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Using auger electron spectroscopy for chemical analysis of plasma Damage induced by reactive ion etching of SiO[2]

Matsui Miyako, Uchida Fumihiko, Katsuyama Kiyomi et al.

Jpn. J. Appl. Phys., Part 1, vol: 37, num: 11, 6199-6203, published: , JP


   Plasma Physics (including Thermonuclear Fusion).
      Plasma applications.
         Plasma technology.
            Etching.

   Plasma Physics (including Thermonuclear Fusion).
      Elementary processes in plasma.
         Ionization of atoms.
            Auger transitions.

   Plasma Physics (including Thermonuclear Fusion).
      Plasma diagnostic techniques and instrumentation.
         Particle measurements.

   Radiophysics. Physical electronics.
      Electron and ion emission. Spectroscopy.
         Electron emission.
            Electron spectroscopy.
               Auger spectroscopy.

   Radiophysics. Physical electronics.
      Electron and ion emission. Spectroscopy.
         Electron emission.
            Electron spectroscopy.
               Photoelectric electron.