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Highly selective SiO[2] etching using inductively coupled plasma source with a multispiral coil

Yamanaka M., Hayashi Sh., Kubota M., Nakagawa H.

Jpn. J. Appl. Phys., Part 1, vol: 37, num: 4B, 2343-2348, published: , JP


   Laser physics.
      Laser applications: Physical bases.
         Laser technology.
            Laser diagnostics of technological processes.

   Plasma Physics (including Thermonuclear Fusion).
      Plasma applications.
         Plasma technology.

   Plasma Physics (including Thermonuclear Fusion).
      Electric discharges (Gas discharges).
         High frequency discharges.
            Low pressure discharges.

   Plasma Physics (including Thermonuclear Fusion).
      Plasma diagnostic techniques and instrumentation.
         Laser diagnostics.
            Resonant fluorescence.