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Behavior of F atoms and CF[2] radicals in fluorocarbon plasmas ror SiO[2]/Si etching

Tachibana Kunihide, Kamisugi Hideaki, Kawasaki Takeshi

Jpn. J. Appl. Phys., Part 1, vol: 38, num: 7B, 4367-4372, published: , JP


   Plasma Physics (including Thermonuclear Fusion).
      Plasma applications.
         Plasma technology.
            Etching.

   Plasma Physics (including Thermonuclear Fusion).
      Plasma diagnostic techniques and instrumentation.
         Laser diagnostics.
            Resonant fluorescence.

   Plasma Physics (including Thermonuclear Fusion).
      Electric discharges (Gas discharges).
         High frequency discharges.
            Low pressure discharges.