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Effect of substrate bias on Si epitaxial growth using sputtering type electron cyclotron resonance (ECR) plasma

Gao Junsi, Nakashima Hiroshi, Wang Junli, et al.

Jpn. J. Appl. Phys., Part 1, vol: 38, num: 11B, L1293-L1295, published: , JP


   Plasma Physics (including Thermonuclear Fusion).
      Electric discharges (Gas discharges).
         High frequency discharges.
            High frequency discharges in magnetic field.

   Plasma Physics (including Thermonuclear Fusion).
      Plasma applications.
         Plasma technology.
            Film deposition.

   Plasma Physics (including Thermonuclear Fusion).
      Plasma applications.
         Plasma technology.
            Surface treatment.

   Gases and liquids. Thermodynamics and statistical physics.
      Theory of irreversible processes and kinetic phenomena.
         Kinetics of the phase transitions.
            Growth kinetics.

   Gases and liquids. Thermodynamics and statistical physics.
      Statistical thermodynamics.
         Thermodynamics and statistical physics of systems of charged particles.
            Thermodynamics and statistical physics of plasma.

   Gases and liquids. Thermodynamics and statistical physics.
      Statistical thermodynamics.
         Thermodynamics and statistical physics of surfaces and films.