов, применяемых в технологии получения алмазных пленок
Вихарев А.Л.\Горбачев А.М.\Колданов В.А.\Радищев Д.Б.
Физ. плазмы, Vol: 31, No: 4 , published: 23 July 2007
Получение и исследование некоторых свойств тонких углеродных _a-C:H пленок
Восканян А.С.\Паносян Ж.Р.
Изв. НАН Армении. Физ., Vol: 39, No: 4 , published: 20 July 2007
Установка для плазменной газификации различных видов отходов
Братцев А.Н.\Попов В.Е.\Рутберг А.Ф.\Штенгель С.В.
Теплофиз. высок. температур, Vol: 44, No: 6 , published: 19 July 2007
Лазерное напыление пленок ZnO на кремниевые и сапфировые подложки
Жерихин А.Н.\Худобенко А.И.\Вилльямс Р.Т.\и др.
Квант. электрон., Vol: 33, No: 11 , published: 12 July 2007
Синглетный кислород в низкотемпературной плазме электроионизационного разряда
Вагин Н.П.\Ионин А.А.\Климачев Ю.М.\и др.
Физ. плазмы, Vol: 32, No: 5 , published: 10 July 2007
Ионизация молекулярного азота излучением канального поверхностного разряда
Козлова Е.И.\Колесников Ю.А.\Котов А.А.\Новиков В.П.
Физ. плазмы, Vol: 32, No: 5 , published: 10 July 2007
Исследование нагрева электронов в мультиполярных магнитных системах и конструирование электрон-циклотрон-резонансных СВЧ-реакторов низкого давления
Петрин А.Б.
Теплофиз. высок. температур, Vol: 44, No: 1 , published: 10 July 2007
Применение методов плазменной сепарации элементов к обращению с ядерными материалами
Жильцов В.А.\Кулыгин В.М.\Семашко Н.Н.\и др.
Атом. энергия, Vol: 101, No: 4 , published: 03 July 2007
Air pollution control by non-thermal plasma
M~:uller S.\Zahn R.-J.
Contrib. Plasma Phys., Vol: 47, No: 7 , published: 03 July 2007
Deposition of nanocomposited by plasmas
Faupel F.\Zaporojtchenko V.\Greve H.\et al.
Contrib. Plasma Phys., Vol: 47, No: 7 , published: 03 July 2007
Об эффективности нагрева газа трехфазным плазмотроном переменного тока со скользящими дугами
Ковшечников В.Б./Антонов Г.Г./Уфимцев А.А.
Инж.-физ. ж., Vol: 80, No: 6 , published: 21 June 2007
Selective Deposition of Silicon at Room Temperature Using DC Microplasmas
Wilson, C.G.; Gianchandani, Y.B.
IEEE Trans. Plasma Sci., Vol: 35, No: 3 , published: 01 June 2007
Numerical Simulation of Plasma Immersion Ion Implantation and Diffusion
Tat-Kun Kwok, D.
IEEE Trans. Plasma Sci., Vol: 35, No: 3 , published: 01 June 2007
Treatment of Diesel Particles Using an Electrostatic Agglomerator Under Negative DC Corona: A Modeling and Experimental Study
Boichot, R.; Bernis, A.; Gonze, E.
IEEE Trans. Plasma Sci., Vol: 35, No: 3 , published: 01 June 2007
Postdicharge long life reactive intermediates involved in the plasma chemical degradation of an azoic dye
Moussa David/Doubla Avaly/Kamgang-Youbi Georges/Brisset Jean-Louis
IEEE Trans. Plasma Sci. Pt 3, Vol: 35, No: 2 , published: 23 April 2007
Experimental study of a double arc nitrogen plasma: static and dynamic behavior
Ch~1eron Bruno G./Bultel Arnaud/Delair Laurent
IEEE Trans. Plasma Sci. Pt 3, Vol: 35, No: 2 , published: 23 April 2007
Wafer Redeposition Impact on Etch Rate Uniformity in IPVD System
Jozef Brcka; Rodney L. Robison
IEEE Trans. Plasma Sci., Vol: 35, No: 1 , published: 01 February 2007
Pseudospark Discharge Behavior at a Low Charging Voltage
Vladimir Arsov; Klaus Frank
IEEE Trans. Plasma Sci., Vol: 35, No: 1 , published: 01 February 2007
Захват дейтерия в плазменно-напыленный вольфрам
Голубева А.В.\Курнаев В.А.\Майер М.\Рот И.
Вопр. атом. науки и техн. Сер. Термоядер. синтез, Vol: 2007, No: 2 , published: 01 January 2007
Формирование прочного микрорельефа на поверхности Ni-Cr-сплава при взаимодействии с микроплазменными разрядами
Иванов В.А./Коныжев М.Е./Спирин А.М./и др.
Прикл. физ., Vol: 2006, No: 6 , published: 03 December 2006
Stabilization of a Turbulent Premixed Flame Using a Nanosecond Repetitively Pulsed Plasma
Pilla, G.; Galley, D.; Lacoste, D. A.; Lacas, F.; Veynante, D.; Laux, C. O.
IEEE Trans. Plasma Sci., Vol: 34, No: 6 , published: 01 December 2006
Ignition of Propane–Air Mixtures by a Repetitively Pulsed Nanosecond Discharge
Pancheshnyi, S. V.; Lacoste, D. A.; Bourdon, A.; Laux, C. O.
IEEE Trans. Plasma Sci., Vol: 34, No: 6 , published: 01 December 2006
Features of Liquid-Fuel Plasma-Chemical Gasification for Diesel Engines
Serbin, S. I.
IEEE Trans. Plasma Sci., Vol: 34, No: 6 , published: 01 December 2006
Propane–Air Mixture Combustion Assisted by MW Discharge in a Speedy Airflow
Esakov, I. I.; Grachev, L. P.; Khodataev, K. V.; Vinogradov, V. A.; Van Wie, D. M.
IEEE Trans. Plasma Sci., Vol: 34, No: 6 , published: 01 December 2006
Nonsteady-State Processes in a Plasma Pilot for Ignition and Flame Control
Korolev, Yu. D.; Matveev, I. B.
IEEE Trans. Plasma Sci., Vol: 34, No: 6 , published: 01 December 2006
Plasma-Assisted Combustion of Gaseous Fuel in Supersonic Duct
Leonov, S. B.; Yarantsev, D. A.; Napartovich, A. P.; Kochetov, I. V.
IEEE Trans. Plasma Sci., Vol: 34, No: 6 , published: 01 December 2006
Decomposition of Ethane in Atmospheric-Pressure Dielectric-Barrier Discharges: Experiments
Rosocha, L. A.; Kim, Y.; Anderson, G. K.; Lee, J. O.; Abbate, S.
IEEE Trans. Plasma Sci., Vol: 34, No: 6 , published: 01 December 2006
Effect of antenna configuration on power transfer efficiency for planar inductively coupled plasmas
Di Xiao-Lian\Xin Yu\Ning Zhao-Yuan
Acta phys. sin., Vol: 55, No: 10 , published: 30 October 2006
Charge Neutralization via Arcing on a Large Solar Array in the GEO Plasma Environment
Kawasaki, T.; Hosoda, S.; Kim, J.; Toyoda, K.; Cho, M.
IEEE Trans. Plasma Sci., Vol: 34, No: 5 , published: 01 October 2006
Development of 400 V Solar Array Technology for Low Earth Orbit Plasma Environment
Hosoda, S.; Okumura, T.; Kim, J.-H.; Toyoda, K.; Cho, M.
IEEE Trans. Plasma Sci., Vol: 34, No: 5 , published: 01 October 2006
Study of the Plasma Interference With High-Voltage Electrode Array for Space Power Application
Iwasa, M.; Tanaka, K.; Sasaki, S.; Odawara, O.
IEEE Trans. Plasma Sci., Vol: 34, No: 5 , published: 01 October 2006
Plasma ESD Qualification Test Procedure of Alcatel Alenia Space Solar Array
Berthou, C.; Boulanger, B.; Levy, L.
IEEE Trans. Plasma Sci., Vol: 34, No: 5 , published: 01 October 2006
Thin SiON Film Grown at Low Temperature (400$^circhboxC$) by Microwave-Excited High-Density$hboxKr/hboxO_2/hboxN_2$Plasma
Ohtsubo, K.; Saito, Y.; Hirayama, M.; Sugawa, S.; Aharoni, H.; Ohmi, T.
IEEE Trans. Plasma Sci., Vol: 34, No: 5 , published: 01 October 2006
Анализ и моделирование процесса переработки медико-биологических отходов в плазменной камерной печи
Моссэ А.Л./Савчин В.В.
Инж.-физ. ж., Vol: 79, No: 4 , published: 22 July 2006
Получение нанопорошка вакуумным импульсно-дуговым методом
Вершок Б.А.\Дормашев А.Б.\Маргулев И.Я.\и др.
Вопр. атом. науки и техн. Сер. Термоядер. синтез, Vol: 2006, No: 2 , published: 01 January 2006
Prediction of a radial variation of plasma structure and ion distributions in the wafer interface in two-frequency capacitively coupled plasma
Yagisawa Takashi/Maeshige Kazunobu/Shimada Takashi/Makabe Toshiaki
IEEE Trans. Plasma Sci. Pt 1, Vol: 32, No: 1 , published: 10 December 2005
Development of a slot-excited planar microwave discharge device for uniform plasma processing
Yasaka Yasuyoshi/Ishii Nobuo/Yamamoto Tetsuya/et al.
IEEE Trans. Plasma Sci. Pt 1, Vol: 32, No: 1 , published: 10 December 2005
Surface wave control under plasma-metal processing
Akimov Yu.A./Olefir V.P.
Phys. scr., Vol: 69, No: 2 , published: 29 April 2005
Detection and comparison of localized states produced in poly-Si/ultra-thin oxide/silicon, structures by plasma exposure or plasma charging during reactive ion etching
Fonash S.J., Ozaita M., Awadelkarim O.O., Preuninger F., Chan Y.D.
J. Appl. Phys. , Vol: 79, No: 4 , published: 01 January 2005
Формирование композиционных пористых покрытий на поверхности имплантатов низкотемпературной плазмой
Калита В.И.\Гнедовец А.Г.\Мамаев А.И.\и др.
Физ. и химия обраб. матер., Vol: 2005, No: 3 , published: 01 January 2005
Установка для обработки поверхности металлов электронным пучком
Коваль Н.Н.\Щанин П.М.\Девятков В.Н.\и др.
Приборы и техн. эксперим., Vol: 2005, No: 1 , published: 01 January 2005
Вакуумно-дуговая напылительная установка ВДНУ (разработка, изготовление, эксперименты)
Иванов В.В.\Карпов Д.А.\Крылов В.А.\и др.
Вопр. атом. науки и техн. Сер. Электрофиз. аппаратура, Vol: 2005, No: 3 , published: 01 January 2005
Получение углеродных покрытий на стекле в плазме, генерируемой в области давлений 1_-10 Па ленточным электронным пучком
Бурдовицин В.А.\Окс Е.М.\Федоров М.В.
Физ. и химия обраб. матер., Vol: 2005, No: 1 , published: 01 January 2005
Исследование циклических вольтамперных характеристик в процессе микроплазменного формирования биокерамических покрытий на титане и его сплавах в щелочных электролитах
Мамаева В.А.\Мамаев А.И.\Бориков В.Н.\и др.
Физ. и химия обраб. матер., Vol: 2005, No: 3 , published: 01 January 2005
Условия переноса распыленного вещества и формирование тонких пленок
Игнатенко П.И.\Терпий Д.Н.
Поверхность. Рентген., синхротрон. и нейтрон. исслед., Vol: 2005, No: 6 , published: 01 January 2005
Плазменная технология обработки высокоактивных отходов ядерных производственных комплексов США
Вахненко Б.А.\Блинова И.В.\Шульга Н.А.
Атом. техн. за рубежом, Vol: 2004, No: 3 , published: 01 January 2004
Флуктуационная стадия образования тонких пленок на поверхности материала, помещенного в плазму
Бондарева А.Л.\Змиевская Г.И.
Вопр. атом. науки и техн. Сер. Термоядер. синтез, Vol: 2004, No: 3 , published: 01 January 2004
Встраиваемый масс-спектрометр для анализа параметров плазмы в установках с продольным магнитным полем
Визгалов И.В., Коборов Н.Н., Курнаев В.А. и др.
Приборы и техн. эксперим., Vol: 1999, No: 5 , published: 01 January 1999
Оперативный контроль чистоты обрабатываемых поверхностей в плазменных установках
Милованов Р.А., Шатохин В.Л., Попов В.А.
Приборы и техн. эксперим., Vol: 1999, No: 5 , published: 01 January 1999
Компьютерное моделирование плазменной обработки порошков
Обабков И.Н., Талабуев А.В., Обабков Н.В., Бекетов А.Р.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Получение и исследование токих пленок нитрида бора
Норматов И.Ш., Мирсаидов У., Имомов А.Н. и др.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Моделирование взаимодействия низкотемпературной кислородсодержащей плазмы с поверхностью окисляемого материала
Бибилашвили А.П., Герасимов А.Б., Самдашвили З.Д.
Физ. и химия обраб. матер., Vol: 1999, No: 3 , published: 01 January 1999
Обработка тонких пленок ванадия в углеводородной плазме
Чапланов А.М., Щербакова Е.Н.
Поверхность. Рентген., синхротрон. и нейтрон. исслед., Vol: 1999, No: 11 , published: 01 January 1999
Модель последовательной двойной высокодозовой имплантации
Данилюк А.Л., Углов В.В., Черенда Н.Н.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Имплантационно-плазменная обработка мартенситной стали и титанового сплава
Гусева М.И., Гордеева Г.М., Мартыненко Ю.В. и др.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Каталитическое плазменное анодирование кремния на поверхности с радиационными дефектами
Бибилашвили А.П., Вепхвадзе М.Т., Герасимов А.Б., Нодия С.С.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Распределение плотности тока по поверхности дюралюминия в процессе роста оксида в условиях микроплазменных разрядов
Терлеева О.П., Уткин В.В., Слонова А.И.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Свойства титановых лопаток компрессора турбины с имплантированным нитридным покрытием
Копылов А.А., Стяжкин В.А., Палеева С.Я. и др.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Синтез алмазных покрытий методом химического газофазного осаждения с помощью электродугового плазмотрона постоянного тока
Переверзев В.И., Ральченко В.Г., Смолин А.А. и др.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Статистические характеристики локальной плотности газотермических покрытий
Винокуров Г.Г., Ларионов В.П.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Высокоскростное нанесение защитных пленок оксида алюминия методом реактивного магнитронного распыления
Бугаев С.П., Захаров А.Н., Ладыженский О.Б., Сочугов Н.С.
Физ. и химия обраб. матер., Vol: 1999, No: 2 , published: 01 January 1999
Диффузионный перенос распыленных атомов при плазменном напылении на внутреннюю цилиндрическую поверхность
Бондаренко Г.Г., Бонк О.Г., Кристя В.И.
Физ. и химия обраб. матер., Vol: 1999, No: 3 , published: 01 January 1999
Modeling and simulation methods for plasma processing
Hamaguchi S.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
Spatial distribution and characteristics of ozone generation with glow discharge using a double discharge method
Hakiai Kazunori, Takazaki Daisaku, Ihara Satoshi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 1A , 1999
Electrode structure and heat treatment effects on stabilization of capacitive humidity sensor with plasma-polymerized thin film
Takeda Shin-ichi
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 2A , 1999
Glancing-angle electron beam bombardment for modification of GaN epilayer growth using plasma-assisted molecular beam epitaxy (short note)
Shim Kyu-Hwan, Paek Mun-Cheol, Cho Kyoung-Ik
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 4A , 1999
Low-energy ion-scattering spectroscopic analysis of structural damage in Si substrate under ultrathin SiO[2] after gate etching
Matsui Miyako, Uchida Fumihiko, Tokunaga Takafumi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 4A , 1999
Endurance characteristics and degradation mechanisms of polysilicon thin film transistor EEPROMs with electron cyclotron resonance N[2]O-plasma gate oxide
Lee NAE-iN, lEE jIN-wOO, hAN cHUL-hI
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 4B , 1999
Charging of glass substrate gy plasma exposure
Kitabayashi Hiroyoshi, Fujii Haruhisa, Ooishi Takayuki
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 5A , 1999
Experimental characterization of an inductively coupled plasma discharge using a shape-adjustable coil
Leou Keh-Chyang, Tsai Szu-Che, Chang Chai Hau et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Studies on magnetron sputtering assited by inductively coupled RF plasma for enhanced metal ionization
Yamashita Masahiro, Setsuhara Yuichi, Miyake Shoji et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Energy control of ion from a capacitively coupled plasma using RF resonance method
Kikuchi Tetsuo, Ohnishi Keitaro, Yasaka Yasuyoshi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Plasma diagnostics: use and justification in an industrial environment
Loewenhardt Peter, Zawalski Wade, Ye Yan et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Oxygen microwave plasma density enhancement by surface waves with a high-permittivity material window
Furukawa M., Koromogawa T., Kamiyo K., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 8 , 1999
Oxygen microwave plasma density enhancement by surface waves with a high-permittivity material window
Furukawa M., Koromogawa T., Kamiyo K., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 8 , 1999
Enhancement of negative-ion-assisted silicon oxidation by radio-frequency bias
Fujii Takashi, Aoyagi Hitoshi, Kusaba Kouta, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 12A , 1999
Characteristics of ultrahigh-frequency surface-wave plasmas excited at 915 MHz
Nagatsu Masaaki, Ito Akira, Toyoda Naoki, Sugai Hideo
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 6A-6B , 1999
Highly charged ions colliding with atoms, surfaces and clusters
Cederquist H., Fardi A., Haghighat K. et al.
Phys. scr., Vol: 80A, No: , 1999
Колебательные спектры плазмополимеризованного покрытия на поверхности монокристалла кремния
Хамчуков Ю.Д., Клубович В.В., Литвинов А.А., Шашков С.Н.
Ж. прикл. спектроскопии, Vol: 66, No: 3 , 1999
Исследование процессов формирования плазмы сильноточного разряда в парах металла
Красноголовец М.А.
Ж. техн. физ., Vol: 69, No: 11 , 1999
Исследование сфероидизации тугоплавких порошков дисперсностью 20-100 мкм в низкотемпературной плазме
Клинская-Руденская Н.А., Фришберг И.В., Цымбалист М.М., Кузьмин Б.П.
Теплофиз. высок. температур, Vol: 37, No: 1 , 1999
Влияние вдува перфторэтилена на состав плазмы около тела при его движении в атмосфере
Антипов А.В., Пилюгин Н.Н., Рудный Е.Б.
Теплофиз. высок. температур, Vol: 37, No: 1 , 1999
Влияние геометрии магнитного поля на параметры СВЧ-ЭЦР плазмы
Полуэктов Н.П., Царьгородцев Ю.П., Усатов И.Г.
Физ. плазмы, Vol: 25, No: 11 , 1999
Plasma-etching processes for ULSI semiconductor circuits
Armacost M., Hoh P.D., Wise R. et al.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
Surface science issues in plasma etching
Oehrlein G.S., Doemling M.F., Kastenmeier B.E.E. et al.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
Effects of N[2] addition on aluminum alloy etching in inductively coupled plasma source
Kim Kil Ho, Baek Kye Hyun, Shin Kang Sup et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 10 , 1999
Chemical dry etching of Si Substrate in a discharge flow using Ar/CF[4] gas mixtures
Tsuji Masaharu, Okano Shinji, Tanak Atsushi, Nishimura Yukio
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 11 , 1999
Study on the properties of interlayer low dielectric polyimide during Cl-based plasma etching of aluminum
Kim Sang Hoon, Moon Ho Sung, Woo Sang Gyun, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 12B , 1999
Fabrication of photonic crystals consisting of Si nanopillars by plasma etching using self-formed masks
Tada Tetsuya, Poborchii Vladimir V., Kanayama Toshihiko
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 12B , 1999
Effects of etching gases and bias rrequency on notching and charging in high-density plasma
Tabara Suguru
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 6A , 1999
Charge exchange ion energy distribution at the RF electrode in a plasma etching chamber
Mizutani Naoki, Hayashi Toshio
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7A , 1999
Plasma properties of a negative ion plasma reactive ion etching system
Keller John H., Kocon W. Walter
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Magnetic neutral loop discharge (NLD) plasma and application to SiO[2] etching process
Chen Wei, Hayashi Toshio, Itoh Masahiro et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Behavior of F atoms and CF[2] radicals in fluorocarbon plasmas ror SiO[2]/Si etching
Tachibana Kunihide, Kamisugi Hideaki, Kawasaki Takeshi
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Effects of fluorocarbon films on CF radical in CF[4]/H[2] plasma
Arai Toshihiko, Goto Miki, Horikoshi Keita et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Dependence of driving frequency on capacitively coupled plasma in CF[4]
Segawa Sumie, Kurihara Masaru, Nakano Nobuhiko, Makabe Toshiaki
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
A numerical study of a collision-dominated inductively coupled plasma using particle-in-cell/Monte Carlo simulation
Oh Jin-Sung, Makabe Toshiaki
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Realistic etch yield of fluorocarbon ions in SiO[2] etch process
Hikosaka Yukinobu, Yayashi Hisataka, Sekine Makoto et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Simulation of variations in the negative ion density in time-modulated Cl[2] plasmas
Yokozawa Ayumi, Samukawa Seiji
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
In situ measurements of the resist etch rate for submicron patterns
Kawata Hiroaki, Fukuda Hiroyoshi, Matsunaga Takashi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Enhancement of dry-etching durabilities by energy or etchant quenching with aliphatic, aromatic and alicyclic homolpolymers, polymer blends and copolymers
Kushida Masahito, Saito Toshihiro, Harada Kieko et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Patterned platinum etching studies in an argon high-density plasma
Delprat Sebasten, Chaker Mohamed, Margot Joelle
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Mechanism of highly selective SiO[2] to Si[3]N[4] etching using C[4]F[8]+CO magnetron plasma
Hayashi H., Sekine M.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 8 , 1999
Thin film-detection employing freguency shift in sheath current oscillation
Urayama T., Niimi H., Fujii S., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 8 , 1999
Mechanism of highly selective SiO[2] to Si[3]N[4] etching using C[4]F[8]+CO magnetron plasma
Hayashi H., Sekine M.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 8 , 1999
Thin film-detection employing freguency shift in sheath current oscillation
Urayama T., Niimi H., Fujii S., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 8 , 1999
Effect of RF plasma etching on surface damage in CsLiB[6]O[10] crystal
Kamimura Tomosumi, Yoshimura Masashi, Mori Yusuke et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 2B , 1999
Etching a single micrometer-size particle in a plasma
Stoffels W. W., Stoffels E., Swinkels G. H. P. M., Boufnichel M., Kroesen G. M. W.
Phys. Rev. E: Stat. Nonlinear Soft Matter Phys., Vol: 59, No: 2 , 1999
Etching of silicon nitride in CCL[2]F[2], CHF[3], SiF[4] and SF[6] reactive plasma: a comparative study
Pant B.D., Tandon U.S.
Plasma Chem. Plasma Process., Vol: 19, No: 4 , 1999
Study on plasma etching of β-SiC thin films in SF[6] and the SF{6}+O[2] mixtures
Cahi Chang-chun, Yang Yin-tang, Li Yue-jin et al.
Acta phys. sin., Vol: 48, No: 3 , 1999
Fabrication of magnetic recording heads and dry etching of head materials
Hsiao R.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
Plasma processing damage in etching and deposition
Fonash S.J.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
A simple model for Ar{+}-Ar, He{+}-He, Ne{+}-Ne and Kr{+}-Kr collisions
Nanbu Kenichi, Wakayama Go
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 10 , 1999
Reduction of copper oxide thin films with hydrogen plasma generated by a dielectric-barrier glow discharge
Sawada Yasushi, Taguchi Noriyuki, Tachibana Kunihide
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 11 , 1999
Large-area uniform surface treatment of polymeric materials using a scanning plasma method
Yang Sung-Chae, Yanagi Junichi, Yamamoto Kyoichi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Effect of substrate bias on Si epitaxial growth using sputtering type electron cyclotron resonance (ECR) plasma
Gao Junsi, Nakashima Hiroshi, Wang Junli, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 11B , 1999
Исследование процесса плазменной обработки кварцевых труб
Уурзель Ф.Б., Плесков Б.А., Битюков В.К.
Теплофиз. высок. температур, Vol: 37, No: 4 , 1999
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits
Cote D.R., Nguyen S.V., Stamper A.K. et al.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays
Kuo Y., Okajima K., Takeichi M.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits
Nguyen S.V.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
Plasma-deposited diamondlike carbon and related materials
Grill A.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
Sputter deposition for semiconductor mandufacturing
Rossnagel S.M.
IBM J. Res. and Dev., Vol: 43, No: 1-2 , 1999
Electrical properties of (Ba,Sr)TiO[3] films on Ru bottom electrodes prepared by electron cyclotron resonance plasma chemical vapor deposition at extremely low temperature and rapid thermal annealing
Sone Shuji, Akahane Reiko, Arita Koji et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 4B , 1999
Plasma-damager-free gate process sing chemical mechanical polishing for 0.1 μm MOSFETs
Saito Tomohiro, Yagishita Atsushi, Inumiya Seiji et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 4B , 1999
Plasma diagnostics of CH[4]/O[2]/H[2] electron cyclotron resonance plasma with permanent magnets and deposition of amorphous
Yasui Toshiaki, Kodera Hidekazu, Oya Izumi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7A , 1999
Effects of O[2]- and N[2]O-plasma treatments on properties of plasma-enhanced-chemical-vapor-deposition tetraethylorthosilicate oxide
Chen Ying-Chia, Yang Ming-Zang, Tung I-Chung et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7A , 1999
Characteristics of scanning mirror-type magnetic field coaxial electron cyclotron resonance plasma for inner coating of slender glass tubes
Nagano Teppei, Fujiyama Hiroshi
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Extended anode effect in coaxial magnetron pulsed plasmas for coating the inside surface of narrow tubes
Sugimoto Seiki, Uchikawa Yuki, Kuwahara Kiyoshi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Conformal deposition of high-purity copper using plasma reactor with H atom source
Jin Hong Jie, Shiratani Masaharu, Nakatake Ysuhiro et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Formation of diamond films by intermittent DC plasma chemical vapor deposition using subelectrode
Noda Mikio
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Diamond deposition and behavior of atomic carbon species in a low-pressure inductively coupled plasma
Ito Haruhiko, Teii Kungen, Ishikawa Masayuki et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Low-dielectric-constant-film deposition with various gases in a helicon plasma reactor
Yun Seok-Min, Chang Hong-Young, Oh Kyoung-Suk, Choi Chi-Kyu
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Gas phase diagnosis of disilane/hydrogen RF glow discharge plasma and its application to high rate growth of high quality amorphous silicon
Futako Wataru, Takagi Tomoko, Nishimoto Tomonori et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Deposition of SiN[x] thin film using μ-SLAN surface wave plasma source
Xu Ying-Yu, Ogishima Takuya, Korzec Dariusz et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Effects of crossed magnetic fields on siliconparticles in plasma chemical vapor deposition process
Fujiyama Hiroshi, Maemura Yoko, Ohtsu Jikio
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Preparation of PbTiO[3] thin film by mist source plasma enhanced chemical vapor deposition (CVD) using heptane solvent
Wakiya Naoki, Nagata Shingo, Higuchi Masashi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 9B , 1999
Prpearation of Pb(Zr,Ti)O[3] thin films by plasma-assisted sputtering
Hioki Tsuyoshi, Akiyama Masahiko, Ueda Tomomasa et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 9B , 1999
Effect of higher silanes in silane plasmas on properties of hydrogenated amorphous silicon films
Suzuki Atsushi
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 11B , 1999
Growth of epitaxial silicon film at low temperature by using sputtering-type electron cyclotron resonance plasma
Gao Junsi, Nakashima Hiroshi, Sakai Naofumi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 3A , 1999
Optical emission observation in electron beam sustained Ti arc and rf plasmas in the formation of TiN thin film
Xiao Shiqin, Lungu C.P., Takai O., Musa G.
Rom. J. Phys., Vol: 44, No: 3-4 , 1999
Deposition of amorphous hydrogenated carbon nitride films by hollow cathode discharge process
Balaceanu M., Grigore E., Truica-Marasescu F., et al.
Rom. Rep. Phys., Vol: 51, No: 7-10 , 1999
Properties of electron cyclotron resonance plasmas and their influence on the deposition of GaN films
Du Xiao-long, Chen Guang-chao, Jiang De-yi et al.
Acta phys. sin., Vol: 48, No: 2 , 1999
Гетероэпитаксиальный рост пленок сложного оксида из самоорганизованной системы, образующейся в плазме газового разряда
Мухортов В.М., Головко Ю.И., Толмачев Г.Н., Мащенко А.И.
Ж. техн. физ., Vol: 69, No: 12 , 1999
Получение пленок оксида церия на сапфире методом ВЧ магнетронного распыления
Гольман Е.К., Разумов С.В., Тумаркин А.В.
Письма в ЖТФ, Vol: 25, No: 11 , 1999
Two-dimensional melting in a coulomb crystal of dustry plasma
Takahashi Kazuo, Hayashi Yasuaki, Tachibana Kunihide
Jpn. J. Appl. Phys., Part 1, Vol: 38, No: 7B , 1999
Диагностика изолированной индуктивно-связанной плазмы в смесях хлора и аргона
Большаков А.А., Барнес Р.М.
Вестн. С.-Петербург. ун-та. Сер. 4, Vol: 1998, No: 3 , published: 01 January 1998
Автоматизированная установка для газофазного осаждения алмазных пленок в разряде постоянного тока
Павловский И.Ю., Образцов А.Н.
Приборы и техн. эксперим., Vol: 1998, No: 1 , published: 01 January 1998
Установка для изготовления рисунков металлических полосок микрополосковых С.В.Ч.-устройств
Беляев Б.А., Казаков А.В., Лексиков А.А., Макиевский И.Я.
Приборы и техн. эксперим., Vol: 1998, No: 1 , published: 01 January 1998
Особенности формирования вольфрамовых пленок, полученных методом ионно-плазменного распыления
Козьма А.А., Малыхин С.В., Соболь О.В., Борисова С.С., Подтележников А.А.
Физ. и химия обраб. матер., Vol: 1998, No: 3 , published: 01 January 1998
Создание низкотемпературного электронагревателя методом плазменного напыления
Аньшаков А.С., Казанов А.М., Урбах Э.К., Фалеев В.А.
Физ. и химия обраб. матер., Vol: 1998, No: 3 , published: 01 January 1998
Radio-frequency-precionized xenon z-pinch source for extreme ultraviolet lithography
McGeoch Malcolm
Appl. Opt., Vol: 37, No: 9 , 1998
The effects of the design of the cap of a natural gas-fired cooktop burner of flame stability
Junus R., Vierkant J.E., Stubington J.F., Sergeant G.D., Tas I.
Int. J. Energy Res., Vol: 22, No: 2 , 1998
Study on plasma enhanced CVD coated material to promote dropwise condensation of steam
Koch G., Zhang D.C., Leipertz A. et al.
Int. J. Heat and Mass Transfer. , Vol: 41, No: 13 , 1998
A novel and convenient method for monitoring processing plasma: The insulated pulse probe method
Deguchi M., Itatani R.
J. Phys. A, Vol: 31, No: 17 , 1998
A novel and convenient method for monitoring processing plasma: The insulated pulse probe method
Deguchi M., Itatani R.
J. Phys. A, Vol: 31, No: 17 , 1998
Simulation of a decaying SF[6] arc plasma: Hydrodynamic and kinetic coupling study
Belhaouari J.-B., Gonzalez J.-J., Gleizes A.
J. Phys. D: Appl. Phys., Vol: 31, No: 10 , 1998
The evolution of the translational energy of hydrogen atoms in a 2 MHz inductively coupled plasma deposition reactor
Andrieux M., Badie J.M., Ducarroir M., Bisch C.
J. Phys. D: Appl. Phys., Vol: 31, No: 12 , 1998
XPS characterization of mica surfaces processed using a radio-frequency (rf) argon plasma
Liu Zh.H., Brown N.M.D.
J. Phys. D: Appl. Phys., Vol: 31, No: 15 , 1998
Spatially resolved ion energy distribution measurements in a large-area planar microwave plasma
Guo X.M., Ohl A.
J. Phys. D: Appl. Phys., Vol: 31, No: 16 , 1998
Ambient gas dependence of hydrogenated silicon clusters grown in an ion trap
Watanabe M.O., Kawashima N., Kanayama T.
J. Phys. D: Appl. Phys., Vol: 31, No: 18 , 1998
Dynamic potential formation of a rf sheath near the substrate in a dc discharge plasma
Hassan Z., Fujita H.
J. Phys. D: Appl. Phys., Vol: 31, No: 18 , 1998
The dynamic analysis of metal transfer in pulsed current gas metal arc welding
Choi S.K., Yoo C.D., Kim Y.S.
J. Phys. D: Appl. Phys., Vol: 31, No: 2 , 1998
Electrode melting during arc welding with pulsed current
Nemchinsky V.A.
J. Phys. D: Appl. Phys., Vol: 31, No: 20 , 1998
The effect of pressure on a plasma plume: temperature and electron density measurements
Singh N., Razafinimanana M., Gleizes A.
J. Phys. D: Appl. Phys., Vol: 31, No: 20 , 1998
Dynamic analysis of globular metal transfer in gas metal arc welding - a comparison of numerical and experimental results
Fan H.G., Kovacevic R.
J. Phys. D: Appl. Phys., Vol: 31, No: 20 , 1998
Determination of the gas temperature in high-pressure microwave discharges in hydrogen
Gritsinin S.I., Kossyi I.A., Malykh N.I., Ral`chenko V.G., Sergeichev K.F., Silakov V.P., Sychev I.A., Tarasova N.M., Chebotarev A.V.
J. Phys. D: Appl. Phys., Vol: 31, No: 20 , 1998
Plasma flow in a nozzle during plasma arc cutting
Nemchinsky V.A.
J. Phys. D: Appl. Phys., Vol: 31, No: 21 , 1998
A comparison of polypropylene-surface treatment by filamentary, homogeneous and glow discharges in helium at atmospheric pressure
Massines F., Gouda G.
J. Phys. D: Appl. Phys., Vol: 31, No: 24 , 1998
Evidence of roughness distributions and interface smoothing in Co/Cu multilayers deposited under energetic particle bombardment
Telling N.D., Guilfoyle S.J., Lovett D.R., Tang C.C., Crapper M.D., Petty M.
J. Phys. D: Appl. Phys., Vol: 31, No: 5 , 1998
The piezoelectric effect and stored polarization in corona charged ABS films
Hundal J.S., Nath R.
J. Phys. D: Appl. Phys., Vol: 31, No: 5 , 1998
The influence of ethene on the conversion of NO[x] in a dielectric barrier discharge
Niessen W., Wolf O., Schruft R., Neiger M.
J. Phys. D: Appl. Phys., Vol: 31, No: 5 , 1998
The effect of the cathode tip angle on the gas tungsten arc welding arc and weld pool. II. The mathematical model for the weld pool
Goodarzi M., Choo R., Takasu T., Toguri J.M.
J. Phys. D: Appl. Phys., Vol: 31, No: 5 , 1998
Selective heating of high-pressure vapour elements by ion-cyclotron resonance
Compant La Fontaine A., Louvet P., Le Gourrierec P., Pailloux A.
J. Phys. D: Appl. Phys., Vol: 31, No: 7 , 1998
Propagation of a magnetized plasma beam in a toroidal filter
Alterkop B., Gidalevich E., Goldsmith S., Boxman R.L.
J. Phys. D: Appl. Phys., Vol: 31, No: 7 , 1998
Plasma processing of LiNbO[3] in a hydrogen/oxygen radio-frequency discharge
Turcicova H., Perlna V., Vacik J., Cervena J., Zemek J., Zelezny V., Arend H.
J. Phys. D: Appl. Phys., Vol: 31, No: 9 , 1998
Sheart and presheath dynamics in plasma immersion ion implantation
Mandl S., Gunzel R., Moller W.
J. Phys. D: Appl. Phys., Vol: 31, No: 9 , 1998
Selective plasma etching for high-aspect-ratio oxide contact holes
Kim Y.-S., Wei P.T.-Ch., Tynan G.R. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 1 , 1998
Dry etch process in magnetic neutral loop discharge plasma
Chen W., Itoh M., Hayashi T. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 1 , 1998
Excitation of sheath oscillating current by superimposing pulse votage
Sawa Y., Fuji S., Horiike Y. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 1 , 1998
Concentric spread plasma source
Watanabe Seiichi, Sumiya Masahiro, Kawasaki Sunao
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 10 , 1998
Transition of particle growth region in SiH[4] RF discharges
Kawasaki Hiroharu, Sakamoto Kazutaka, Maeda Shinichi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 10 , 1998
Comparison of copper and stainless steel used for low voltage electrode in wire-to-plane electrode configuration for NO[x] treatment
Gasparik Robert, Yamabe Chobei, Ihara Satoshi, Satoh Saburoh
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 10 , 1998
Radiative recombination and afterglow characteristics X-ray irradiated BaFCl:Eu{2+} and KCl:Eu{2+}
Kimura Taku, Inabe Katsuyuki
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 11 , 1998
Competing surface oxidation reactions during diamond synthesis in low pressure flames
Kim J.S., Cappelli M.A.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 11 , 1998
Negative ion formation in SiO[2] etching using a pulsed inductively coupled plasma
Choi Chang Ju, Kwon O Sung, Seol Yeo Song et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Plasma-wall interactions in dual frequency narrow-gap reactive ion etching system
Morishita Satoshi, Hayashi Hisataka, Tatsuji Tetsuya et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Study of electron energy distribution functions (EEDFs) in three DC low-pressure plasma sources
Antonova Tatjana, Bougrov Gleb, Bougrova Antonina et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Effects of post annealing and oxidation processes on the removal of damage generated during the shallow trench etch process
Lee Young-Jun, Hwang Soon-Won, Oho Kyung-Hee et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Pattern-dependent chargining and the role tunneling
Giaps K.P., Hwang G.S.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Mechanism of charging reduction in pulsed plasma etching
Hwang G.S., Giapis K.P.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Influence of pulsed electron cyclotron resonance plasma on gate electrode etching
Rujiwara N., Maruyama T., Miyatake H.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Reduction of charge build-up with pulse-modulated bias in pulsed electron cyclotron resonance plasma
Maruyama T., Fujiwara N., Ogino S., Miyatake H.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Enhancement of reactivity in Au etching by pulse-time-modulated Cl[2] plasma
Ohtake H., Samukawa S., Oikawa H., Nashimoto Y.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Effects of charge build-up of underlying layer by high aspect ratio etching
Yonekura K., Kiritani M., Sakamori Sh., Yokoi T., Fujiwara N., Miyatake H.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Effect of electron shading on gate oxide degradation
Sakamori Sh., Maruyama T., Fujiwara N., Miyatake H.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Donor neutralization by fluorine containing plasmas in Si-doped n-type GaAs crystals
Wada J., Matsukura Y., Ogihara T., Furukawa Y., Tanaka H.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
In-situ after-treatment using low-energy dry-etching with a CF[4]/O[2] gas mixture to remove reactive ion etching damage
Matsu M., Uchida F., Kojima T., Tokunaga T., Yamazaki K., Katsuyama K., Arai H.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Vertical profile control in ultrahigh-aspect-ratio contact hole etching with 0.05-μm-diameter range
Ikegami N., Yabata A., Liu G.L., Uchida H., Hirashita N., Kanamori J.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Highly selective SiO[2] etching using inductively coupled plasma source with a multispiral coil
Yamanaka M., Hayashi Sh., Kubota M., Nakagawa H.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Enhancement of mask selectivity in SiO[2] etching with a phase-controlled pulsed inductively coupled plasma
Shin K.S., Chi K.K., Kang Ch.J., Jung Ch., Jung Ch.O., Moon J.T., Lee M.Y.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
WSi[2]/poly-Si gate etching using a TiON hard mask
Tabara S., Hibino S., Nakaya H.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
High density aluminum etcher process window characterization and comparison
Jacobs J., Saito K., Yamamoto J.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
High performance etching process for organic films using SO[2]/O[2] plasma
Ohkuni M., Kugo Sh., Sasaki T., Tateiwa K., Nikon H., Marsuo T., Kubota M.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
A study of the O[2]-SO[2] plasma etch chemistry for top surface imaging photoresist dry development
Huang Z.S., Melaku Y., Nguyen W.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Real-time monitoring and control of plasma etching
Safaty M., Baum Ch., Happer M., Hershkowitz N., Shohet J.L.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Trace rare gases optical emission spectroscopy for determination of electron temperatures and species concentrations in chlorine-containing plasmas
Donnelly V.M., Malyshev M.V., Kornblit A., Ciampa N.A., Colonell J.I., Lee J.T.C.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Mechanism of radical control in capacitive RF plasma for ULSI processing
Tatsumi T., Hayashi H., Morishita S., Noda Sh., Okigawa M., Itabashi N., Hikosaka Y., Inoue M.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Reactive ion etching mechanism of RuO[2] thin films in oxygen plasma with the addition of CF[4], Cl[2], and N[2]
Lee E.-J., Kim J.-W., Lee W.-J.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 5A , 1998
Barrier metal properties of amorphous tantalum nitride thin films between platinum and silicon deposited using remote plasma metal organic chemical vapor method
Han Ch.-H., Cho K.-N., Oh J.-E. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 5A , 1998
Plasma characterization in chlorine-based reactive ion beam etching and chemically assisted ion beam etching
Matsutani A., Koyama F., Iga K.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 5A , 1998
Changes in Raman spectra with deposition conditions and plasma treatment of diamond like carbon thin films
Endo K., Miyamura T., Kitaori N. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 6A , 1998
The effect of etching cases on notching and charging in high-density plasma
Tabara S.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 6A , 1998
Secondary corrosion of aluminum alloy due to residual sidewall and its remoal using M=0 helicon plasma reactor
Kim Yun-Sang, Ji Ho-Yeon, Han Kyo-Sik, Song Chi-Wha
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 11A , 1998
Production of low-pressure planar non-magnetized plasmas sustained under a dielectric-free metal-plasma interface
Morita Sh., Nagatsu M., Ghanashev I. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Similarities in spatial distributions of absolute GeH[2] density, radical production rate and particle amount in GeH[4] RF discharges
Kawasaki H., Kida J., Sakamoto K. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 4B , 1998
Deposition of micro-crystalline β-C[3]N[4] films by an inductively-coupled-plasma (ICP)sputtering method
Hsu Ch.-Y., Hong F.Ch.-N.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 6B , 1998
Electro-optic thin films by magnetron sputtering
Migliuolo M., Schlesinger T.E.
Nuovo cim. D, Vol: 20, No: 7-8 , 1998
Plasma physics and plasma technology
Kawabe T., Hayashi T.
Phys. scr., Vol: 75, No: , 1998
Quasiclassical theory and simulations of strongly coupled plasmas
Ebeling W., Ortner J.
Phys. scr., Vol: 75, No: , 1998
Trials of RF plasma production using different antenna geometries with magnetic field
Shinohara S., Socjima T.
Plasma Phys. and Contr. Fusion, Vol: 40, No: 12 , 1998
Spectroscopic diagnostics and modelling of silane microwave plasmas
Fantz U.
Plasma Phys. and Contr. Fusion, Vol: 40, No: 6 , 1998
The expanding thermal arc plasma: The low-flow regime
van de Sanden M.C.M., Tobin J.A.
Plasma Sources Sci. and Technol., Vol: 7, No: 1 , 1998
Degree of dissociation measured by FTIR absorption spectroscopy applied to VHF silane plasmas
Sansonnens L., Howling A.A., Hollenstein Ch.
Plasma Sources Sci. and Technol., Vol: 7, No: 2 , 1998
Measurements of plasma parameters in the direct current discharge for isotope separation
Ezoubtchenko A., Ohtsuki N., Akatasuka H., Suzuki M.
Plasma Sources Sci. and Technol., Vol: 7, No: 2 , 1998
Source of a dense metal plasma
Anpilov A.M., Barkhudarov E.M., Berezhetskaya N.K., Kop`ev V.A., Kossyi I.A., Malykh N.I., Matossian J., Taktakishvili M.I., Terekhin V.E.
Plasma Sources Sci. and Technol., Vol: 7, No: 2 , 1998
Experimental investigation of a large volume SF[6] magnetoplasma source based on surface-wave propagation
St-Onge L., Margot J., Chaker M.
Plasma Sources Sci. and Technol., Vol: 7, No: 2 , 1998
A novel distributed system for plasma immersion ion implanter control and automation
Liu A.G., Wang X.F., Tang B.Y., Chu P.K., Ko P.K., Cheng Y.C.
Rev. Sci. Instrum. , Vol: 69, No: 3 , 1998
Ion energy and mass analyzer at radio frequency electrode in a plasma chamber
Mizutani Naoki, Nagata Yasushi, Kubo Akira, Hayashi Toshio
Rev. Sci. Instrum. , Vol: 69, No: 4 , 1998
Влияние облучения азотной плазмой и N{+} на структуру и химический состав поверхности композита C-TaC
Апарина Н.П., Мансурова А.Н., Неумоин В.Е., Васильев В.И.
Атом. энергия, Vol: 85, No: 2 , 1998
Монохроматизация излуыения для спектрального контроля плазменных технологических процессов
Бурмаков А.П., Лабуда А.А., Никифоренко Н.Н.
Ж. прикл. спектроскопии, Vol: 65, No: 4 , 1998
Неустойчивость и плавление кристалла микрочастиц в плазме высокочастотного разряда
Швейгерт И.В., Беданов В.М., Мельцер А., Хоманн А., Пиль А.
Ж. эксперим. и теор. физ., Vol: 114, No: 5 , 1998
Взаимодействие энергичных атомов водорода, генерируемых в гелиевой плазме, с ниобиевой мембраной
Лившиц А.И., Ноткин М.Е., Алимов В.Н. и др.
Изв. РАН. Сер. физ., Vol: 62, No: 4 , 1998
Воздействие кислородной и аргоновой плазмы с энергией ионов 10-100 эВ на нержавеющие стали и графит
Акишин А.И., Черник В.И., Куликаускас В.С.
Изв. РАН. Сер. физ., Vol: 62, No: 4 , 1998
Математическое описание процесса образования минеральных волокон плазменным методом
Лактюшин А.Н., Сергеев В.Л.
Инж.-физ. ж., Vol: 71, No: 6 , 1998
Синтез алмазных пленок с помощью лазерной плазмы
Конов В.И., Углов С.А.
Квант. электрон., Vol: 25, No: 4 , 1998
Получение GaN молекулярно-пучковой эпитаксией с активацией азота ВЧ-емкостным магнетронным разрядом
Мамутин В.В., Жмерик В.Н., Шубина Т.В., Торопов А.А., Лебедев А.В., Векшин В.А., Иванов С.В., Копьев П.С.
Письма в ЖТФ, Vol: 24, No: 12 , 1998
Формирование структур из макрочастиц в плазме ВЧ разряда индукционного типа
Герасимов Ю.В., Нефедов А.П., Синельщиков В.А., Фортов В.Е.
Письма в ЖТФ, Vol: 24, No: 19 , 1998
Управление ионными потоками полями поверхностной ионно-звуковой волны
Азаренков Н.А., Бирюков А.А., Гапон А.В., Денисенко И.Б.
Письма в ЖТФ, Vol: 24, No: 3 , 1998
Формирование алмазоподобной фазы в условиях преимущественного осаждения неалмазного углерода в плазме газового СВЧ-разряда с электронным циклотронным резонансом
Суздальцев С.Ю., Сысуев С.В., Яфаров Р.К.
Письма в ЖТФ, Vol: 24, No: 4 , 1998
Влияние давления рабочего газа на свойства тонких пленок высокотемпературных сверхпроводников, полученных магнетронным распылением
Воробьев А.К., Гапонов С.В., Гусев С.А., Дроздов Ю.Н., Клюенков Е.Б., Лучин В.И.
Письма в ЖТФ, Vol: 24, No: 4 , 1998
Процессы в кластерной плазме и кластерных пучках
Смирнов Б.М.
Письма в ЖЭТФ, Vol: 68, No: 9-10 , 1998
Формирование тепловых локализованных структур в сварном шве при импульсно-дуговой сварке неплавящимся электродом
Бежин О.Н., Косяков В.А., Кректулева Р.А.
Прикл. мех. и техн. физ., Vol: 39, No: 6 , 1998
Исследование эффектов дифференциальной зарядки в процессе формирования субмикронных структур методом плазменного травления
Бугаев А.С., Шибков А.А.
Радиотехн. и электрон. (Россия), Vol: 43, No: 4 , 1998
Диффузионная модель стационарного газового разряда в неоднородном внешнем магнитном поле при СВЧ вакуумно-плазменной обработке с электронно-циклотронным резонансом
Гуляев Ю.В., Черкасов И.Д., Яфаров Р.К.
Радиотехн. и электрон. (Россия), Vol: 43, No: 8 , 1998
Магнетронный высокочастотный разряд в метане, аргоне и смеси метана с аргоном
Автаева С.В., Мамытбеков М.З., Оторбаев Д.К.
Теплофиз. высок. температур, Vol: 36, No: 2 , 1998
Актинометрический метод контроля концентрации атомарного водорода в тлеющем разряде
Дятко Н.А., Кашко Д.А., Паль А.Ф., Серов А.О., Суетин Н.В., Филиппов А.В.
Физ. плазмы, Vol: 24, No: 12 , 1998
Термические свойства покрытий на основе активированных в плазме продуктов деструкции полипропилена
Нестеров М.А., Байдаровцев Ю.П., Савенков Г.Н., Пономарев А.Н.
Химия высок. энергий, Vol: 32, No: 1 , 1998
Using auger electron spectroscopy for chemical analysis of plasma Damage induced by reactive ion etching of SiO[2]
Matsui Miyako, Uchida Fumihiko, Katsuyama Kiyomi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 11 , 1998
Spatial and temporal behavior of radicals in inductively coupled plasm for SiO[2] etching
Hayashi Shigenori, Yamanaka Michinari, Kubota Masafumi, Ogura Mototsugu
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Aluminum etch and after-corrosion characteristics in a m=0 helicon wave plasma etcher
Ha Jae Hee, Yim Myoung-ho, Kim Jae-jeong
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Study of self-limiting etching behavior in wet isotropic etching of silicon
Han Cheol-Hyun, Kim Eun-Sok
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Estimation of sidewall nonradiative recombination in GaInAsP/InP wire structures fabricated by low energy electron-cyclotron-resonance reactive-ion-beam-etching
Tamura M., Ando T., Nunoya N. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 6A , 1998
Slant slot antenna-type electron cyclotron resonance plasma source
Watanabe Seiichi, Tamura Hitoshi, Sumiya Masahiro, Furuse Muneo, Kawasaki Sunao
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 9A , 1998
Dopant-dependent ion assisted etching kinetics in highly doped polysilicon reactive ion etching
Sato Masaaki
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 9A , 1998
The generation of high-density microwave plasma and its application to large-area microcrystalline silicon thin film formation
Shirai H., Arai T., Ueyama H.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 9A-9B , 1998
Cubic boron nitride film synthesis by reactive sputtering of pure boron target in electron cyclotron resonance plasmas
Wakatsuchi M., Takaba Y., Ueda Y. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 9A-9B , 1998
Enhanced deposition rates in plasma sputter deposition
Thomann A.L., Charles C., Brault P., Laure C., Boswell R.
Plasma Sources Sci. and Technol., Vol: 7, No: 3 , 1998
Etching materials with an atmospheric-pressure plasma jet
Jeong J.Y., Babayan S.E., Tu V.J. et al.
Plasma Sources Sci. and Technol., Vol: 7, No: 3 , 1998
Negative ion assisted silicon oxidation in downstream of microwave plasma
Koromogawa Takashi, Fujii Takashi, Yamashita Akihito, Horiike Yasuhiro, Shindo Haruo
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 9A , 1998
Comparative study of silane radical composition in continuous and pulsed electron cyclotron resonance discharges
Yasaka Y., Nishimura K.
Plasma Sources Sci. and Technol., Vol: 7, No: 3 , 1998
Characterizationof RF-enhanced DC sputtering to deposit tin-doped indium oxide thin films
Futagami Toshiro, Shigesato Yuzo, Yasui Itaru
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 11 , 1998
Epitaxial growth of GaN by helicon wave plasma assisted metal organic chemical vapor deposition process
Kim Ki-Sung, Kim Seon-Hyo
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Effect of post plasma treatment of reliability of electron cyclotron resonance chemical vapor deposited SiOF films
Lee Seoghyeong, Park Jong-Wan
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
The optimization of the deposition variables for high photoconductivity a-Si:H films prepared by electron cyclotron resonance plasma chemical vapor deposition
Kang Moonsang, Koo Yongseo, An Chul
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Stress behavior of high density plasma chemical vapor deposition oxide deposited on a metal-patterned wafer
Lee Soo Geun, Park Jong Wang, Kim Min et al.
Jpn. J. Appl. Phys., Part 1, Vol: 37, No: 12B , 1998
Deposition of silicon dioxide films with an atmospheric-pressure plasma jet
Babayan S.E., Jeong J.Y., Tu V.J.
Plasma Sources Sci. and Technol., Vol: 7, No: 3 , 1998
Модифицированный метод плазмохимического газофазного осаждения нанокристаллического кремния
Голубев В.Г., Медведев А.В., Певцов А.Б., Феоктистов Н.А.
Письма в ЖТФ, Vol: 24, No: 19 , 1998
Modeling, simulation and experimental studies of plasma processing
Hedlund Christer
Acta univ. upsal. Compr. Summ. Uppsala Diss. Fac. Sci. and Technol., Vol: 1997, No: 258 , published: 01 January 1997
Плазмохимическое травление арсенида галлия в хлоре
Ефремов А.М., Овчинников Н.Л., Светцов В.И.
Физ. и химия обраб. матер., Vol: 1997, No: 1 , published: 01 January 1997
Диагностика работы торцевого холловского ускорителя плазмы и ее связь с каплеобразованием при напылении покрытий
Рязанцев С.С., Гавриленко И.Ю., Удалов Ю.П.
Физ. и химия обраб. матер., Vol: 1997, No: 1 , published: 01 January 1997
Модификация поверхности оптических стекол при электронно-лучевой обработке в вакууме
Лохов Ю.Н., Углов А.А., Чередниченко Д.И.
Физ. и химия обраб. матер., Vol: 1997, No: 1 , published: 01 January 1997
Упрочнение твердосплавных пластин с кобальтовой связкой ионизирующим облучением
Коршунов А.Б., Миркин Л.И., Мякотин Е.А., Шестериков С.А., Шемаев Б.В.
Физ. и химия обраб. матер., Vol: 1997, No: 3 , published: 01 January 1997
Плазменное термоупрочение сталей
Лыков А.М., Почепаев В.Г., Редькин Ю.Г., Куминов Е.С.
Физ. и химия обраб. матер., Vol: 1997, No: 3 , published: 01 January 1997
Prediction of multiple-feature effects in plasma etching
Hwang G.S., Giapis K.P.
Appl. Phys. Lett. , Vol: 70, No: 18 , 1997
Deposition of silicon dioxide films on amorphous carbon films by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
Endo K., Tatsumi T., Matsubara Y.
Appl. Phys. Lett. , Vol: 70, No: 9 , 1997
On the use of dust plasma acoustic waves for the diagnostic of nanometer-size contaminant particles in plasmas
Kortshagen U.
Appl. Phys. Lett. , Vol: 71, No: 2 , 1997
A method for simultaneous determination of the diffusion coefficient of particles in gas media and their reflection coefficient at the wall
Rusinov I.M., Paeva G.W., Blagoev A.B.
J. Phys. D: Appl. Phys., Vol: 30, No: 13 , 1997
Heat transfer to a metallic wire exposed to a plasma flow for great Knudsen numbers
Chen X.
J. Phys. D: Appl. Phys., Vol: 30, No: 13 , 1997
Modelling of the reactive synthesis of ultra-fine powders in a thermal plasma reactor
Desilets M., Bilodeau J.-F., Proulx P.
J. Phys. D: Appl. Phys., Vol: 30, No: 13 , 1997
The thermophoretic force acting on a spherical non-evaporating or eveporating particle suspended in a rarefied plasma
Chen X.
J. Phys. D: Appl. Phys., Vol: 30, No: 5 , 1997
Spatially and temporally resolved electron density measurements in streamers in dielectric liquids
Barmann P., Kroll S., Sunesson A.
J. Phys. D: Appl. Phys., Vol: 30, No: 5 , 1997
Improvement of sputtering target utilization using dynamic plasma processing
Harada H., Kamatani Y., Hirata A., Koyanagi T.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 2 , 1997
A synthetic approach to RF plasma modeling verified by experiments: Demonstration of a predictive and complete plasma simulator
Gogolides E.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 4B , 1997
Characteristics of very high-aspect-ratio contact etching
Ikegami N., Yabata A., Matsui T., Kanamori J., Horiike Y.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 4B , 1997
Low temperature growth of amorphous and polycrystalline silicon films from a modified inductively coupled plasma
Goto M., Toyoda H., Kitagawa M., Hirao T., Sugai H.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 6A , 1997
Numerical simulation of etching and deposition processes
Hamaguchi S., Mayo A.A., Rossnagel S.M. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Silicon dry etching in hydrogen iodide plasmas: Surface diagnostics and technological applications
Richter H.H., Aminpur M.A., Erzgraber H.B., Wolff A., Kruger D., Dehoff A., Reetz M.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Profile evolution during cold plasma beam etching of silicon
Ono K., Tuda M.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
The role of a resist during O[2] plasma ashing and its impact on the reliability evaluation of ultrathin gate oxides
Chien Ch.-H., Chang Ch.-Y., Lin H.-Ch., Chang T.-F., Hsien S.-K., Tseng H.-Ch., Chiou Sh.G., Huang T.-Y.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Resist etching with parallel-plate RF plasmas enhanced by a cusp magnetic field
Kawata H., Kubo T., Yasuda M., Murata K.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Amorphous hydrogeneted carbon-nitrogen films deposited by plasma-enhanced chemical vapor deposition
Freire F.L. (Jr)
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Formation of carbon nitride films by the radio-frequency plasma chemical deposition method
Zhang M., Wang P., Nakayama Y.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Carbon nitride films produced using electron cyclotron resonance nitrogen plasmas
Zhang M., Pan L., Miyazaki T., Nakayama Y.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Fast deposition of amorphous and microcrystalline silicon films from SiH[2]Cl[2]-SiH[4]-H[2] by plasma-enhanced chemical vapor deposition
Arai T., Nakamura T., Shirai H.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Preparation of stable F-doped SiO[2] thin films from Si(NCO)[4]/SiF[4]/O[2] gas mixtures using a conventional capacitively coupled RF plasma source
Sawada M., Makagami Y., Shirafuji T., Hayashi Y., Nishino Sh.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Relation between plasma parameters and film properties in DC reactive magnetron sputtering of indium-tin-oxide
Matsuda Y., Yamori Y., Muta M., Ohgushi Sh., Fujiyama H.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Reducing the effects of plasma proximity in plasma immersion ion implantation
Jones E.C., Shao J., Denholm A.S., Cheung N.W.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
The low-pressure Rf plasma as a medium for nitriding iron and steel
Baldwin M.J., Collinss G.A., Fewell M.P., Haydon S.C., Kumar S., Short K.T., Tendys J.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Effect of plasma parameter control on the growrh of zincblende type GaN films by ECR plasma enhanced metalorganic chemical vapor deposition
Yasui K., Iizuka K., Harada T., Akahane T.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Effects of methyl and perfluoro-alkyl groups on water repellency of silicon oxide films prepared by microwave plasma-enhanced chemical vapor deposition
Hozumi A., Kondo T., Kajita I. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Roles of SiH[3] and SiH[2] radicals in particle growth in rf silane plasmas
Kawasaki H., Fukusama T., Ohkura H. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Modeling of the evolutions of negative ions in silane plasma chemical vapor deposition for various process conditions
Kim D.-J., Kim K.-S.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Removal of carbon tetrachloride from air stream by a corona torch plasma reactor
Chang J.-S., Myint T., Chakrabarti A., Miziolek A.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 7B , 1997
Vaporization behavior of Cs in plasma melting of simulated low level miscellaneous solid wastes
Yasui Sh., Adachi K., Amakawa T.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 9A , 1997
Study of CF[4], C[2]F[6], SF[6] and NF[3] decomposition characteristics and etching performance in plasma state
Koike K., Fukuda T., Fujikawa Sh., Saeda M.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 9A , 1997
The removal of intentionally contaminated Cu impurities on Si substrate using remote H-plasma treatments
Ahn T., Park M., Lee Ch., Park J.-W., Jeon H.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 9A , 1997
Exterior corona effect on sphere-plane discharge in SF[6] gas utilizing optical measurement
Kamatani H., Watabe K., Masuoka H., Onoda M., Nakayama H.
Jpn. J. Appl. Phys., Part 1, Vol: 36, No: 2А , 1997
Crystalline structures of strongly coupled dusty plasmas in dc glow discharge strata
Fortov V.E., Nefedov A.P., Torchinsky V.M>, Molotkov V.I., Petrov O.F., Samarin A.A., Lipaev A.M., Khrapak A.G.
Phys. Lett. A, Vol: 229, No: 5 , 1997
Improvement of plasma spraying efficiency and coating quality
Chen H.C., Pfender E., Heberlein J.
Plasma Chem. Plasma Process., Vol: 17, No: 1 , 1997
Reactions of hydrocarbons in a supersonic vacuum plasma jet
Pauser H., Schwarzler C.G., Laimer J., Stori H.
Plasma Chem. Plasma Process., Vol: 17, No: 2 , 1997
Plasma etching of III-V semiconductors in BCl[3] chemistries. PtI. GaAs and related compounds
Lee J.W., Hong J., Lambers E.S., Abernathy C.R., Pearton S.J., Hobson W.S., Ren F.
Plasma Chem. Plasma Process., Vol: 17, No: 2 , 1997
Plasma etching of III-V semiconductors in BCl[3] chemistries. PtII. InP and related compounds
Lee J.W., Hong J., Lambers E.S., Abernathy C.R., Pearton S.J., Hobson W.S., Ren F.
Plasma Chem. Plasma Process., Vol: 17, No: 2 , 1997
Effects of process parameters on ultrafine SiC synthesis using induction plasmas
Guo J.Y., Gitzhofer F., Boulos M.I.
Plasma Chem. Plasma Process., Vol: 17, No: 2 , 1997
Impact of copper vapor contamination on argon arcs
Akbar S., Etemadi K.
Plasma Chem. Plasma Process., Vol: 17, No: 2 , 1997
Deposition of gallium nitride thin films by MOCVD in microwave plasma
Ihashi N., Itoh K., Matsumoto O.
Plasma Chem. Plasma Process., Vol: 17, No: 4 , 1997
A torch nozzle design to improve plasma spraying techniques
Cao M., Gitzhofer F., Gravelle D.V., Henne R., Boulos M.I.
Plasma Sources Sci. and Technol., Vol: 6, No: 1 , 1997
A voltage uniformity study in large-area reactors for RF plasma deposition
Sansonnens L., Pletzer A., Magni D., Howling A.A., Hollenstein Ch., Schmitt J.P.M.
Plasma Sources Sci. and Technol., Vol: 6, No: 2 , 1997
Measurement of the induced plasma current in a planar coil, low-frequency, RF induction plasma source
El-Fayoumi I.M., Jones I.R.
Plasma Sources Sci. and Technol., Vol: 6, No: 2 , 1997
Two-dimensional simulation of compact ECR plasma sources
Wu H.-M., Graves D.B., Kilgore M.
Plasma Sources Sci. and Technol., Vol: 6, No: 2 , 1997
Transport of chemically active species in plasma reactors for etching
Martisovits V., Zahoran M.
Plasma Sources Sci. and Technol., Vol: 6, No: 3 , 1997
Surface modification and etch product detection during reactive ion etching of InP in CH[4]-H[2] plasma
Feurprier Y., Cardinaud Ch., Turban G.
Plasma Sources Sci. and Technol., Vol: 6, No: 3 , 1997
Electron lithography using a compact plasma focus
Lee P., Feng X., Zhang G.X., Liu M.H., Lee S.
Plasma Sources Sci. and Technol., Vol: 6, No: 3 , 1997
Скорость и равномерность СВЧ-вакуумно-плазменной обработки в неоднородных внешних магнитных полях
Гуляев Ю.В., Черкасов И.Д., Яфаров Р.К.
Докл. РАН, Vol: 353, No: 3 , 1997
Плазменно-термическая переработка токсичных галогенорганических отходов
Кнак А.Н., Калитко В.А., Моссэ А.Л., Федоров С.А.
Инж.-физ. ж., Vol: 70, No: 4 , 1997
Синтез и регенерация катализаторов в электродуговой плазме
Високов Г.П.
Инж.-физ. ж., Vol: 70, No: 4 , 1997
Обработка водных растворов тяжелых металлов плазмой несамостоятельного разряда
Черняк В.Я., Цыбулев П.Н., Ольшевский С.В., Воронин П.Н.
Инж.-физ. ж., Vol: 70, No: 4 , 1997
Анизотропия и нелокальность функции распределения электронов разряда постоянного тока в CF[4] низкого давления
Волынец В.Н., Иванов В.В., Рахимова А.Т., Словецкий Д.И.
Физ. плазмы, Vol: 23, No: 1 , 1997
Устойчивость слабоионизованной ион-ионной плазмы в сильном электрическом поле
Александров Н.Л., Охримовский А.М.
Физ. плазмы, Vol: 23, No: 1 , 1997
Etching of Ga-based III-V semiconductors in inductively coupled Ar and CH[4]H[2]-based plasma chemistries
Lee J.W., Abernathy C.R., Pearton S.J., Constantine C., Shul R.J., Hobson W.S.
Plasma Sources Sci. and Technol., Vol: 6, No: 4 , 1997
Etch product identification during CH[4]-H[2] RIE of InP using mass spectrometry
Feurprier Y., Cardinaud Ch., Grolleau B., Turban G.
Plasma Sources Sci. and Technol., Vol: 6, No: 4 , 1997
Влияние добавок в электролит оксидирования комплексных соединений на процесс нанесения микроплазменных покрытий и их свойства
Тимошенко А.В., Магурова Ю.В., Артемова С.Ю.
Физ. и химия обраб. матер., Vol: 1996, No: 2 , published: 01 January 1996
Нанесение покрытий вакуумным электродуговым методом
Марков Г.В.
Физ. и химия обраб. матер., Vol: 1996, No: 3 , published: 01 January 1996
Плазменная технология переработки тетрафторида кремния на дисперсный оксид кремния и фтористоводородную кислоту
Туманов Ю.Н., Кобзарь Ю.Ф., Кузьминых С.А., Хохлов В.А.
Физ. и химия обраб. матер., Vol: 1996, No: 5 , published: 01 January 1996
Повышение защитных свойств ионно-плазменных покрытий плазмохимической обработкой
Клубович В.В., Литвинов А.А.
Физ. и химия обраб. матер., Vol: 1996, No: 5 , published: 01 January 1996
Модель формирования оксидных покрытий при плазменно-электролитическом оксидировании алюминия в растворах силикатов
Ерохин А.Л., Любимов В.В., Ашитков Р.В.
Физ. и химия обраб. матер., Vol: 1996, No: 5 , published: 01 January 1996
Структура и декоративные свойства оксидтитановых покрытий, формируемых из сепарированных потоков низкотемпературной плазмы
Вершина А.К., Агеев В.А., Плескачевский И.Ю.
Физ. и химия обраб. матер., Vol: 1996, No: 5 , published: 01 January 1996
Многослойные вакуумно-плазменные покрытия на основе карбидов титана и хрома, их структура и свойства
Анциферов В.Н., Косогор С.П.
Физ. и химия обраб. матер., Vol: 1996, No: 6 , published: 01 January 1996
Плазменные покрытия на композиционных материалах
Лыков А.М., Науменко Н.Н.
Физ. и химия обраб. матер., Vol: 1996, No: 6 , published: 01 January 1996
Нагрев дисперсного материала электрической дугой
Васильев Д.В., Лыков А.М., Сурис А.Л.
Физ. и химия обраб. матер., Vol: 1996, No: 6 , published: 01 January 1996
Air plasma treatment of polyacrylonitrile porous membrane
Bryjak M., Gancarz I., Krajciewicz A., Piglowski J.
Angew. macromol. Chem.=Appl. macromol. Chem and Phys., Vol: 234, No: , 1996
Scaling laws for particle growth in plasma reactors
Lemons D.S., Keinigs R.K., Winske D., Jones M.E.
Appl. Phys. Lett. , Vol: 68, No: 5 , 1996
Ion drag effects in inductively coupled plasmas for etching
Collison W.Z., Kushner M.J.
Appl. Phys. Lett. , Vol: 68, No: 7 , 1996
Plasma beam deposited amorphous hydrogenated carbon: Improved film quality at higher growth rate
Gielen J.W.A.M., van de Sanden M.C.M., Schram D.C.
Appl. Phys. Lett. , Vol: 69, No: 2 , 1996
Nitrogen incorporation in thin oxides by constant current N[2]O plasma anodization of silicon and N[2] plasma nitridation of silicon oxides
Kaluri S.R., Hess D.W.
Appl. Phys. Lett. , Vol: 69, No: 8 , 1996
Role of sputtered Cu atoms and ions in a direct current glow discharge: Combined fluid and Monte Carlo model
Bogaerts A., Gijbels R.
J. Appl. Phys. , Vol: 79, No: 3 , 1996
Ion energy and plasma characterization in a silicon filtered cathodic vacuum arc
Bilek M.M.M., Chhowalla M., Weiler M., Milne W.I.
J. Appl. Phys. , Vol: 79, No: 3 , 1996
Partial discharges due to electrical treeing in polymers: Phase-resolved and time-sequence observation and analysis
Suwarno, Suzuoki Y., Komori F., Mizutani T.
J. Phys. D: Appl. Phys., Vol: 29, No: 11 , 1996
Predictions of metal droplet formation in arc welding
Haidar J., Lowke J.J.
J. Phys. D: Appl. Phys., Vol: 29, No: 12 , 1996
Predictions of metal droplet formation in arc welding
Haidar J., Lowke J.J.
J. Phys. D: Appl. Phys., Vol: 29, No: 12 , 1996
Characterization of a DC arcjet plasma for diamond growth by measurement of spatial distributions of optical emission
Yamaguchi H., Ishii M., Uematsu K., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 35, No: 4A , 1996
Highly selective SiO[2]/Si etching and related kinetics in time-modulated helicon wave plasma
Chinzei Y., Shindo H., Horiike Y.
Jpn. J. Appl. Phys., Part 1, Vol: 35, No: 6A , 1996
Effects of He gas addition on the production of active particles in rf magnetron sputtering
Harada K., Kishida T., Matsuoka T., Maruyama T., Tokutaka H., Fujimura K., Koyanagi T., Fujii T.
Jpn. J. Appl. Phys., Part 1, Vol: 35, No: 6A , 1996
Nitriding of zirconium and aluminium by using ECR nitrogen plasmas
Hino T., Fujita I., Nishikawa M.
Plasma Sources Sci. and Technol., Vol: 5, No: 3 , 1996
Quality improvement of plasma-beam-deposited amorphous hydrogenated carbon with higher growth rate
Gielen J.W.A.M., van de Sanden M.C.M., Kleuskens P.R.M., Schram D.C.
Plasma Sources Sci. and Technol., Vol: 5, No: 3 , 1996
Plasma assisted evaporation of palladium
Laure C., Brault P., Thomman A.-L., Boswell R., Rousseau B., Estrade-Szwarckopf H.
Plasma Sources Sci. and Technol., Vol: 5, No: 3 , 1996
TiN coating generated with a pulsed plasma arc
Bruzzone H., Kelly H., Marquez A., Lamas D., Ansaldi A., Oviedo C.
Plasma Sources Sci. and Technol., Vol: 5, No: 3 , 1996
Analysis of powder particle acceleration and heating processes in a discharge capillary-ablative pipe device
Zoler D., Kaplan Z., Ashkenazy J.
Plasma Sources Sci. and Technol., Vol: 5, No: 3 , 1996
A 100 kV 10 A high-voltage pulse generator for plasma immersion ion implantation
Brutscher J.
Rev. Sci. Instrum. , Vol: 67, No: 7 , 1996
Air plasma treatments of asymmetric polysulfone membranes
Aldea E., Dinescu G., Musa G., Albu B., Nechifor G., Popescu G.
Rom. J. Phys., Vol: 41, No: 3-4 , 1996
Моделирование процессов в плотной HeCd плазме импульсного объемного разряда
Макаров С.В., Новоселов Ю.Н.
Ж. техн. физ., Vol: 66, No: 8 , 1996
Влияние плазменной обработки люминофора на его светотехнические параметры
Байбурин В.Б., Максименко Б.Н., Михайлова В.В., Михайлин А.Ю., Терентьев А.А., Усанов Д.А., Перовский Э.В.
Письма в ЖТФ, Vol: 22, No: 14 , 1996
Low energy electron-enhanced etching of Si(100) in hydrogen/helium direct-current plasma
Gillis H.P., Choutov D.A., Steiner P.A., IV, et al.
Appl. Phys. Lett. , Vol: 66, No: 19 , 1995
Analysis of the Coulomb-solidification process in particle plasmas
Tashibana K., Hayashi Y.
Austral. J. Phys., Vol: 48, No: 3 , 1995
Role of the chamber wall in low-pressure high-density etcing plasmas
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J. Appl. Phys. , Vol: 77, No: 2 , 1995
Spatially and temporally resolved absolute O-atom concentrations in etching plasmas
Tserepi A.D., Miller T.A.
J. Appl. Phys. , Vol: 77, No: 2 , 1995
The effect of subwafer dielectrics on plasma properties in plasma etching reactors
Hoekstra R.J., Kushner M.J.
J. Appl. Phys. , Vol: 77, No: 8 , 1995
Plasma-assisted low-pressure metalorganic chemical vapor deposition of GaN on GaAs substrates
Sato M.
J. Appl. Phys. , Vol: 78, No: 3 , 1995
The effect of plasma formation on beam focusing in deep penetration welding with CO[2] lasers
Beck M., Berger P., Hugel H.
J. Phys. D: Appl. Phys., Vol: 28, No: 12 , 1995
Electron impact cross section data for carbon tetrafluoride
Bonham R.A.
Jpn. J. Appl. Phys., Part 1, Vol: 33, No: 7B , 1995
Gate electrode etching using a transformer coupled plasma
Yoshida K., Miyamoto T., Ikawa E., Murao Y.
Jpn. J. Appl. Phys., Part 1, Vol: 34, No: 4B , 1995
The electron charging effects of plasma on notch profile defects
Novawa T., Kihoshita T., Nishizuka T., Narai A., Inoue T., Nakaue A.
Jpn. J. Appl. Phys., Part 1, Vol: 34, No: 4B , 1995
Reaction studies between fluorocarbon films and Si using temperature-programmed X-ray photoelectron and desorption spectroscopies
Harashita N., Mayakawa Y., Fujita K., Kanamori J.
Jpn. J. Appl. Phys., Part 1, Vol: 34, No: 4B , 1995
The precision implant 9500 plasma flood system-the advanced solution to wafer charging
Ito H., Kamata T., England J., et al.
Nucl. Instrum. Methods Phys. Res., Sect. A , Vol: 96, No: 1-2 , 1995
Особенности упрочения стали У8 с помощью импульсно-плазменной обработки
Волошин М.Н., Гасин Д.А., Кораблева И.Р., Скляренко Н.Н.
Физ. и химия обраб. матер., Vol: 1994, No: 1 , published: 01 January 1994
Генерация атомарного кислорода в плазме СВЧ разряда смеси Ar-O[2] для удаления фоторезиста
Васильков А.К., Жидков А.Г., Иванов А.И., Кузнецов В.И.
Физ. и химия обраб. матер., Vol: 1994, No: 1 , published: 01 January 1994
Модифицирование (металлизация) дисперсных карбидов и оксидов в импульсной плазме конденсаторного разряда
Блинков И.В., Орехов И.Е.
Физ. и химия обраб. матер., Vol: 1994, No: 1 , published: 01 January 1994
Тонкопленочные вакуум-плазменные покрытия из диэлектрических сыпучих материалов
Тимофеев Л.А., Катрич С.А., Солнцев Л.А.
Физ. и химия обраб. матер., Vol: 1994, No: 3 , published: 01 January 1994
Fluid dynamics and dust growth in plasma enhanced chemical vapor deposition
Haaland P., Ibrani S., Jiang H.
Appl. Phys. Lett. , Vol: 64, No: 13 , 1994
Running waveguide discharge for inner coating of metal tubes
Hytry R., Moller W., Wilhelm R.
Appl. Phys. Lett. , Vol: 64, No: 25 , 1994
Plasma processing
Graves D.B.
IEEE Trans. Plasma Sci. Pt 3, Vol: 22, No: 1 , 1994
Effect of duct bias on transport of vacuum arc plasmas through curved magnetic filters
Anders A., Anders S., Brown I.G.
J. Appl. Phys. , Vol: 75, No: 10 , 1994
Ion-induced etching of organic polymers in argon and oxygen radio-frequency plasmas
Baggerman J.A.G., Visser R.J., Collart E.J.H.
J. Appl. Phys. , Vol: 75, No: 2 , 1994
Tungsten etching in low-pressure SF[6] plasma: Influence of the surface temperature
Petri R., Henry D., Francou J.-M., Sadeghi N., Vager-Besancon M.
J. Appl. Phys. , Vol: 75, No: 2 , 1994
Plasma-charging damage: A physical model
Cheung K.P., Chang C.P.
J. Appl. Phys. , Vol: 75, No: 9 , 1994
Anisotropic etching of polymers in SO[2]/O[2] plasmas: Hypotheses on surface mechanisms
Pons M., Pelletier J., Joubert O.
J. Appl. Phys. , Vol: 75, No: 9 , 1994
Plasma composition and mixing ratio in current modulated metal halide discharges
Karabourniotis D., Drakakis E., Palladas A.
J. Phys. D: Appl. Phys., Vol: 27, No: 4 , 1994
Radio-frequency glow discharges in methane gas: Modelling of the gas-phase physics and chemistry
Gogolides E., Buteau C., Rhallabi A., Turban G.
J. Phys. D: Appl. Phys., Vol: 27, No: 4 , 1994
Transient glow discharge in nitrogen after the breakdown
Fujiwara T., Sato T., Sekikawa J., Yamada H.
J. Phys. D: Appl. Phys., Vol: 27, No: 4 , 1994
Electron cyclotron resonance plasma source for metalorganic chemical vapor deposition of silicon oxide films
Popov O.A., Shapoval S.Y., Yoder M.D., Chumakov A.A.
J. Vac. Sci. Technol., A, Vol: 12, No: 2 , 1994
Fluorinated diamondlike carbon films deposited from radio-frequency glow discharge in a triode reactor
d`Agostino R., Lamendola R., Favia P., Giquel A.
J. Vac. Sci. Technol., A, Vol: 12, No: 2 , 1994
Influence of an external axial magnetic field on the plasma characteristics and deposition conditions during direct current planar magnetron sputtering
Ivanov I., Kazansky P., Hultman L., Petrov I., Sundgren J.-E.
J. Vac. Sci. Technol., A, Vol: 12, No: 2 , 1994
Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF[4] and CHF[3]
Oehrlein G.S., Zhang Y., Vender D., Haverlag M.
J. Vac. Sci. Technol., A, Vol: 12, No: 2 , 1994
Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF[4] and CHF[3]
Oehrlein G.S., Zhang Y., Vender D., Joubert O.
J. Vac. Sci. Technol., A, Vol: 12, No: 2 , 1994
Study on electromagnetron for plasma polymerization. II. Magnetic field enhanced radio frequency plasma deposition of organogermanium films from tetraethylgermanium
Gazicki M., Schalko J., Olcaytug F., Ebel M., Wernisch J., Yasuda H.
J. Vac. Sci. Technol., A, Vol: 12, No: 2 , 1994
Redeposition kinetics in fluorocarbon plasma etching
Gray D.C., Mohindra V., Sawin H.H.
J. Vac. Sci. Technol., A, Vol: 12, No: 2 , 1994
Plasma fluorination of graphite
Merfeld G.D., Petrich M.A.
J. Vac. Sci. Technol., A, Vol: 12, No: 2 , 1994
Cleaning of metal parts in oxygen radio frequency plasma: Process study
Korzec D., Rapp J., Theirich D., Engemann J.
J. Vac. Sci. Technol., A, Vol: 12, No: 2 , 1994
Fluorocarbon high density plasma. V. Influence of aspect ratio on the etch rate of silicon dioxide in an electron cyclotron resonance plasma
Joubert O., Oehrlein G.S., Zhang Y.
J. Vac. Sci. Technol., A, Vol: 12, No: 3 , 1994
Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma
Joubert O., Oehrlein G.S., Surendra M.
J. Vac. Sci. Technol., A, Vol: 12, No: 3 , 1994
Adverse effects on plasma polymerized films due to previous oxygen etching in an "electrodeless" reactor
Wymore T., Nichols M.F.
J. Vac. Sci. Technol., A, Vol: 12, No: 3 , 1994
Comparison of argon electron-cyclotron-resonance plasmas in three magnetic field configurations. II. Energy distribution of argon ions
Junck K.L., Getty W.D.
J. Vac. Sci. Technol., A, Vol: 12, No: 3 , 1994
Sputtering behavior of boron using electron cyclotron resonance plasma
Ito Yoshifumi, Kuriki Shunichi, Saidoh Masahiro, Nishikawa Masahiro
Jpn. J. Appl. Phys., Part 1, Vol: 33, No: 10 , 1994
Generation of electron cyclotron resonance neutral stream and its application to Si etching
Tsuchizawa T., Jin Y., Matsuo S.
Jpn. J. Appl. Phys., Part 1, Vol: 33, No: 4B , 1994
Именение поверхностных свойств тонких металлических пленок после обработки в плазме инертного газа
Хатько В.В., Терехов А.М., Томченко А.А., Емельянов Ю.Л.
Изв. РАН. Сер. физ., Vol: 58, No: 3 , 1994
Исследование особенностей ионно-плазменного азотирования железа и чугуна
Абдуллин И.Ш., Романов Е.С., Хусаинов И.Г., Углов А.А.
Физ. и химия обраб. матер., Vol: 1993, No: 1 , published: 01 January 1993
Иммобилизация сульфатсодержащих радиоактивных отходов в стекле
Стефановский С.В.
Физ. и химия обраб. матер., Vol: 1993, No: 2 , published: 01 January 1993
Исследование внедрения ионов в растущие слои многослойных покрытий, получаемых ионно-плазменным осаждением в вакууме
Воеводин А.А., Ерохин А.Л.
Физ. и химия обраб. матер., Vol: 1993, No: 2 , published: 01 January 1993
Исследование структуры и свойств ионно-плазменного покрытия на основе нитрида титана
Сайдахмедов Р.Х., Карпман М.Г., Усманов К.Б., Фетисов Г.П.
Физ. и химия обраб. матер., Vol: 1993, No: 2 , published: 01 January 1993
2-10 nm scale plasma polymerized organic films
Senda K., Vinogradov G.K., Gorwadkar S., Morita S.
J. Appl. Phys. , Vol: 74, No: 10 , 1993
Effect of graphitic carbon films on diamond nucleation by microwave-plasma-enchanced chemical-vapor deposition
Feng Z., Komvopoulos K., Brown I.G., Body D.B.
J. Appl. Phys. , Vol: 74, No: 4 , 1993
Processing uniformity improvement by magnetic field distribution control in electron cyclotron resonance plasma chamber
Nishimura H., Kiuchi M., Matsuo S.
Jpn. J. Appl. Phys., Part 1, Vol: 32, No: 18 , 1993
Ozone generation of bipolar-type ceramic ozonizer module with semiconductor ceramic discharge electrode
Watanabe T., Aso Y., Nakayama Ch.
Jpn. J. Appl. Phys., Part 1, Vol: 32, No: 3A , 1993
Тахометрическая неустойчивость травления полимеров в плазме ВЧ разряда
Магунов А.Н.
Письма в ЖТФ, Vol: 1992, No: , published: 01 January 1992
Насыщение стали фзотом при плазменной сварке и наплавке
Боженко Б.Л., Шалимов В.Н., Зубков Н.Н.
Физ. и химия обраб. матер., Vol: 1992, No: 4 , published: 01 January 1992
Сопротивление деформации покрытий из термодинамически несмешиваемых элементов, полученных методом ионно-атомного осаждения
Вальднер В.О., Геминов В.Н., Едидович Л.Д., Заболотный В.Т., Старостин Е.Е.
Физ. и химия обраб. матер., Vol: 1992, No: 6 , published: 01 January 1992
Поведение цезия при высокотемпературной переработке твердых радиоактивных отходов
Князев И.А., Толстов И.Д., Стефановский С.В.
Физ. и химия обраб. матер., Vol: 1992, No: 6 , published: 01 January 1992
Плазменно-дуговое рафинирование вольфрама от металлов группы железа
Николаев А.А., Николаев А.В., Самойленко М.В., Фисенков М.В.
Физ. и химия обраб. матер., Vol: 1992, No: 6 , published: 01 January 1992
Tungsten etching mechanism in low-pressure SF[6] plasma
Petri R., Henry D., Sadeghi N.
J. Appl. Phys. , Vol: 72, No: 7 , 1992
Role of arc plasma instability on nanosynthesis
Ghorui S., Sahasrabudhe S.N., Tak Atul K., et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 34, No: 1
Role of arc plasma instability on nanosynthesis
Ghorui S., Sahasrabudhe S.N., Tak Atul K., et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 34, No: 1
Пpостpанственное изменение хаpактеpистик эpозионной плазмы свинца пpи pаспpостpанении лазеpного факела от мишени
Шуаибов А.К., Чучман М.П.
Ж. техн. физ., Vol: 76, No: 11
Синтез гидpофобно-гидpофильных наностpуктуp на повеpхности полимеpов с помощью углеpодной низкотемпеpатуpной плазмы
Алехин А.П., Киpиленко А.Г., Козлитин А.И., и дp.
Поверхность. Рентген., синхротрон. и нейтрон. исслед., Vol: , No: 11
Two-dimensional temperature distribution inside a hemispherical bowl-shaped targeet for plasma source ion implantation
Liu Cheng-Sen, Wang Yan-Hui, Wang De-Zhen
Chin. Phys., Vol: 14, No: 1
High-voltage breakdown and conditioning of carbon and molybdenum electrodes
Goebel D.M., Schneider A.C.
IEEE Trans. Plasma Sci. Pt 3, Vol: 4, No: 1.
A high repetition rate nanosecond pulsed power supply for nonthermal plasma generation
Liu K., Hu Q., Qiu J., et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 4, No: 1.
Plasma-based ion implantation and deposition: A review of physics, technology, and applications
Pelletier Jacques, Anders Andre
IEEE Trans. Plasma Sci. Pt 3, Vol: 6, No: 1.
Plasma-based ion implantation and deposition: A review of physics, technology, and applications
Pelletier Jacques, Anders Andre
IEEE Trans. Plasma Sci. Pt 3, Vol: 6, No: 1.
Production of volume wave plasma with internally mounted cylindrical planar microwave launcher and two-dimensional field analysis using finite difference time domain method
Ogino Akihisa, Naito Katsutoshi, Terashita Fumie, et al.
Jpn. J. Appl. Phys., Part 2, Vol: 44, No: 8-11
Kinetic modeling of the decomposition of carbon tetrachloride in thermal plasma
Kovacs T., Turanyi T., Foglein K., et al.
Plasma Chem. Plasma Process., Vol: 25, No: 2.
Formation of iron macro-spheres in plasma
Bica I.
Plasma Chem. Plasma Process., Vol: 25, No: 2.
Degradation of organic contaminants in water by pulsed corona discharge
Wen Y.Z., Liu H.J., Liu W.P., et al.
Plasma Chem. Plasma Process., Vol: 25, No: 2.
Effect of ion energy on structure and composition of cathodic arc deposited alumina thin films
Rosen J., Mraz S., Kreissig U., et al.
Plasma Chem. Plasma Process., Vol: 25, No: 4
Condensation of argon, monosilane and their mixtures in a pulse free jet
Korobeishchikov N.G., Zarvin A.E., Madirbaev V.Zh., et al.
Plasma Chem. Plasma Process., Vol: 25, No: 4
Laser-induced fluorescence (LIF) probe for in-situ nitric oxide concentration measurement in a non-thermal pulsed corona discharge plasma reactor
Hu X., Zhao G.-B., Garikipati S.V.B. Janardhan, et al.
Plasma Chem. Plasma Process., Vol: 25, No: 4
Statistical analysis of the motion and heating of particles in a plasma jet
Zhang T., Liu B., Bao Y., et al.
Plasma Chem. Plasma Process., Vol: 25, No: 4
System for in situ characterization of nanoparticles synthesized in a thermal plasma process
Wang X., Hafiz J., Mukherjee R., et al.
Plasma Chem. Plasma Process., Vol: 25, No: 5
Treatment ofred tide in ocean using non-thermal plasma based advanced oxidation technology
Bai M., Bai X., Zhang Z., et al.
Plasma Chem. Plasma Process., Vol: 25, No: 5
Structure, composition, mechanical, and tribological properties of BCN films deposited by plasma enhanced chemical vapor deposition
Kurapov D., Schneider J.M.
Plasma Chem. Plasma Process., Vol: 25, No: 6
Simultaneous removal of nitrogen oxides and particulate matters from diesel engine exhaust using dielectric barrier discharge and catalysis hybrid system
Mok Y.S., Huh Y.J.
Plasma Chem. Plasma Process., Vol: 25, No: 6
Destruction of styrene in an air stream by packed dielectric barrier discharge reactors
Chang C.-L., Bai H., Lu S.-J.
Plasma Chem. Plasma Process., Vol: 25, No: 6
Контpоль загpязнения сpеды и пpоцессы очистки плазменными методами
Амоpу Дж., Моpван Д., Кавадиас С., и дp.
Ж. техн. физ., Vol: 75, No: 5
Properties of TiN coating on 45{#} steel for inner surface modification by grid-enhanced plasma source ion implantation method
Zhang Gu-Ling, Wang Jiu-Li, Liu Yuan-Fu, et al.
Chin. Phys. Lett., Vol: 13, No: 8
Pulsed DC magnetron discharges and their utilization in plasma surface engineering
Vlcek J., Pajdarov A.D., Musil J.
Contrib. Plasma Phys., Vol: 44, No: 5-6
Plasma processing of materials at the atomic scale
Braithwaite N.St.J., Matsuura T.
Contrib. Plasma Phys., Vol: 44, No: 5-6
Isotope effects of H{-}/D{-} volume production in low-pressure H[2]/D[2] plasmas-measurement of VUV emissions and negative ion densities
Fukumasa O., Mori S., Nakada N., et al.
Contrib. Plasma Phys., Vol: 44, No: 5-6
Two-dimensional kinetic and three-dimensional fluid-radiation transport simulations of plasma display panel
Lee J.K., Ko S.W., Kim H.C., et al.
Contrib. Plasma Phys., Vol: 44, No: 5-6
Pulsed corona discharge as a source of hydrogen and carbon nanotube production
Mishra Lekha, Shibata Kenetoshi, Ito Hiroaki, et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 4, No: Pt3
Low-temperature growth (400°C) of high-integrity thin silicon-oxynitride films by microwave-excited high-density Kr-O[2]-NH[3] plasma
Ohtsubo Kazuo, Saito Yuji, Hirayama Masaki, et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 4, No: Pt3
Polymer-like C:H thin film coating of nanopowders in capacitively coupled RF discharge
Kouprine A., Gitzhofer F., Boulos M., et al.
Plasma Chem. Plasma Process., Vol: 24, No: 2
A global model of chemical vapor deposition of silicon dioxide by direct-current corona discharges in dry air containing octamethylcyclotetrasiloxane vapor
Chen J., Davidson J.H.
Plasma Chem. Plasma Process., Vol: 24, No: 4.
Hydrogen isotope exchange reactions in an atmospheric pressure discharge utilizing water as currier gas
Koo I.G., Lee W.M.
Plasma Chem. Plasma Process., Vol: 24, No: 4.
In-flight spheroidization of alumina powders in Ar-H[2] and Ar-N[2] induction plasmas
Ye R., Ishigaki T., Jurewicz J., et al.
Plasma Chem. Plasma Process., Vol: 24, No: 4.
The design optimization of a plasma reactor for chemical waste destruction
Dayal A.R., Pfluger D., Kearney T.N., et al.
Plasma Chem. Plasma Process., Vol: 24, No: 4.
Comparative study of flow characteristics inside plasma torch with different nozzle configurations
Yuan X.Q., Li H., Zhao T.Z., et al.
Plasma Chem. Plasma Process., Vol: 24, No: 4.
Comparison of simple particle-radiation coupling models applied on a plasma black process
Gonzalez-Aguilar J., Deme I., Fulcheri L., et al.
Plasma Chem. Plasma Process., Vol: 24, No: 4.
Growth and characterization of indium tin oxide films grown on polymer substrates by DC magnetron sputtering
Bhaumik S., Barua A.K.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6A
Material spraying using electromagnetically accelerated plasma
Tahara H., Shibat T., Mitsuo K., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6A
Localized plasma processing of materials using atmospehric-pressure microplasma jets
Yoshiki H., Ikeda K., Wakaki A., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6B
Plasma enhanced chemical vapor deposition of fluorinated amorphous carbon films on the surface with reverse tapered microstructures
Shirafuji T., Wada T., Kashiwagi M., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 7A
Estimation o carbon fluxes interchanging between chamber wall and gas phase in fluorocarbon plasmas
Takada N., Sasaki K., Iida T., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 7A
Paallel simulations of relaxation in electron transport in crossed electric and magnetic fields
Suzuki T., Horie I., Kitamori K., Maruyama K.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 7A
Electron transport in nonorthogonal crossed DC electric and magnetic fields
Horie Ikuya, Suzuki Takuma, Kitamori Kazutaka, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 8
Development of a compact time-of-flight mass spectrometer with a length of 1 m for processing plasma diagnostics
Saito Naoaki, Koyama Kazuyoshi, Tanimoto Mitsumori
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 8
Comparative studies of perfluorocarbon alternative gas plasmas for contact hole etch
Nakamura Shingo, Itano Mitsushi, Aoyama Hirokazu, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 9A
Effect of an atmospheric pressure plasma cleaning on the outgassing characteristics of MgO layer for plasma display panel
Song B.K., Lee Y.J., Yi C.H., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 1A-1B
Metal organic atomic layer deposition of high-κ gate dielectrics using plasma oxidation
Endo K., Tatsumi T.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6B
Low-temperature sterilization with surface-wave-excited oxygen plasma
Nagatsu M., Terashita F., Koide Y.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 7B
Characterization of La[0.8]Sr[0.2]MnO[3] produced by a reactive DC thermal plasma spray system
Kang H. Ki, Taylor P.R., Lee Jun Hee
Plasma Chem. Plasma Process., Vol: 23, No: 2
Recent studies on the decomposition of n-hexane and toluene in RF thermal plasma
Foglein K.A., Babievskaya I., Szabo P.T., Szepvolygi J.
Plasma Chem. Plasma Process., Vol: 23, No: 2
Effect of the coil angle in an inductively coupled plasma torch: A novel two-dimensional model
Xue S., Proulx P., Boulos M.I.
Plasma Chem. Plasma Process., Vol: 23, No: 2
Atmospheric pressure RF (13.56 MHz) glow discharge: Characterization and appliction to "in line" waste water treatment
Blanco J.C., Guerra-Mutis M.H., Moreno J.D.
Plasma Chem. Plasma Process., Vol: 23, No: 2
Моделирование формирования плазмы в прикатодном слое разряда эффективных эксиламп
Ткачев А.Н., Яковленко С.И.
Ж. техн. физ., Vol: 73, No: 2
Перспективы увеличения мощности дуговых цезий-кислородных термоэмиссионных преобразователей с вольфрамовыми электродами при повышенных эмиттерных температурах
Кобяков В.П., Каландаришвили А.Г.
Ж. техн. физ., Vol: 73, No: 2
Получение покрытий из порошковых материалов с применением короткой аргоновой дуги. 2. Тепловой поток из плазмы к макрочастице
Смягликов И.П., Шиманович В.Д., Ходыко Ю.В.
Инж.-физ. ж., Vol: 76, No: 1
Plasma properties in a high-pressure gas mixture for a plasma display panel
Uhm Han S., Choi Eun H., Cho Guansup, et al.
J. Plasma Phys., Vol: 67, No: 1
Topography simulation of reactive ion etching combined with plasma simulation, sheath moel, and surface reaction model
Takagi S., Iyanagi K., Onoue S., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 6A
Calculation of the precursor flux from optical emission spectroscopy data in plasma enhanced chemical vapour deposition of silane and its correlation with the depositionr ate
Ray P.P., Dutta GUpta N., Chaudhuri P.
Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 6A
Deposition of diamond-like carbon film in a closed-space CH[4]RF plasma
Mutsukura N., Handa Y.
Plasma Chem. Plasma Process., Vol: 22, No: 4
Effect of wafer temperature on high aspect ratio hardmask etching
Lee S., Tien Y.-C., Chang Y.-W.
Plasma Chem. Plasma Process., Vol: 22, No: 4
GMR layers as deposited by TVA technology
Mustata I., Musa G., Cudalbu Bianca, et al.
Rom. Rep. Phys., Vol: 54, No: 6-10
Особенности распределения электромагнитных полей в замагниченной плазме установки ПР-1
Греков Д.Л., Азаренков Н.А., Бизюков А.А., Олефир В.П.
Вопр. атом. науки и техн. Сер. Термоядер. синтез, Vol: , No: 3-4
Осаждение пленок a-C:H в тлеющем разряде на постоянном токе с областью магнетронной плазмы, локализованной вблизи анода
Коншина Е.А.
Ж. техн. физ., Vol: 72, No: 6
Взаимосвязь поверхностной структуры и свойств пленок, полученных из гептана под действием плазмы тлеющего разряда
Ляхович А.М., Дорфман А.М., Повстугар В.И.
Изв. РАН. Сер. физ., Vol: 66, No: 7
Фотоэлектрические свойства планарных структур с двойным барьером Шоттки, обработанных в высоковакуумном СВЧ-разряде
Ушаков Н.М., Терентьев С.А., Яфаров Р.К.
Письма в ЖТФ, Vol: 28, No: 15
Образование возбужденных атомов хлора в поперечном объемном разряде низкого давления
Шуаибов А.К., Дащенко А.М., Шевера И.В.
Письма в ЖТФ, Vol: 28, No: 8
Диффузионная модель образования градиентных оксидных покрытий в микроплазменном режиме
Мамаев А.И., Рамазанова Ж.М., Бутягин П.И.
Физ. и химия обраб. матер., Vol: , No: 3
Модификация структуры и свойств поверхностных слоев углеродистых сталей при воздействии компрессионного плазменного потока
Углов В.В., Анищик В.М., Асташинский В.В., и др.
Физ. и химия обраб. матер., Vol: , No: 3
Микроволновый "ячеистый" разряд в мелкодисперсных порошковых смесях
Шатанов Г.М., Бережецкая Н.К., Копьев В.А., и др.
Физ. плазмы, Vol: 28, No: 10
Transport properties of μc-Si:H films prepared by very high hydrogen-diluted silane plasma
Shi Jian-jun, Huang Shao-yun, Chen Kun-ji et al.
Chin. Phys., Vol: 10, No: 8
Wall Heating effect ofncrystallization of low-temperature deposited silicon films from an inductively-coupled plasma
Kojima Tetsuya, Ohishi Akihiro, Toyoda Hirotaka et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 1
Measurements of electron temperature and ensity of a micro-discharge plasma using laser thomson scattering
Noguchi Yasuyuki, Matsuoka Akira, Bowden Mark D. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 1
Prebreakdown phenomena and formation processes of low-pressure glow discharges in Ar, Ar/N[2] and Ar/O[2] mixtures
Hosokawa Tatsuzo, Goto Kazuhiro, Ohuchi Mikio et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 11
Investigation of the conditions required for the formation of a magnetic neutral loop discharge plasma
Sakoda Tatsuya, Okraku-Yirenkyi Yaw, Sung Youl-Moon et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 11
Amorphous silicon and tungsten etching employing environmentally benign plasma process
Fujita Kazushi, Kobayashi Shigeto, Ito Masafumi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 2A
End-point detection of reactive ion etching by plasma impedancemonitoring
Kanoh Masaaki, Yamage Masashi, Takada Hiroyuki
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 3A
Production of low-electron-temperature electron cyclotron resonance plasma using nitrogen gas in the mirror magnetic field
Itagaki N., Ueda Y., Ishii N., Kawai Y.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 4A
Plasma source ion implantation for ultrashallow junctions: Low energy and high dose rate
Cho J., Han S., Lee Y., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 4A
Separation of townsend secondary electron emission coefficients by frequency response analysis
Tsurugida Kanji, Otsubo Masahisa, Honda Chikahisa, Ikuta Nobuaki
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 5A
Characteristics of very-high-frequency-excited SiH[4] plasmas using a ladder-shaped electrode
Takeuchi Yoshiaki, Mashima Hiroshi, Murata Masayoshi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 5A
Inductively coupled plasma source iwth itnernal straight antenna
Kanoh M., Suzuki K., Tonotani J., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 9A
Striation mechanism and triggered striation in dielectric microdischarge plasma
Lee Jae Koo, Sastgeer Sheikh, Shon Chae Hwa, Hur Min Sup et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 5B
A proposed process control chart for DC plasma spraying process. Pt II. Experimental verification for spraying alumina
Ang C.B., Devasenapathi A., Ng H.W. et al.
Plasma Chem. Plasma Process., Vol: 21, No: 3
Chemical kinetics database and predictive schemes for nonthermal humid air plasma chemistry. Pt II. Neutral species reactions
Herron J.T., Green D.S.
Plasma Chem. Plasma Process., Vol: 21, No: 3
Reduction of metallurgical wastes in an RF thermal plasma reactor
Mohai I., Szepvolgyi J., Karoly Z., et al.
Plasma Chem. Plasma Process., Vol: 21, No: 4
Diagnostics and application of high frequency plasma pencil
Janca J., Zajickova L., Klima M., et al.
Plasma Chem. Plasma Process., Vol: 21, No: 4
Несамостоятельный разряд в азоте с конденсированной дисперсной фазой
Паль А.Ф., Серов А.О., Старостин А.Н. и др.
Ж. эксперим. и теор. физ., Vol: 119, No: 2
Диагностика in situ плазменных технологических процессов микроэлектроники: современное состояние и ближайшие перспективы. Ч. I
Орликовский А.А., Руденко К.В.
Микроэлектроника, Vol: 30, No: 2
Влияние температуры поверхности облучаемой мишени на распределение наночастиц, сформированных имплантацией
Степанов А.Л., Холе(Hole D.), Попок В.Н.
Письма в ЖТФ, Vol: 27, No: 13
О физической модели короткого тлеющего разряда для плазменных дисплеев (PDP)
Кудрявцев А.А., Цендин Л.Д.
Письма в ЖТФ, Vol: 27, No: 7
Азотирование конструкционных сталей в газовых разрядах низкого давдения
Щапин П.М., Коваль Н.Н., Гончаренко И.М. и др.
Физ. и химия обраб. матер., Vol: , No: 3
Ионизация распыленных атомов металла в СВЧ-ЭЦР источнике плазмы
Полуэктов Н.П., Харченко В.Н., Усатов И.Г.
Физ. плазмы, Vol: 27, No: 7
Горение метан-кислородных и метан-кислород-фреоновых смесей, инициированное сильноточным скользящим поверхностным разрядом
Коссый И.А., Силаков В.П., Тарасова Н.М.
Физ. плазмы, Vol: 27, No: 8
Parameter space for collisionless RF sheaths
Manheimer W.M.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 2
Surface hydrogen incorpora;tion and profile broadening caused by sheath expansion in hydrogen plasma immersion ion implantation
Fan Z., Zeng X., Chu P.K.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 2
End-point detection of polymer etching using langmuir probes
de Castro R.M., Verdonck P., Pisani M.B., et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 3
A hard-tube pulser of 60 kV, 10 A for experiment and modeling in plasma immersion ion implantation
Rossi J.O., Ueda M.Barroso J.J., Spassov V.A.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 5
Experimental investigation of gas tungsten arc welding and comparison with theoretical predictions
Tusek J.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 5
Ion implantation and deposition on the inner surfaces of cylinders by exploding metallic foils
Demokan O.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 5
Manipulating large-area, heavy metal ion beams with a high-current electrostatic plasma lens
Goncharov A.A., Portsenko I.M., Yushkov G.Y., Brown I.G.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 6
Measurement and modeling of Xe vacuum ultraviolet emission and radiative transfer in a plasma display panel discharge
Tamida Taichiro, Sanders Steven Jay, Tanaka Masaaki
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 2A
A two-dimensional simulation of pulsed discharge for a color DC-type plasma display panel
Murakami Yukio, Matsuzaki Hideomi, Murakami Hiroshi, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 2A
Production of pure electron plasmas using a field emitter array
Tanaka Hitoshi, Sodekoda Tatsuya, Maekawa Takashi, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 2A
Development of yttrium-dihydride film for use in cold cathodelamps
Nakamura Osamu, Kanbara Minoru, Suzuki Shigemi, Mori Yuichi
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 8
Optical emission spectroscopy of arc flame plasma for generation of carbon nanotubes
Akita Seiji, Ashihara Hiroshi, Nakayama Yoshikazu
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 8
Influence of RF power supply on electron-cyclotron-resonance plasma with mirror confinement for SrTiO[3] thin film formation
Baba So, Miyake Shoji
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 8
Linear theory of plasma wakes
Lapenta Giovanni
Phys. Rev. E: Stat. Nonlinear Soft Matter Phys., Vol: 62, No: 1
Remarks relative to the use of atmospheric plasma-pulsed dischargefor PET bottles instant sterilization
Koulik P.
Plasma Chem. Plasma Process., Vol: 20, No: 1
A proposed process control chart for DC plasma spraying process
Ang C.B., Ng H.W., Yu S.C.M., Lam Y.C.
Plasma Chem. Plasma Process., Vol: 20, No: 3
An investigation of the positive column of a Cd-Ne glow discharge. I. Steady state
Petrova Ts., Ogoyski A., Petrov G.M., Blagoev A.
Plasma Chem. Plasma Process., Vol: 20, No: 3
Cleaning of air streams from organic pollutants by plasma-catalytic oxidation
Francke K.-P., Miessner H., Rudolph R.
Plasma Chem. Plasma Process., Vol: 20, No: 3
Inductively coupled plasma etching in ICl- and IBr-based chemistries. Part I. GaAs, GaSb, and AlGaAs
Hahn Y.B., Hays D.C., Cho H. et al.
Plasma Chem. Plasma Process., Vol: 20, No: 3
Inductively coupled plasma etching in ICl- and IBr-based chemistries. Part II. InP, InSb, InGaP, and InGaAs
Hahn Y.B., Hays D.C., Cho H. et al.
Plasma Chem. Plasma Process., Vol: 20, No: 3
Mathematical modeling of silica anode decomposition
Addona T., Proulx P., Munz R.J.
Plasma Chem. Plasma Process., Vol: 20, No: 4
Мишени на основе ферритов и высокотемпературных сверхпроводников для ионно-плазменного распыления
Лепешев А.А., Саунин В.Н., Телегин С.В. и др.
Ж. техн. физ., Vol: 70, No: 5
Расчет траекторий движения заряженных частиц в газоразрядных приборах низкого давления
Антошкин В.А., Арефьев А.С., Юдаев Ю.А.
Изв. РАН. Сер. физ., Vol: 64, No: 7
Исследование характеристик столба дуги при лазерно-дуговой сварке на основе численного моделирования
Старцев В.Н., Мартыненко Д.П., Леонов А.Ф.
Теплофиз. высок. температур, Vol: 38, No: 1
Структурно-фазовые в алюминии при последовательной имплантации ионов углерода и азота
Углов В.В., Черенда Н.Н., Даналюк А.Л., Ходасевич В.В.
Физ. и химия обраб. матер., Vol: , No: 2
Electron cyclotron resonance ion source ionic currents (both in the stable and periodic regimes) modeled in relation with the hot electron temperature via the potential dip
Pras R., Lamoureux M., Girard A., Khodja H., Melin G.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Prototype negative ion sources for radioactive ion beam generation (abstract)
Alton G.D., Welton R.F., Williams C., Cui B., Murray S.N.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Microwave ion sources for material processing (invited)
Sakudo N.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Distributed electron cyclotron resonance plasma immersion for large area ion implantation (invited)
Le Coeur F., Lagarde T., Pelletier J., Arnal Y., Burke R., Brunel M.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Indirectly heated cathode arc discharge source for ion implantation of semiconductors
Horsky Thomas N.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Powerful source of accelerated atoms for surface modification
Churkin I.N., Volosov V.I., Steshov A.G.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Bernas ion source modifications for platinum and aluminum ion implantation (abstract)
Medulla C., Raspagliesi M.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Ion sources for industrial applications (invited)
Ishikawa Junzo
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
A plasma window for vacuum-atmosphere interface and focusing lens of sources for nonvacuum ion material modification (invited)
Hershcovitch Ady
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Multicusp sources for ion beam projection lithography
Lee Y., Gough R.A., Kunkel W.B., Leung K.N., Vujic J., Williams M.D., Wutte D., Zahir N.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
A filamentless ion source for materials processing
Anders Andre, MacGill Robert A., Brown Ian G., Vizir Alexey
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
A filamentless ion source for materials processing
Anders Andre, MacGill Robert A., Brown Ian G., Vizir Alexey
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Vacuum arc ion and plasma source Raduga 5 for materials treatment
Ryabchikov A.I., Stepanov I.B., Dektjarev S.V., Sergeev O.V.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Formation of uniform titanium dioxide films by sputtering of tapered targets in an electron cylotron resonance plasma
Ishii S., Morishita N., Kato Y., Tani F., Koizumi Y., Sunagawa M.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Ion sources for microsize ion-beam treatment of optical parts
Michnev R.A., Shtandel S.K., Belokurov A.P., Martynov M.I.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Installation for ion-beam treatment of high-precision optical parts
Michnev R.A., Shtandel S.K.
Rev. Sci. Instrum. , Vol: 2, No: Pt 2
Effects of particle clouds in a plasma etch system on silicon dioxide wafer contamination
Collins S.M., O`Hanlon J.F., Carlile R.N.
J. Vac. Sci. Technol., A, Vol: 4, No: Pt 1
Role of ions in reactive ion etching
Coburn J.W.
J. Vac. Sci. Technol., A, Vol: 4, No: Pt 1
InGaAsP-InP nanoscale waveguide-coupledmicroring lasers with sub,illismpere threshold current using Cl[2]-N[2]-based high-density plasma etching
Park S., Kim S.-S., Wang L., et al.
IEEE J. Quantum Electron. , Vol: 41, No: 3
An atomic scale model of multilayer surface reactions and the feature profile evolution during plasma etching
Osano Yugo, Ono Kouichi
Jpn. J. Appl. Phys., Part 1, Vol: 44, No: 12
Quantitative analysis of CF[4] produced in the SiO[2] etching process using c-C[4]F[8], C[3]F[8], and C[2]F[6] plasmas by in situ mass spectrometry
Furuya Kenji, Hatano Yoshihiko
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 1
Effects of air exposure on SiO[2] surfaces irradiated with fluorocarbon plasma (Short Note)
Kurihara Kazuaki, Yamaoka Yoshikazu, Sekine Makoto
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 1
Requirements of neutral beam source regarding gas pressure and neutral angle for nanoscale etching
Kim Sung Jin, Lee Hae June, Yeom Geun Young, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 10
Etching characteristics of manganese-doped zinc sulfide film using Cl[2]/CF[4] inductively coupled plasma
Yun Sun Jin, Kwon Kwang-Ho, Lee Yong-Eui, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 5B
Исследование возможности ионно-стимулиpованного тpавления повеpхности полимеpов в плазме сильноточного диффузного pазpяда
Иванов И.В., Могpин Д.В., Садеков Я.А., и дp.
Поверхность. Рентген., синхротрон. и нейтрон. исслед., Vol: , No: 8
Characteristics of Ag etching using inductively coupled Cl[2]-based plasmas
Lee Y.-J., Park S.-D., Song B.-K. et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 1
A new Stacked-Mask process utilizing spun-on carbon film for sub-130-nm etching
Abe Junko, Hayashi Hisataka, Kishigami Daizo, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 10
Investigations of surface reactions in neutral loop discharge plasma for high-aspect-ratio SiO[2] etching
Morikawa Y., Chen W., Hayashi T., Uchida T.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 3
Etching reactivity of negative ions generated in Cl[2] downstream plasma
Morikawa Y., Shibayama T., Takayanagi S., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 3
Etching characteristics of organic polymers in the magnetic neutral loop discharge plasma
Morikawa Y., Hayashi T., Uchida T.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 3
Effect of etch gas on dry etching of ferroelectric Bi[3.25]La[0.75]Ti[3]O[12] thin films
Song Y.S., Kim H.I., Chung C.W.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 3
Electron cyclotron resonance-reactive ion etching of III-V semiconductors by cyclic injection of CH[4]/H[2]/Ar and O[2] with constant Ar flow
Haneji N., Segami G., Ide T., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6B
Transformation of dense cotnact holes during SiO[2] etching
Sakamori S., Fujiwara N., Miyatake H., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6B
Fine pattern etching of molybdenum thin film and silicon substrate by using atmospheric line-shaped microplasma source
Okumura T., Saitoh M., Yashiro, Kimura T.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6B
Effects of oxygen and nitrogen atoms on SiOCH film etching in ultrahigh-frequency plasma
Nagai H., Maeda Y., Hiramatsu M., et al.
Phys. Rev. A: At. Mol. Opt. Phys., Vol: 42, No: 3B
Planar laser-induced fluorescence of fluorocarbon radicals in oxide etch process plasma
Hayashi S., Ishikawa K., Sekine M.
Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 4A
Particle modeling of inductively coupled plasma and radicals flow to predict etch rate of silicon
Shiozawa M., Nanbu K.
Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 4A
SO[2] and NO[x] removal by electron beam and microwave induced non-thermal plasmas
Martin D., Ighigeanu D., Macarie R., et al.
Rom. Rep. Phys., Vol: 54, No: 6-10
Thermal behavior along depth of extreme ultraviolet lithography mask during dry etching
Chiba Akira, Hoshino Eiichi, Takahashi Masashi et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 12
High-efficiency neutral-beam generation by combination of inductively coupled plasma and parallel plate DC bias
Samukawa Seiji, Sakamoto Keisuke, Ichiki Katsunori
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 7B
A simplified model for the etch rate of novolac-based photoresist
ray R.P., Rhinehart R.R.
Plasma Chem. Plasma Process., Vol: 21, No: 1
A method of mechanistic model validation with a case study in plasma etching
Bray R.P., Rhinehart R.R.
Plasma Chem. Plasma Process., Vol: 21, No: 1
Травление материалов локализованным газовым разрядом
Абрамов А.В., Абрамова Е.А., Суровцев И.С.
Письма в ЖТФ, Vol: 27, No: 3
GaAs photonic crystals on SiO[2] fabricated by very-high-frequency anode-coupled reactive ion etching and wafer bonding
Saitoh Tadashi, Sogawa Tetsuomi, Notomi Masaya et al.
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 11
Electron cyclotron resonance plasma etching of α-Ta for X-ray mask absorber using chlorine and fluoride gas mixture
Tsuhizawa Tai, Iriguchi Hiroki, Takahashi Chiharu et al.
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 12B
RF-plasma-assisted fast atom beam etching
Ono Takahito, Orimoto Norimune, Lee Seungseoup et al.
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 12B
Initial stage of hydrogen etching of Si surface investigated by infrared reflection absorption spectroscopy
Noda Hideyuki, Urisu Tsuneo, Kobayashi Yoshihiro, Ogino Toshio
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 12B
In-situ time-resolve infrared spectroscopic study of silicon-oxide surface during selective etching over silicon in fluorocarbon plasma
Ishikawa Kenji, Sekine Makoto
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 12B
Etching characteristics of fine Ta patterns with electron cyclotron resonance chlorine plasma
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Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 12B
Effects of H[2] addition in magnetized inductively coupled C[2]F[6] plasma etching of silica aerogel film
Wang Seok-Joo, Park Hyung-Ho, Yeom Geun-Young
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 12B
Effects of SF[6] addition to O[2] plasma on polyimide etching
Kim Sang Hoon, Woo Sang-Gyun, Ahn Jinho
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 12B
Plasma treatment and dry etch characteristics of organic low-k dielectrics
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Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 12B
Effects of discharge frequency in plasma etching and ultrahigh-frequency plasma source for high-performance etching for ultralarge-scale integrated circuits
Samukawa S., Donnelly V.M., Malyshev M.V.
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 4A
A model for the mechanism of chlorinated plasma etching of aluminium
Baleo J.-N., Vignes M.-J.
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О механизме взрывного травления пленки полиамидокислоты в неравновесной кислородной плазме
Амиров И.И.
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Фоpмиpование наноpазмеpных упpочняющих фаз в плазменных покpытиях из сталей, чугунов и сплавов на основе железа
Калита В.И., Яpкин В.В., Касимцев А.В., Лубман Г.У.
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RF plasma conditions for growth of carbon nanostructures
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IEEE Trans. Plasma Sci. Pt 3, Vol: 33, No: 1pt2
Plasma treatment of mammalian vascular cells: A quantitative description
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IEEE Trans. Plasma Sci. Pt 3, Vol: 33, No: 2pt2
Applications of electron-beam generated plasmas to materials processing
Leonhardt D., Muratore Ch., Walton S.G.
IEEE Trans. Plasma Sci. Pt 3, Vol: 33, No: 2pt2
Control of uniformity of plasma-surface modification inside of small-diameter polyethylene tubing using microplasma diagnostics
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IEEE Trans. Plasma Sci. Pt 3, Vol: 33, No: 2pt2
H[α] emission as a feedback control sensor for reactive sputter deposition of nano-structured, diamond-like carbon coatings
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IEEE Trans. Plasma Sci. Pt 3, Vol: 33, No: 2pt2
Nanowire coating by plasma processing
Cao J., Matsoukas Th.
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Characterization of oxygen plasma with a fiber optic catalytic probe and determination of recombination coefficients
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Analytical solution of axisymmetrical Poisson equation for the electric field with thin sheaths
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Effect of He plasma treatment on the rectification properties of Al/CdTe Schottky contacts
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The particle in-flight characteristics in plasma spraying process measured by phase Doppler anemometry (PDA)
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Plasma Chem. Plasma Process., Vol: 25, No: 1
Simulation of step response of silane low-temperature pasma (1)
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Optimizing the process parameters and characterization of plasma sprayed alumina coatings
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Chin. J. Space Sci. = Kongjian kexue xuebao, Vol: 25, No: 1
Optimizing the process parameters and characterization of plasma sprayed alumina coatings
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In situ measurements of etching species in SF[6] microwave downstream plasma by ion attachment mass spectroscopy
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Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 8A
Стpуктуpа и свойства покpытий из Al-Ni, нанесенных импульсной плазменной стpуей на подложку из стали
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A new plasma process for surface treatment prior to wire bonding that utilizes the sublimation effect of alkyl group radicals
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Повышение функциональных свойств металлических матеpиалов в pезультате плазменной обpаботки
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Cleaning of glass disk in oxygen plasma by using compact electron-beam-excited plasma source
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Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 11A
Effect of oxygen plasma treatment of indium tin oxide for organic light-emitting devices with iodogallium phthalocyanine layer
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Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 4A
Calculated sheath dynamics under the influence of an asymmetrically pulsed dc bias
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Anode magnetron enhanced DC glow discharge processes for plasma surface cleaning and polymerization
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Ag/graphite tribological coatings prepared by plasma electrode type spray gun
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Rom. Rep. Phys., Vol: 54, No: 6-10
TVA discharges for hydrogen free carbon layer deposition
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Влияние физики-химического состояния поверхности образцов различной формы на колебания тока при электролитно-плазменной обработке
Невьянцева Р.Р., Измайлова Н.Ф., Парфенов Е.В., Быбин А.А.
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Упрочнение и массоперенос при импульсной плазменно-детонационной обработке сталей
Погребняк А.Д., Кульментьева О.П., Лшнякин В.С. и др.
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Влияние ионно-плазменной обpаботки на стойкость твеpдосплавного металлоpежущего инстpумента
Литвинов А.А.
Физ. и химия обраб. матер., Vol: , No: 4
Упpугие напpяжения в тонкопленочных покpытиях пpи ионно-плазменном упpочнении алюминиевых сплавов металлическими и интеpметаллическими соединениями на основе титана
Гpечихин Л.И., Иващенко С.А., Макаpевич Е.В.
Физ. и химия обраб. матер., Vol: , No: 4
Восстановление и упpочнение матpиц пpессования алюминиевых пpофилей методом электpоискpового легиpования
Веpхотуpов А.Д., Мулин Ю.И., Вишневский А.Н.
Физ. и химия обраб. матер., Vol: , No: 4
Evaluation of oxygen-plasma damage in GaAs exposed to a surface-wave plasma source developed for the ashing process
Aoki K., Uekusa S., Yamauchi T., Katsumata H.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 9A
СВЧ плазменное удаление фоторезиствных покрытий с полупроводниковых пластин
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Investigations on the energy influx at plasma surface processes
Kersten H, Rohle D., Deutsch H. et al.
Acta phys. slov., Vol: 50, No: 4
Enhanced energy depositon efficiency of glow discharge electron beams for metal surface treatment
Mingolo N., Cesa Y., Martinez O.E. et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 2
Ion implantation into race surfaces of aerospace ball bearings in a plasma immersion configuration
Zeng Z., Chu P.K., Tian X. et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 2
Fluid-like transport variables in a kinetic, collisonless plasma near a surface with ion and electron reflection
Wei P.-S., Yeh F.-B.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 4
The role of outgassing in surface flashover under vacuum
Neuber A.A., Butcher M., Krompholz H. et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 28, No: 5
Reduction of sheath electric field by multidielectric slabs in plasma
Uhm Han S.
J. Plasma Phys., Vol: 63, No: 2
Surface treatment by Ar plasma irradiation in electron cyclotron resonance chemicalvapor deposition
Hashimoto Jun-ichi, Ikoma Nobuyuki, Murata Michio et al.
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 5A
Field-emission characteristics of hydrogenated amorphous carbon films prepared by surface wave plasma
Nagatsu M., Sano T., Takada N., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 39, No: 9A
Влияние предварительной обработки в водородной плазме на радиационное дефектообразование в арсениде галлия, облученном гамма-квантами {60}Co
Коршунов Ф.П., Курилович Н.Ф., Прохоренко Т.А. и др.
Поверхность. Рентген., синхротрон. и нейтрон. исслед., Vol: , No: 5
Investigation of a new type nano carbon film prepared by high energy plasma assisted CVD
Yang Wu-Bao, Fan Song-Hua, Ge Min, et al.
Acta phys. sin., Vol: 55, No: 1
Characterization of a magnetron plasma for deposition of titanium oxide and titanium nitride films
Hippler R., Wrehde S., Stranak V., et al.
Contrib. Plasma Phys., Vol: 45, No: 5-6
Plasma-enhanced metal-organic chemical vapor deposition (PEMOCVD) of catalytic coatings for fuel cell reformers
Dhar R., Pedrow P.D., Liddell K.C., et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 33, No: 1pt2
Growth and characterization of ZnO film on sapphire by the helicon wave oxygen-plasma-assisted evaporation process
Park Sun-Hong, Park Tae-Hee, Kim Kyoung-Bo, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 44, No: 5A
Aerosol plasma deposition method for preparation of lead zirconate titanate thick films (Brief Communication)
Peng Cheng-Jien, Wang Shih-Chieh, Wang Sea-Fue, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 44, No: 5A
Electrochemical deposition of ZnO[1-x]S[x] thin films using three-step pulse
Fathy Naglaa, Ichimura Masaya
Jpn. J. Appl. Phys., Part 2, Vol: 44, No: 42-45
Study on the preparation of high barrier hydrogenated carbon film and its properties
Chen Guang-Liang, Ge Yuan-Jing, Zhang Yue-Fei, et al.
Acta phys. sin., Vol: 54, No: 2
Study on the microstructure and properties of (Ti, Al)N film deposited by pulsed high energy density plasma
Liu Yuan-Fu, Han Jian-Min, Zhang Gu-Ling, et al.
Acta phys. sin., Vol: 54, No: 3
Structure and tribology properties of diamond-like carbon films prepared by microwave electron cyclotron resonance plasma source ion implantation
Gao Peng, Xu Jun, Deng Xin-Lu, et al.
Acta phys. sin., Vol: 54, No: 7
Zr-N films prepared by MW-ECR PE-UNB alanced magnetron sputtering: plasma diagnostics and structure evolution
Zhang Zhi-Guo, Liu Tian-Wei, Xu Jun, et al.
Acta phys. sin., Vol: 54, No: 7
Preparation of Al[2]O[3] ceramic coating by electrolytic plasma processing and its properties
Gu Wei-Chao, Shen De-Jiu, Wang Yu-Lin, et al.
Acta phys. sin., Vol: 54, No: 7
Рост a-C:H-слоев пpи темпеpатуpе 200 К
Маpкин А.В.
Вопр. атом. науки и техн. Сер. Термоядер. синтез, Vol: , No: 1
Film deposition on particles trapped in the sheath of reactive dusty plasma: Effect of size distribution
Matsoukas T., Cao J.C.
IEEE Trans. Plasma Sci. Pt 3, Vol: 2, No: 2
Shadowgraphic studies of DLC film deposition process in dense plasma focus device
Soh L.Y., Lee P., Shuyan X., et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 2, No: 1
Microstructure and adhesion of Au deposited on parylene-c substrate with surface modification for potential immunoassay application
Lee J.H., Hwang K.S., Yoon K.H., et al.
IEEE Trans. Plasma Sci. Pt 3, Vol: 2, No: 1
Measurements of elastic properties of plasma-sprayed coatings using bulk ultrasonic pulses
Sugasawa Sh.
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 5B
Filtered cathodic vacuum arc process conditions and properties of thin tetrahedral amorphous carbon films
Inaba Hiroshi, Furusawa Kenji, Sasaki Shinji
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 5B
Plasma copolymerization of C[6]F[6]/C[5]F[8] for application of low-dielectric-constant fluorinated amorphous carbon films and its gas-phase diagnostics using in situ fourier transform infrared spectroscopy
Shirafuji Tatsuru, Tsuchino Akio, Nakamura Toshihiro, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 5B
Deposition and characterization of low-stress plasma enhanced chemical vapor deposition of tetraethoxysilane oxide for micro-electro-mechanical-sistems applications
Chang Chin-Piao, Wang Yeong-Shing, Huang Ruey-Shing
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 8A
Growth and surface morphology of textured NiO thin films deposited by off-axis RF magnetron sputtering (Short Note)
Ryu Hyun-Wook, Choi Gwang-Pyo, Hong Gwang-Jun, et al.
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 8A
The effects of hydrogen plasma treatment on the plasma-enhanced chemical vapor deposition a-SiC:H films
Chen Chia-Fu, Li Yan-Way
Jpn. J. Appl. Phys., Part 1, Vol: 43, No: 8A
Simulation of gas-phase nanoparticle dynamics in the plasma-enhanced chemical vapor deposition of carbon nanostructures
Rutkevych P.P., Ostrikov K., Denysenko I.B., et al.
Phys. scr., Vol: 70, No: 5
Diamond-like carbon films deposited on optical glass substrate by using ECR microwave acetone plasma CVD method
Yang Wu-Bao, Wang Jiu-Li, Zhang Gu-Ling, et al.
Acta phys. sin., Vol: 53, No: 9
Кинетика обpазования оксидной пленки на повеpхности катода в тлеющем pазpяде атмосфеpного давления в гелии
Аpхипенко В.И., Гpебень В.З., Длугунович В.А., и дp.
Ж. прикл. спектроскопии, Vol: 71, No: 3
Фоpмиpование повеpхностного слоя пpи нанесении покpытий в плазме несамостоятельного тлеющего pазpяда
Лозован А.А., Железнов В.В., Тишкин А.А.
Поверхность. Рентген., синхротрон. и нейтрон. исслед., Vol: , No: 8
Плазменная установка для нанесения покpытий на повеpхность твеpдых тел "Яшма-2"
Ананьин П.С., Баинов Д.Д., Косицын Л.Г., и дp.
Приборы и техн. эксперим., Vol: , No: 4
Покpытия из каpбонат-гидpоксилапатита на кpемнии
Бобpовский В.В.
Физ. и химия обраб. матер., Vol: , No: 2
Low-temperature growth of carbon nanotube by plasma-enhanced chemical vapor deposition using nickel catalyst
Ryu K., Kang M., Kim Y., Jeon H.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6A
Structure and electrical studies of fluorinated amorphous carbon films prepared by electron cyclotron resonance/chemical-vapor deposition
Huang K.P., Lin P., Shih H.C.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6A
Growth of highly oriented CoCrTa films by inductively coupled plasma-assisted sputtering
Okimura K., Yamauchi K.
Jpn. J. Appl. Phys., Part 1, Vol: 42, No: 6A
On the use of global kinetics models for the investigation of energy deposition and chemistry in RF argon-oxygen plamas working in the Torr regime
Morscheidt W., Hassouni K., Bauduin N., et al.
Plasma Chem. Plasma Process., Vol: 23, No: 1
Deposition of vinyl acetic through the pulsed rf plasma plymerization
Zhang Jing, Feng Xiang-Fen, Xie Han-Kun, et al
Acta phys. sin., Vol: 52, No: 7
Механизм pоста покpытия на стадии микpоплазменных pазpядов
Хохpяков Е.В., Бутягин П.И., Мамаев А.И.
Физ. и химия обраб. матер., Vol: , No: 2
Свойства углеpодных покpытий, синтезиpованных из импульсных плазменных потоков и обpаботанных потоками газовых ионов
Хамчуков Ю.Д., Бобpовский В.В., Сычев И.Ю., Пакуpо Дж.
Физ. и химия обраб. матер., Vol: , No: 5
Использование оптической эмиссионной спектpоскопии для контpоля состава плазмы в пpоцессах осаждения углеpодных пленок в СВЧ-pазpяде
Двоpкин В.В., Дзбановский Н.Н., Минаков П.В., и дp.
Физ. плазмы, Vol: 29, No: 9
Studies of a reactive sputter ion plating for prepar;ation of TiN films using a facing target sputter and immersed inductive coupled plasma source
Sung Y.-M., Otsubo M., Honda C., Park C.-H.
Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 11A
C[4]F[8]O/O[2]/N-based additive gases for silicon nitride plasma enhanced chemical vapor deposition chamber cleaning with low global warming potentials
Kim J.H., Bae J.W., Oh C.H., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 11A
Properties of TiO[2] thin films on InP substrate prepared by liquid phase depositon
Lee M.-K., Huang J.-J., Shih C.-M., Cheng C.-C.
Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 7A
Investigation of nitrogen atoms in low-pressure nitrogen plasmas using a compact electron-beam-excited plasma source
Tada S., Takashima S., Ito M., et al.
Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 7A
Effects of Fe film thickness and pretreatments on the growth behaviours of carbon nanotubes on Fe-doped (001) Si substrates
Sohn J.I., Choi C.-J., Lee S., Seong T.-Y.
Jpn. J. Appl. Phys., Part 1, Vol: 41, No: 7A
Deposition rate as described by the electrical characteristics of thermionic vacuum arc discharges (TVA)
Mustata I., Cretu M., Cudalbu C., et al.
Rom. Rep. Phys., Vol: 54, No: 1-5
Effect of ion bombardment on the properties of TiN coatings deposited by the cathodic arc technique
Braic M., Braic V., Manea A., et al.
Rom. Rep. Phys., Vol: 54, No: 6-10
Nanoindentation measurements of superhard TiN films prepared by magnetron reactive sputtering plasma using neon and nitrogen
Lungu C.P., Saze H., Takai O.
Rom. Rep. Phys., Vol: 54, No: 6-10
Relationship between thermal stability and optical bandgap of fluorinated amorphous carbon films
Yang Shen-Dong, Ning Zhao-Yuan, Huang Feng, et al.
Acta phys. sin., Vol: 51, No: 6
Получение покрытий из порошковых материалов с применением короткой аргоновой дуги. 1. Экспериментальное изучение нагрева макрочастиц в плазме
Шиманович В.Д., Смягликов И.П., Золотовский А.И.
Инж.-физ. ж., Vol: 75, No: 6
Нанесение покрытий в холловском торцевом ускорителе плазмы с центральным экранирующим анодом
Литвинов А.А.
Физ. и химия обраб. матер., Vol: , No: 2
Получение прочного сцепления с подложкой при низкоскоростном газоплазменном напылении жидких металлических частиц. I. Взаимодействие частиц с подложкой
Синолицын Э.К.
Физ. и химия обраб. матер., Vol: , No: 2
Стpуктуpа и свойства покpытий, напpавленных импульсной плазменной стpуей
Погpебняк А.Д., Тюpин Ю.Н., Колисниченко О.В.
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Optical constants of TiO[2] thin films based on spectroscopic ellipsometry measurements
Mardare D.
An. sti. Univ. Iasi. Fiz. plasm. si spectosc., Vol: 47, No:
SrTa[2]O[6] thin films deposited by plasma-enhanced atomic layer depsotion
Lee Won-Jae, You In-Kyu, Ryu Sang-Ouk et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 12
C-axis-oriented Ru thin films prepared by sputtering in Ar and O[2] gas mixture
Abe Yoshio, Kaga Yukinao, Kawamura Midori, Sasaki Katsutaka
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 12
Quantitative analysis of hydrogen in amorphous films hydrogenated carbon nitride
Ohkawara Yoshiaki, Ohshio Shigeo, Suzuki Tsuneo et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 12
Dual damascene etching process using sacrificial spin-on-glass film
Seta Shoji, Yoshida Yukimasa, Nakata Renpei, Ohiwa Tokuhisa
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 12
A modified EDDY code to simulate erosion/redeposition of carbon target in an ITER-FEAT divertor
Ohya K., Kawakami R.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 9A
High-efficiency low energy neutral beam generation using negative ions in pulsed plasma
Samukawa Seiji, Sakamoto Keisuke, Ichiki Katsunori
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 10A
Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator
Taniyama Norikazu, Kudo Minoru, Matsumoto Osamu et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 7A
Novel high-density microwave plasma utilizing an internal spoke antenna for fast deposition of microcrystalline silicon films
Shirai Hajime, Yoshino Koichi, Ohkawara Go et al.
Jpn. J. Appl. Phys., Part 1, Vol: 40, No: 7A
Experimental testing of a curvilinear gas shroud nozzle for improved plasma spraying
Thomson I., Pershin V., Mostaghimi J., Chandra S.
Plasma Chem. Plasma Process., Vol: 21, No: 1
Deposition of diamondlike carbon film and mass spectroemtry measurement in CH[4]/N[2] RF plasma
Nutsukura N.
Plasma Chem. Plasma Process., Vol: 21, No: 2
Wire-arc spray modeling
Kelkar M., Heberlein J.
Plasma Chem. Plasma Process., Vol: 21, No: 4
Dynamics of spial formation in plasma spray coating process
Mostaghimi J., Pasandideh-Fard M., Chandra S.
Plasma Chem. Plasma Process., Vol: 21, No: 4
ECR Plasma in growth of cubic GaN by low pressure MOCVD
Gu B., Xu Y., Qin F.W., et al.
Plasma Chem. Plasma Process., Vol: 21, No: 4
Синтез тонких пленок с регулируемым поглощением с помощью струйного высокочастотного индукционного плазмотрона
Абдуллин И.Ш., Галяутдинов Р.Т., Кашапов Н.Ф.
Инж.-физ. ж., Vol: 74, No: 5
О механизме образования катодного покрытия в углеродной дуге
Анищик В.М., Пыжов И.А., Смягликов И.П. и др.
Инж.-физ. ж., Vol: 74, No: 5
Determination of optical parameters and thichness of thin films deposited on absorbing substrates using their reflection spectra
M:ullerova J., Mudron J.
Acta phys. slov., Vol: 50, No: 4
Distribution functions of positive ions and electrons in a plasma near a surface
Wei P.-S., Yeh F.-B., Ho C.-Y.
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Thin-film deposition of (Ba[x]Sr[1-x])TiO[3] by pulsed ion beam evaporation
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The microwave electro-thermal (MET) thruster using water vapor propellant
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Analysis of influence of address electrode width on address discharge characteristics using threshold voltage closed curve
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Laser-produced plasma light source development for extreme ultraviolet lithography
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Nano-carbon particle preparation by plasma assisted PLD technique-plume diagnostics and particle analysis
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Аналитическое описание распространения тепла при непрямолинейной ручной сварке соединений из профильных труб
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