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A study of the O[2]-SO[2] plasma etch chemistry for top surface imaging photoresist dry development

Huang Z.S., Melaku Y., Nguyen W.

Jpn. J. Appl. Phys., Part 1, vol: 37, num: 4B, 2373-2380, published: , JP


   Plasma Physics (including Thermonuclear Fusion).
      Plasma applications.
         Plasma technology.

   Plasma Physics (including Thermonuclear Fusion).
      Plasma applications.
         Plasma chemistry.

   Plasma Physics (including Thermonuclear Fusion).
      Electric discharges (Gas discharges).
         High frequency discharges.
            Low pressure discharges.

   Plasma Physics (including Thermonuclear Fusion).
      Plasma diagnostic techniques and instrumentation.
         Particle measurements.