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Laser-Assisted Counter-Facing Plasma Focus Device as a Light Source for EUV Lithography

Tatsuya Sodekoda; Shintaro Kurata; Hajime Kuwabara; Tomoaki Kawasaki; Shotaro Kittaka; Kazuhiko Horioka

IEEE Trans. Plasma Sci., vol: 45, num: 5, 836 - 842, published: 01 May 2017,


   Plasma Physics (including Thermonuclear Fusion).
      Magnetic plasma confinement. (including fusion reactions)
         Pinch effects.
            Plasma focus.

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